JP2017057490A5 - - Google Patents
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- JP2017057490A5 JP2017057490A5 JP2016010266A JP2016010266A JP2017057490A5 JP 2017057490 A5 JP2017057490 A5 JP 2017057490A5 JP 2016010266 A JP2016010266 A JP 2016010266A JP 2016010266 A JP2016010266 A JP 2016010266A JP 2017057490 A5 JP2017057490 A5 JP 2017057490A5
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- JP
- Japan
- Prior art keywords
- less
- particle size
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- fine powder
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000843 powder Substances 0.000 claims 6
- 239000002245 particle Substances 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 2
- 229910052742 iron Inorganic materials 0.000 claims 2
- 238000005477 sputtering target Methods 0.000 claims 2
- 239000013077 target material Substances 0.000 claims 2
- 229910052796 boron Inorganic materials 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- 229910052741 iridium Inorganic materials 0.000 claims 1
- 229910052748 manganese Inorganic materials 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052702 rhenium Inorganic materials 0.000 claims 1
- 229910052703 rhodium Inorganic materials 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 229910052720 vanadium Inorganic materials 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP16846625.8A EP3351655A4 (en) | 2015-09-18 | 2016-09-16 | sputter target |
| SG10201913475PA SG10201913475PA (en) | 2015-09-18 | 2016-09-16 | Sputtering target material |
| US15/760,404 US20180265963A1 (en) | 2015-09-18 | 2016-09-16 | Sputtering Target Material |
| SG11201802203UA SG11201802203UA (en) | 2015-09-18 | 2016-09-16 | Sputtering target material |
| PCT/JP2016/077459 WO2017047754A1 (ja) | 2015-09-18 | 2016-09-16 | スパッタリングターゲット材 |
| KR1020187006795A KR102635337B1 (ko) | 2015-09-18 | 2016-09-16 | 스퍼터링 타겟재 |
| TW105130206A TWI712698B (zh) | 2015-09-18 | 2016-09-19 | 濺鍍靶材 |
| US16/986,331 US11377726B2 (en) | 2015-09-18 | 2020-08-06 | Sputtering target material |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015184846 | 2015-09-18 | ||
| JP2015184846 | 2015-09-18 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020074715A Division JP7084958B2 (ja) | 2015-09-18 | 2020-04-20 | Ｃｏ－Ｆｅ－Ｂ系合金ターゲット材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2017057490A JP2017057490A (ja) | 2017-03-23 |
| JP2017057490A5 true JP2017057490A5 (enExample) | 2019-12-05 |
Family
ID=58391141
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016010266A Withdrawn JP2017057490A (ja) | 2015-09-18 | 2016-01-22 | Ｃｏ−Ｆｅ−Ｂ系合金ターゲット材 |
| JP2020074715A Active JP7084958B2 (ja) | 2015-09-18 | 2020-04-20 | Ｃｏ－Ｆｅ－Ｂ系合金ターゲット材 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020074715A Active JP7084958B2 (ja) | 2015-09-18 | 2020-04-20 | Ｃｏ－Ｆｅ－Ｂ系合金ターゲット材 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20180265963A1 (enExample) |
| EP (1) | EP3351655A4 (enExample) |
| JP (2) | JP2017057490A (enExample) |
| KR (1) | KR102635337B1 (enExample) |
| SG (2) | SG10201913475PA (enExample) |
