JP2018190950A - 配線回路基板、および、撮像装置 - Google Patents
配線回路基板、および、撮像装置 Download PDFInfo
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- JP2018190950A JP2018190950A JP2017191030A JP2017191030A JP2018190950A JP 2018190950 A JP2018190950 A JP 2018190950A JP 2017191030 A JP2017191030 A JP 2017191030A JP 2017191030 A JP2017191030 A JP 2017191030A JP 2018190950 A JP2018190950 A JP 2018190950A
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- terminal
- insulating layer
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- circuit board
- wiring
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
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-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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Abstract
Description
1.撮像素子実装基板
図1〜図3Bを参照して、本発明の配線回路基板の一実施形態として、撮像素子実装基板(以下、単に実装基板とも略する。)の第1実施形態を説明する。
第1実施形態の実装基板1は、図4A〜図5Gに示すように、例えば、金属支持板用意工程、ベース絶縁層形成工程、金属薄膜形成工程、フォトレジスト形成工程、導体パターン形成工程、フォトレジスト・金属薄膜除去工程、第1カバー絶縁層形成工程、シールド層形成工程、第2カバー絶縁層形成工程、および、金属支持板除去工程を順次実施することにより、得られる。
図6を参照して、第1実施形態の実装基板1を備える撮像装置20を説明する。
図10〜図11を参照して、第1実施形態の実装基板1の変形例について説明する。なお、変形例において、上記した図2に示す実施形態と同様の部材には同様の符号を付し、その説明を省略する。
1.撮像素子実装基板
図12を参照して、本発明の配線回路基板の一実施形態として、実装基板の第2実施形態について説明する。なお、第2実施形態の実装基板1において、上記した図2に示す第1実施形態と同様の部材には同様の符号を付し、その説明を省略する。
第2実施形態の実装基板1は、図14A〜図15Jに示すように、例えば、金属支持板用意工程、ベース絶縁層形成工程、金めっき層形成工程、充填部形成工程、金属薄膜形成工程、フォトレジスト形成工程、導体パターン形成工程、フォトレジスト・金属薄膜除去工程、第1カバー絶縁層形成工程、シールド層形成工程、第2カバー絶縁層形成工程、および、金属支持板除去工程を順次実施することにより、得られる。第1実施形態と同様の工程については、省略する。
第2実施形態の実装基板1を備える撮像装置20は、図6が参照されるように、第1実施形態の実装基板1を備える撮像装置20と同様である。
図16〜図17を参照して、第2実施形態の実装基板1の変形例について説明する。なお、変形例において、上記した図2、図12などに示す実施形態と同様の部材には同様の符号を付し、その説明を省略する。
図1〜図17に示す実施形態では、配線回路基板として、撮像素子に実装するための撮像素子実装基板1を例示したが、この用途に限定されず、本発明の配線回路基板は、撮像素子以外の電子素子(例えば、圧電素子、発光素子)を実装するための配線回路基板として使用することができる。
4 ベース絶縁層
5 導体パターン
6 第1カバー絶縁層
7 シールド層
8 第2カバー絶縁層
9 撮像素子接続端子
12 接続配線
14 端子領域
14a 端子領域の上面
20 撮像装置
21 撮像素子
41 撮像素子開口部
43 内側面
51 端子接続部
52 配線接続部
53 周縁部
54 中実部
55 内側部
56 外側部
57 金めっき層
Claims (10)
- 第1絶縁層と、
端子と、
前記端子の厚み方向一方側に配置される第2絶縁層と、
前記端子と厚み方向と交差する方向に連続する配線と
を備え、
前記第1絶縁層は、厚み方向に貫通し、厚み方向一方側に向かうに従って開口断面積が広がる開口部を有し、
前記端子は、
前記開口部を形成する前記第1絶縁層の内側面に接触する周縁部と、
前記周縁部の内側に、前記周縁部と一体的に配置される中実部と
を有し、
前記周縁部および前記中実部は、前記開口部の全部を充填していることを特徴とする、配線回路基板。 - 前記端子の厚み方向他方面が、前記第1絶縁層の厚み方向他方面と略面一であることを特徴とする、請求項1に記載の配線回路基板。
- 前記端子を厚み方向に投影したときに、前記端子と重複する配線回路基板の厚み方向一方面が、略平坦であることを特徴とする、請求項1または2に記載の配線回路基板。
- 前記端子は、前記周縁部および前記中実部の厚み方向一方側に、前記周縁部および前記中実部と一体的に配置される配線接続部とを備え、
前記配線の厚み方向一方面が、前記配線接続部の厚み方向一方面と略面一であることを特徴とする請求項1〜3のいずれか一項に記載の配線回路基板。 - 前記端子は、
前記厚み方向に投影したときに、前記開口部に含まれる内側部と、
前記内側部から外側に延びる外側部と
を備え、
前記内側部の厚み方向一方面は、前記外側部の厚み方向一方面と略面一であることを特徴とする、請求項1〜4のいずれか一項に記載の配線回路基板。 - 前記端子の厚みが、30μm以下であることを特徴とする、請求項1〜5のいずれか一項に記載の配線回路基板。
- 前記端子は、前記開口部内に配置され、前記開口部の厚み方向他方面から露出する金めっき層をさらに備えることを特徴とする、請求項1〜6のいずれか一項に記載の配線回路基板。
- 前記第2絶縁層の厚み方向一方側に配置されるシールド層と、
前記シールド層の厚み方向一方側に配置される第3絶縁層と
をさらに備えることを特徴とする、請求項1〜7のいずれか一項に記載の配線回路基板。 - 撮像素子を実装するために用いられることを特徴とする、請求項1〜8のいずれか一項に記載の配線回路基板。
- 請求項1〜9のいずれか一項に記載の配線回路基板と、
前記配線回路基板に実装される撮像素子と
を備えることを特徴とする、撮像装置。
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PCT/JP2018/016447 WO2018199017A1 (ja) | 2017-04-28 | 2018-04-23 | 配線回路基板、および、撮像装置 |
US16/607,612 US11183448B2 (en) | 2017-04-28 | 2018-04-23 | Wiring circuit board and imaging device |
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