JP2016219812A5 - - Google Patents
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- Publication number
- JP2016219812A5 JP2016219812A5 JP2016102480A JP2016102480A JP2016219812A5 JP 2016219812 A5 JP2016219812 A5 JP 2016219812A5 JP 2016102480 A JP2016102480 A JP 2016102480A JP 2016102480 A JP2016102480 A JP 2016102480A JP 2016219812 A5 JP2016219812 A5 JP 2016219812A5
- Authority
- JP
- Japan
- Prior art keywords
- lithography
- control unit
- data
- subsystems
- command
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001459 lithography Methods 0.000 claims 27
- 230000004048 modification Effects 0.000 claims 4
- 238000000034 method Methods 0.000 claims 3
- 238000012986 modification Methods 0.000 claims 3
- 238000004891 communication Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 claims 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161478117P | 2011-04-22 | 2011-04-22 | |
| US61/478,117 | 2011-04-22 | ||
| US201161533673P | 2011-09-12 | 2011-09-12 | |
| US61/533,673 | 2011-09-12 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014505664A Division JP5951753B2 (ja) | 2011-04-22 | 2012-04-23 | リソグラフィ機のクラスタのためのネットワークアーキテクチャおよびプロトコル |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016219812A JP2016219812A (ja) | 2016-12-22 |
| JP2016219812A5 true JP2016219812A5 (enExample) | 2018-12-20 |
| JP6550623B2 JP6550623B2 (ja) | 2019-07-31 |
Family
ID=45998374
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014505667A Active JP6042410B2 (ja) | 2011-04-22 | 2012-04-23 | リソグラフィ機クラスタのためのネットワークアーキテクチャ |
| JP2014505664A Active JP5951753B2 (ja) | 2011-04-22 | 2012-04-23 | リソグラフィ機のクラスタのためのネットワークアーキテクチャおよびプロトコル |
| JP2016102480A Active JP6550623B2 (ja) | 2011-04-22 | 2016-05-23 | リソグラフィ機のクラスタのためのネットワークアーキテクチャおよびプロトコル |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014505667A Active JP6042410B2 (ja) | 2011-04-22 | 2012-04-23 | リソグラフィ機クラスタのためのネットワークアーキテクチャ |
| JP2014505664A Active JP5951753B2 (ja) | 2011-04-22 | 2012-04-23 | リソグラフィ機のクラスタのためのネットワークアーキテクチャおよびプロトコル |
Country Status (8)
| Country | Link |
|---|---|
| US (3) | US9086912B2 (enExample) |
| EP (2) | EP2699966B1 (enExample) |
| JP (3) | JP6042410B2 (enExample) |
| KR (2) | KR102072200B1 (enExample) |
| CN (2) | CN103649836B (enExample) |
| RU (1) | RU2573398C2 (enExample) |
| TW (2) | TWI526789B (enExample) |
| WO (2) | WO2012143548A2 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2681624B1 (en) * | 2010-12-14 | 2016-07-20 | Mapper Lithography IP B.V. | Lithography system and method of processing substrates in such a lithography system |
| US8893059B2 (en) | 2012-02-06 | 2014-11-18 | Kla-Tencor Corporation | Pattern data system for high-performance maskless electron beam lithography |
| JP2014204012A (ja) * | 2013-04-05 | 2014-10-27 | キヤノン株式会社 | 描画装置、及び物品の製造方法 |
| CN103389625A (zh) * | 2013-07-11 | 2013-11-13 | 浙江大学 | 一种应用于浸没式光刻机中浸液液体传送系统的通讯方法 |
| JP6312379B2 (ja) * | 2013-07-19 | 2018-04-18 | キヤノン株式会社 | リソグラフィ装置、リソグラフィ方法、リソグラフィシステム、プログラム、物品の製造方法 |
| JP2015204401A (ja) * | 2014-04-15 | 2015-11-16 | キヤノン株式会社 | リソグラフィ装置、および物品の製造方法 |
| US9927725B2 (en) | 2015-02-16 | 2018-03-27 | Canon Kabushiki Kaisha | Lithography apparatus, lithography method, program, lithography system, and article manufacturing method |
| JP6198805B2 (ja) * | 2015-02-16 | 2017-09-20 | キヤノン株式会社 | リソグラフィ装置、リソグラフィ方法、プログラム、リソグラフィシステムおよび物品製造方法 |
| KR102185748B1 (ko) * | 2016-07-19 | 2020-12-03 | 에이에스엠엘 네델란즈 비.브이. | 직접 기록 마스크리스 리소그래피용 장치 |
| US10522472B2 (en) | 2016-09-08 | 2019-12-31 | Asml Netherlands B.V. | Secure chips with serial numbers |
