JP2015532313A5 - - Google Patents
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- Publication number
- JP2015532313A5 JP2015532313A5 JP2015532525A JP2015532525A JP2015532313A5 JP 2015532313 A5 JP2015532313 A5 JP 2015532313A5 JP 2015532525 A JP2015532525 A JP 2015532525A JP 2015532525 A JP2015532525 A JP 2015532525A JP 2015532313 A5 JP2015532313 A5 JP 2015532313A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- antireflection film
- independently selected
- forming
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 10
- 125000003118 aryl group Chemical group 0.000 claims 5
- 229910052757 nitrogen Inorganic materials 0.000 claims 5
- 239000003431 cross linking reagent Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 125000002947 alkylene group Chemical group 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- KZRAAPTWXAMZHQ-UHFFFAOYSA-N methoxymethanamine Chemical group COCN KZRAAPTWXAMZHQ-UHFFFAOYSA-N 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- -1 vinyloxy group Chemical group 0.000 claims 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- ULDHMXUKGWMISQ-UHFFFAOYSA-N carvone Chemical compound CC(=C)C1CC=C(C)C(=O)C1 ULDHMXUKGWMISQ-UHFFFAOYSA-N 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 239000011593 sulfur Substances 0.000 claims 2
- MJPPGVVIDGQOQT-UHFFFAOYSA-N 2-bromo-5-(2-bromo-2-nitroethenyl)furan Chemical compound [O-][N+](=O)C(Br)=CC1=CC=C(Br)O1 MJPPGVVIDGQOQT-UHFFFAOYSA-N 0.000 claims 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 1
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- 239000005973 Carvone Substances 0.000 claims 1
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 150000001299 aldehydes Chemical class 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000003282 alkyl amino group Chemical group 0.000 claims 1
- 125000001769 aryl amino group Chemical group 0.000 claims 1
- 150000007514 bases Chemical class 0.000 claims 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 1
- 229910052794 bromium Inorganic materials 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 125000001309 chloro group Chemical group Cl* 0.000 claims 1
- 125000004663 dialkyl amino group Chemical group 0.000 claims 1
- RMGVZKRVHHSUIM-UHFFFAOYSA-N dithionic acid Chemical compound OS(=O)(=O)S(O)(=O)=O RMGVZKRVHHSUIM-UHFFFAOYSA-N 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 150000002430 hydrocarbons Chemical group 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 150000003949 imides Chemical class 0.000 claims 1
- 239000011630 iodine Chemical group 0.000 claims 1
- 229910052740 iodine Chemical group 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 125000004151 quinonyl group Chemical group 0.000 claims 1
- 230000007261 regionalization Effects 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
- 229940124530 sulfonamide Drugs 0.000 claims 1
- 150000003456 sulfonamides Chemical class 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/627,599 | 2012-09-26 | ||
| US13/627,599 US8900797B2 (en) | 2012-09-26 | 2012-09-26 | Developable bottom anti-reflective coating |
| PCT/IB2013/002121 WO2014049420A2 (en) | 2012-09-26 | 2013-09-26 | Developable bottom anti-reflective coating |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015532313A JP2015532313A (ja) | 2015-11-09 |
| JP2015532313A5 true JP2015532313A5 (enExample) | 2016-03-17 |
