JP2015151628A5 - - Google Patents
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- Publication number
- JP2015151628A5 JP2015151628A5 JP2015023742A JP2015023742A JP2015151628A5 JP 2015151628 A5 JP2015151628 A5 JP 2015151628A5 JP 2015023742 A JP2015023742 A JP 2015023742A JP 2015023742 A JP2015023742 A JP 2015023742A JP 2015151628 A5 JP2015151628 A5 JP 2015151628A5
- Authority
- JP
- Japan
- Prior art keywords
- solution
- ions
- platinum
- providing
- stabilization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 31
- 150000002500 ions Chemical class 0.000 claims 20
- 238000000034 method Methods 0.000 claims 20
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims 12
- 229910052697 platinum Inorganic materials 0.000 claims 10
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims 9
- 230000006641 stabilisation Effects 0.000 claims 9
- 238000011105 stabilization Methods 0.000 claims 9
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 claims 8
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims 8
- 239000000203 mixture Substances 0.000 claims 7
- 230000000087 stabilizing effect Effects 0.000 claims 6
- 238000000151 deposition Methods 0.000 claims 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 4
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 claims 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 4
- 229910052796 boron Inorganic materials 0.000 claims 4
- 230000008021 deposition Effects 0.000 claims 4
- 239000000174 gluconic acid Substances 0.000 claims 4
- 235000012208 gluconic acid Nutrition 0.000 claims 4
- 229910052698 phosphorus Inorganic materials 0.000 claims 4
- 239000011574 phosphorus Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims 3
- 235000015165 citric acid Nutrition 0.000 claims 3
- 239000011975 tartaric acid Substances 0.000 claims 3
- 235000002906 tartaric acid Nutrition 0.000 claims 3
- 238000007772 electroless plating Methods 0.000 claims 2
- -1 platinum ions Chemical class 0.000 claims 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 claims 1
- 239000000908 ammonium hydroxide Substances 0.000 claims 1
- 229940050410 gluconate Drugs 0.000 claims 1
- SOBHUZYZLFQYFK-UHFFFAOYSA-K trisodium;hydroxy-[[phosphonatomethyl(phosphonomethyl)amino]methyl]phosphinate Chemical compound [Na+].[Na+].[Na+].OP(O)(=O)CN(CP(O)([O-])=O)CP([O-])([O-])=O SOBHUZYZLFQYFK-UHFFFAOYSA-K 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/182,987 US9469902B2 (en) | 2014-02-18 | 2014-02-18 | Electroless deposition of continuous platinum layer |
| US14/182,987 | 2014-02-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015151628A JP2015151628A (ja) | 2015-08-24 |
| JP2015151628A5 true JP2015151628A5 (https=) | 2019-07-11 |
Family
ID=53797584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015023742A Pending JP2015151628A (ja) | 2014-02-18 | 2015-02-10 | 連続白金層の無電解堆積 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9469902B2 (https=) |
| JP (1) | JP2015151628A (https=) |
| KR (1) | KR102455120B1 (https=) |
| CN (1) | CN104851837B (https=) |
| SG (1) | SG10201501150YA (https=) |
| TW (1) | TW201542873A (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003008537A2 (en) | 2001-04-06 | 2003-01-30 | Mannkind Corporation | Epitope sequences |
| EP1752160A3 (en) | 2001-04-06 | 2007-05-30 | Mannkind Corporation | Epitope sequences |
| AU2004249254B2 (en) | 2003-06-17 | 2010-07-08 | Mannkind Corporation | Combinations of tumor-associated antigens for the treatment of various types of cancers |
| DE602004028468D1 (de) | 2003-06-17 | 2010-09-16 | Mannkind Corp | Haltung von immunantworten gegen mhc-klasse-i-beschränkte epitope, für prophylaktische oder therapeutische zwecke |
| US8202841B2 (en) | 2004-06-17 | 2012-06-19 | Mannkind Corporation | SSX-2 peptide analogs |
| NZ564359A (en) | 2005-06-17 | 2011-09-30 | Mannkind Corp | Analogs of pepetides corresponding to class I MHC-restricted T cell epitopes |
| CN101687020A (zh) | 2005-06-17 | 2010-03-31 | 曼康公司 | 用于癌症的多价引发-和-增强免疫治疗剂 |