| TW (1) | TWI712698B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3391982B1 (en) * | 2017-04-21 | 2023-08-16 | Raytheon Technologies Corporation | Systems, devices and methods for spark plasma sintering |
| TWI642800B (zh) * | 2017-10-03 | 2018-12-01 | 光洋應用材料科技股份有限公司 | 鈷鉑錸基濺鍍靶材、其製法及磁記錄層 |
| TWI658150B (zh) * | 2018-02-05 | 2019-05-01 | 光洋應用材料科技股份有限公司 | 含鈷鉻鉑硼錸濺鍍靶材、含鈷鉻鉑硼錸層及其製法 |
| JP7382142B2 (ja) * | 2019-02-26 | 2023-11-16 | 山陽特殊製鋼株式会社 | スパッタリングターゲット材に適した合金 |
| JP7492831B2 (ja) * | 2020-01-06 | 2024-05-30 | 山陽特殊製鋼株式会社 | スパッタリングターゲット材 |
| JP7506477B2 (ja) * | 2020-01-06 | 2024-06-26 | 山陽特殊製鋼株式会社 | スパッタリングターゲット材の製造方法 |
| CN112371987A (zh) * | 2020-11-13 | 2021-02-19 | 河南东微电子材料有限公司 | 一种铁钴硼铬铝合金粉末的制备方法 |
| JP7205999B1 (ja) * | 2021-09-09 | 2023-01-17 | 山陽特殊製鋼株式会社 | スパッタリングターゲット材 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4127474B2 (ja) * | 2002-02-04 | 2008-07-30 | 株式会社東芝 | スパッタリングターゲット |
| JP4016399B2 (ja) | 2003-04-30 | 2007-12-05 | 日立金属株式会社 | Ｆｅ−Ｃｏ−Ｂ合金ターゲット材の製造方法 |
| US7141208B2 (en) | 2003-04-30 | 2006-11-28 | Hitachi Metals, Ltd. | Fe-Co-B alloy target and its production method, and soft magnetic film produced by using such target, and magnetic recording medium and TMR device |
| JP2005320627A (ja) | 2004-04-07 | 2005-11-17 | Hitachi Metals Ltd | Ｃｏ合金ターゲット材の製造方法、Ｃｏ合金ターゲット材および垂直磁気記録用軟磁性膜ならびに垂直磁気記録媒体 |
| US20070017803A1 (en) | 2005-07-22 | 2007-01-25 | Heraeus, Inc. | Enhanced sputter target manufacturing method |
| JP4331182B2 (ja) * | 2006-04-14 | 2009-09-16 | 山陽特殊製鋼株式会社 | 軟磁性ターゲット材 |
| CN102652184B (zh) | 2009-12-11 | 2014-08-06 | 吉坤日矿日石金属株式会社 | 磁性材料溅射靶 |
| JP5631659B2 (ja) | 2010-08-24 | 2014-11-26 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体用軟磁性合金およびスパッタリングターゲット材並びに磁気記録媒体 |
| JP5769059B2 (ja) * | 2011-03-30 | 2015-08-26 | 日立金属株式会社 | 永久磁石薄膜用スパッタリングターゲット及びその製造方法 |
| CN105102670B (zh) * | 2013-03-22 | 2017-06-23 | 吉坤日矿日石金属株式会社 | 钨烧结体溅射靶及其制造方法 |
| WO2015019513A1 (ja) * | 2013-08-09 | 2015-02-12 | Jx日鉱日石金属株式会社 | ネオジム、鉄、ボロンを主成分とする希土類粉末又はスパッタリングターゲットの製造方法、同希土類元素からなる粉末又はスパッタリングターゲット及びネオジム、鉄、ボロンを主成分とする希土類磁石用薄膜又はその製造方法 |
| KR20160075723A (ko) * | 2013-11-28 | 2016-06-29 | 제이엑스금속주식회사 | 자성재 스퍼터링 타깃 및 그 제조 방법 |
| JP6405261B2 (ja) | 2014-05-01 | 2018-10-17 | 山陽特殊製鋼株式会社 | 磁気記録用軟磁性合金及びスパッタリングターゲット材並びに磁気記録媒体 |
| SG11201704465WA (en) * | 2015-03-04 | 2017-06-29 | Jx Nippon Mining & Metals Corp | Magnetic material sputtering target and method for producing same |
-
2016
- 2016-01-22 JP JP2016010266A patent/JP2017057490A/ja not_active Withdrawn
- 2016-09-16 SG SG10201913475PA patent/SG10201913475PA/en unknown
- 2016-09-16 KR KR1020187006795A patent/KR102635337B1/ko active Active
- 2016-09-16 SG SG11201802203UA patent/SG11201802203UA/en unknown
- 2016-09-16 US US15/760,404 patent/US20180265963A1/en not_active Abandoned
- 2016-09-16 EP EP16846625.8A patent/EP3351655A4/en not_active Ceased
- 2016-09-19 TW TW105130206A patent/TWI712698B/zh active
-
2020
- 2020-04-20 JP JP2020074715A patent/JP7084958B2/ja active Active
- 2020-08-06 US US16/986,331 patent/US11377726B2/en active Active
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