JP2015133482A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2015133482A JP2015133482A JP2014250466A JP2014250466A JP2015133482A JP 2015133482 A JP2015133482 A JP 2015133482A JP 2014250466 A JP2014250466 A JP 2014250466A JP 2014250466 A JP2014250466 A JP 2014250466A JP 2015133482 A JP2015133482 A JP 2015133482A
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Classifications
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1222—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
- H01L27/1225—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
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- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
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- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76816—Aspects relating to the layout of the pattern or to the size of vias or trenches
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- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
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- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1251—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs comprising TFTs having a different architecture, e.g. top- and bottom gate TFTs
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Abstract
Description
本実施の形態では、半導体装置の一例として、チャネル形成領域が酸化物半導体膜で形成されているトランジスタ(OSトランジスタ)、およびその作製方法等について説明する。また、本実施の形態では、デバイス構造の異なる複数のトランジスタを同一絶縁表面に有する半導体装置について説明する。
トランジスタTA1は、ゲート電極GE1、ソース電極SE1、ドレイン電極DE1、バックゲート電極BGE1、および酸化物半導体層OS1を有する。
トランジスタTA2は、ゲート電極GE2、ソース電極SE2、ドレイン電極DE2、バックゲート電極BGE2、および酸化物半導体層OS2を有する。電極BGE2は、絶縁層21−23を貫通する開口CG2において電極GE2に接している。トランジスタTA2は、トランジスタTA1の変形例であり、層OS2が酸化物半導体膜33でなる単層構造である点でトランジスタTA1と異なり、その他については同様である。ここでは、トランジスタTA2のチャネル長La2、チャネル幅Wa2は、トランジスタTA1のチャネル長La1、チャネル幅Wa1と等しくなるようにしている。