| NL2019502B1 (en) | 2016-09-08 | 2018-08-31 | Mapper Lithography Ip Bv | Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system |
| US20180068047A1 (en) * | 2016-09-08 | 2018-03-08 | Mapper Lithography Ip B.V. | Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system |
| US10418324B2 (en) | 2016-10-27 | 2019-09-17 | Asml Netherlands B.V. | Fabricating unique chips using a charged particle multi-beamlet lithography system |
| CN106647181B (zh) * | 2016-12-19 | 2018-03-09 | 电子科技大学 | 一种用于dmd无掩膜光刻机的高速图像曝光方法 |
| EP3514640B1 (de) | 2018-01-18 | 2023-05-17 | Gebr. Saacke GmbH & Co.KG | Vorrichtung und verfahren zur bereitstellung von maschinendaten |
| EP4206831A1 (de) * | 2021-12-29 | 2023-07-05 | Siemens Aktiengesellschaft | Verfahren und system zur bereitstellung von zeitkritischen steuerungsanwendungen |
| CN115297183B (zh) * | 2022-07-29 | 2023-11-03 | 天翼云科技有限公司 | 一种数据处理方法、装置、电子设备和存储介质 |
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| AU6449994A (en) | 1993-04-30 | 1994-11-21 | Board Of Regents, The University Of Texas System | Megavoltage scanning imager and method for its use |
| JP3654597B2 (ja) | 1993-07-15 | 2005-06-02 | 株式会社ルネサステクノロジ | 製造システムおよび製造方法 |
| EP0766405A1 (en) | 1995-09-29 | 1997-04-02 | STMicroelectronics S.r.l. | Successive approximation register without redundancy |
| US5778386A (en) * | 1996-05-28 | 1998-07-07 | Taiwan Semiconductor Manufacturing Company Ltd. | Global view storage management system for semiconductor manufacturing plants |
| JP3087696B2 (ja) * | 1997-07-25 | 2000-09-11 | 日本電気株式会社 | 分散メモリ型マルチプロセッサ・システム制御方法およびコンピュータ読み取り可能な記録媒体 |
| KR19990062942A (ko) * | 1997-12-10 | 1999-07-26 | 히로시 오우라 | 전하 입자 빔 노출 장치 |
| US6011952A (en) * | 1998-01-20 | 2000-01-04 | Viasat, Inc. | Self-interference cancellation for relayed communication networks |
| US6610150B1 (en) | 1999-04-02 | 2003-08-26 | Asml Us, Inc. | Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system |
| IL151166A0 (en) | 2000-02-16 | 2003-04-10 | Cymer Inc | Process monitoring system for lithography lasers |
| US6714830B2 (en) * | 2000-02-28 | 2004-03-30 | Canon Kabushiki Kaisha | Push-type scheduling for semiconductor fabrication |
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| JP2003288496A (ja) * | 2002-03-27 | 2003-10-10 | Toshiba Corp | 描画支援システム、描画支援方法、マスク製造支援システム、及びマスク製造支援方法 |
| JP4078150B2 (ja) | 2002-08-22 | 2008-04-23 | 株式会社日立ハイテクノロジーズ | 半導体製造装置 |
| KR100523839B1 (ko) | 2002-10-07 | 2005-10-27 | 한국전자통신연구원 | 건식 리소그라피 방법 및 이를 이용한 게이트 패턴 형성방법 |
| KR101060557B1 (ko) | 2002-10-25 | 2011-08-31 | 마퍼 리쏘그라피 아이피 비.브이. | 리소그라피 시스템 |
| KR101077098B1 (ko) | 2002-10-30 | 2011-10-26 | 마퍼 리쏘그라피 아이피 비.브이. | 전자 빔 노출 시스템 |
| KR101068607B1 (ko) | 2003-03-10 | 2011-09-30 | 마퍼 리쏘그라피 아이피 비.브이. | 복수 개의 빔렛 발생 장치 |
| JP4949843B2 (ja) | 2003-05-28 | 2012-06-13 | マッパー・リソグラフィー・アイピー・ビー．ブイ． | 荷電粒子ビームレット露光システム |
| WO2005010618A2 (en) | 2003-07-30 | 2005-02-03 | Mapper Lithography Ip B.V. | Modulator circuitry |
| US7094613B2 (en) | 2003-10-21 | 2006-08-22 | Applied Materials, Inc. | Method for controlling accuracy and repeatability of an etch process |
| JP2005174959A (ja) * | 2003-12-05 | 2005-06-30 | Nikon Corp | リソグラフィシステム、プログラム及び情報記録媒体、支援装置、並びに露光方法 |
| US7728880B2 (en) | 2004-06-25 | 2010-06-01 | Qualcomm Incorporated | Automatic white balance method and apparatus |
| JP2006113705A (ja) * | 2004-10-13 | 2006-04-27 | Nikon Corp | 情報処理システム及びプログラム |
| DE102004055149B4 (de) * | 2004-11-16 | 2007-07-19 | Leica Microsystems Lithography Gmbh | Vorrichtung und Verfahren zum Abbilden eines Mehrfach-Partikelstrahls auf ein Substrat |
