JP2015089943A5 - - Google Patents
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- JP2015089943A5 JP2015089943A5 JP2014225478A JP2014225478A JP2015089943A5 JP 2015089943 A5 JP2015089943 A5 JP 2015089943A5 JP 2014225478 A JP2014225478 A JP 2014225478A JP 2014225478 A JP2014225478 A JP 2014225478A JP 2015089943 A5 JP2015089943 A5 JP 2015089943A5
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- 239000000203 mixture Substances 0.000 claims 27
- 239000011859 microparticle Substances 0.000 claims 25
- 239000002105 nanoparticle Substances 0.000 claims 25
- 239000007788 liquid Substances 0.000 claims 24
- 230000005855 radiation Effects 0.000 claims 19
- 239000002245 particle Substances 0.000 claims 18
- 239000000654 additive Substances 0.000 claims 15
- 230000000996 additive effect Effects 0.000 claims 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 9
- -1 aliphatic epoxide Chemical class 0.000 claims 8
- 238000007493 shaping process Methods 0.000 claims 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 6
- 125000005843 halogen group Chemical group 0.000 claims 6
- 239000006185 dispersion Substances 0.000 claims 5
- 125000004423 acyloxy group Chemical group 0.000 claims 4
- 125000003545 alkoxy group Chemical group 0.000 claims 4
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 4
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 125000004644 alkyl sulfinyl group Chemical group 0.000 claims 4
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims 4
- 125000004414 alkyl thio group Chemical group 0.000 claims 4
- 125000005529 alkyleneoxy group Chemical group 0.000 claims 4
- 125000003277 amino group Chemical group 0.000 claims 4
- 150000001768 cations Chemical class 0.000 claims 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- 239000011159 matrix material Substances 0.000 claims 4
- 238000000465 moulding Methods 0.000 claims 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 4
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 claims 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims 3
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical group C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 claims 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 3
- 239000004593 Epoxy Substances 0.000 claims 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims 3
- 239000012952 cationic photoinitiator Substances 0.000 claims 3
- 125000000623 heterocyclic group Chemical group 0.000 claims 3
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 claims 3
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 claims 3
- 239000000377 silicon dioxide Substances 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims 2
- 125000005129 aryl carbonyl group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 claims 2
- 125000005135 aryl sulfinyl group Chemical group 0.000 claims 2
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims 2
- 125000005110 aryl thio group Chemical group 0.000 claims 2
- 125000004104 aryloxy group Chemical group 0.000 claims 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims 2
- 239000012949 free radical photoinitiator Substances 0.000 claims 2
- 239000012798 spherical particle Substances 0.000 claims 2
- JGTNAGYHADQMCM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-M 0.000 claims 1
- GHTVHGGJFHMYBA-UHFFFAOYSA-N 2-(7-oxabicyclo[4.1.0]heptane-4-carbonyloxy)ethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCCOC(=O)C1CC2OC2CC1 GHTVHGGJFHMYBA-UHFFFAOYSA-N 0.000 claims 1
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 claims 1
- TZLVUWBGUNVFES-UHFFFAOYSA-N 2-ethyl-5-methylpyrazol-3-amine Chemical compound CCN1N=C(C)C=C1N TZLVUWBGUNVFES-UHFFFAOYSA-N 0.000 claims 1
- SLJFKNONPLNAPF-UHFFFAOYSA-N 3-Vinyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1C(C=C)CCC2OC21 SLJFKNONPLNAPF-UHFFFAOYSA-N 0.000 claims 1
- RRXFVFZYPPCDAW-UHFFFAOYSA-N 4-(7-oxabicyclo[4.1.0]heptan-4-ylmethoxymethyl)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2OC2CC1COCC1CC2OC2CC1 RRXFVFZYPPCDAW-UHFFFAOYSA-N 0.000 claims 1