トランジスタTB1は、ゲート電極GE3、ソース電極SE3、ドレイン電極DE3および酸化物半導体層OS3を有する。トランジスタTB1は、トランジスタTA2の変形例である。層OS3は、トランジスタTA2と同様に酸化物半導体膜33でなる単層構造である。トランジスタTA2とは、バックゲート電極を有していない点で異なる。また、層OS3および電極(GE3、SE3、DE3)のレイアウトおよびサイズが異なる。図1Cに示すように、層OS3は、電極GE3と重なっていない領域は、電極SE3または電極DE3の何れかと重なっている。そのため、トランジスタTB1のチャネル幅Wb1は、層OS3の幅で決定される。チャネル長Lb1は、トランジスタTA2と同様、電極SE3と電極DE3間の距離で決定され、ここでは、トランジスタTA2のチャネル長La2よりも長くしている。
絶縁層21、絶縁層22および絶縁層23は、基板10のトランジスタ(TA1、TA2、TB1)が形成される領域全体に形成される膜である。絶縁層21、22および23は、単層あるいは複数層の絶縁膜で形成される。絶縁層21は、トランジスタ(TA1、TA2、TB1)のゲート絶縁層を構成する膜である。また、絶縁層22および絶縁層23は、トランジスタ(TA1、TA2、TB1)のバックチャネル側のゲート絶縁層を構成する膜である。また、最上面の絶縁層23は、基板10に形成されるトランジスタの保護膜として機能するような材料で形成することが好ましい。絶縁層23は適宜設ければよい。3層目の電極BGE1と2層目の電極(SE1、DE1)を絶縁するために、これらの間に少なくとも1層絶縁膜が存在していればよい。
ここでは、OSトランジスタの半導体層を構成する酸化物半導体膜について説明する。層OS1のように半導体層を多層構造とする場合、これらを構成する酸化物半導体膜は、少なくとも1つ同じ金属元素を含む金属酸化物膜であることが好ましく、Inを含むことが好ましい。
図3A、図3Bに、それぞれ、トランジスタTA3、トランジスタTA4の上面図(レイアウト図)と、その回路記号を示す。図4A、図4Bに、トランジスタTA3のa7−a8線およびb7−b8線による断面図、並びにトランジスタTA4のa9−a10線およびb9−b10線による断面図を示す。
図5A、図5B、図5Cに、それぞれ、トランジスタTC1、トランジスタTB2、およびトランジスタTD1の上面図(レイアウト図)と、その回路記号を示す。図6A、図6Bに、トランジスタTC1のa11−a12線およびb11−b12線による断面図、トランジスタTB2のa13−a14線およびb13−b14線による断面図、並びにトランジスタTD1のa15−a16線およびb15−b16線による断面図を示す。
以下、半導体装置の作製方法の一例を説明する。ここでは、トランジスタTA1、トランジスタTA2およびトランジスタTB1を同一の工程で作製する方法の一例を説明する。なお他のトランジスタTA3等も同様に作製することができる。ここでは、図2Aと同様のトランジスタのチャネル長方向の断面図(図7−図9)を参照して、トランジスタの作製方法について説明する。
基板10としては、様々な基板を用いることができ、特定のものに限定されることはない。基板10の一例としては、半導体基板(例えば単結晶基板又はシリコン基板)、SOI基板、ガラス基板、石英基板、プラスチック基板、金属基板、ステンレス・スチル基板、ステンレス・スチル・ホイルを有する基板、タングステン基板、タングステン・ホイルを有する基板、可撓性基板、貼り合わせフィルム、繊維状の材料を含む紙、又は基材フィルムなどがある。ガラス基板の一例としては、バリウムホウケイ酸ガラス、アルミノホウケイ酸ガラス、又はソーダライムガラスなどがある。可撓性基板、貼り合わせフィルム、基材フィルムなどの一例としては、以下のものがあげられる。例えば、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリエーテルサルフォン(PES)に代表されるプラスチックがある。または、一例としては、アクリル等の合成樹脂などがある。または、一例としては、ポリプロピレン、ポリエステル、ポリフッ化ビニル、又はポリ塩化ビニルなどがある。または、一例としては、ポリアミド、ポリイミド、アラミド、エポキシ、無機蒸着フィルム、又は紙類などがある。特に、半導体基板、単結晶基板、又はSOI基板などを用いてトランジスタを製造することによって、特性、サイズ、又は形状などのばらつきが少なく、電流能力が高く、サイズの小さいトランジスタを製造することができる。このようなトランジスタによって回路を構成すると、回路の低消費電力化、又は回路の高集積化を図ることができる。
