JP6056032B2 - 付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物 - Google Patents

付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物 Download PDF

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JP6056032B2
JP6056032B2 JP2014225478A JP2014225478A JP6056032B2 JP 6056032 B2 JP6056032 B2 JP 6056032B2 JP 2014225478 A JP2014225478 A JP 2014225478A JP 2014225478 A JP2014225478 A JP 2014225478A JP 6056032 B2 JP6056032 B2 JP 6056032B2
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liquid radiation
radiation curable
curable composition
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JP2015089943A5 (enExample
JP2015089943A (ja
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ヒー ミンボー
ヒー ミンボー
ランドレット ベス
ランドレット ベス
レン カンタイ
レン カンタイ
リュウ キャロライン
リュウ キャロライン
ヨン リー タイ
ヨン リー タイ
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DSM IP Assets BV
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
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    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/02—Emulsion paints including aerosols
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    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2063/00—Use of EP, i.e. epoxy resins or derivatives thereof, as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0088—Blends of polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/24—Condition, form or state of moulded material or of the material to be shaped crosslinked or vulcanised
    • B29K2105/246—Uncured, e.g. green
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2509/00—Use of inorganic materials not provided for in groups B29K2503/00 - B29K2507/00, as filler
    • B29K2509/02—Ceramics
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
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    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/106—Esters of polycondensation macromers
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    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether

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  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2014225478A 2013-11-05 2014-11-05 付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物 Active JP6056032B2 (ja)

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Application Number Priority Date Filing Date Title
US201361900044P 2013-11-05 2013-11-05
US61/900,044 2013-11-05
US201462074735P 2014-11-04 2014-11-04
US62/074,735 2014-11-04

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JP2015089943A JP2015089943A (ja) 2015-05-11
JP2015089943A5 JP2015089943A5 (enExample) 2016-02-12
JP6056032B2 true JP6056032B2 (ja) 2017-01-11

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US (7) US9228073B2 (enExample)
EP (4) EP2868692B2 (enExample)
JP (1) JP6056032B2 (enExample)
CN (2) CN109503761B (enExample)
HK (1) HK1209440A1 (enExample)

