MY164775A - CrTi-BASED ALLOY AND SPUTTERING TARGET MATERIAL, PERPENDICULAR MAGNETIC RECORDING MEDIUM, AND PRODUCTION METHODS THEREOF - Google Patents

CrTi-BASED ALLOY AND SPUTTERING TARGET MATERIAL, PERPENDICULAR MAGNETIC RECORDING MEDIUM, AND PRODUCTION METHODS THEREOF

Info

Publication number
MY164775A
MY164775A MYPI2013700253A MYPI2013700253A MY164775A MY 164775 A MY164775 A MY 164775A MY PI2013700253 A MYPI2013700253 A MY PI2013700253A MY PI2013700253 A MYPI2013700253 A MY PI2013700253A MY 164775 A MY164775 A MY 164775A
Authority
MY
Malaysia
Prior art keywords
crti
target material
based alloy
sputtering target
production methods
Prior art date
Application number
MYPI2013700253A
Inventor
Hiroyuki Hasegawa
Toshiyuki Sawada
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of MY164775A publication Critical patent/MY164775A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B22F3/15—Hot isostatic pressing
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C14/00—Alloys based on titanium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/06—Alloys based on chromium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73917—Metallic substrates, i.e. elemental metal or metal alloy substrates
    • G11B5/73919—Aluminium or titanium elemental or alloy substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

CrTi-BASED ALLOY AND SPUTTERING TARGET MATERIAL, PERPENDICULAR MAGNETIC RECORDING MEDIUM, AND PRODUCTION METHODS THEREOF In accordance with the present invention, there is provided a CrTi-based alloy or a sputtering target material, comprising 35-65 at% of Ti and the balance Cr and unavoidable impurities; and production methods thereof. The CrTi-based alloy or target material has an intensity ratio [I(Cr2Ti)/I(Cr)] of an X-ray diffraction intensity [I(Cr2Ti)] of Cr2Ti(311) to an X-ray diffraction intensity [I(Cr)] of Cr(110), of 0.50 or less. According to the present invention, it is possible to reduce compounds in a CrTi-based alloy and a sputtering target material, and thereby to suppress the generation of particles during sputtering to improve the product yield of a sputtered film.
MYPI2013700253A 2010-08-17 2011-08-10 CrTi-BASED ALLOY AND SPUTTERING TARGET MATERIAL, PERPENDICULAR MAGNETIC RECORDING MEDIUM, AND PRODUCTION METHODS THEREOF MY164775A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010182144A JP5734599B2 (en) 2010-08-17 2010-08-17 CrTi alloy sputtering target material and method for producing perpendicular magnetic recording medium using them

Publications (1)

Publication Number Publication Date
MY164775A true MY164775A (en) 2018-01-30

Family

ID=45605129

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2013700253A MY164775A (en) 2010-08-17 2011-08-10 CrTi-BASED ALLOY AND SPUTTERING TARGET MATERIAL, PERPENDICULAR MAGNETIC RECORDING MEDIUM, AND PRODUCTION METHODS THEREOF

Country Status (5)

Country Link
JP (1) JP5734599B2 (en)
CN (1) CN103119186B (en)
MY (1) MY164775A (en)
TW (1) TWI500791B (en)
WO (1) WO2012023475A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5854308B2 (en) * 2010-05-06 2016-02-09 日立金属株式会社 Cr-Ti alloy target material
JP5964121B2 (en) * 2012-04-18 2016-08-03 山陽特殊製鋼株式会社 CrTi alloy for adhesion film layer and sputtering target material used for magnetic recording medium, and perpendicular magnetic recording medium using the same
WO2016129449A1 (en) * 2015-02-12 2016-08-18 日立金属株式会社 Cr-Ti ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING SAME
CN112517917B (en) * 2020-11-25 2023-04-18 河南东微电子材料有限公司 Preparation method of CrTiLa alloy powder for chromium-titanium target material

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH083893B2 (en) * 1987-02-12 1996-01-17 株式会社日立製作所 In-plane magnetic recording medium
JPH10134631A (en) * 1996-10-31 1998-05-22 Tokyo Gas Co Ltd Liminaire installation device responding to double ceiling
JPH10298742A (en) * 1997-04-23 1998-11-10 Hitachi Metals Ltd Cr-ti series target
JPH11134631A (en) * 1997-10-27 1999-05-21 Hitachi Metals Ltd Magnetic record medium
JPH11140506A (en) * 1997-11-10 1999-05-25 Daido Steel Co Ltd Production of multielement metal powder sintered target
CN1195098C (en) * 2002-10-28 2005-03-30 天津大学 Manufacturing method for producing target material with high resistance used in metal film resistor with high stability by using sputtering technique
JP4499044B2 (en) * 2006-01-04 2010-07-07 ヒタチグローバルストレージテクノロジーズネザーランドビーブイ Perpendicular magnetic recording medium and magnetic storage device using the same
JP4331182B2 (en) * 2006-04-14 2009-09-16 山陽特殊製鋼株式会社 Soft magnetic target material
JP2009059431A (en) * 2007-08-31 2009-03-19 Showa Denko Kk Magnetic recording medium and magnetic recording and reproducing apparatus
JP5854308B2 (en) * 2010-05-06 2016-02-09 日立金属株式会社 Cr-Ti alloy target material

Also Published As

Publication number Publication date
TWI500791B (en) 2015-09-21
JP2012041585A (en) 2012-03-01
TW201221674A (en) 2012-06-01
CN103119186B (en) 2015-01-14
WO2012023475A1 (en) 2012-02-23
JP5734599B2 (en) 2015-06-17
CN103119186A (en) 2013-05-22

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