JP2017011051A - 基板処理システム及び基板処理方法 - Google Patents
基板処理システム及び基板処理方法 Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
Abstract
Description
11 基板
12 処理液
14 処理槽
18 排気部
19 圧力センサ
21a、21b カバー部材
26 ヒータ
27 排気制御部
28 加水制御部
31 循環部
38 インラインヒータ
41 排気弁
43 純水供給部
44 給水弁
Claims (6)
- 加熱した水溶液からなる処理液に基板を浸漬することにより基板表面の被膜を除去する基板処理システムにおいて、
前記処理液が貯留され、前記処理液に基板が浸漬される処理槽と、
前記処理槽から排出される前記処理液を前記処理槽に戻す循環部と、
前記処理槽内の前記処理液が目的温度を保つように、前記処理液を加熱する処理液加熱部と、
前記処理槽を密閉する密閉部と、
前記処理槽の内部圧力を測定する圧力センサと、
前記圧力センサで測定される前記内部圧力に基づいて、前記処理槽内から外部へ排出される水蒸気の排気量を増減することによって、前記処理槽の内部圧力を大気圧よりも高い目的圧力に調節する圧力調節部と、
前記循環部を介して前記処理液に純水を連続的に加水するとともに、純水の加水量を前記圧力センサで測定される前記内部圧力に基づいて増減することにより、処理液の濃度を一定に調節する濃度調節部と
を備えることを特徴とする基板処理システム。 - 前記処理槽には、複数枚の基板が配列されており、
前記圧力調節部は、前記処理液の上方の空間内に前記複数枚の基板に沿って配され、一端が外部に連通した管状の排気部を有し、
前記排気部は、前記複数枚の基板の配列範囲に、前記処理槽内の水蒸気を吸引する複数の開口が形成されている
ことを特徴とする請求項1に記載の基板処理システム。 - 前記圧力調節部は、前記排気部に接続された排気弁と、前記圧力センサで測定される前記内部圧力に基づいて、前記排気弁の開度を増減する排気制御部とを有することを特徴とする請求項1または2に記載の基板処理システム。
- 前記基板は、表面にシリコン酸化膜とシリコン窒化膜とが形成されたシリコンウエハであり、前記処理液は、リン酸水溶液であることを特徴とする請求項1ないし3のいずれか1項に記載の基板処理システム。
- 前記圧力調節部は、前記内部圧力の変動状態に基づいて、前記水蒸気の排気量を増減することを特徴とする請求項1ないし4のいずれか1項に記載の基板処理システム。
- 加熱した水溶液からなる処理液に基板を浸漬することにより基板表面の被膜を除去する基板処理方法において、
処理槽内に貯留された前記処理液に基板を浸漬する浸漬ステップと、
前記処理槽を密閉する密閉ステップと、
前記処理槽から排出される前記処理液を前記処理槽に戻す循環ステップと、
前記処理槽内の前記処理液を目的温度に保つように、前記処理液を加熱する処理液加熱ステップと、
前記処理槽内から外部へ排出される水蒸気の排気量を前記処理槽の内部圧力に応じて増減し、前記処理槽の内部圧力を大気圧よりも高い目的圧力に調節する圧力調節ステップと、
前記循環ステップによって循環される前記処理液に純水を連続的に加水するとともに、前記処理槽の内部圧力を測定し、純水の加水量を測定した前記内部圧力に基づいて増減することにより、処理液の濃度を調節する濃度調節ステップと
を有することを特徴とする基板処理方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015123461A JP6454611B2 (ja) | 2015-06-19 | 2015-06-19 | 基板処理システム及び基板処理方法 |
US15/737,641 US10186436B2 (en) | 2015-06-19 | 2016-06-14 | Substrate processing system and substrate processing method |
CN201680029785.2A CN107636807B (zh) | 2015-06-19 | 2016-06-14 | 基板处理系统及基板处理方法 |
PCT/JP2016/067666 WO2016204143A1 (ja) | 2015-06-19 | 2016-06-14 | 基板処理システム及び基板処理方法 |
KR1020187001291A KR20180017183A (ko) | 2015-06-19 | 2016-06-14 | 기판 처리 시스템 및 기판 처리 방법 |
SG11201710329TA SG11201710329TA (en) | 2015-06-19 | 2016-06-14 | Substrate processing system and substrate processing method |
TW105118889A TWI687988B (zh) | 2015-06-19 | 2016-06-16 | 基板處理系統及基板處理方法 |
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JP2015123461A JP6454611B2 (ja) | 2015-06-19 | 2015-06-19 | 基板処理システム及び基板処理方法 |
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JP2017011051A true JP2017011051A (ja) | 2017-01-12 |
JP6454611B2 JP6454611B2 (ja) | 2019-01-16 |
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US (1) | US10186436B2 (ja) |
JP (1) | JP6454611B2 (ja) |
KR (1) | KR20180017183A (ja) |
CN (1) | CN107636807B (ja) |
SG (1) | SG11201710329TA (ja) |
TW (1) | TWI687988B (ja) |
WO (1) | WO2016204143A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019212652A (ja) * | 2018-05-31 | 2019-12-12 | 東京エレクトロン株式会社 | 基板液処理方法、基板液処理装置及び記憶媒体 |
KR20200029598A (ko) * | 2017-09-04 | 2020-03-18 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 기판 처리 장치의 이상 감시 방법, 및 프로그램 |
US11728188B2 (en) | 2019-08-23 | 2023-08-15 | Kioxia Corporation | Semiconductor manufacturing device |