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2868692B2 (en) * 2013-11-05 2025-07-16 Stratasys, Inc. Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication
CN105643924A (zh) * 2014-11-25 2016-06-08 南京百川行远激光科技有限公司 蓝光光固化3d打印笔
KR101819335B1 (ko) * 2015-05-07 2018-01-17 주식회사 엘지화학 3d 프린터
WO2016200972A1 (en) * 2015-06-08 2016-12-15 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
MX2017016391A (es) * 2015-06-16 2018-03-02 Huntsman Adv Mat Licensing Switzerland Gmbh Composicion de resina epoxica.
EP3341793B1 (en) * 2015-10-01 2021-05-26 DSM IP Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
US11332625B2 (en) 2015-11-17 2022-05-17 Covestro (Netherlands) B.V. Antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes
JP6603127B2 (ja) * 2015-12-29 2019-11-06 サンアプロ株式会社 感光性組成物
CN108473822B (zh) * 2015-12-30 2021-11-12 3M创新有限公司 双阶段结构粘结粘合剂
JP6895442B2 (ja) 2015-12-30 2021-06-30 スリーエム イノベイティブ プロパティズ カンパニー 研磨物品
JP6895441B2 (ja) 2015-12-30 2021-06-30 スリーエム イノベイティブ プロパティズ カンパニー 研磨物品及び関連する方法
CN108367492B (zh) * 2016-02-25 2020-03-06 惠普发展公司，有限责任合伙企业 使用烧结助剂/固定剂流体和液体功能材料的三维(3d)打印
JP6798071B2 (ja) * 2016-03-14 2020-12-09 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 改善された靭性および耐高温性を有する付加造形用放射線硬化性組成物
KR102142430B1 (ko) * 2016-09-07 2020-08-07 애경화학 주식회사 양이온경화 및 자외선경화 메커니즘을 동시에 가지는 지환족 에폭시 아크릴계 화합물
JP6774020B2 (ja) * 2016-09-29 2020-10-21 セイコーエプソン株式会社 三次元造形物の製造装置及び三次元造形物の製造方法
US11535568B2 (en) * 2016-11-30 2022-12-27 Hrl Laboratories, Llc Monomer formulations and methods for 3D printing of preceramic polymers
TW201840510A (zh) * 2016-12-20 2018-11-16 德商巴地斯顏料化工廠 用於積層製造(additive fabrication)的光聚合物陶瓷分散液
TW201840515A (zh) * 2016-12-20 2018-11-16 德商巴地斯顏料化工廠 光聚合物陶瓷分散液
WO2018131333A1 (ja) 2017-01-12 2018-07-19 コニカミノルタ株式会社 樹脂組成物および立体造形物の製造方法
CN110198827B (zh) * 2017-03-06 2021-09-21 麦克赛尔控股株式会社 模型材料油墨组、支撑材料组合物、油墨组、立体造型物和立体造型物的制造方法
US11274169B2 (en) * 2017-05-14 2022-03-15 Collider, Inc. Synthetic resin composition and method for hybrid manufacturing
US11097449B2 (en) 2017-05-17 2021-08-24 Formlabs, Inc. Techniques for casting from additively fabricated molds and related systems and methods
US10590042B2 (en) * 2017-06-29 2020-03-17 Hrl Laboratories, Llc Photopolymer resins with solid and liquid phases for polymer-derived ceramics
CN110869421A (zh) * 2017-07-21 2020-03-06 美国圣戈班性能塑料公司 形成三维本体的方法
JP7115491B2 (ja) * 2017-09-22 2022-08-09 コニカミノルタ株式会社 樹脂組成物、およびこれを用いた立体造形物の製造方法、ならびに立体造形物
US11578221B2 (en) 2017-12-15 2023-02-14 Covestro (Netherlands) B.V. Compositions and methods for high-temperature jetting of viscous thermosets to create solid articles via additive fabrication
JP6987355B2 (ja) * 2017-12-22 2021-12-22 日本電気硝子株式会社 立体造形用樹脂組成物
KR102864443B1 (ko) 2017-12-29 2025-09-24 스트래터시스,인코포레이티드 적층 제작을 위한 조성물 및 물품, 및 이의 사용 방법
WO2019167895A1 (ja) * 2018-03-01 2019-09-06 コニカミノルタ株式会社 樹脂組成物、およびこれを用いた立体造形物の製造方法、ならびに立体造形物
