JP6056032B2 - 付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物 - Google Patents

付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物 Download PDF

Info

Publication number
JP6056032B2
JP6056032B2 JP2014225478A JP2014225478A JP6056032B2 JP 6056032 B2 JP6056032 B2 JP 6056032B2 JP 2014225478 A JP2014225478 A JP 2014225478A JP 2014225478 A JP2014225478 A JP 2014225478A JP 6056032 B2 JP6056032 B2 JP 6056032B2
Authority
JP
Japan
Prior art keywords
group
component
liquid radiation
radiation curable
curable composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014225478A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015089943A (ja
JP2015089943A5 (enExample
Inventor
ヒー ミンボー
ヒー ミンボー
ランドレット ベス
ランドレット ベス
レン カンタイ
レン カンタイ
リュウ キャロライン
リュウ キャロライン
ヨン リー タイ
ヨン リー タイ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DSM IP Assets BV
Original Assignee
DSM IP Assets BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=51845350&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP6056032(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by DSM IP Assets BV filed Critical DSM IP Assets BV
Publication of JP2015089943A publication Critical patent/JP2015089943A/ja
Publication of JP2015089943A5 publication Critical patent/JP2015089943A5/ja
Application granted granted Critical
Publication of JP6056032B2 publication Critical patent/JP6056032B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/02—Emulsion paints including aerosols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2063/00—Use of EP, i.e. epoxy resins or derivatives thereof, as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0088—Blends of polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/24—Condition, form or state of moulded material or of the material to be shaped crosslinked or vulcanised
    • B29K2105/246—Uncured, e.g. green
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2509/00—Use of inorganic materials not provided for in groups B29K2503/00 - B29K2507/00, as filler
    • B29K2509/02—Ceramics
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Civil Engineering (AREA)
  • Composite Materials (AREA)
  • Structural Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Dispersion Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2014225478A 2013-11-05 2014-11-05 付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物 Active JP6056032B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201361900044P 2013-11-05 2013-11-05
US61/900,044 2013-11-05
US201462074735P 2014-11-04 2014-11-04
US62/074,735 2014-11-04

Publications (3)

Publication Number Publication Date
JP2015089943A JP2015089943A (ja) 2015-05-11
JP2015089943A5 JP2015089943A5 (enExample) 2016-02-12
JP6056032B2 true JP6056032B2 (ja) 2017-01-11

Family

ID=51845350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014225478A Active JP6056032B2 (ja) 2013-11-05 2014-11-05 付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物

Country Status (5)

Country Link
US (7) US9228073B2 (enExample)
EP (4) EP3971235B1 (enExample)
JP (1) JP6056032B2 (enExample)
CN (2) CN104610511B (enExample)
HK (1) HK1209440A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12595355B2 (en) 2019-04-17 2026-04-07 Canon Kabushiki Kaisha Stereolithographic resin composition and three-dimensional shaped object

