SG10201913475PA - Sputtering target material - Google Patents

Sputtering target material

Info

Publication number
SG10201913475PA
SG10201913475PA SG10201913475PA SG10201913475PA SG10201913475PA SG 10201913475P A SG10201913475P A SG 10201913475PA SG 10201913475P A SG10201913475P A SG 10201913475PA SG 10201913475P A SG10201913475P A SG 10201913475PA SG 10201913475P A SG10201913475P A SG 10201913475PA
Authority
SG
Singapore
Prior art keywords
target material
sputtering target
sputtering
target
Prior art date
Application number
SG10201913475PA
Inventor
Hiroyuki Hasegawa
Noriaki Matsubara
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of SG10201913475PA publication Critical patent/SG10201913475PA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05—Metallic powder characterised by the size or surface area of the particles
    • B22F1/052—Metallic powder characterised by the size or surface area of the particles characterised by a mixture of particles of different sizes or by the particle size distribution
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0433—Nickel- or cobalt-based alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
    • C22C33/0278—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5%
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
    • C22C33/0278—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5%
    • C22C33/0285—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5% with Cr, Co, or Ni having a minimum content higher than 5%
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/14—Ferrous alloys, e.g. steel alloys containing titanium or zirconium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/16—Ferrous alloys, e.g. steel alloys containing copper
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10—Processes characterised by the sequence of their steps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
SG10201913475PA 2015-09-18 2016-09-16 Sputtering target material SG10201913475PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015184846 2015-09-18
JP2016010266A JP2017057490A (en) 2015-09-18 2016-01-22 Co-Fe-B based alloy target material

Publications (1)

Publication Number Publication Date
SG10201913475PA true SG10201913475PA (en) 2020-03-30

Family

ID=58391141

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201913475PA SG10201913475PA (en) 2015-09-18 2016-09-16 Sputtering target material
SG11201802203UA SG11201802203UA (en) 2015-09-18 2016-09-16 Sputtering target material

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201802203UA SG11201802203UA (en) 2015-09-18 2016-09-16 Sputtering target material

Country Status (6)

Country Link
US (2) US20180265963A1 (en)
EP (1) EP3351655A4 (en)
JP (2) JP2017057490A (en)
KR (1) KR102635337B1 (en)
SG (2) SG10201913475PA (en)
TW (1) TWI712698B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3391982B1 (en) * 2017-04-21 2023-08-16 Raytheon Technologies Corporation Systems, devices and methods for spark plasma sintering
TWI642800B (en) * 2017-10-03 2018-12-01 光洋應用材料科技股份有限公司 Co-pt-re-based sputtering target, method of making the same, and magnetic recording layer
TWI658150B (en) * 2018-02-05 2019-05-01 光洋應用材料科技股份有限公司 CoCrPtBRe-CONTAINING SPUTTERING TARGET, CoCrPtBRe-CONTAINING MEMBRANE, AND METHOD OF PREPARING THE SAME
JP7382142B2 (en) * 2019-02-26 2023-11-16 山陽特殊製鋼株式会社 Alloy suitable for sputtering target material
JP7506477B2 (en) * 2020-01-06 2024-06-26 山陽特殊製鋼株式会社 Method for manufacturing sputtering target material
JP7492831B2 (en) 2020-01-06 2024-05-30 山陽特殊製鋼株式会社 Sputtering target material
CN112371987A (en) * 2020-11-13 2021-02-19 河南东微电子材料有限公司 Preparation method of iron-cobalt-boron-chromium-aluminum alloy powder
JP7205999B1 (en) * 2021-09-09 2023-01-17 山陽特殊製鋼株式会社 Sputtering target material

