JP2018006851A - 弾性波デバイスの製造方法及び弾性波デバイス - Google Patents
弾性波デバイスの製造方法及び弾性波デバイス Download PDFInfo
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 12
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- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 15
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 13
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- 229910000484 niobium oxide Inorganic materials 0.000 claims description 9
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 9
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 9
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 9
- 229910052714 tellurium Inorganic materials 0.000 claims description 9
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 9
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- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 5
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- 229910020177 SiOF Inorganic materials 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
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Abstract
【解決手段】圧電基板10上に、櫛型電極26と櫛型電極26に接続された配線層14とを形成する工程と、圧電基板10上に、櫛型電極26及び配線層14よりも厚い膜厚で櫛型電極26と配線層14とを覆う、他の元素がドープ又は非ドープの酸化シリコンからなる誘電体膜12を形成する工程と、誘電体膜12上に、配線層14上に開口51を有する誘電体膜50を形成する工程と、配線層14の端面と櫛型電極26とを覆って誘電体膜12が残存するように、誘電体膜50の開口51で露出した誘電体膜12を、誘電体膜50のエッチングレートが誘電体膜12よりも遅くなるようなエッチング液を用いたウエットエッチングで除去する工程と、を備える弾性波デバイスの製造方法。
【選択図】図8
Description
12 誘電体膜
13 開口
14 配線層
15 端面
16 保護膜
18 パッド電極
20 IDT
22 電極指
24 バスバー
26 櫛型電極
28 反射器
30 Ti層
32 Cu層
34 Cr層
36 Ti層
38 Au層
40〜40b レジスト膜
41 開口
42a〜42c バンプ
50 誘電体膜
51 開口
52 厚膜部
54 残渣物
60 突起部
100、110、200、210、400 弾性波共振器
120、130、220、230、300、310 ラダー型フィルタ
S1〜S4 直列共振器
P1〜P3 並列共振器
Claims (8)
- 圧電基板上に、櫛型電極と前記櫛型電極に接続された配線層とを形成する工程と、
前記圧電基板上に、前記櫛型電極及び前記配線層よりも厚い膜厚で前記櫛型電極と前記配線層とを覆う、他の元素がドープ又は非ドープの酸化シリコンからなる第1誘電体膜を形成する工程と、
前記第1誘電体膜上に、前記配線層上に開口を有する第2誘電体膜を形成する工程と、
前記配線層の端面と前記櫛型電極とを覆って前記第1誘電体膜が残存するように、前記第2誘電体膜の前記開口で露出した前記第1誘電体膜を、前記第2誘電体膜のエッチングレートが前記第1誘電体膜よりも遅くなるようなエッチング液を用いたウエットエッチングで除去する工程と、を備える弾性波デバイスの製造方法。 - 圧電基板上に、櫛型電極と前記櫛型電極に接続された配線層とを形成する工程と、
前記圧電基板上に、前記櫛型電極及び前記配線層よりも厚い膜厚で前記櫛型電極と前記配線層とを覆う、他の元素がドープ又は非ドープの酸化シリコンからなる第1誘電体膜を形成する工程と、
前記第1誘電体膜上に、酸化タンタル、酸化ニオブ、酸化タングステン、酸化チタン、酸化テルル、酸化アルミニウム、窒化シリコン、窒化アルミニウム、及び炭化シリコンのうちの少なくとも1種を含み、前記配線層上に開口を有する第2誘電体膜を形成する工程と、
前記配線層の端面と前記櫛型電極とを覆って前記第1誘電体膜が残存するように、前記第2誘電体膜の前記開口で露出した前記第1誘電体膜を、フッ酸系エッチング液を用いたウエットエッチングで除去する工程と、を備える弾性波デバイスの製造方法。 - 前記第2誘電体膜を形成する工程は、前記配線層上及び前記櫛型電極と前記配線層とが形成されていない領域上に前記開口を有する前記第2誘電体膜を形成し、
前記第1誘電体膜を除去する工程は、前記第1誘電体膜が前記配線層の端面を覆い且つ前記配線層の端面に沿って残存するように、前記第2誘電体膜の前記開口で露出した前記第1誘電体膜を除去する、請求項1または2記載の弾性波デバイスの製造方法。 - 前記第1誘電体膜を除去する工程は、前記櫛型電極及び前記配線層が形成されていない領域に前記第1誘電体膜が突起部として残存するように、前記第1誘電体膜を除去する、請求項3記載の弾性波デバイスの製造方法。
- 前記第2誘電体膜を形成する工程は、前記第1誘電体膜を除去することで形成される開口の周囲における厚さが他の部分よりも厚い厚膜部を有する前記第2誘電体膜を形成する、請求項1から4のいずれか一項記載の弾性波デバイスの製造方法。
- 前記第2誘電体膜を形成する工程は、前記第2誘電体膜に対してドライエッチングを行うことで側壁に残渣物が付着した前記厚膜部を有する前記第2誘電体膜を形成する、請求項5記載の弾性波デバイスの製造方法。
- 圧電基板と、
前記圧電基板上に設けられた櫛型電極と、
前記圧電基板上に設けられ、前記櫛型電極に接続された配線層と、
前記圧電基板上に設けられ、前記櫛型電極と前記配線層の端面とを覆い且つ前記配線層を露出する開口を有し、前記櫛型電極及び前記配線層よりも厚い膜厚を有する、他の元素がドープ又は非ドープの酸化シリコンからなる第1誘電体膜と、
前記第1誘電体膜上に設けられ、フッ酸系エッチング液を用いたウエットエッチングにおけるエッチングレートが前記第1誘電体膜よりも遅い第2誘電体膜と、を備える弾性波デバイス。 - 圧電基板と、
前記圧電基板上に設けられた櫛型電極と、
前記圧電基板上に設けられ、前記櫛型電極に接続された配線層と、
前記圧電基板上に設けられ、前記櫛型電極と前記配線層の端面とを覆い且つ前記配線層を露出する開口を有し、前記櫛型電極及び前記配線層よりも厚い膜厚を有する、他の元素がドープ又は非ドープの酸化シリコンからなる第1誘電体膜と、
前記第1誘電体膜上に設けられ、酸化タンタル、酸化ニオブ、酸化タングステン、酸化チタン、酸化テルル、酸化アルミニウム、窒化シリコン、窒化アルミニウム、及び炭化シリコンのうちの少なくとも1種を含む第2誘電体膜と、を備える弾性波デバイス。
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