WO2019191355A1 (en) * 2018-03-28 2019-10-03 Henkel IP & Holding GmbH Photocurable compositions and method of forming topographical features on a membrane surface using photocurable compositions
KR102743665B1 (ko) 2018-04-20 2024-12-16 스트래터시스,인코포레이티드 적층 제조용 복사선 경화성 조성물
KR20210005707A (ko) 2018-05-03 2021-01-14 디에스엠 아이피 어셋츠 비.브이. 적층 제조를 통하여 생성된 광-제작된 물품을 후처리하는 방법
DE102018006397A1 (de) 2018-08-15 2020-02-20 DP Polar GmbH Verfahren zum Herstellen eines dreidimensionalen Formgegenstands mittels schichtweisem Materialauftrag
KR20210084437A (ko) 2018-10-26 2021-07-07 디에스엠 아이피 어셋츠 비.브이. 폴리에스테르 분말 및 3차원 인쇄 공정에서의 이의 용도
CN109517340B (zh) * 2018-11-21 2021-03-23 中山大简科技有限公司 一种耐温透明3d打印用光敏树脂
CN113165971A (zh) * 2018-12-03 2021-07-23 Ms控股有限公司 用于涂布光纤的填充式可辐射固化组合物以及由其产生的涂层
WO2020191689A1 (en) * 2019-03-28 2020-10-01 Henkel Ag & Co. Kgaa Photo-curable compositions for additive manufacturing
CN110041011A (zh) * 2019-05-28 2019-07-23 四川益好优科环保科技有限公司 一种高无机物填充的辐射交联聚乙烯醇材料及制备方法
TW202110899A (zh) 2019-07-11 2021-03-16 德商夸茲沃克公司 用於3d列印的樹脂組合物
WO2021077065A1 (en) * 2019-10-17 2021-04-22 Molecule Corp. Additive manufacturing method to achieve three dimensional parts having superior properties
CN111233493A (zh) * 2020-01-17 2020-06-05 中国科学院金属研究所 一种熔模铸造用光固化硅基陶瓷型芯素坯烧结方法
CN111170730B (zh) * 2020-01-17 2021-07-23 中国科学院金属研究所 一种熔模铸造光固化用硅基陶瓷型芯浆料配制方法
JP7442659B2 (ja) 2020-02-04 2024-03-04 キャボット コーポレイション 液状積層造形用組成物
CN111348906A (zh) * 2020-02-10 2020-06-30 中国科学院金属研究所 一种熔模铸造用光固化硅基陶瓷型芯素坯脱脂方法
CN116034117A (zh) 2020-07-24 2023-04-28 应用材料公司 具有用于uv-led固化的基于硫醇的交联剂的量子点配方
US11404612B2 (en) 2020-08-28 2022-08-02 Applied Materials, Inc. LED device having blue photoluminescent material and red/green quantum dots
US11942576B2 (en) 2020-08-28 2024-03-26 Applied Materials, Inc. Blue color converter for micro LEDs
US11646397B2 (en) 2020-08-28 2023-05-09 Applied Materials, Inc. Chelating agents for quantum dot precursor materials in color conversion layers for micro-LEDs
DE102020127603A1 (de) 2020-10-20 2022-04-21 Kurtz Gmbh Verfahren und Vorrichtung zum Gießen eines metallenen Gussteils mittels eines Sandkernes
US20230407132A1 (en) 2020-10-28 2023-12-21 Covestro (Netherlands) B.V. (meth)acrylate-functional radiation curable compositions for additive fabrication
WO2022173697A1 (en) * 2021-02-09 2022-08-18 Illumina, Inc. Resin composition and flow cells incorporating the same
JP2024507399A (ja) * 2021-02-25 2024-02-19 ビーエーエスエフ ソシエタス・ヨーロピア コーティング、２ｄ物体形成及び３ｄ印刷のための、光重合性液体及びエポキシ前駆体を含む硬化性組成物
CN115247023B (zh) * 2021-04-25 2023-04-25 宁波安特弗新材料科技有限公司 一种光固化组合物及一种硬涂膜
CA3247991A1 (en) * 2021-04-27 2022-11-03 Oti Lumionics Inc. OPTOELECTRONIC DEVICE COMPRISING RADIATION TRANSMISSION REGIONS BETWEEN EMISING REGIONS
WO2022258689A1 (en) 2021-06-11 2022-12-15 Covestro (Netherlands) B.V. Methods of making biodegradable and/or compostable biobased powders for additive manufacturing
US20230392027A1 (en) * 2022-06-06 2023-12-07 3M Innovative Properties Company Abrasion-resistant thermoformable coating and preparation of same