| MX2007015933A (es) | 2005-06-17 | 2008-04-21 | Mannkind Corp | Metodos y composiciones para generar respuestas inmunes multivalentes contra espitopes dominantes y subdominantes, expresados en celulas cancerigenas y estromas tumorales. |
| AU2010310468A1 (en) | 2009-10-23 | 2012-05-24 | Mannkind Corporation | Cancer immunotherapy and method of treatment |
| US9499913B2 (en) * | 2014-04-02 | 2016-11-22 | Lam Research Corporation | Electroless deposition of continuous platinum layer using complexed Co2+ metal ion reducing agent |
| LT6547B (lt) | 2016-12-28 | 2018-08-10 | Valstybinis mokslinių tyrimų institutas Fizinių ir technologijos mokslų centras | Platinos cheminio nusodinimo tirpalas ir platinos tolydžios dangos formavimo būdas |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3698939A (en) * | 1970-07-09 | 1972-10-17 | Frank H Leaman | Method and composition of platinum plating |
| US4004051A (en) * | 1974-02-15 | 1977-01-18 | Crown City Plating Company | Aqueous noble metal suspensions for one stage activation of nonconductors for electroless plating |
| US4279951A (en) * | 1979-01-15 | 1981-07-21 | Mine Safety Appliances Company | Method for the electroless deposition of palladium |
| JPH04325688A (ja) | 1991-04-26 | 1992-11-16 | Murata Mfg Co Ltd | 無電解めっき浴 |
| US5360471A (en) * | 1992-08-05 | 1994-11-01 | Murata Manufacturing Co., Ltd. | Electroless solder plating bath |
| JP3116637B2 (ja) | 1993-03-12 | 2000-12-11 | 株式会社村田製作所 | 無電解めっき液 |
| JP3920462B2 (ja) * | 1998-07-13 | 2007-05-30 | 株式会社大和化成研究所 | 貴金属を化学的還元析出によって得るための水溶液 |
| JP3455709B2 (ja) * | 1999-04-06 | 2003-10-14 | 株式会社大和化成研究所 | めっき方法とそれに用いるめっき液前駆体 |
| JP3744300B2 (ja) * | 1999-04-06 | 2006-02-08 | 住友電気工業株式会社 | 導電性多孔質とそれを用いた金属多孔質体および電池用極板 |
| US20020152955A1 (en) * | 1999-12-30 | 2002-10-24 | Yezdi Dordi | Apparatus and method for depositing an electroless solution |
| DE10048844A1 (de) * | 2000-10-02 | 2002-04-11 | Basf Ag | Verfahren zur Herstellung von Platinmetall-Katalysatoren |
| WO2003075409A1 (fr) * | 2002-03-04 | 2003-09-12 | Sumitomo Electric Industries, Ltd. | Film conducteur anisotrope et procede de production |
| JP2004115885A (ja) * | 2002-09-27 | 2004-04-15 | Tokyo Electron Ltd | 無電解メッキ方法 |
| JP2009016389A (ja) * | 2007-06-29 | 2009-01-22 | Panasonic Corp | 半導体レーザ素子およびその製造方法 |
| JP4986174B2 (ja) * | 2008-10-30 | 2012-07-25 | 独立行政法人産業技術総合研究所 | マイクロリアクター用反応管及びその製造方法 |
| EP2501509A2 (en) * | 2009-11-16 | 2012-09-26 | Basf Se | Metal island coatings and method for synthesis |
| KR101079775B1 (ko) * | 2010-04-01 | 2011-11-03 | 경희대학교 산학협력단 | 전기방사에 이은 무전해 도금을 통한 전기 전도성 나노섬유 제조 방법 |
| US8632628B2 (en) * | 2010-10-29 | 2014-01-21 | Lam Research Corporation | Solutions and methods for metal deposition |
| EP2481835B1 (en) * | 2011-01-28 | 2013-09-11 | Atotech Deutschland GmbH | Autocatalytic plating bath composition for deposition of tin and tin alloys |
| JP2013161928A (ja) * | 2012-02-03 | 2013-08-19 | Sumitomo Electric Ind Ltd | プリント配線板用基材およびプリント配線板用基材の製造方法 |
| US9499913B2 (en) * | 2014-04-02 | 2016-11-22 | Lam Research Corporation | Electroless deposition of continuous platinum layer using complexed Co2+ metal ion reducing agent |
| US20150307995A1 (en) * | 2014-04-29 | 2015-10-29 | Lam Research Corporation | ELECTROLESS DEPOSITION OF CONTINUOUS PALLADIUM LAYER USING COMPLEXED Co2+ METAL IONS OR Ti3+ METAL IONS AS REDUCING AGENTS |
| US9428836B2 (en) * | 2014-04-29 | 2016-08-30 | Lam Research Corporation | Electroless deposition of continuous cobalt layer using complexed Ti3+ metal ions as reducing agents |
| US20150307994A1 (en) * | 2014-04-29 | 2015-10-29 | Lam Research Corporation | ELECTROLESS DEPOSITION OF CONTINUOUS NICKEL LAYER USING COMPLEXED Ti3+ METAL IONS AS REDUCING AGENTS |
-
2014
- 2014-02-18 US US14/182,987 patent/US9469902B2/en active Active
-
2015
- 2015-02-10 JP JP2015023742A patent/JP2015151628A/ja active Pending
- 2015-02-11 TW TW104104496A patent/TW201542873A/zh unknown
- 2015-02-13 KR KR1020150022631A patent/KR102455120B1/ko active Active
- 2015-02-13 SG SG10201501150YA patent/SG10201501150YA/en unknown
- 2015-02-16 CN CN201510084904.1A patent/CN104851837B/zh active Active
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