MY190813A - Alloy for seed layers of magnetic recording media, sputtering target material and magnetic recording medium - Google Patents

Alloy for seed layers of magnetic recording media, sputtering target material and magnetic recording medium

Info

Publication number
MY190813A
MY190813A MYPI2018703718A MYPI2018703718A MY190813A MY 190813 A MY190813 A MY 190813A MY PI2018703718 A MYPI2018703718 A MY PI2018703718A MY PI2018703718 A MYPI2018703718 A MY PI2018703718A MY 190813 A MY190813 A MY 190813A
Authority
MY
Malaysia
Prior art keywords
magnetic recording
alloy
target material
sputtering target
recording medium
Prior art date
Application number
MYPI2018703718A
Inventor
Imoto Miyuki
Matsubara Noriaki
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of MY190813A publication Critical patent/MY190813A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7379—Seed layer, e.g. at least one non-magnetic layer is specifically adapted as a seed or seeding layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C23C14/025—Metallic sublayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)

Abstract

An object of the present invention is to provide an alloy for a seed layer of a Ni-based magnetic recording medium as a seed layer of a perpendicular magnetic recording medium, which has a small crystal grain size, and a sputtering target material. Specifically, the Ni-based sputtering target material according to the present invention includes a Ni-Fe-Co-M alloy, wherein the Ni-Fe-Co-M alloy contains 2 to 20 at.% in total of one or more M1 elements selected from Au, Ag, Pd, Rh, Ir, Ru, Re, and Pt, and the balance including Ni, Fe, Co, and unavoidable impurities, and wherein the ratio of the contents of Ni, Fe, and Co is Ni:Fe:Co=100 to 20:0 to 50:0 to 60 in terms of at.%.
MYPI2018703718A 2016-04-13 2017-04-05 Alloy for seed layers of magnetic recording media, sputtering target material and magnetic recording medium MY190813A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016080217A JP6431496B2 (en) 2016-04-13 2016-04-13 Alloy for seed layer of magnetic recording medium, sputtering target material, and magnetic recording medium
PCT/JP2017/014181 WO2017179466A1 (en) 2016-04-13 2017-04-05 Alloy for seed layers of magnetic recording media, sputtering target material and magnetic recording medium

Publications (1)

Publication Number Publication Date
MY190813A true MY190813A (en) 2022-05-12

Family

ID=60041503

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2018703718A MY190813A (en) 2016-04-13 2017-04-05 Alloy for seed layers of magnetic recording media, sputtering target material and magnetic recording medium

Country Status (6)

Country Link
JP (1) JP6431496B2 (en)
CN (1) CN109074824B (en)
MY (1) MY190813A (en)
SG (1) SG11201808739XA (en)
TW (1) TWI746540B (en)
WO (1) WO2017179466A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7118804B2 (en) 2018-08-17 2022-08-16 キオクシア株式会社 Semiconductor device manufacturing method
JP7385370B2 (en) * 2019-05-07 2023-11-22 山陽特殊製鋼株式会社 Ni-based sputtering target and magnetic recording medium
JP7274361B2 (en) * 2019-06-19 2023-05-16 山陽特殊製鋼株式会社 Alloy for seed layer of magnetic recording media
CN110423934B (en) * 2019-08-27 2021-03-30 哈尔滨理工大学 A kind of Ni-Co-Mn-Sn-Cu alloy with high temperature, high toughness and large magnetocaloric effect, preparation method and application thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4810360B2 (en) * 2006-08-31 2011-11-09 石福金属興業株式会社 Magnetic thin film
JP2008226416A (en) * 2007-03-16 2008-09-25 Fuji Electric Device Technology Co Ltd Perpendicular magnetic recording medium and manufacturing method thereof
JP5015901B2 (en) * 2008-12-01 2012-09-05 昭和電工株式会社 Thermally assisted magnetic recording medium and magnetic recording / reproducing apparatus
JP5384969B2 (en) * 2009-02-25 2014-01-08 山陽特殊製鋼株式会社 Sputtering target material and thin film produced using the same
JP5370917B2 (en) * 2009-04-20 2013-12-18 日立金属株式会社 Method for producing Fe-Co-Ni alloy sputtering target material
JP5726615B2 (en) * 2010-11-22 2015-06-03 山陽特殊製鋼株式会社 Alloy for seed layer of magnetic recording medium and sputtering target material
JP6302153B2 (en) * 2011-09-28 2018-03-28 山陽特殊製鋼株式会社 Soft magnetic thin film layer and perpendicular magnetic recording medium in perpendicular magnetic recording medium
JP6081134B2 (en) * 2012-10-17 2017-02-15 株式会社日立製作所 Perpendicular magnetic recording medium and magnetic storage device
JP2015111482A (en) * 2013-12-06 2015-06-18 株式会社東芝 Perpendicular magnetic recording medium and magnetic recording / reproducing apparatus

Also Published As

Publication number Publication date
JP6431496B2 (en) 2018-11-28
WO2017179466A1 (en) 2017-10-19
JP2017191625A (en) 2017-10-19
SG11201808739XA (en) 2018-11-29
TW201807229A (en) 2018-03-01
CN109074824A (en) 2018-12-21
TWI746540B (en) 2021-11-21
CN109074824B (en) 2020-10-09

Similar Documents

Publication Publication Date Title
SG11201808739XA (en) Alloy for seed layers of magnetic recording media, sputtering target material and magnetic recording medium
MY181595A (en) Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
MY180011A (en) Cofe-based alloy for soft magnetic film layer in perpendicular magnetic recording medium and sputtering target material
JP2017057490A5 (en)
JP2016023352A5 (en)
JP2016023351A5 (en)
MY167394A (en) C grain dispersed fe-pt-based sputtering target
TWI661064B (en) Master alloy for sputtering target, sputtering target and manufacturing method thereof
JP2016029193A5 (en)
WO2011053737A3 (en) Ni-Ti SEMI-FINISHED PRODUCTS AND RELATED METHODS
MY168766A (en) Aluminum alloy substrate for magnetic storage disks and method for manufacturing the same
MY175409A (en) Sputtering target for magnetic recording film, and raw carbon material for use in producing same
MY161232A (en) Fe-pt-based ferromagnetic sputtering target and method for producing same
MY185510A (en) Ni-based sputtering target material and magnetic recording medium
MY178372A (en) Perpendicular magnetic recording medium
MY182858A (en) Fe-co-based alloy sputtering target material
JP2019110114A5 (en)
MY167946A (en) Co-Cr-Pt-BASED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
MY173713A (en) Fept-based sputtering target and process for producing the same
SG10201906538UA (en) Ni-BASED TARGET MATERIAL EXCELLENT IN SPUTTERING PROPERTY
MY172177A (en) Sputtering target material for producing intermediate layer film of perpendicular magnetic recording medium and thin film produced by using the same
MY190782A (en) Ni-ta-based alloy, target material and magnetic recording medium
MY190845A (en) Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material
MY189794A (en) Ferromagnetic material sputtering target
MY210200A (en) Alloy for a seed layer of a magnetic recording medium