導電膜51は、単層の導電膜、または2つ以上の導電膜が積層された多層構造の膜である。導電膜51として形成される導電膜は、アルミニウム、クロム、銅、タンタル、チタン、モリブデン、タングステンから選ばれた金属元素、または上述した金属元素を成分とする合金か、上述した金属元素を組み合わせた合金等で形成することができる。また、マンガン、ジルコニウムのいずれか一または複数から選択された金属元素で形成することができる。また、アルミニウムに、チタン、タンタル、タングステン、モリブデン、クロム、ネオジム、スカンジウムから選ばれた元素の一または複数を組み合わせた合金、もしくは窒化物で形成することができる。また、インジウム錫酸化物、酸化タングステンを含むインジウム酸化物、酸化タングステンを含むインジウム亜鉛酸化物、酸化チタンを含むインジウム酸化物、酸化チタンを含むインジウム錫酸化物、インジウム亜鉛酸化物、酸化シリコンを含むインジウム錫酸化物等の透光性を有する金属酸化物で形成することもできる。
ゲート電極GE1−GE3を覆って、絶縁層21を形成する(図7B)。絶縁層21は、単層の絶縁膜あるいは2層以上の多層構造の絶縁膜である。絶縁層21として形成される絶縁膜は、酸化物絶縁膜、窒化物絶縁膜、酸化窒化絶縁膜、および窒化酸化絶縁膜等が挙げられる。なお、本明細書において、酸化窒化物とは、窒素より酸素の含有量が多い材料であり、窒化酸化物とは酸素より窒素の含有量が多い材料とする。
絶縁層21上に酸化物半導体膜31を形成し、酸化物半導体膜31上に酸化物半導体膜32を形成する(図7C)。酸化物半導体膜32上にフォトリソグラフィ工程によりマスクRM2(図示せず)を形成する。マスクRM2を用いて酸化物半導体膜31および酸化物半導体膜32をエッチングして、層OS1の1層目(31)および2層目(32)を形成する。この後、マスクRM2を除去する。
絶縁層21、酸化物半導体層(OS1、OS2、OS3)を覆って、導電膜52を形成する(図9A)。導電膜52は導電膜51と同様に形成することができる。ここでは、3層構造の導電膜52を形成する。厚さ50nmの銅−マンガン合金膜、厚さ400nmの銅膜、及び厚さ100nmの銅−マンガン合金膜の順に、これらの膜をスパッタリング法により積層する。
電極(SE1、DE1、SE2、DE2、SE3、DE3)、酸化物半導体層(OS1、OS2、OS3)および絶縁層21を覆って、絶縁層22を形成し、絶縁層22上に絶縁層23を形成する(図9C)。絶縁層22および絶縁層23は絶縁層21と同様に形成することができる。
フォトリソグラフィ工程により絶縁層23上にマスクRM5(図示せず)を形成し、マスクRM5を用いて絶縁層21−23をエッチングして、これらを貫通する開口CG1、および開口CG2を形成する(図2B)。マスクRM5を除去し、絶縁層23上に導電膜53を形成する(図9C)。導電膜53は導電膜51と同様に形成することができる。
図10A、図10B、図10Cに、それぞれ、トランジスタTE1、トランジスタTE2、トランジスタTF1の上面図(レイアウト図)と、その回路記号を示す。図11A、図11Bに、トランジスタTE1のa17−a18線およびb17−b18線による断面図、トランジスタTE2のa19−a20線およびb19−b20線による断面図、並びにトランジスタTF1のa21−a22線およびb21−b22線による断面図を示す。
図12A、図12B、図12Cに、それぞれ、トランジスタTG1、トランジスタTG2、トランジスタTH1の上面図(レイアウト図)と、その回路記号を示す。図13A、図13Bに、トランジスタTG1のa23−a24線およびb23−b24線による断面図、トランジスタTG2のa25−a26線およびb25−b26線による断面図、並びにトランジスタTH1のa27−a28線およびb27−b28線による断面図を示す。
図14A、図14B、図14Cに、それぞれ、トランジスタTG3、トランジスタTG4、トランジスタTH2の上面図(レイアウト図)と、その回路記号を示す。図15A、図15Bに、トランジスタTG3のa29−a30線およびb29−b30による断面図、トランジスタTG4のa31−a32線およびb31−b32線による断面図、並びにトランジスタTH2のa33−a34線およびb33−b34線による断面図を示す。
実施の形態1に係るトランジスタを用いて、機能の異なる複数の回路を備えた半導体装置を構成することができる。本実施の形態では、このような半導体装置の一例としてアクティブマトリクス型表示装置について説明する。
図16は、アクティブマトリクス型表示装置の構成の一例を示すブロック図である。図16に示すように、アクティブマトリクス型表示装置700(以下、表示装置700と呼ぶ。)は、画素部710と、駆動回路721および駆動回路722を有する。なお、以下の説明おいて、駆動回路721と駆動回路722を総称して駆動回路部720と呼ぶ場合がある。
