JP2013098271A5 - - Google Patents

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Publication number
JP2013098271A5
JP2013098271A5 JP2011238285A JP2011238285A JP2013098271A5 JP 2013098271 A5 JP2013098271 A5 JP 2013098271A5 JP 2011238285 A JP2011238285 A JP 2011238285A JP 2011238285 A JP2011238285 A JP 2011238285A JP 2013098271 A5 JP2013098271 A5 JP 2013098271A5
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JP
Japan
Prior art keywords
supply
jig
film forming
purge gas
substrate
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JP2011238285A
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English (en)
Japanese (ja)
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JP5794893B2 (ja
JP2013098271A (ja
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Priority to JP2011238285A priority Critical patent/JP5794893B2/ja
Priority claimed from JP2011238285A external-priority patent/JP5794893B2/ja
Priority to US13/661,362 priority patent/US20130104800A1/en
Priority to KR1020120119641A priority patent/KR101447663B1/ko
Publication of JP2013098271A publication Critical patent/JP2013098271A/ja
Publication of JP2013098271A5 publication Critical patent/JP2013098271A5/ja
Application granted granted Critical
Publication of JP5794893B2 publication Critical patent/JP5794893B2/ja
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JP2011238285A 2011-10-31 2011-10-31 成膜方法および成膜装置 Active JP5794893B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011238285A JP5794893B2 (ja) 2011-10-31 2011-10-31 成膜方法および成膜装置
US13/661,362 US20130104800A1 (en) 2011-10-31 2012-10-26 Film-forming method and film-forming apparatus
KR1020120119641A KR101447663B1 (ko) 2011-10-31 2012-10-26 성막 방법 및 성막 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011238285A JP5794893B2 (ja) 2011-10-31 2011-10-31 成膜方法および成膜装置

Publications (3)

Publication Number Publication Date
JP2013098271A JP2013098271A (ja) 2013-05-20
JP2013098271A5 true JP2013098271A5 (enExample) 2014-10-02
JP5794893B2 JP5794893B2 (ja) 2015-10-14

Family

ID=48171078

Family Applications (1)

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JP2011238285A Active JP5794893B2 (ja) 2011-10-31 2011-10-31 成膜方法および成膜装置

Country Status (3)

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US (1) US20130104800A1 (enExample)
JP (1) JP5794893B2 (enExample)
KR (1) KR101447663B1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018037537A (ja) * 2016-08-31 2018-03-08 株式会社ニューフレアテクノロジー 気相成長装置
JP6998839B2 (ja) * 2018-06-25 2022-01-18 グローバルウェーハズ・ジャパン株式会社 エピタキシャルシリコンウェーハの製造方法
JP2020043260A (ja) * 2018-09-12 2020-03-19 住友金属鉱山株式会社 多結晶膜の成膜方法、基板載置機構および成膜装置
DE102019132933A1 (de) * 2018-12-10 2020-06-10 Showa Denko K.K. Suszeptor und vorrichtung zur chemischen gasphasenabscheidung
JP7382836B2 (ja) * 2020-01-15 2023-11-17 東京エレクトロン株式会社 基板処理装置及び回転駆動方法
JP2021082824A (ja) * 2021-01-27 2021-05-27 株式会社ニューフレアテクノロジー 気相成長装置
KR102570336B1 (ko) * 2021-03-22 2023-08-25 김용한 질화갈륨 기판의 제조 장치
CN118854267A (zh) * 2024-09-25 2024-10-29 无锡展硕科技有限公司 一种半导体薄膜成膜系统及方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3061401B2 (ja) * 1990-07-20 2000-07-10 株式会社東芝 半導体気相成長装置
JP2990551B2 (ja) * 1992-01-16 1999-12-13 東京エレクトロン株式会社 成膜処理装置
US5960555A (en) * 1996-07-24 1999-10-05 Applied Materials, Inc. Method and apparatus for purging the back side of a substrate during chemical vapor processing
US6133152A (en) * 1997-05-16 2000-10-17 Applied Materials, Inc. Co-rotating edge ring extension for use in a semiconductor processing chamber
JP2001053030A (ja) * 1999-08-11 2001-02-23 Tokyo Electron Ltd 成膜装置
KR100507753B1 (ko) * 2000-03-17 2005-08-10 가부시키가이샤 히타치세이사쿠쇼 반도체 제조방법 및 제조장치
JP4614252B2 (ja) * 2001-02-15 2011-01-19 キヤノンアネルバ株式会社 基板処理装置及びこれに用いられるコンピュータプログラム
WO2003046966A1 (en) * 2001-11-30 2003-06-05 Shin-Etsu Handotai Co., Ltd. Susceptor, gaseous phase growing device, device and method for manufacturing epitaxial wafer, and epitaxial wafer
KR100534209B1 (ko) * 2003-07-29 2005-12-08 삼성전자주식회사 반도체소자 제조용 화학기상증착 공정설비
JP5117856B2 (ja) * 2005-08-05 2013-01-16 株式会社日立国際電気 基板処理装置、冷却ガス供給ノズルおよび半導体装置の製造方法
JP4803578B2 (ja) * 2005-12-08 2011-10-26 東京エレクトロン株式会社 成膜方法
JP5165952B2 (ja) * 2007-07-20 2013-03-21 株式会社ニューフレアテクノロジー 気相成長装置及び気相成長方法
KR101405346B1 (ko) * 2008-01-04 2014-06-12 삼성디스플레이 주식회사 기판 지지대, 이를 포함하는 기판 처리 장치 및 기판 정렬방법
KR101006647B1 (ko) * 2008-04-25 2011-01-10 가부시키가이샤 뉴플레어 테크놀로지 성막 장치 및 성막 방법

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