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3971235B1 (en) * 2013-11-05 2025-01-01 Stratasys, Inc. Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication
CN105643924A (zh) * 2014-11-25 2016-06-08 南京百川行远激光科技有限公司 蓝光光固化3d打印笔
EP3292990B1 (en) * 2015-05-07 2021-08-11 LG Chem, Ltd. 3d printer
KR102698770B1 (ko) * 2015-06-08 2024-08-23 스트래터시스,인코포레이티드 부가적 제조용 액체 하이브리드 자외선/가시광선 복사선-경화성 수지 조성물
HUE055541T2 (hu) * 2015-06-16 2021-12-28 Huntsman Adv Mat Licensing Switzerland Gmbh Epoxigyanta kompozit
WO2017059222A1 (en) * 2015-10-01 2017-04-06 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
WO2017087614A1 (en) 2015-11-17 2017-05-26 Dsm Ip Assets, B.V. Improved antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes
JP6603127B2 (ja) * 2015-12-29 2019-11-06 サンアプロ株式会社 感光性組成物
JP6895441B2 (ja) 2015-12-30 2021-06-30 スリーエム イノベイティブ プロパティズ カンパニー 研磨物品及び関連する方法
US11845885B2 (en) 2015-12-30 2023-12-19 3M Innovative Properties Company Dual stage structural bonding adhesive
WO2017117356A1 (en) 2015-12-30 2017-07-06 3M Innovative Properties Company Abrasive article
EP3352975B1 (en) 2016-02-25 2020-07-01 Hewlett-Packard Development Company, L.P. Three-dimensional (3d) printing with a sintering aid/fixer fluid and a liquid functional material
JP6798071B2 (ja) 2016-03-14 2020-12-09 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 改善された靭性および耐高温性を有する付加造形用放射線硬化性組成物
KR102142430B1 (ko) * 2016-09-07 2020-08-07 애경화학 주식회사 양이온경화 및 자외선경화 메커니즘을 동시에 가지는 지환족 에폭시 아크릴계 화합물
JP6774020B2 (ja) * 2016-09-29 2020-10-21 セイコーエプソン株式会社 三次元造形物の製造装置及び三次元造形物の製造方法
US11299430B2 (en) * 2016-11-30 2022-04-12 Hrl Laboratories, Llc Formulations with active functional additives for 3D printing of preceramic polymers, and methods of 3D-printing the formulations
WO2018119049A1 (en) * 2016-12-20 2018-06-28 Basf Se Photopolymer ceramic dispersion for additive fabrication
TW201840515A (zh) * 2016-12-20 2018-11-16 德商巴地斯顏料化工廠 光聚合物陶瓷分散液
US11421119B2 (en) 2017-01-12 2022-08-23 Konica Minolta, Inc. Resin composition, and three-dimensional moulding production method
CN110198827B (zh) * 2017-03-06 2021-09-21 麦克赛尔控股株式会社 模型材料油墨组、支撑材料组合物、油墨组、立体造型物和立体造型物的制造方法
US11274169B2 (en) * 2017-05-14 2022-03-15 Collider, Inc. Synthetic resin composition and method for hybrid manufacturing
WO2018213432A1 (en) 2017-05-17 2018-11-22 Formlabs, Inc. Techniques for casting from additively fabricated molds and related systems and methods
US10590042B2 (en) * 2017-06-29 2020-03-17 Hrl Laboratories, Llc Photopolymer resins with solid and liquid phases for polymer-derived ceramics
DK3655465T3 (da) 2017-07-21 2024-10-21 Saint Gobain Performance Plastics Corp Fremgangsmåde til formning af et tredimensionelt legeme
US11692093B2 (en) 2017-09-22 2023-07-04 Konica Minolta, Inc. Resin composition, method for producing three-dimensional molding using same, and three-dimensional molding
CN111788269B (zh) 2017-12-15 2023-10-20 科思创(荷兰)有限公司 用于高温喷射粘性热固性材料以经由增材制造创建固体制品的组合物和方法
JP6987355B2 (ja) * 2017-12-22 2021-12-22 日本電気硝子株式会社 立体造形用樹脂組成物
JP7251715B2 (ja) 2017-12-29 2023-04-04 コベストロ （ネザーランズ） ビー．ブイ． 付加造形用組成物及び物品並びにそれらの使用方法
WO2019167895A1 (ja) * 2018-03-01 2019-09-06 コニカミノルタ株式会社 樹脂組成物、およびこれを用いた立体造形物の製造方法、ならびに立体造形物
