JP2019150929A - チャックテーブル、切削装置、及び、切削装置のチャックテーブル修正方法 - Google Patents
チャックテーブル、切削装置、及び、切削装置のチャックテーブル修正方法 Download PDFInfo
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- JP2019150929A JP2019150929A JP2018038871A JP2018038871A JP2019150929A JP 2019150929 A JP2019150929 A JP 2019150929A JP 2018038871 A JP2018038871 A JP 2018038871A JP 2018038871 A JP2018038871 A JP 2018038871A JP 2019150929 A JP2019150929 A JP 2019150929A
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- chuck table
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- cutting blade
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- 238000005520 cutting process Methods 0.000 title claims abstract description 196
- 238000000034 method Methods 0.000 title claims abstract description 18
- 239000004020 conductor Substances 0.000 claims description 25
- 230000002093 peripheral effect Effects 0.000 claims description 22
- 238000003754 machining Methods 0.000 claims description 21
- 238000001514 detection method Methods 0.000 claims description 15
- 239000002390 adhesive tape Substances 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 5
- 229920005989 resin Polymers 0.000 claims description 5
- 230000007246 mechanism Effects 0.000 description 21
- 238000010586 diagram Methods 0.000 description 12
- 239000000758 substrate Substances 0.000 description 9
- 239000002346 layers by function Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000002173 cutting fluid Substances 0.000 description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Dicing (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Abstract
Description
6 X軸移動機構(加工送りユニット)
20、120 チャックテーブル
21、121、321 本体部
21a、121a、321a 保持面
21b、121b、321b 吸引溝
21c、121c、321c 吸引路
21d、121d、321d 下面
21e 修正面
22 クランプ(フレーム保持部)
32 吸引源
42 切削ユニット移動機構(割り出し送りユニット、切り込み送りユニット)
60 切削ユニット
64 スピンドル
65 ハウジング
66 切削ブレード
66a 先端
72 制御ユニット
72a 加工送り制御部
72b 割り出し送り制御部
80 検出回路
100 被加工物
101 基板
102 表面
103 分割予定ライン
104 デバイス
105 裏面
106 ダイシングテープ(粘着テープ)
106A 環状領域
107 フレーム
108 フレームユニット
130 導体部(導体領域)
131 接触部
220 基台
221 基台付本体部(本体部)
321f 細溝(内側吸引溝)
Claims (10)
- 環状のフレームの開口に粘着テープで被加工物が支持されるフレームユニットの該被加工物を該粘着テープを介して保持面で保持する本体部と、該本体部の外周で該フレームを保持するフレーム保持部とを備え、該被加工物を切削ブレードで分割するのに用いる切削装置のチャックテーブルであって、
該本体部は、
平坦面で構成される該保持面と、
該フレームユニットの該被加工物と該フレームの間の環状領域が重なる該保持面の領域に形成され、該環状領域の該粘着テープを吸引保持する外周吸引溝と、
該外周吸引溝と吸引源とを連通する吸引路と、を有し、
該フレーム保持部は、
該保持面より該フレームを引き落として保持し、該粘着テープを該保持面に密着させるチャックテーブル。 - 該外周吸引溝は、該被加工物を囲繞する環状溝である請求項1に記載のチャックテーブル。
- 平坦な該保持面は半導体であるシリコンで構成されている請求項1または2に記載のチャックテーブル。
- 該保持面の一部には導体で形成された導体領域を備え、
該導体は、該チャックテーブルが支持される支持台と接触する該チャックテーブルの外周面または該保持面と反対側の裏面側に電気的に接続する請求項1から3のいずれか一項に記載のチャックテーブル。 - 該導体は、カーボン、またはカーボンが混合された樹脂からなる請求項4に記載のチャックテーブル。
- 該保持面における該外周吸引溝の内側領域に形成され、該外周吸引溝に連通する内側吸引溝を更に備える請求項1から5のいずれか一項に記載のチャックテーブル。
- 請求項1から6のいずれか一項に記載のチャックテーブルを支持し、該チャックテーブルに保持された被加工物を切削ブレードで切削する切削装置であって、
該切削ブレードが装着されるスピンドルを該保持面と直交する切り込み送り方向に移動させる切り込み送りユニットと、
該切削ブレードの先端と該チャックテーブルの該保持面の該切り込み送り方向での位置を電気的導通により検出する検出回路とを備え、
該検出回路は、該切削ブレードが装着されるスピンドルと該チャックテーブルとを電気的に接続し、該保持面と該切削ブレードとの接触時の導通により該位置を検出する切削装置。 - 該切削ブレードは該保持面の該導体領域に接触する請求項7に記載の切削装置。
