JP2017505998A5 - - Google Patents

Download PDF

Info

Publication number
JP2017505998A5
JP2017505998A5 JP2016549259A JP2016549259A JP2017505998A5 JP 2017505998 A5 JP2017505998 A5 JP 2017505998A5 JP 2016549259 A JP2016549259 A JP 2016549259A JP 2016549259 A JP2016549259 A JP 2016549259A JP 2017505998 A5 JP2017505998 A5 JP 2017505998A5
Authority
JP
Japan
Prior art keywords
glass substrate
ppm
cte2
cte1
main surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016549259A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017505998A (ja
JP6505726B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2015/013405 external-priority patent/WO2015116749A1/en
Publication of JP2017505998A publication Critical patent/JP2017505998A/ja
Publication of JP2017505998A5 publication Critical patent/JP2017505998A5/ja
Application granted granted Critical
Publication of JP6505726B2 publication Critical patent/JP6505726B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2016549259A 2014-01-31 2015-01-29 半導体チップを相互接続するためのインタポーザを提供するための方法及び装置 Expired - Fee Related JP6505726B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461934366P 2014-01-31 2014-01-31
US61/934,366 2014-01-31
PCT/US2015/013405 WO2015116749A1 (en) 2014-01-31 2015-01-29 Methods and apparatus for providing an interposer for interconnecting semiconductor chips

Publications (3)

Publication Number Publication Date
JP2017505998A JP2017505998A (ja) 2017-02-23
JP2017505998A5 true JP2017505998A5 (enExample) 2018-03-22
JP6505726B2 JP6505726B2 (ja) 2019-04-24

Family

ID=52463211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016549259A Expired - Fee Related JP6505726B2 (ja) 2014-01-31 2015-01-29 半導体チップを相互接続するためのインタポーザを提供するための方法及び装置

Country Status (7)