CN111936295A (zh) * 2018-03-28 2020-11-13 汉高知识产权控股有限责任公司 可光固化组合物和使用可光固化组合物在膜表面上形成形貌特征的方法
EP3781987B1 (en) 2018-04-20 2022-10-05 Covestro (Netherlands) B.V. Radiation curable compositions for additive fabrication
US11590706B2 (en) 2018-05-03 2023-02-28 Covestro (Netherlands) B.V. Methods of post-processing photofabricated articles created via additive fabrication
DE102018006397A1 (de) 2018-08-15 2020-02-20 DP Polar GmbH Verfahren zum Herstellen eines dreidimensionalen Formgegenstands mittels schichtweisem Materialauftrag
KR20210084437A (ko) 2018-10-26 2021-07-07 디에스엠 아이피 어셋츠 비.브이. 폴리에스테르 분말 및 3차원 인쇄 공정에서의 이의 용도
CN109517340B (zh) * 2018-11-21 2021-03-23 中山大简科技有限公司 一种耐温透明3d打印用光敏树脂
JP2022509797A (ja) 2018-12-03 2022-01-24 コベストロ （ネザーランズ） ビー．ヴィー． 光ファイバーをコーティングするための充填放射線硬化性組成物およびそれから製造されるコーティング
WO2020191689A1 (en) * 2019-03-28 2020-10-01 Henkel Ag & Co. Kgaa Photo-curable compositions for additive manufacturing
CN110041011A (zh) * 2019-05-28 2019-07-23 四川益好优科环保科技有限公司 一种高无机物填充的辐射交联聚乙烯醇材料及制备方法
TW202110899A (zh) * 2019-07-11 2021-03-16 德商夸茲沃克公司 用於3d列印的樹脂組合物
EP4045291A4 (en) * 2019-10-17 2023-11-15 Henkel AG & Co. KGaA METHOD FOR PRODUCING THREE-DIMENSIONAL PARTS WITH SUPERIOR PROPERTIES
CN111170730B (zh) * 2020-01-17 2021-07-23 中国科学院金属研究所 一种熔模铸造光固化用硅基陶瓷型芯浆料配制方法
CN111233493A (zh) * 2020-01-17 2020-06-05 中国科学院金属研究所 一种熔模铸造用光固化硅基陶瓷型芯素坯烧结方法
EP4100469A1 (en) 2020-02-04 2022-12-14 Cabot Corporation Composition for liquid-based additive manufacturing
CN111348906A (zh) * 2020-02-10 2020-06-30 中国科学院金属研究所 一种熔模铸造用光固化硅基陶瓷型芯素坯脱脂方法
KR20230041786A (ko) 2020-07-24 2023-03-24 어플라이드 머티어리얼스, 인코포레이티드 Uv-led 경화를 위한 티올계 가교제들을 갖는 양자점 배합물들
US11404612B2 (en) 2020-08-28 2022-08-02 Applied Materials, Inc. LED device having blue photoluminescent material and red/green quantum dots
US11942576B2 (en) 2020-08-28 2024-03-26 Applied Materials, Inc. Blue color converter for micro LEDs
US11646397B2 (en) 2020-08-28 2023-05-09 Applied Materials, Inc. Chelating agents for quantum dot precursor materials in color conversion layers for micro-LEDs
DE102020127603A1 (de) 2020-10-20 2022-04-21 Kurtz Gmbh Verfahren und Vorrichtung zum Gießen eines metallenen Gussteils mittels eines Sandkernes
WO2022090342A1 (en) 2020-10-28 2022-05-05 Covestro (Netherlands) Bv (meth)acrylate-functional radiation curable compositions for additive fabrication
US12415906B2 (en) 2021-02-09 2025-09-16 Illumina, Inc. Resin composition and flow cells incorporating the same
WO2022179867A1 (en) * 2021-02-25 2022-09-01 Basf Se Curable composition comprising light polymerizable liquid and epoxy precursor for coating, 2d object formation and 3d printing
WO2022196579A1 (ja) 2021-03-15 2022-09-22 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物及び電子部品
CN115247023B (zh) * 2021-04-25 2023-04-25 宁波安特弗新材料科技有限公司 一种光固化组合物及一种硬涂膜
WO2022229885A1 (en) * 2021-04-27 2022-11-03 Oti Lumionics Inc. Opto-electronic device including em radiation transmissive regions between emissive regions
US20250122345A1 (en) 2021-06-11 2025-04-17 Stratasys, Inc. Methods of making biodegradable and/or compostable biobased powders for additive manufacturing
US20230392027A1 (en) * 2022-06-06 2023-12-07 3M Innovative Properties Company Abrasion-resistant thermoformable coating and preparation of same