- HYYPKCMPDGCDHE-UHFFFAOYSA-N 4-(7-oxabicyclo[4.1.0]heptan-4-ylmethyl)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2OC2CC1CC1CC2OC2CC1 HYYPKCMPDGCDHE-UHFFFAOYSA-N 0.000 claims 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 claims 1
- XAYDWGMOPRHLEP-UHFFFAOYSA-N 6-ethenyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1CCCC2OC21C=C XAYDWGMOPRHLEP-UHFFFAOYSA-N 0.000 claims 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims 1
- 229910018286 SbF 6 Inorganic materials 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 claims 1
- 229940077388 benzenesulfonate Drugs 0.000 claims 1
- DJUWPHRCMMMSCV-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-ylmethyl) hexanedioate Chemical compound C1CC2OC2CC1COC(=O)CCCCC(=O)OCC1CC2OC2CC1 DJUWPHRCMMMSCV-UHFFFAOYSA-N 0.000 claims 1
- LMMDJMWIHPEQSJ-UHFFFAOYSA-N bis[(3-methyl-7-oxabicyclo[4.1.0]heptan-4-yl)methyl] hexanedioate Chemical compound C1C2OC2CC(C)C1COC(=O)CCCCC(=O)OCC1CC2OC2CC1C LMMDJMWIHPEQSJ-UHFFFAOYSA-N 0.000 claims 1
- QDHFHIQKOVNCNC-UHFFFAOYSA-M butane-1-sulfonate Chemical compound CCCCS([O-])(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-M 0.000 claims 1
- 239000000919 ceramic Substances 0.000 claims 1
- KXAOUKMOJCJUHZ-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid dioctyl benzene-1,2-dicarboxylate Chemical compound C(C=1C(C(=O)OCCCCCCCC)=CC=CC1)(=O)OCCCCCCCC.C1(C(CCCC1)C(=O)O)C(=O)O KXAOUKMOJCJUHZ-UHFFFAOYSA-N 0.000 claims 1
- 150000002118 epoxides Chemical class 0.000 claims 1
- DWYMPOCYEZONEA-UHFFFAOYSA-L fluoridophosphate Chemical class [O-]P([O-])(F)=O DWYMPOCYEZONEA-UHFFFAOYSA-L 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000011417 postcuring Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims 1
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361900044P | 2013-11-05 | 2013-11-05 | |
| US61/900,044 | 2013-11-05 | ||
| US201462074735P | 2014-11-04 | 2014-11-04 | |
| US62/074,735 | 2014-11-04 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015089943A JP2015089943A (ja) | 2015-05-11 |
| JP2015089943A5 true JP2015089943A5 (enExample) | 2016-02-12 |
| JP6056032B2 JP6056032B2 (ja) | 2017-01-11 |
Family
ID=51845350
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014225478A Active JP6056032B2 (ja) | 2013-11-05 | 2014-11-05 | 付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (7) | US9228073B2 (enExample) |
| EP (4) | EP2868692B2 (enExample) |
| JP (1) | JP6056032B2 (enExample) |
| CN (2) | CN109503761B (enExample) |
| HK (1) | HK1209440A1 (enExample) |
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| MX2017016391A (es) * | 2015-06-16 | 2018-03-02 | Huntsman Adv Mat Licensing Switzerland Gmbh | Composicion de resina epoxica. |
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| US11332625B2 (en) | 2015-11-17 | 2022-05-17 | Covestro (Netherlands) B.V. | Antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes |
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2014
- 2014-11-05 EP EP14191905.0A patent/EP2868692B2/en active Active
- 2014-11-05 EP EP24215781.6A patent/EP4491679A3/en active Pending
- 2014-11-05 CN CN201811221774.1A patent/CN109503761B/zh active Active
- 2014-11-05 EP EP21200893.2A patent/EP3971235B1/en active Active
- 2014-11-05 EP EP17188195.6A patent/EP3266815B1/en active Active
- 2014-11-05 US US14/533,238 patent/US9228073B2/en active Active
- 2014-11-05 CN CN201410635503.6A patent/CN104610511B/zh active Active
- 2014-11-05 JP JP2014225478A patent/JP6056032B2/ja active Active
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2015
- 2015-10-16 HK HK15110192.8A patent/HK1209440A1/xx unknown
- 2015-11-25 US US14/951,743 patent/US9951198B2/en active Active
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2018
- 2018-03-12 US US15/917,928 patent/US10526469B2/en active Active
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2019
- 2019-11-20 US US16/689,257 patent/US20200102442A1/en not_active Abandoned
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2021
- 2021-02-12 US US17/174,576 patent/US20210189097A1/en not_active Abandoned
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