- 請求項1から6のいずれか一項に記載のチャックテーブルと、該チャックテーブルに保持された被加工物を切削する切削ブレードが装着されるスピンドルと、該チャックテーブルを該スピンドルに対し該スピンドルの回転軸と直行する加工送り方向に相対的に移動させる加工送りユニットと、該チャックテーブルに対し該スピンドルを該回転軸と平行な割り出し送り方向に相対的に移動させる割り出し送りユニットと、該スピンドルを該加工送り方向及び該割り出し送り方向に直行する切り込み送り方向に移動させる切り込み送りユニットと、を備える切削装置のチャックテーブル修正方法であって、
該チャックテーブルの該保持面に切り込む所定の高さに設定した該切削ブレードで該保持面を研削して修正面を形成し、該修正面を新たな該保持面とする切削装置のチャックテーブル修正方法。 - 該切削ブレードが該チャックテーブルの該保持面に切り込む深さは該外周吸引溝より浅い請求項9に記載の切削装置のチャックテーブル修正方法。
Priority Applications (3)
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JP2018038871A JP7106298B2 (ja) | 2018-03-05 | 2018-03-05 | チャックテーブル、切削装置、及び、切削装置のチャックテーブル修正方法 |
CN201910159322.3A CN110233128B (zh) | 2018-03-05 | 2019-03-04 | 卡盘工作台、切削装置以及卡盘工作台的修正方法 |
US16/293,009 US11101162B2 (en) | 2018-03-05 | 2019-03-05 | Chuck table, cutting apparatus, and method correcting chuck table |
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JP2018038871A JP7106298B2 (ja) | 2018-03-05 | 2018-03-05 | チャックテーブル、切削装置、及び、切削装置のチャックテーブル修正方法 |
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JP2019150929A true JP2019150929A (ja) | 2019-09-12 |
JP7106298B2 JP7106298B2 (ja) | 2022-07-26 |
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US (1) | US11101162B2 (ja) |
JP (1) | JP7106298B2 (ja) |
CN (1) | CN110233128B (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021049611A (ja) * | 2019-09-26 | 2021-04-01 | Shoda株式会社 | 加工システム及びその制御方法 |
WO2022097842A1 (ko) * | 2020-11-06 | 2022-05-12 | ㈜토니텍 | 정밀 간격 배치용 포켓을 구비한 반도체 패키지의 마운팅 테이블 및 이 마운팅 테이블을 구비한 반도체 패키지 마운팅 시스템 |
JP7503362B2 (ja) | 2020-02-14 | 2024-06-20 | 株式会社ディスコ | 切削装置、及び、切削方法 |
JP7542368B2 (ja) | 2020-09-04 | 2024-08-30 | 株式会社ディスコ | 保持テーブル及び保持方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7357521B2 (ja) * | 2019-11-28 | 2023-10-06 | 株式会社ディスコ | 加工装置 |
JP7418916B2 (ja) * | 2020-01-31 | 2024-01-22 | 株式会社ディスコ | 切削ブレードの位置検出方法 |
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2018
- 2018-03-05 JP JP2018038871A patent/JP7106298B2/ja active Active
-
2019
- 2019-03-04 CN CN201910159322.3A patent/CN110233128B/zh active Active
- 2019-03-05 US US16/293,009 patent/US11101162B2/en active Active
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JPH11307619A (ja) * | 1998-04-20 | 1999-11-05 | Yamatake Corp | ウエハ固定装置 |
JP2004356357A (ja) * | 2003-05-29 | 2004-12-16 | Disco Abrasive Syst Ltd | 切削方法 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2021049611A (ja) * | 2019-09-26 | 2021-04-01 | Shoda株式会社 | 加工システム及びその制御方法 |
JP7138321B2 (ja) | 2019-09-26 | 2022-09-16 | Shoda株式会社 | 加工システム及びその制御方法 |
JP7503362B2 (ja) | 2020-02-14 | 2024-06-20 | 株式会社ディスコ | 切削装置、及び、切削方法 |
JP7542368B2 (ja) | 2020-09-04 | 2024-08-30 | 株式会社ディスコ | 保持テーブル及び保持方法 |
WO2022097842A1 (ko) * | 2020-11-06 | 2022-05-12 | ㈜토니텍 | 정밀 간격 배치용 포켓을 구비한 반도체 패키지의 마운팅 테이블 및 이 마운팅 테이블을 구비한 반도체 패키지 마운팅 시스템 |
Also Published As
Publication number | Publication date |
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CN110233128B (zh) | 2024-03-15 |
US20190273010A1 (en) | 2019-09-05 |
CN110233128A (zh) | 2019-09-13 |
US11101162B2 (en) | 2021-08-24 |
JP7106298B2 (ja) | 2022-07-26 |
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