Family Cites Families (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4575330A (en) 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US5047568A (en) 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
US5626919A (en) 1990-03-01 1997-05-06 E. I. Du Pont De Nemours And Company Solid imaging apparatus and method with coating station
DE4225309A1 (de) † 1992-07-31 1994-02-03 Roehm Gmbh Suspension für die Herstellung gefüllter Gießharze
US5380923A (en) 1993-04-29 1995-01-10 Minnesota Mining And Manufacturing Company Polymeric sulfonium salts and method of preparation thereof
US5648407A (en) 1995-05-16 1997-07-15 Minnesota Mining And Manufacturing Company Curable resin sols and fiber-reinforced composites derived therefrom
US5665792A (en) 1995-06-07 1997-09-09 E. I. Du Pont De Nemours And Company Stabilizers for use with photoacid precursor formulations
GB9522656D0 (en) 1995-11-04 1996-01-03 Zeneca Ltd Mould
CA2239488C (en) 1995-12-22 2005-12-06 Ciba Specialty Chemicals Holding Inc. Process for the homogenisation of fillers in the stereolithographic preparation of three-dimensional objects
DE59701299D1 (de) 1996-07-29 2000-04-27 Ciba Sc Holding Ag Flüssige, strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
JP3820289B2 (ja) 1996-09-20 2006-09-13 Ｊｓｒ株式会社 樹脂製成形用型製造用光硬化性樹脂組成物および樹脂製成形用型の製造方法
JPH1087963A (ja) 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd 樹脂組成物および繊維質材料成形型
US20020045126A1 (en) * 1996-09-20 2002-04-18 Tsuyoshi Watanabe Photo-curable resin compositions and process for preparing a resin-based mold
BR9811802A (pt) 1997-07-21 2000-09-19 Ciba Sc Holding Ag Composições contendo fìler, estabilizadas à sedimentação, curáveis por radiação
JP4614030B2 (ja) * 1997-07-21 2011-01-19 ハンツマン アドバンスト マテリアルズ （スイッツァランド） ゲーエムベーハー 輻射線−硬化性組成物の粘度安定化
JP4204113B2 (ja) 1997-12-04 2009-01-07 株式会社Ａｄｅｋａ 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法
DE69940916D1 (de) 1998-02-18 2009-07-09 Dsm Ip Assets Bv Fotohärtbare flüssige Harzzusammensetzung
US20030207959A1 (en) 2000-03-13 2003-11-06 Eduardo Napadensky Compositions and methods for use in three dimensional model printing
EP1236765A1 (de) 2001-02-28 2002-09-04 hanse chemie GmbH Siliciumdioxiddispersion
US6833231B2 (en) * 2002-07-31 2004-12-21 3D Systems, Inc. Toughened stereolithographic resin compositions
EP1557413B1 (en) 2002-09-25 2012-08-01 Adeka Corporation Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
US20040077745A1 (en) 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
US6742456B1 (en) 2002-11-14 2004-06-01 Hewlett-Packard Development Company, L.P. Rapid prototyping material systems
DE60332768D1 (de) 2002-12-23 2010-07-08 Stx Aprilis Inc Fluorarylsulfonium fotosäure erzeugende verbindungen
EP2301742B1 (en) * 2003-07-23 2014-01-15 DSM IP Assets B.V. Viscosity reducible radiation curable resin composition
US20050040562A1 (en) * 2003-08-19 2005-02-24 3D Systems Inc. Nanoparticle-filled stereolithographic resins
US7230122B2 (en) 2003-11-04 2007-06-12 National Starch And Chemical Investment Holding Corporation Sulfonium salt photinitiators and use thereof
US20050101684A1 (en) 2003-11-06 2005-05-12 Xiaorong You Curable compositions and rapid prototyping process using the same
WO2005054330A1 (en) * 2003-12-02 2005-06-16 Dsm Ip Assets B.V. Flame retardant radiation curable compositions
US7323248B2 (en) * 2004-03-13 2008-01-29 Ecology Coatings, Inc. Environmentally friendly coating compositions for coating composites, coated composites therefrom, and methods, processes and assemblages for coating thereof
US7591865B2 (en) * 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
WO2007037434A1 (ja) * 2005-09-29 2007-04-05 Cmet Inc. 光学的立体造形用樹脂組成物
EP1941322B1 (en) * 2005-10-27 2018-05-30 3D Systems, Inc. Antimony-free photocurable resin composition and three dimensional article
US7678528B2 (en) 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
EP2019975B1 (en) * 2006-05-01 2017-08-16 DSM IP Assets B.V. Radiation curable resin composition and rapid three dimensional imaging process using the same
US8354160B2 (en) * 2006-06-23 2013-01-15 3M Innovative Properties Company Articles having durable hydrophobic surfaces
US20080081020A1 (en) * 2006-10-03 2008-04-03 Huang Yeong H Color change surgical prep solution
JP5304977B2 (ja) 2007-10-04 2013-10-02 セイコーエプソン株式会社 光硬化組成物を用いた硬化物の形成方法およびその硬化物
BRPI0816605A2 (pt) * 2007-10-10 2015-03-03 Ppg Ind Ohio Inc Composição de revestimento curável por radiação, revestimento curado por radiação e método para revestir um substrato
CN101925594B (zh) 2007-11-28 2013-11-20 住友精化株式会社 光致酸发生剂及光反应性组合物
JP5208573B2 (ja) 2008-05-06 2013-06-12 サンアプロ株式会社 スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体
JP5721630B2 (ja) 2008-10-20 2015-05-20 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ スルホニウム誘導体および潜在酸としてのその使用
US8617787B2 (en) 2009-02-20 2013-12-31 San-Apro, Ltd. Sulfonium salt, photo-acid generator, and photosensitive resin composition
KR101833078B1 (ko) * 2009-12-17 2018-02-27 디에스엠 아이피 어셋츠 비.브이. 적층식 제작을 위한 발광 다이오드 경화성 액체 수지 조성물
CA2784905C (en) * 2009-12-29 2014-12-16 Saint-Gobain Abrasifs Durable coated abrasive article
JP2013525842A (ja) * 2010-04-23 2013-06-20 ジョンソン・アンド・ジョンソン・ビジョン・ケア・インコーポレイテッド レンズ回転の改善方法
JP6414411B2 (ja) * 2013-08-09 2018-10-31 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 積層造形用の低粘度液状放射線硬化型歯科アライナー成形型用樹脂組成物
EP3971235B1 (en) 2013-11-05 2025-01-01 Stratasys, Inc. Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12595355B2 (en) 2019-04-17 2026-04-07 Canon Kabushiki Kaisha Stereolithographic resin composition and three-dimensional shaped object