| CN100361113C (zh) * | 2005-02-05 | 2008-01-09 | 上海微电子装备有限公司 | 步进扫描投影光刻机的高速同步广播总线系统 |
| JP2006338232A (ja) * | 2005-06-01 | 2006-12-14 | Murata Mach Ltd | 通信システム |
| US20070010905A1 (en) * | 2005-07-07 | 2007-01-11 | Taiwan Semiconductor Manufacturing Co., Ltd. | Systems and methods for monitoring processing tool |
| US7709815B2 (en) | 2005-09-16 | 2010-05-04 | Mapper Lithography Ip B.V. | Lithography system and projection method |
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| US7652749B2 (en) | 2006-02-14 | 2010-01-26 | Asml Netherlands B.V. | Software upgrades in a lithographic apparatus |
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| JP4992750B2 (ja) * | 2008-02-14 | 2012-08-08 | 日本電気株式会社 | 中継装置 |
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| US8258484B2 (en) | 2008-04-15 | 2012-09-04 | Mapper Lithography Ip B.V. | Beamlet blanker arrangement |
| WO2009141428A1 (en) | 2008-05-23 | 2009-11-26 | Mapper Lithography Ip B.V. | Imaging system |
| JP5743886B2 (ja) | 2008-06-04 | 2015-07-01 | マッパー・リソグラフィー・アイピー・ビー．ブイ． | ターゲットを露光するための方法およびシステム |
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| TWI479530B (zh) | 2008-10-01 | 2015-04-01 | Mapper Lithography Ip Bv | 靜電透鏡結構、靜電透鏡陣列、帶電粒子的子束微影系統以及製造絕緣結構的方法 |
| JP2010093125A (ja) * | 2008-10-09 | 2010-04-22 | Toray Eng Co Ltd | 基板処理システムおよび基板処理方法 |
| TW201040680A (en) * | 2008-12-15 | 2010-11-16 | Tokyo Electron Ltd | System for processing of substrate, method of processing of substrate, and storage medium that stores program |
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| NL2004392A (en) | 2009-04-15 | 2010-10-18 | Asml Netherlands Bv | Lithographic apparatus, control system, multi-core processor, and a method to start tasks on a multi-core processor. |
| CN102460633B (zh) * | 2009-05-20 | 2014-12-17 | 迈普尔平版印刷Ip有限公司 | 用于光刻系统的图案数据转换器 |
| CN104810232B (zh) | 2009-05-20 | 2017-12-29 | 迈普尔平版印刷Ip有限公司 | 两次扫描 |
| JP2011054679A (ja) * | 2009-08-31 | 2011-03-17 | Hitachi Kokusai Electric Inc | 基板処理装置 |
| JP5392190B2 (ja) * | 2010-06-01 | 2014-01-22 | 東京エレクトロン株式会社 | 基板処理システム及び基板処理方法 |
| US8822106B2 (en) * | 2012-04-13 | 2014-09-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Grid refinement method |
| JP6352529B2 (ja) | 2015-04-03 | 2018-07-04 | 株式会社日立ハイテクノロジーズ | 光量検出装置、それを用いた免疫分析装置および荷電粒子線装置 |
-
2012
- 2012-04-23 WO PCT/EP2012/057366 patent/WO2012143548A2/en not_active Ceased
- 2012-04-23 EP EP12716017.4A patent/EP2699966B1/en active Active
- 2012-04-23 CN CN201280030773.3A patent/CN103649836B/zh active Active
- 2012-04-23 JP JP2014505667A patent/JP6042410B2/ja active Active
- 2012-04-23 US US13/452,990 patent/US9086912B2/en active Active
- 2012-04-23 KR KR1020177029925A patent/KR102072200B1/ko active Active
- 2012-04-23 EP EP12719948.7A patent/EP2700081B1/en active Active
- 2012-04-23 TW TW101114467A patent/TWI526789B/zh active
- 2012-04-23 WO PCT/EP2012/057385 patent/WO2012143555A2/en not_active Ceased
- 2012-04-23 KR KR1020137030924A patent/KR101791252B1/ko active Active
- 2012-04-23 CN CN201610308354.1A patent/CN105974743B/zh active Active
- 2012-04-23 US US13/453,008 patent/US9244726B2/en active Active
- 2012-04-23 JP JP2014505664A patent/JP5951753B2/ja active Active
- 2012-04-23 RU RU2013151876/07A patent/RU2573398C2/ru active
- 2012-04-23 TW TW101114468A patent/TWI576670B/zh active
-
2015
- 2015-06-15 US US14/738,962 patent/US9507629B2/en active Active
-
2016
- 2016-05-23 JP JP2016102480A patent/JP6550623B2/ja active Active
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