図17Aは、順序回路の構成の一例を示す回路図であり、図17Bは同ブロック図である。
図19Aは、分配回路(デマルチプレクサ)の構成の一例を示す回路図であり、図19Bは同ブロック図である。分配回路760は、サンプリング信号(制御信号)に従って、1つの信号を複数の配線に分配する機能を有する回路である。分配回路760は、駆動回路722の最終段に設けられ、分配回路760の出力に配線SLが接続されている。分配回路760では、x本の配線SLから、順次にn本の配線SLを選択し、それらを電気的に導通させる機能を有する。
保護回路HOGOは、ダイオード接続されたトランジスタや抵抗素子等で構成することができる。図21Bの例では、回路HOGOは直列に接続された4つトランジスタM31−M34を有する。各トランジスタM31−M34はダイオード接続されており、またゲートに接続されたバックゲートを有する。これにより、トランジスタM31−M34のオン電流を大きくすることができる。トランジスタM31−M34には、例えば、トランジスタTA1(図1A)、トランジスタTA2(図1B)等を適用することができる。また配線GLに対しても、回路HOGOと同様な保護回路を接続することができる。
図22Aは、OLEDの画素の構成の一例を示す回路図である。
図25は、LCDの画素の構成例を示す回路図である。
図26に、表示装置700として、OLEDの構成の一例を示す。なお、図26は、OLEDの画素部と駆動回路部のデバイス構造を説明するための図であり、OLEDの特定の部位の断面図ではない。
図27に、表示装置700として、LCDの構成の一例を示す。なお、図26と同様に図27も、LCDの画素部と駆動回路部のデバイス構造の積層構造を説明するための図であり、LCDの特定の部位の断面図ではない。
実施の形態1で述べたように、半導体装置を一部あるいは全部完成させた後、半導体装置の作製に使用した基板を分離して、他の基板に転載することが可能である。このような作製方法を用いることで、トランジスタを耐熱性の劣る基板や可撓性の基板にも転載できる。
本発明の一形態にかかる表示装置700の作製方法について、図28及び図29を用いて説明する。
次いで、本発明の一形態にかかる表示装置700の別の作製方法について、図30を用いて説明する。なお、図30では、絶縁膜420及び絶縁膜440として無機絶縁膜を用いる構成について説明する。
本実施の形態では、半導体装置の一例として、表示装置および表示装置を備えた電子機器などについて説明する。
図31Aは、表示装置の外観の一例を示す、斜視図である。図31Aに示すように、表示装置1610は、パネル1601と、コントローラ、電源回路、画像処理回路、画像メモリ、CPUなどが設けられた回路基板1602と、接続部1603とを有している。パネル1601は、画素が複数設けられた画素部1604と、複数の画素を行ごとに選択する駆動回路1605と、選択された行内の画素への画像信号Sigの入力を制御する駆動回路1606とを有する。
図32に、回路基板2003の外観図を示す。回路基板2003は、スリット2211を有するFPC2201上に、Bluetooth(登録商標。IEEE802.15.1に同じ。)規格の通信装置2101、マイコン2102、記憶装置2103、FPGA2104、DAコンバータ2105、充電制御IC2106、レベルシフタ2107を設けた構成を有する。また、回路基板2003は、入出力コネクタ2108を介して、本発明の一形態に係る表示装置と電気的に接続する。また、FPC2201にスリット2211を設けることにより、FPC2201を用いた回路基板2003の可撓性を高めている。
図33Aは情報処理装置1000の外観を説明する模式図であり、図33Bは、図33AのX1−X2線による断面の構造を説明する模式図である。また、図33Cおよび図33Dは、情報処理装置1000の外観を説明する模式図であり、図33Eは、図33Cおよび図33DのX3−X4線による断面の構造を説明する模式図である。図33Cは情報処理装置1000の正面を説明する模式図であり。図33Dは情報処理装置1000の背面を説明する模式図である。
