JP2018018702A5 - - Google Patents
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- Publication number
- JP2018018702A5 JP2018018702A5 JP2016148487A JP2016148487A JP2018018702A5 JP 2018018702 A5 JP2018018702 A5 JP 2018018702A5 JP 2016148487 A JP2016148487 A JP 2016148487A JP 2016148487 A JP2016148487 A JP 2016148487A JP 2018018702 A5 JP2018018702 A5 JP 2018018702A5
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- region
- display
- manufacturing
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims 14
- 238000004519 manufacturing process Methods 0.000 claims 10
- 239000011810 insulating material Substances 0.000 claims 2
- 238000009832 plasma treatment Methods 0.000 claims 2
- SPSPIUSUWPLVKD-UHFFFAOYSA-N 2,3-dibutyl-6-methylphenol Chemical compound CCCCC1=CC=C(C)C(O)=C1CCCC SPSPIUSUWPLVKD-UHFFFAOYSA-N 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 229910021417 amorphous silicon Inorganic materials 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 235000010354 butylated hydroxytoluene Nutrition 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 239000011368 organic material Substances 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 150000003014 phosphoric acid esters Chemical class 0.000 claims 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 claims 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- -1 siloxanes Chemical class 0.000 claims 1
- 239000002313 adhesive film Substances 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016148487A JP6717700B2 (ja) | 2016-07-28 | 2016-07-28 | 表示装置の製造方法 |
| TW106115257A TWI659527B (zh) | 2016-07-28 | 2017-05-09 | 顯示裝置之製造方法 |
| KR1020170064616A KR101908230B1 (ko) | 2016-07-28 | 2017-05-25 | 표시 장치의 제조 방법 |
| CN201710391404.1A CN107665957B (zh) | 2016-07-28 | 2017-05-27 | 显示装置的制造方法 |
| US15/632,485 US9941491B2 (en) | 2016-07-28 | 2017-06-26 | Method of manufacturing display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016148487A JP6717700B2 (ja) | 2016-07-28 | 2016-07-28 | 表示装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018018702A JP2018018702A (ja) | 2018-02-01 |
| JP2018018702A5 true JP2018018702A5 (enExample) | 2019-06-20 |
| JP6717700B2 JP6717700B2 (ja) | 2020-07-01 |
Family
ID=61010625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016148487A Active JP6717700B2 (ja) | 2016-07-28 | 2016-07-28 | 表示装置の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9941491B2 (enExample) |
| JP (1) | JP6717700B2 (enExample) |
| KR (1) | KR101908230B1 (enExample) |
| CN (1) | CN107665957B (enExample) |
| TW (1) | TWI659527B (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019167270A1 (ja) * | 2018-03-02 | 2019-09-06 | シャープ株式会社 | 表示装置及びその製造方法 |
| US20220181582A1 (en) * | 2019-03-28 | 2022-06-09 | Sharp Kabushiki Kaisha | Display device, and method for manufacturing display device |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5985740A (en) * | 1996-01-19 | 1999-11-16 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a semiconductor device including reduction of a catalyst |
| US6465287B1 (en) * | 1996-01-27 | 2002-10-15 | Semiconductor Energy Laboratory Co., Ltd. | Method for fabricating a semiconductor device using a metal catalyst and high temperature crystallization |
| US6312979B1 (en) * | 1998-04-28 | 2001-11-06 | Lg.Philips Lcd Co., Ltd. | Method of crystallizing an amorphous silicon layer |
| US7109653B2 (en) | 2002-01-15 | 2006-09-19 | Seiko Epson Corporation | Sealing structure with barrier membrane for electronic element, display device, electronic apparatus, and fabrication method for electronic element |
| JP4656916B2 (ja) * | 2003-11-14 | 2011-03-23 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| US7612498B2 (en) * | 2003-11-27 | 2009-11-03 | Toshiba Matsushita Display Technology Co., Ltd. | Display element, optical device, and optical device manufacturing method |
| US7732334B2 (en) * | 2004-08-23 | 2010-06-08 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| JP5025107B2 (ja) * | 2004-08-23 | 2012-09-12 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP4865999B2 (ja) * | 2004-11-19 | 2012-02-01 | 株式会社日立製作所 | 電界効果トランジスタの作製方法 |
| TWI396464B (zh) * | 2007-01-22 | 2013-05-11 | Innolux Corp | 有機電致發光顯示裝置及其製作方法 |
| JP2009196318A (ja) * | 2008-02-25 | 2009-09-03 | Fujifilm Corp | 積層体とバリア性フィルム基板の製造方法、バリア材料、デバイスおよび光学部材 |
| JP5424738B2 (ja) * | 2009-06-23 | 2014-02-26 | キヤノン株式会社 | 表示装置 |
| JP2011018686A (ja) * | 2009-07-07 | 2011-01-27 | Hitachi Displays Ltd | 有機ｅｌ表示装置 |
| JP2011210544A (ja) * | 2010-03-30 | 2011-10-20 | Canon Inc | 有機発光装置及びその製造方法 |
| JP3195992U (ja) * | 2011-06-17 | 2015-02-19 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | Ｏｌｅｄ処理のためのｃｖｄマスクアライメント |
| JP5971679B2 (ja) * | 2011-11-21 | 2016-08-17 | 株式会社ジャパンディスプレイ | 液晶表示装置 |
| KR101948173B1 (ko) * | 2012-11-29 | 2019-02-14 | 엘지디스플레이 주식회사 | 유기전계발광 표시소자 |
| CN105514298B (zh) * | 2015-12-31 | 2018-12-18 | 固安翌光科技有限公司 | 一种薄膜封装结构及薄膜封装方法 |
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2016
- 2016-07-28 JP JP2016148487A patent/JP6717700B2/ja active Active
-
2017
- 2017-05-09 TW TW106115257A patent/TWI659527B/zh active
- 2017-05-25 KR KR1020170064616A patent/KR101908230B1/ko active Active
- 2017-05-27 CN CN201710391404.1A patent/CN107665957B/zh active Active
- 2017-06-26 US US15/632,485 patent/US9941491B2/en active Active