JP2009230128A5 - - Google Patents
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- Publication number
- JP2009230128A5 JP2009230128A5 JP2009040576A JP2009040576A JP2009230128A5 JP 2009230128 A5 JP2009230128 A5 JP 2009230128A5 JP 2009040576 A JP2009040576 A JP 2009040576A JP 2009040576 A JP2009040576 A JP 2009040576A JP 2009230128 A5 JP2009230128 A5 JP 2009230128A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- resist mask
- conductive film
- forming
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010408 film Substances 0.000 claims 72
- 239000004065 semiconductor Substances 0.000 claims 32
- 238000005530 etching Methods 0.000 claims 19
- 239000012535 impurity Substances 0.000 claims 12
- 239000004973 liquid crystal related substance Substances 0.000 claims 11
- 238000004519 manufacturing process Methods 0.000 claims 10
- 230000003796 beauty Effects 0.000 claims 8
- 239000010409 thin film Substances 0.000 claims 6
- 238000000034 method Methods 0.000 claims 4
- 238000001312 dry etching Methods 0.000 claims 1
- 238000001039 wet etching Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009040576A JP5525166B2 (ja) | 2008-02-27 | 2009-02-24 | 液晶表示装置及びその製造方法、電子機器 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008046601 | 2008-02-27 | ||
| JP2008046601 | 2008-02-27 | ||
| JP2009040576A JP5525166B2 (ja) | 2008-02-27 | 2009-02-24 | 液晶表示装置及びその製造方法、電子機器 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014081525A Division JP5788052B2 (ja) | 2008-02-27 | 2014-04-11 | 薄膜トランジスタ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009230128A JP2009230128A (ja) | 2009-10-08 |
| JP2009230128A5 true JP2009230128A5 (enExample) | 2012-03-29 |
| JP5525166B2 JP5525166B2 (ja) | 2014-06-18 |
Family
ID=40997429
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009040576A Expired - Fee Related JP5525166B2 (ja) | 2008-02-27 | 2009-02-24 | 液晶表示装置及びその製造方法、電子機器 |
| JP2014081525A Expired - Fee Related JP5788052B2 (ja) | 2008-02-27 | 2014-04-11 | 薄膜トランジスタ |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014081525A Expired - Fee Related JP5788052B2 (ja) | 2008-02-27 | 2014-04-11 | 薄膜トランジスタ |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8049221B2 (enExample) |
| JP (2) | JP5525166B2 (enExample) |
| CN (1) | CN101939694B (enExample) |
| TW (1) | TWI483049B (enExample) |
| WO (1) | WO2009107686A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8101442B2 (en) * | 2008-03-05 | 2012-01-24 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing EL display device |
| US7749820B2 (en) * | 2008-03-07 | 2010-07-06 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor, manufacturing method thereof, display device, and manufacturing method thereof |
| US8207026B2 (en) * | 2009-01-28 | 2012-06-26 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of thin film transistor and manufacturing method of display device |
| US7989234B2 (en) * | 2009-02-16 | 2011-08-02 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing thin film transistor and method for manufacturing display device |
| US8202769B2 (en) | 2009-03-11 | 2012-06-19 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| JP5539765B2 (ja) * | 2009-03-26 | 2014-07-02 | 株式会社半導体エネルギー研究所 | トランジスタの作製方法 |
| US8456586B2 (en) * | 2009-06-11 | 2013-06-04 | Apple Inc. | Portable computer display structures |
| US8408780B2 (en) * | 2009-11-03 | 2013-04-02 | Apple Inc. | Portable computer housing with integral display |
| US8743309B2 (en) | 2009-11-10 | 2014-06-03 | Apple Inc. | Methods for fabricating display structures |
| US8467177B2 (en) | 2010-10-29 | 2013-06-18 | Apple Inc. | Displays with polarizer windows and opaque masking layers for electronic devices |
| US9143668B2 (en) | 2010-10-29 | 2015-09-22 | Apple Inc. | Camera lens structures and display structures for electronic devices |
| US9894781B2 (en) | 2012-06-06 | 2018-02-13 | Apple Inc. | Notched display layers |
| US11838432B2 (en) | 2019-12-03 | 2023-12-05 | Apple Inc. | Handheld electronic device |
| US11637919B2 (en) | 2019-12-03 | 2023-04-25 | Apple Inc. | Handheld electronic device |
| US12003657B2 (en) | 2021-03-02 | 2024-06-04 | Apple Inc. | Handheld electronic device |
| US12267449B2 (en) | 2022-03-03 | 2025-04-01 | Apple Inc. | Handheld electronic device |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56122123A (en) * | 1980-03-03 | 1981-09-25 | Shunpei Yamazaki | Semiamorphous semiconductor |
| JPS60242674A (ja) * | 1984-05-17 | 1985-12-02 | Oki Electric Ind Co Ltd | 薄膜トランジスタ及びその製造方法 |