本発明の一態様に係る半導体装置は、表示装置、ノート型パーソナルコンピュータ、記録媒体を備えた画像再生装置(代表的にはDVD:Digital Versatile Disc等の記録媒体を再生し、その画像を表示しうるディスプレイを有する装置)に用いることができる。その他に、本発明の一態様に係る半導体装置を用いることができる電子機器として、携帯電話、携帯型ゲーム機、携帯情報端末、電子書籍、ビデオカメラ、デジタルスチルカメラなどのカメラ、ゴーグル型ディスプレイ(ヘッドマウントディスプレイ)、ナビゲーションシステム、音響再生装置(カーオーディオ、デジタルオーディオプレイヤー等)、複写機、ファクシミリ、プリンター、プリンター複合機、現金自動預け入れ払い機(ATM)、自動販売機などが挙げられる。これら電子機器の具体例を図34に示す。
本実施の形態では、OSトランジスタに用いられる酸化物半導体膜について説明する。
CAAC−OSは、c軸配向した複数の結晶部を有する酸化物半導体の一つである。CAAC−OSを、CANC(C−Axis Aligned nanocrystals)を有する酸化物半導体と呼ぶこともできる。透過型電子顕微鏡(TEM:Transmission Electron Microscope)によってCAAC−OSの明視野像と回折パターンとの複合解析像(高分解能TEM像ともいう。)を観察すると、複数の結晶部を確認することができる。一方、明確な結晶部同士の境界、即ち結晶粒界(グレインバウンダリーともいう。)を確認することができない。そのため、CAAC−OSは、結晶粒界に起因する電子移動度の低下が起こりにくいといえる。
微結晶酸化物半導体は、高分解能TEM像において、結晶部を確認することのできる領域と、明確に結晶部を確認することができない領域とを有する。微結晶酸化物半導体膜に含まれる結晶部は、1nm以上100nm以下、または1nm以上10nm以下の大きさであることが多い。特に、1nm以上10nm以下、または1nm以上3nm以下の微結晶であるナノ結晶(nc:nanocrystal)を有する酸化物半導体膜を、nc−OS(nanocrystalline Oxide Semiconductor)膜とよぶ。nc−OSは、例えば、高分解能TEM像では、結晶粒界を明確に確認できない場合がある。
21−22 絶縁層
31−33 酸化物半導体膜
51−53 導電層
Claims (5)
- 基板上に、第1および第2のトランジスタを含む第1の回路、および第3のトランジスタを含む第2の回路を有し、
前記第1のトランジスタは、第1の酸化物半導体膜、および第2の酸化物半導体膜の順に積層された第1の半導体層を有し、
前記第2のトランジスタは、前記第2の酸化物半導体膜を含む第2の半導体層を有し、
前記第3のトランジスタは、前記第2の酸化物半導体膜を含む第3の半導体層を有し、
前記第1のトランジスタは、ゲートに接続されたバックゲートを有することを特徴とする半導体装置。 - 基板上に、第1および第2のトランジスタを含む第1の回路、および第3のトランジスタを含む第2の回路を有し、
前記第1のトランジスタは、第1の酸化物半導体膜、第2の酸化物半導体膜および第3の酸化物半導体膜の順に積層された第1の半導体層を有し、
前記第2のトランジスタは、前記第3の酸化物半導体膜を含む第2の半導体層を有し、
前記第3のトランジスタは、前記第3の酸化物半導体膜を含む第3の半導体層を有し、
前記第1のトランジスタは、ゲートに接続されたバックゲートを有することを特徴とする半導体装置。 - 請求項1または2において、
前記第1のトランジスタのチャネル長は、2.5μm未満であることを特徴とする半導体装置。 - 請求項1乃至3のいずれか1項において、
前記第2のトランジスタは、ゲートに接続されたバックゲートを有することを特徴とする半導体装置。 - 請求項1乃至4のいずれか1項において、
前記第2の回路を含む画素部と、
前記第1の回路を含み、前記画素部に信号を供給する機能を有する駆動回路と、
を有することを特徴とする半導体装置。
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US20160254291A1 (en) | 2016-09-01 |
US20170263497A1 (en) | 2017-09-14 |
US10115631B2 (en) | 2018-10-30 |
JP2019087760A (ja) | 2019-06-06 |
JP6486091B2 (ja) | 2019-03-20 |
JP2016184764A (ja) | 2016-10-20 |
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