Also Published As

Publication number Publication date
CN109503761B (zh) 2022-02-01
HK1209440A1 (en) 2016-04-01
US20200102442A1 (en) 2020-04-02
JP2015089943A (ja) 2015-05-11
US9228073B2 (en) 2016-01-05
US20170145184A1 (en) 2017-05-25
EP3971235B1 (en) 2025-01-01
EP2868692A1 (en) 2015-05-06
US20210189097A1 (en) 2021-06-24
EP4491679A2 (en) 2025-01-15
EP3971235A1 (en) 2022-03-23
CN104610511B (zh) 2018-11-16
US11840618B2 (en) 2023-12-12
US9951198B2 (en) 2018-04-24
EP4491679A3 (en) 2025-02-19
US20220185987A1 (en) 2022-06-16
US20240076471A1 (en) 2024-03-07
US20180265669A1 (en) 2018-09-20
US12269933B2 (en) 2025-04-08
CN104610511A (zh) 2015-05-13
EP3266815A1 (en) 2018-01-10
CN109503761A (zh) 2019-03-22
EP2868692B2 (en) 2025-07-16
EP2868692B1 (en) 2017-10-25
US20170283580A9 (en) 2017-10-05
US20150125702A1 (en) 2015-05-07
US10526469B2 (en) 2020-01-07
EP3266815B1 (en) 2021-11-03

Similar Documents

Publication Publication Date Title
US11840618B2 (en) Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication
JP6414411B2 (ja) 積層造形用の低粘度液状放射線硬化型歯科アライナー成形型用樹脂組成物
CN102858738B (zh) 用于加成法制造的包含三芳基锍硼酸盐阳离子光引发剂的液体可辐射固化树脂
US12296528B2 (en) Compositions and articles for additive fabrication and methods of using the same in particle image velocimetry testing
JP2019513842A (ja) 改善された靭性および耐高温性を有する付加造形用放射線硬化性組成物

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151215

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20151215

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20151215

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20160304

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160315

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20160615

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20160812

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20161108

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20161110

R150 Certificate of patent or registration of utility model

Ref document number: 6056032

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250