JP2016541113A5 - - Google Patents

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JP2016541113A5
JP2016541113A5 JP2016526908A JP2016526908A JP2016541113A5 JP 2016541113 A5 JP2016541113 A5 JP 2016541113A5 JP 2016526908 A JP2016526908 A JP 2016526908A JP 2016526908 A JP2016526908 A JP 2016526908A JP 2016541113 A5 JP2016541113 A5 JP 2016541113A5
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Japan
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adhesive layer
structure according
integrated circuit
circuit structure
interconnect structure
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JP2016526908A
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JP2016541113A (ja
JP6652245B2 (ja
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JP2016526908A 2013-12-20 2015-02-21 コバルトベースの複数のインターコネクトおよびそれらの複数の製造方法 Active JP6652245B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/137,526 2013-12-20
US14/137,526 US9997457B2 (en) 2013-12-20 2013-12-20 Cobalt based interconnects and methods of fabrication thereof
PCT/IB2015/000198 WO2015092780A1 (en) 2013-12-20 2015-02-21 Cobalt based interconnects and methods of fabrication thereof

Publications (3)

Publication Number Publication Date
JP2016541113A JP2016541113A (ja) 2016-12-28
JP2016541113A5 true JP2016541113A5 (enExample) 2018-05-24
JP6652245B2 JP6652245B2 (ja) 2020-02-19

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JP2016526908A Active JP6652245B2 (ja) 2013-12-20 2015-02-21 コバルトベースの複数のインターコネクトおよびそれらの複数の製造方法

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US (5) US9997457B2 (enExample)
EP (2) EP3084810B1 (enExample)
JP (1) JP6652245B2 (enExample)
KR (3) KR102710883B1 (enExample)
CN (2) CN106068549B (enExample)
TW (1) TWI610398B (enExample)
WO (1) WO2015092780A1 (enExample)

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