| JPS61225869A (ja) * | 1985-03-29 | 1986-10-07 | Seiko Instr & Electronics Ltd | 薄膜トランジスタ装置とその製造方法 |
| JPS6269680A (ja) * | 1985-09-24 | 1987-03-30 | Seiko Instr & Electronics Ltd | 薄膜トランジスタの製造方法 |
| JPS6273669A (ja) * | 1985-09-26 | 1987-04-04 | Seiko Instr & Electronics Ltd | 薄膜トランジスタ装置の製造方法 |
| JPS6484669A (en) | 1987-09-26 | 1989-03-29 | Casio Computer Co Ltd | Thin film transistor |
| JPH0311744A (ja) | 1989-06-09 | 1991-01-21 | Citizen Watch Co Ltd | 薄膜トランジスタの製造方法 |
| JPH03161938A (ja) | 1989-11-20 | 1991-07-11 | Seiko Instr Inc | 薄膜トランジスタの製造方法 |
| JPH04188770A (ja) * | 1990-11-22 | 1992-07-07 | Casio Comput Co Ltd | 薄膜トランジスタ |
| JP3161938B2 (ja) * | 1995-05-11 | 2001-04-25 | キヤノン株式会社 | 超伝導線の製造方法 |
| DE69635239T2 (de) * | 1995-11-21 | 2006-07-06 | Samsung Electronics Co., Ltd., Suwon | Verfahren zur Herstellung einer Flüssigkristall-Anzeige |
| JPH09292633A (ja) * | 1996-02-27 | 1997-11-11 | Canon Inc | カラー液晶表示装置の製造方法 |
| JPH1084669A (ja) * | 1996-09-10 | 1998-03-31 | Fuji Electric Co Ltd | 電力変換装置のノイズフィルタ |
| JPH1117166A (ja) * | 1997-06-23 | 1999-01-22 | Nec Corp | 半導体装置の製造方法 |
| US6493048B1 (en) * | 1998-10-21 | 2002-12-10 | Samsung Electronics Co., Ltd. | Thin film transistor array panel for a liquid crystal display and a method for manufacturing the same |
| US6858898B1 (en) * | 1999-03-23 | 2005-02-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| JP3450758B2 (ja) * | 1999-09-29 | 2003-09-29 | 株式会社東芝 | 電界効果トランジスタの製造方法 |
| KR100325079B1 (ko) * | 1999-12-22 | 2002-03-02 | 주식회사 현대 디스플레이 테크놀로지 | 고개구율 및 고투과율 액정표시장치의 제조방법 |
| KR100494683B1 (ko) * | 2000-05-31 | 2005-06-13 | 비오이 하이디스 테크놀로지 주식회사 | 4-마스크를 이용한 박막 트랜지스터 액정표시장치의제조시에 사용하는 할프톤 노광 공정용 포토 마스크 |
| US7223643B2 (en) * | 2000-08-11 | 2007-05-29 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing a semiconductor device |
| JP4570278B2 (ja) * | 2000-08-28 | 2010-10-27 | シャープ株式会社 | アクティブマトリクス基板 |
| TW488080B (en) * | 2001-06-08 | 2002-05-21 | Au Optronics Corp | Method for producing thin film transistor |
| JP2003179069A (ja) * | 2001-12-12 | 2003-06-27 | Matsushita Electric Ind Co Ltd | 薄膜トランジスタ、液晶表示装置、有機エレクトロルミネッセンス素子、ならびに表示装置用基板およびその製造方法 |
| JP2004241774A (ja) | 2003-02-03 | 2004-08-26 | Samsung Electronics Co Ltd | 薄膜トランジスタ表示板及びその製造方法とそのためのマスク |
| US7579220B2 (en) * | 2005-05-20 | 2009-08-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device manufacturing method |
| KR101201017B1 (ko) * | 2005-06-27 | 2012-11-13 | 엘지디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
| KR101225440B1 (ko) * | 2005-06-30 | 2013-01-25 | 엘지디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
| KR20070019457A (ko) * | 2005-08-12 | 2007-02-15 | 삼성전자주식회사 | 박막 트랜지스터 표시판 및 이를 포함하는 액정표시장치 |
| JP5105811B2 (ja) | 2005-10-14 | 2012-12-26 | 株式会社半導体エネルギー研究所 | 表示装置 |
| US8149346B2 (en) * | 2005-10-14 | 2012-04-03 | Semiconductor Energy Laboratory Co., Ltd. | Display device and manufacturing method thereof |
| EP1793266B1 (en) * | 2005-12-05 | 2017-03-08 | Semiconductor Energy Laboratory Co., Ltd. | Transflective Liquid Crystal Display with a Horizontal Electric Field Configuration |
| EP2479605B1 (en) * | 2005-12-05 | 2015-07-15 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device |
| JP2007227440A (ja) * | 2006-02-21 | 2007-09-06 | Idemitsu Kosan Co Ltd | Tft基板及びその製造方法 |
| TWI322288B (en) * | 2006-03-07 | 2010-03-21 | Au Optronics Corp | Manufacture method of pixel array substrate |
| KR20080001181A (ko) * | 2006-06-29 | 2008-01-03 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 어레이 기판과 그 제조방법 |
| WO2008099528A1 (ja) * | 2007-02-13 | 2008-08-21 | Sharp Kabushiki Kaisha | 表示装置、表示装置の製造方法 |
| KR101296653B1 (ko) * | 2007-10-05 | 2013-08-14 | 엘지디스플레이 주식회사 | 액정 표시 장치 및 이의 제조 방법 |
| KR101243824B1 (ko) * | 2008-09-24 | 2013-03-18 | 엘지디스플레이 주식회사 | 액정표시장치 및 그 제조방법 |
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2009
- 2009-02-19 CN CN200980104073.2A patent/CN101939694B/zh not_active Expired - Fee Related
- 2009-02-19 WO PCT/JP2009/053465 patent/WO2009107686A1/en not_active Ceased
- 2009-02-23 US US12/390,911 patent/US8049221B2/en not_active Expired - Fee Related
- 2009-02-24 JP JP2009040576A patent/JP5525166B2/ja not_active Expired - Fee Related
- 2009-02-26 TW TW098106195A patent/TWI483049B/zh not_active IP Right Cessation
-
2011
- 2011-10-31 US US13/285,456 patent/US8361820B2/en not_active Expired - Fee Related
-
2014
- 2014-04-11 JP JP2014081525A patent/JP5788052B2/ja not_active Expired - Fee Related