JP7413113B2 (ja) | 2020-03-24 | 2024-01-15 | 株式会社Screenホールディングス | 処理液温調方法、基板処理方法、処理液温調装置、及び、基板処理システム |
Families Citing this family (7)
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JP6994899B2 (ja) * | 2017-10-20 | 2022-01-14 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法および記憶媒体 |
KR102461911B1 (ko) * | 2018-07-13 | 2022-10-31 | 삼성전자주식회사 | 플라즈마 제네레이터, 이를 포함하는 세정수 처리 장치, 반도체 세정 장치 및 세정수 처리 방법 |
US11532493B2 (en) * | 2018-07-30 | 2022-12-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Wet bench and chemical treatment method using the same |
KR102646484B1 (ko) * | 2020-12-29 | 2024-03-12 | 세메스 주식회사 | 약액 공급 장치 및 이를 포함하는 기판 처리 장치 |
CN113964067B (zh) * | 2021-11-26 | 2022-10-25 | 江苏威森美微电子有限公司 | 一种晶圆刻蚀设备 |
DE102022124098A1 (de) * | 2022-09-20 | 2024-03-21 | Rösler Holding Gmbh | Verfahren und Vorrichtung zum chemischen Glätten |
CN115376915A (zh) * | 2022-10-27 | 2022-11-22 | 合肥新晶集成电路有限公司 | 选择性蚀刻方法及装置 |
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2015
- 2015-06-19 JP JP2015123461A patent/JP6454611B2/ja active Active
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2016
- 2016-06-14 KR KR1020187001291A patent/KR20180017183A/ko active IP Right Grant
- 2016-06-14 SG SG11201710329TA patent/SG11201710329TA/en unknown
- 2016-06-14 CN CN201680029785.2A patent/CN107636807B/zh active Active
- 2016-06-14 WO PCT/JP2016/067666 patent/WO2016204143A1/ja active Application Filing
- 2016-06-14 US US15/737,641 patent/US10186436B2/en not_active Expired - Fee Related
- 2016-06-16 TW TW105118889A patent/TWI687988B/zh not_active IP Right Cessation
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JPH0448630A (ja) * | 1990-06-14 | 1992-02-18 | Sony Corp | エッチング方法 |
JPH0799175A (ja) * | 1993-06-04 | 1995-04-11 | Nippon Steel Corp | 処理液の供給方法及び供給装置 |
JPH11253894A (ja) * | 1998-03-16 | 1999-09-21 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
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KR20200029598A (ko) * | 2017-09-04 | 2020-03-18 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 기판 처리 장치의 이상 감시 방법, 및 프로그램 |
KR102389689B1 (ko) | 2017-09-04 | 2022-04-22 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 기판 처리 장치의 이상 감시 방법, 및 기록 매체에 저장된 프로그램 |
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JP2019212652A (ja) * | 2018-05-31 | 2019-12-12 | 東京エレクトロン株式会社 | 基板液処理方法、基板液処理装置及び記憶媒体 |
JP7198595B2 (ja) | 2018-05-31 | 2023-01-04 | 東京エレクトロン株式会社 | 基板液処理方法、基板液処理装置及び記憶媒体 |
US11728188B2 (en) | 2019-08-23 | 2023-08-15 | Kioxia Corporation | Semiconductor manufacturing device |
JP7413113B2 (ja) | 2020-03-24 | 2024-01-15 | 株式会社Screenホールディングス | 処理液温調方法、基板処理方法、処理液温調装置、及び、基板処理システム |
Also Published As
Publication number | Publication date |
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WO2016204143A1 (ja) | 2016-12-22 |
KR20180017183A (ko) | 2018-02-20 |
JP6454611B2 (ja) | 2019-01-16 |
TW201717272A (zh) | 2017-05-16 |
CN107636807B (zh) | 2021-06-04 |
US10186436B2 (en) | 2019-01-22 |
TWI687988B (zh) | 2020-03-11 |
US20180158700A1 (en) | 2018-06-07 |
CN107636807A (zh) | 2018-01-26 |
SG11201710329TA (en) | 2018-01-30 |
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