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4127474B2 (en) * 2002-02-04 2008-07-30 株式会社東芝 Sputtering target
US7141208B2 (en) 2003-04-30 2006-11-28 Hitachi Metals, Ltd. Fe-Co-B alloy target and its production method, and soft magnetic film produced by using such target, and magnetic recording medium and TMR device
JP4016399B2 (en) 2003-04-30 2007-12-05 日立金属株式会社 Method for producing Fe-Co-B alloy target material
JP2005320627A (en) 2004-04-07 2005-11-17 Hitachi Metals Ltd Co ALLOY TARGET AND ITS PRODUCTION METHOD, SOFT MAGNETIC FILM FOR PERPENDICULAR MAGNETIC RECORDING AND PERPENDICULAR MAGNETIC RECORDING MEDIUM
US20070017803A1 (en) * 2005-07-22 2007-01-25 Heraeus, Inc. Enhanced sputter target manufacturing method
JP4331182B2 (en) * 2006-04-14 2009-09-16 山陽特殊製鋼株式会社 Soft magnetic target material
CN102652184B (en) 2009-12-11 2014-08-06 吉坤日矿日石金属株式会社 Magnetic material sputtering target
JP5631659B2 (en) * 2010-08-24 2014-11-26 山陽特殊製鋼株式会社 Soft magnetic alloy and sputtering target material for perpendicular magnetic recording medium, and magnetic recording medium
JP5769059B2 (en) * 2011-03-30 2015-08-26 日立金属株式会社 Sputtering target for permanent magnet thin film and method for producing the same
KR102059710B1 (en) * 2013-03-22 2019-12-26 제이엑스금속주식회사 Tungsten-sintered-body sputtering target and method for producing same
WO2015019513A1 (en) * 2013-08-09 2015-02-12 Jx日鉱日石金属株式会社 Process for manufacturing neodymium-iron-boron-based rare earth powder or sputtering target, neodymium-iron-boron-based rare earth powder or sputtering target, and neodymium-iron-boron-based thin film for rare earth magnet or manufacturing process therefor
KR20180088491A (en) * 2013-11-28 2018-08-03 제이엑스금속주식회사 Magnetic material sputtering target and method for producing same
JP6405261B2 (en) 2014-05-01 2018-10-17 山陽特殊製鋼株式会社 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
US10644230B2 (en) 2015-03-04 2020-05-05 Jx Nippon Mining & Metals Corporation Magnetic material sputtering target and method for producing same

Also Published As

Publication number Publication date
JP7084958B2 (en) 2022-06-15
US11377726B2 (en) 2022-07-05
EP3351655A1 (en) 2018-07-25
KR20180054595A (en) 2018-05-24
US20180265963A1 (en) 2018-09-20
TWI712698B (en) 2020-12-11
EP3351655A4 (en) 2019-04-17
TW201726954A (en) 2017-08-01
JP2017057490A (en) 2017-03-23
KR102635337B1 (en) 2024-02-07
SG11201802203UA (en) 2018-04-27
US20200362451A1 (en) 2020-11-19
JP2020143372A (en) 2020-09-10

Similar Documents

Publication Publication Date Title
GB201711541D0 (en) Target re-identification
HUE044538T2 (en) Triggered target wake time operation
PL3504506T3 (en) Target
SG11201800871SA (en) Ferromagnetic material sputtering target
SG11201802203UA (en) Sputtering target material
IL246811B (en) Sputtering target
SG11201700667VA (en) Sputtering target
EP3165632A4 (en) Target material for sputtering and method for manufacturing same
IL270046B1 (en) Superalloy sputtering target
GB2554577B (en) Coating material
SG11201608581XA (en) Sputtering target and process for production thereof
SG11201709089YA (en) Magnetron sputtering apparatus
SG11201710836UA (en) Sputtering target material
PL3172354T3 (en) Silver-alloy based sputtering target
GB201517270D0 (en) Target designator
SG11201704051SA (en) Target assembly
SG10201913474RA (en) Sputtering target material
FI20160292A (en) Target goal
SG11201606737UA (en) Sputtering target
EP3272370A4 (en) Cartilage-regenerating material
SG11201706370SA (en) Ni-BASED TARGET MATERIAL EXCELLENT IN SPUTTERING PROPERTY
GB201517259D0 (en) Material
GB2540342B (en) Reactive Target for Shooting
GB201503312D0 (en) Targets
SG11201700721QA (en) Target assembly