Country Link
US (2) US9472479B2 (enExample)
EP (1) EP3100300A1 (enExample)
JP (1) JP6505726B2 (enExample)
KR (1) KR20160114710A (enExample)
CN (1) CN106165088B (enExample)
TW (1) TWI653713B (enExample)
WO (1) WO2015116749A1 (enExample)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6505726B2 (ja) * 2014-01-31 2019-04-24 コーニング インコーポレイテッド 半導体チップを相互接続するためのインタポーザを提供するための方法及び装置
KR101681410B1 (ko) * 2015-04-20 2016-11-30 삼성전기주식회사 커패시터 부품
US9780044B2 (en) * 2015-04-23 2017-10-03 Palo Alto Research Center Incorporated Transient electronic device with ion-exchanged glass treated interposer
CN107851646A (zh) * 2015-07-10 2018-03-27 凸版印刷株式会社 配线基板及其制造方法
US9852988B2 (en) 2015-12-18 2017-12-26 Invensas Bonding Technologies, Inc. Increased contact alignment tolerance for direct bonding
US20170179066A1 (en) * 2015-12-18 2017-06-22 Russell S. Aoki Bulk solder removal on processor packaging
EP3479398B1 (en) 2016-07-01 2025-02-19 Intel Corporation Molded embedded bridge for enhanced emib applications
US10446487B2 (en) 2016-09-30 2019-10-15 Invensas Bonding Technologies, Inc. Interface structures and methods for forming same
US10580735B2 (en) 2016-10-07 2020-03-03 Xcelsis Corporation Stacked IC structure with system level wiring on multiple sides of the IC die
WO2018126052A1 (en) 2016-12-29 2018-07-05 Invensas Bonding Technologies, Inc. Bonded structures with integrated passive component
US20180190583A1 (en) * 2016-12-29 2018-07-05 Invensas Bonding Technologies, Inc. Bonded structures with integrated passive component
WO2018169968A1 (en) 2017-03-16 2018-09-20 Invensas Corporation Direct-bonded led arrays and applications
WO2018183739A1 (en) 2017-03-31 2018-10-04 Invensas Bonding Technologies, Inc. Interface structures and methods for forming same
DE202018006776U1 (de) 2017-06-15 2022-12-14 Chiaro Technology Limited Brustpumpensystem
US11584673B2 (en) * 2017-07-31 2023-02-21 Corning Incorporated Laminate article having a non-glass core and glass envelope and methods thereof
TWI653919B (zh) * 2017-08-10 2019-03-11 晶巧股份有限公司 高散熱等線距堆疊晶片封裝結構和方法
US10622311B2 (en) 2017-08-10 2020-04-14 International Business Machines Corporation High-density interconnecting adhesive tape
TW201936376A (zh) * 2017-12-21 2019-09-16 美商康寧公司 包含低cte玻璃層的多層隔熱玻璃單元
US11169326B2 (en) 2018-02-26 2021-11-09 Invensas Bonding Technologies, Inc. Integrated optical waveguides, direct-bonded waveguide interface joints, optical routing and interconnects
US11256004B2 (en) 2018-03-20 2022-02-22 Invensas Bonding Technologies, Inc. Direct-bonded lamination for improved image clarity in optical devices
US11515291B2 (en) 2018-08-28 2022-11-29 Adeia Semiconductor Inc. Integrated voltage regulator and passive components
US11114308B2 (en) 2018-09-25 2021-09-07 International Business Machines Corporation Controlling of height of high-density interconnection structure on substrate
US11195789B2 (en) 2018-11-30 2021-12-07 International Business Machines Corporation Integrated circuit module with a structurally balanced package using a bottom side interposer
US10707169B1 (en) * 2018-12-28 2020-07-07 Intel Corporation Ceramic interposers for on-die interconnects
US11148935B2 (en) 2019-02-22 2021-10-19 Menlo Microsystems, Inc. Full symmetric multi-throw switch using conformal pinched through via
JP7293360B2 (ja) 2019-03-07 2023-06-19 アブソリックス インコーポレイテッド パッケージング基板及びこれを含む半導体装置
EP3916770A4 (en) 2019-03-07 2022-11-02 Absolics Inc. Packaging substrate and semiconductor apparatus comprising same
US11901281B2 (en) 2019-03-11 2024-02-13 Adeia Semiconductor Bonding Technologies Inc. Bonded structures with integrated passive component
JP7228697B2 (ja) 2019-03-12 2023-02-24 アブソリックス インコーポレイテッド パッケージング基板及びこれを含む半導体装置
EP3916772A4 (en) 2019-03-12 2023-04-05 Absolics Inc. PACKAGING SUBSTRATE AND SEMICONDUCTOR DEVICE WITH IT
CN113424304B (zh) 2019-03-12 2024-04-12 爱玻索立克公司 装载盒及对象基板的装载方法
WO2020185023A1 (ko) 2019-03-12 2020-09-17 에스케이씨 주식회사 패키징 기판 및 이의 제조방법
KR102515304B1 (ko) 2019-03-29 2023-03-29 앱솔릭스 인코포레이티드 반도체용 패키징 유리기판, 반도체용 패키징 기판 및 반도체 장치
KR102600154B1 (ko) 2019-06-12 2023-11-07 삼성전자주식회사 반도체 패키지
KR20220089715A (ko) 2019-08-23 2022-06-28 앱솔릭스 인코포레이티드 패키징 기판 및 이를 포함하는 반도체 장치
US11762200B2 (en) 2019-12-17 2023-09-19 Adeia Semiconductor Bonding Technologies Inc. Bonded optical devices
GB202004395D0 (en) 2020-03-26 2020-05-13 Chiaro Technology Ltd Lima
US20230402337A1 (en) * 2020-11-16 2023-12-14 Corning Incorporated 3d interposer with through glass vias - method of increasing adhesion between copper and glass surfaces and articles therefrom
KR20220150137A (ko) 2021-05-03 2022-11-10 삼성전자주식회사 반도체 패키지
US12476176B2 (en) * 2022-03-29 2025-11-18 Intel Corporation Glass core substrate printed circuit board for warpage reduction
GB2622196A (en) 2022-08-31 2024-03-13 Chiaro Technology Ltd Measurement system
TWI834336B (zh) * 2022-10-12 2024-03-01 欣興電子股份有限公司 封裝結構及其製作方法
CN115677213B (zh) * 2022-11-16 2024-07-26 湖南兆湘光电高端装备研究院有限公司 化学强化层压玻璃制品及其制备方法
KR102738263B1 (ko) 2023-03-14 2024-12-05 주식회사 아크 수동 소자가 내장된 mems구조의 기판 및 반도체 패키지

