MY175409A - Sputtering target for magnetic recording film, and raw carbon material for use in producing same - Google Patents
Sputtering target for magnetic recording film, and raw carbon material for use in producing sameInfo
- Publication number
- MY175409A MY175409A MYPI2015703482A MYPI2015703482A MY175409A MY 175409 A MY175409 A MY 175409A MY PI2015703482 A MYPI2015703482 A MY PI2015703482A MY PI2015703482 A MYPI2015703482 A MY PI2015703482A MY 175409 A MY175409 A MY 175409A
- Authority
- MY
- Malaysia
- Prior art keywords
- sputtering target
- magnetic recording
- carbon material
- recording film
- producing same
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
A sintered compact sputtering target configured from an alloy having a composition containing 5 to 60 mol% of Pt and remainder being Fe, and nonmagnetic materials dispersed in the alloy, wherein the nonmagnetic materials include at least C in an amount of 5 to 60 mol%, and an average grain area of C grains in a vertical cross section relative to a sputtering surface of the target is 50 I?m2 or more. The present invention aims to provide a sputtering target which enables the production of a magnetic thin film of a thermally assisted magnetic recording media without having to use an expensive cosputtering device, and the reduction in the amount of particles that are generated during sputtering.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013094300 | 2013-04-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
MY175409A true MY175409A (en) | 2020-06-24 |
Family
ID=51791958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2015703482A MY175409A (en) | 2013-04-26 | 2014-04-24 | Sputtering target for magnetic recording film, and raw carbon material for use in producing same |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5876155B2 (en) |
CN (1) | CN104955981B (en) |
MY (1) | MY175409A (en) |
SG (1) | SG11201506097YA (en) |
TW (1) | TWI595103B (en) |
WO (1) | WO2014175392A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6383510B2 (en) * | 2016-03-07 | 2018-08-29 | 田中貴金属工業株式会社 | FePt-C sputtering target |
WO2021085410A1 (en) * | 2019-11-01 | 2021-05-06 | 田中貴金属工業株式会社 | Sputtering target for thermal assist magnetic recording medium |
JP7483999B1 (en) | 2023-09-22 | 2024-05-15 | Jx金属株式会社 | Sputtering targets and sputtering target assemblies |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000012020A (en) * | 1998-06-23 | 2000-01-14 | Nippon Steel Corp | Carbon material for lithium secondary battery negative electrode |
US20070189916A1 (en) * | 2002-07-23 | 2007-08-16 | Heraeus Incorporated | Sputtering targets and methods for fabricating sputtering targets having multiple materials |
KR100470151B1 (en) * | 2002-10-29 | 2005-02-05 | 한국과학기술원 | HIGH-DENSITY MAGNETIC RECORDING MEDIA USING FePtC FILM AND MANUFACTURING METHOD THEREOF |
JP5428561B2 (en) * | 2009-06-16 | 2014-02-26 | 株式会社Gsユアサ | Direct fuel cell system and its operation stop method |
JP5678414B2 (en) * | 2009-06-17 | 2015-03-04 | 三菱化学株式会社 | Graphite negative electrode material, method for producing the same, and negative electrode for lithium secondary battery and lithium secondary battery using the same |
SG189255A1 (en) * | 2010-12-20 | 2013-05-31 | Jx Nippon Mining & Metals Corp | Fe-pt-based sputtering target with dispersed c grains |
JP5912559B2 (en) * | 2011-03-30 | 2016-04-27 | 田中貴金属工業株式会社 | Method for producing FePt-C sputtering target |
US9683284B2 (en) * | 2011-03-30 | 2017-06-20 | Jx Nippon Mining & Metals Corporation | Sputtering target for magnetic recording film |
JP6037197B2 (en) * | 2011-05-09 | 2016-12-07 | 三菱マテリアル株式会社 | Sputtering target for forming a magnetic recording medium film and method for producing the same |
-
2014
- 2014-04-24 WO PCT/JP2014/061594 patent/WO2014175392A1/en active Application Filing
- 2014-04-24 CN CN201480006305.1A patent/CN104955981B/en active Active
- 2014-04-24 SG SG11201506097YA patent/SG11201506097YA/en unknown
- 2014-04-24 MY MYPI2015703482A patent/MY175409A/en unknown
- 2014-04-24 JP JP2014530046A patent/JP5876155B2/en active Active
- 2014-04-25 TW TW103114947A patent/TWI595103B/en active
Also Published As
Publication number | Publication date |
---|---|
CN104955981B (en) | 2018-01-23 |
JP5876155B2 (en) | 2016-03-02 |
JPWO2014175392A1 (en) | 2017-02-23 |
CN104955981A (en) | 2015-09-30 |
TWI595103B (en) | 2017-08-11 |
WO2014175392A1 (en) | 2014-10-30 |
SG11201506097YA (en) | 2015-09-29 |
TW201508074A (en) | 2015-03-01 |
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