JP2015500921A5 - - Google Patents
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- Publication number
- JP2015500921A5 JP2015500921A5 JP2014543775A JP2014543775A JP2015500921A5 JP 2015500921 A5 JP2015500921 A5 JP 2015500921A5 JP 2014543775 A JP2014543775 A JP 2014543775A JP 2014543775 A JP2014543775 A JP 2014543775A JP 2015500921 A5 JP2015500921 A5 JP 2015500921A5
- Authority
- JP
- Japan
- Prior art keywords
- power
- cathode
- assembly
- power source
- value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 15
- 239000007789 gas Substances 0.000 claims 8
- 238000000151 deposition Methods 0.000 claims 6
- 230000008021 deposition Effects 0.000 claims 5
- 230000001276 controlling effect Effects 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 238000005137 deposition process Methods 0.000 claims 2
- 230000010355 oscillation Effects 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 230000003044 adaptive effect Effects 0.000 claims 1
- 230000002596 correlated effect Effects 0.000 claims 1
- 238000012544 monitoring process Methods 0.000 claims 1
- 230000007704 transition Effects 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2011/071425 WO2013079108A1 (en) | 2011-11-30 | 2011-11-30 | Closed loop control |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017196735A Division JP6596474B2 (ja) | 2017-10-10 | 2017-10-10 | 閉ループ制御 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015500921A JP2015500921A (ja) | 2015-01-08 |
| JP2015500921A5 true JP2015500921A5 (enExample) | 2015-02-26 |
| JP6305929B2 JP6305929B2 (ja) | 2018-04-04 |
Family
ID=45349469
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014543775A Active JP6305929B2 (ja) | 2011-11-30 | 2011-11-30 | 閉ループ制御 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US9758855B2 (enExample) |
| EP (1) | EP2785892B1 (enExample) |
| JP (1) | JP6305929B2 (enExample) |
| KR (2) | KR20180132975A (enExample) |
| CN (1) | CN103958723B (enExample) |
| TW (1) | TWI592510B (enExample) |
| WO (1) | WO2013079108A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EA020763B9 (ru) | 2008-08-04 | 2015-05-29 | Эй-Джи-Си Флет Гласс Норт Эмерике, Инк. | Источник плазмы и способы нанесения тонкопленочных покрытий с использованием плазменно-химического осаждения из газовой фазы |
| WO2016034197A1 (en) * | 2014-09-01 | 2016-03-10 | Applied Materials, Inc. | Assembly and method for deposition of material on a substrate |
| BR112017011612A2 (pt) | 2014-12-05 | 2018-01-16 | Agc Glass Europe, S.A | fonte de plasma de cátodo oco |
| EP3228161B1 (en) | 2014-12-05 | 2021-11-03 | AGC Flat Glass North America, Inc. | Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces |
| US9721765B2 (en) * | 2015-11-16 | 2017-08-01 | Agc Flat Glass North America, Inc. | Plasma device driven by multiple-phase alternating or pulsed electrical current |
| US10573499B2 (en) | 2015-12-18 | 2020-02-25 | Agc Flat Glass North America, Inc. | Method of extracting and accelerating ions |
| US10242846B2 (en) | 2015-12-18 | 2019-03-26 | Agc Flat Glass North America, Inc. | Hollow cathode ion source |
| DE102016116762B4 (de) * | 2016-09-07 | 2021-11-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Abscheiden einer Schicht mittels einer Magnetronsputtereinrichtung |
| KR102643656B1 (ko) | 2017-11-09 | 2024-03-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 리튬 금속 애노드에 대해 칼코게나이드들을 사용하는 엑스-시튜 고체 전해질 계면 개질 |
| US11631840B2 (en) | 2019-04-26 | 2023-04-18 | Applied Materials, Inc. | Surface protection of lithium metal anode |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2821119C2 (de) | 1978-05-13 | 1983-08-25 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren und Anordnung zur Regelung des Entladungsvorganges in einer Katodenzerstäubungsanlage |
| US4201645A (en) | 1978-06-26 | 1980-05-06 | Robert J. Ferran | Closed-loop sputtering system and method of operating same |
| DE4106513C2 (de) * | 1991-03-01 | 2002-06-13 | Unaxis Deutschland Holding | Verfahren zur Regelung eines reaktiven Sputterprozesses und Vorrichtung zur Durchführung des Verfahrens |
| US6106676A (en) | 1998-04-16 | 2000-08-22 | The Boc Group, Inc. | Method and apparatus for reactive sputtering employing two control loops |
| WO2000028104A1 (en) | 1998-11-06 | 2000-05-18 | Scivac | Sputtering apparatus and process for high rate coatings |
| US6537428B1 (en) * | 1999-09-02 | 2003-03-25 | Veeco Instruments, Inc. | Stable high rate reactive sputtering |
| JP3866615B2 (ja) * | 2002-05-29 | 2007-01-10 | 株式会社神戸製鋼所 | 反応性スパッタリング方法及び装置 |
| DE102004006131B4 (de) | 2004-02-07 | 2005-12-15 | Applied Films Gmbh & Co. Kg | Bandbeschichtungsanlage mit einer Vakuumkammer und einer Beschichtungswalze |
| JP2010229523A (ja) * | 2009-03-27 | 2010-10-14 | Bridgestone Corp | 導電性透明化合物薄膜の成膜方法および導電性透明化合物薄膜 |
| DE102009053756B4 (de) | 2009-06-26 | 2011-07-21 | VON ARDENNE Anlagentechnik GmbH, 01324 | Verfahren zur Beschichtung eines Substrates in einer Vakuumkammer mit mindestens einem rotierenden Magnetron |
-
2011
- 2011-11-30 JP JP2014543775A patent/JP6305929B2/ja active Active
- 2011-11-30 EP EP11796945.1A patent/EP2785892B1/en not_active Revoked
- 2011-11-30 CN CN201180075166.4A patent/CN103958723B/zh active Active
- 2011-11-30 US US14/357,168 patent/US9758855B2/en not_active Expired - Fee Related
- 2011-11-30 WO PCT/EP2011/071425 patent/WO2013079108A1/en not_active Ceased
- 2011-11-30 KR KR1020187035066A patent/KR20180132975A/ko not_active Ceased
- 2011-11-30 KR KR1020147017890A patent/KR20140097510A/ko not_active Ceased
-
2012
- 2012-11-29 TW TW101144735A patent/TWI592510B/zh active
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