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4221047A (en) * 1979-03-23 1980-09-09 International Business Machines Corporation Multilayered glass-ceramic substrate for mounting of semiconductor device
US5209798A (en) * 1991-11-22 1993-05-11 Grunman Aerospace Corporation Method of forming a precisely spaced stack of substrate layers
US6399892B1 (en) 2000-09-19 2002-06-04 International Business Machines Corporation CTE compensated chip interposer
JP2003342064A (ja) * 2002-05-28 2003-12-03 Kyocera Corp ガラスセラミック焼結体および多層配線基板
JP2005050882A (ja) * 2003-07-29 2005-02-24 Kyocera Corp 積層型配線基板および電気装置並びにその実装構造
US7226654B2 (en) * 2003-07-29 2007-06-05 Kyocera Corporation Laminated wiring board and its mounting structure
US7221050B2 (en) * 2004-09-02 2007-05-22 Intel Corporation Substrate having a functionally gradient coefficient of thermal expansion
US8780576B2 (en) * 2011-09-14 2014-07-15 Invensas Corporation Low CTE interposer
US8865507B2 (en) * 2011-09-16 2014-10-21 Sionyx, Inc. Integrated visible and infrared imager devices and associated methods
JP6505726B2 (ja) * 2014-01-31 2019-04-24 コーニング インコーポレイテッド 半導体チップを相互接続するためのインタポーザを提供するための方法及び装置

Similar Documents

Publication Publication Date Title
JP2017505998A5 (enExample)
MX2016013040A (es) Particula adhesiva selectivamente aplicada en sustratos no metalicos.
WO2012057893A3 (en) Multiple bonding layers for thin-wafer handling
FR2963982B1 (fr) Procede de collage a basse temperature
SG10201805702QA (en) Method of forming an integrated circuit and related integrated circuit
JP2012169678A5 (enExample)
WO2009001564A1 (ja) 半導体素子の実装構造体及びその製造方法、半導体素子の実装方法、並びに加圧ツール
US8866273B2 (en) Lead frame and semiconductor package structure thereof
WO2010126448A3 (en) Novel bonding process and bonded structures
TW201613037A (en) Substrate for power modules, substrate with heat sink for power modules and power module with heat sink
WO2012122388A3 (en) Chip-last embedded interconnect structures and methods of making the same
JP2009111373A5 (enExample)
JP2008270771A5 (enExample)
WO2012177934A3 (en) Integrated circuits with components on both sides of a selected substrate and methods of fabrication
TWI621230B (zh) 用來控制積體電路封裝扭曲的可移除式基板
WO2013025573A3 (en) Solder bump bonding in semiconductor package using solder balls having high-temperature cores
SG10201805091VA (en) Semiconductor package and method of manufacturing the same
WO2015038367A3 (en) Forming through wafer vias in glass
JP2015224143A5 (enExample)
WO2011111989A3 (ko) 금속접합 세라믹기판
TW200741934A (en) Wafer-shaped measuring apparatus and method for manufacturing the same
CN107768415A (zh) 柔性显示器件、显示装置以及制造方法
JP2013229457A5 (enExample)
JP2009158764A5 (enExample)
MX2017014614A (es) Particulado adhesivo aplicado en forma selectiva en substratos no metalicos.