Family Cites Families (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4575330A (en) 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US5047568A (en) 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
US5626919A (en) 1990-03-01 1997-05-06 E. I. Du Pont De Nemours And Company Solid imaging apparatus and method with coating station
DE4225309A1 (de) 1992-07-31 1994-02-03 Roehm Gmbh Suspension für die Herstellung gefüllter Gießharze
US5380923A (en) 1993-04-29 1995-01-10 Minnesota Mining And Manufacturing Company Polymeric sulfonium salts and method of preparation thereof
US5648407A (en) 1995-05-16 1997-07-15 Minnesota Mining And Manufacturing Company Curable resin sols and fiber-reinforced composites derived therefrom
US5665792A (en) 1995-06-07 1997-09-09 E. I. Du Pont De Nemours And Company Stabilizers for use with photoacid precursor formulations
GB9522656D0 (en) 1995-11-04 1996-01-03 Zeneca Ltd Mould
DE69617051T2 (de) 1995-12-22 2002-07-04 Vantico Ag, Basel Verfahren zur stereolithografischen herstellung von dreidimensionalen gegenständen durch gebrauch eines strahlungshärtenden harzes mit füllstoff
DE59701299D1 (de) 1996-07-29 2000-04-27 Ciba Sc Holding Ag Flüssige, strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
US20020045126A1 (en) 1996-09-20 2002-04-18 Tsuyoshi Watanabe Photo-curable resin compositions and process for preparing a resin-based mold
JPH1087963A (ja) 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd 樹脂組成物および繊維質材料成形型
JP3820289B2 (ja) 1996-09-20 2006-09-13 Ｊｓｒ株式会社 樹脂製成形用型製造用光硬化性樹脂組成物および樹脂製成形用型の製造方法
AU744727B2 (en) * 1997-07-21 2002-02-28 Vantico Ag Sedimentation stabilized radiation-curable filled compositions
EP0998696A2 (en) * 1997-07-21 2000-05-10 Ciba SC Holding AG Viscosity stabilization of radiation-curable filled compositions
JP4204113B2 (ja) 1997-12-04 2009-01-07 株式会社Ａｄｅｋａ 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法
US6287745B1 (en) 1998-02-18 2001-09-11 Dsm N.V. Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound
US20030207959A1 (en) 2000-03-13 2003-11-06 Eduardo Napadensky Compositions and methods for use in three dimensional model printing
EP1236765A1 (de) 2001-02-28 2002-09-04 hanse chemie GmbH Siliciumdioxiddispersion
US6833231B2 (en) * 2002-07-31 2004-12-21 3D Systems, Inc. Toughened stereolithographic resin compositions
JP5131888B2 (ja) 2002-09-25 2013-01-30 株式会社Ａｄｅｋａ 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物並びに光学的立体造形法
US20040077745A1 (en) 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
US6742456B1 (en) 2002-11-14 2004-06-01 Hewlett-Packard Development Company, L.P. Rapid prototyping material systems
EP1583740B1 (en) 2002-12-23 2010-05-26 STX Aprilis, Inc. Fluoroarylsulfonium photoacid generators
EP1646493B1 (en) * 2003-07-23 2011-11-16 DSM IP Assets B.V. Viscosity reducible radiation curable resin composition
US20050040562A1 (en) 2003-08-19 2005-02-24 3D Systems Inc. Nanoparticle-filled stereolithographic resins
US7230122B2 (en) 2003-11-04 2007-06-12 National Starch And Chemical Investment Holding Corporation Sulfonium salt photinitiators and use thereof
US20050101684A1 (en) 2003-11-06 2005-05-12 Xiaorong You Curable compositions and rapid prototyping process using the same
EP1689800A1 (en) * 2003-12-02 2006-08-16 DSM IP Assets B.V. Flame retardant radiation curable compositions
US7323248B2 (en) * 2004-03-13 2008-01-29 Ecology Coatings, Inc. Environmentally friendly coating compositions for coating composites, coated composites therefrom, and methods, processes and assemblages for coating thereof
US7591865B2 (en) * 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
KR101341081B1 (ko) * 2005-09-29 2013-12-12 씨메트 가부시키가이샤 광학적 입체 조형용 수지 조성물
JP5250776B2 (ja) * 2005-10-27 2013-07-31 スリーディー システムズ インコーポレーテッド アンチモンを含まない光硬化性樹脂組成物及び三次元物品
US7678528B2 (en) 2005-11-16 2010-03-16 Az Electronic Materials Usa Corp. Photoactive compounds
US9676899B2 (en) * 2006-05-01 2017-06-13 Dsm Ip Assets B.V. Radiation curable resin composition and rapid three dimensional imaging process using the same
US8354160B2 (en) * 2006-06-23 2013-01-15 3M Innovative Properties Company Articles having durable hydrophobic surfaces
US20080081020A1 (en) * 2006-10-03 2008-04-03 Huang Yeong H Color change surgical prep solution
JP5304977B2 (ja) 2007-10-04 2013-10-02 セイコーエプソン株式会社 光硬化組成物を用いた硬化物の形成方法およびその硬化物
BRPI0816605A2 (pt) * 2007-10-10 2015-03-03 Ppg Ind Ohio Inc Composição de revestimento curável por radiação, revestimento curado por radiação e método para revestir um substrato
US8216768B2 (en) 2007-11-28 2012-07-10 Sumitomo Seika Chemicals Co., Ltd. Photoacid generator and photoreactive composition
JP5208573B2 (ja) 2008-05-06 2013-06-12 サンアプロ株式会社 スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体
JP5721630B2 (ja) 2008-10-20 2015-05-20 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ スルホニウム誘導体および潜在酸としてのその使用
KR101700980B1 (ko) 2009-02-20 2017-01-31 산아프로 가부시키가이샤 술포늄염, 광산 발생제 및 감광성 수지 조성물
US9034236B2 (en) 2009-12-17 2015-05-19 Dsm Ip Assets B.V. Substrate-based additive fabrication process
EP2519566A4 (en) * 2009-12-29 2016-10-12 Saint Gobain Abrasifs Sa LONG-LUBBER COATED GRINDING
CA2796732C (en) * 2010-04-23 2018-09-25 Johnson & Johnson Vision Care, Inc. Method of improving lens rotation
US9861452B2 (en) * 2013-08-09 2018-01-09 Dsm Ip Assets B.V. Low-viscosity liquid radiation curable dental aligner mold resin compositions for additive manufacturing
EP2868692B2 (en) * 2013-11-05 2025-07-16 Stratasys, Inc. Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication

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