| JP6005866B2 JP6005866B2 (ja) | 2016-10-12 |
Family
ID=49943392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015532525A Active JP6005866B2 (ja) | 2012-09-26 | 2013-09-26 | 現像可能な下層反射防止膜 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8900797B2 (enExample) |
| EP (1) | EP2895468B1 (enExample) |
| JP (1) | JP6005866B2 (enExample) |
| KR (1) | KR101673890B1 (enExample) |
| CN (1) | CN104736523B (enExample) |
| WO (1) | WO2014049420A2 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102214895B1 (ko) | 2017-12-26 | 2021-02-09 | 삼성에스디아이 주식회사 | 레지스트 하층막용 조성물 및 이를 이용한 패턴 형성 방법 |
| KR102117555B1 (ko) * | 2018-02-09 | 2020-06-01 | 에스엠에스주식회사 | 고굴절 아크릴 모노머 및 이를 이용한 광경화 조성물 |
| KR102285555B1 (ko) | 2018-06-12 | 2021-08-03 | 주식회사 엘지화학 | 코팅 조성물 및 이를 이용한 마이크로 전자 소자 제조용 포지티브형 패턴의 제조방법 |
| CN111670177B (zh) | 2018-10-11 | 2022-08-23 | 株式会社Lg化学 | 化合物、包含其的光致抗蚀剂组合物、光致抗蚀剂图案及其制备方法 |
| WO2020076123A1 (ko) * | 2018-10-11 | 2020-04-16 | 주식회사 엘지화학 | 화합물, 이를 포함하는 포토레지스트 조성물, 이를 포함하는 포토레지스트 패턴 및 포토레지스트 패턴의 제조 방법 |
| JP2020132749A (ja) * | 2019-02-19 | 2020-08-31 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ | ポリマー、ポリマーを含んでなる半導体組成物、および半導体組成物を用いた膜の製造方法 |
| US11269252B2 (en) * | 2019-07-22 | 2022-03-08 | Rohm And Haas Electronic Materials Llc | Method for forming pattern using antireflective coating composition including photoacid generator |
| JP7377848B2 (ja) | 2020-12-31 | 2023-11-10 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシー | フォトレジスト組成物及びパターン形成方法 |
| CN115873176B (zh) * | 2021-09-28 | 2023-09-26 | 上海新阳半导体材料股份有限公司 | 一种duv光刻用底部抗反射涂层及其制备方法和应用 |
| CN116102680B (zh) * | 2021-11-09 | 2024-02-13 | 上海新阳半导体材料股份有限公司 | 一种底部抗反射涂层及其制备方法和应用 |
| US12411412B2 (en) | 2022-11-22 | 2025-09-09 | Toyko Electron Limited | Patterning semiconductor features |
| CN120605812B (zh) * | 2025-08-12 | 2025-10-17 | 湖南明珠选矿药剂有限责任公司 | 一种金属矿浮选捕收剂及其制备方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3165514A (en) * | 1962-08-07 | 1965-01-12 | Dal Mon Research Co | Unsaturated triazine compounds |
| US6156479A (en) * | 1997-09-30 | 2000-12-05 | Brewer Science, Inc. | Thermosetting anti-refective coatings |
| JP3907165B2 (ja) * | 2001-11-05 | 2007-04-18 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| US20050214674A1 (en) * | 2004-03-25 | 2005-09-29 | Yu Sui | Positive-working photoimageable bottom antireflective coating |
| US20060250463A1 (en) * | 2004-05-07 | 2006-11-09 | Canon Kagushiki Kaisha | Recording method, set of ink compositions applicable to recording method and image-forming apparatus |
| US8088548B2 (en) | 2007-10-23 | 2012-01-03 | Az Electronic Materials Usa Corp. | Bottom antireflective coating compositions |
| US8329387B2 (en) | 2008-07-08 | 2012-12-11 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US8455176B2 (en) * | 2008-11-12 | 2013-06-04 | Az Electronic Materials Usa Corp. | Coating composition |
-
2012
- 2012-09-26 US US13/627,599 patent/US8900797B2/en active Active
-
2013
- 2013-09-26 EP EP13818772.9A patent/EP2895468B1/en active Active
- 2013-09-26 KR KR1020157010837A patent/KR101673890B1/ko active Active
- 2013-09-26 CN CN201380049311.0A patent/CN104736523B/zh active Active
- 2013-09-26 JP JP2015532525A patent/JP6005866B2/ja active Active
- 2013-09-26 WO PCT/IB2013/002121 patent/WO2014049420A2/en not_active Ceased
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