JP2013526001A5 - - Google Patents
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- Publication number
- JP2013526001A5 JP2013526001A5 JP2012544923A JP2012544923A JP2013526001A5 JP 2013526001 A5 JP2013526001 A5 JP 2013526001A5 JP 2012544923 A JP2012544923 A JP 2012544923A JP 2012544923 A JP2012544923 A JP 2012544923A JP 2013526001 A5 JP2013526001 A5 JP 2013526001A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor die
- die
- arc
- vias
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 23
- 239000000758 substrate Substances 0.000 claims 18
- 239000000463 material Substances 0.000 claims 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/640,111 | 2009-12-17 | ||
| US12/640,111 US8710629B2 (en) | 2009-12-17 | 2009-12-17 | Apparatus and method for controlling semiconductor die warpage |
| PCT/US2010/061143 WO2011084706A2 (en) | 2009-12-17 | 2010-12-17 | Apparatus and method for controlling semiconductor die warpage |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013526001A JP2013526001A (ja) | 2013-06-20 |
| JP2013526001A5 true JP2013526001A5 (enExample) | 2014-04-10 |
| JP5536901B2 JP5536901B2 (ja) | 2014-07-02 |
Family
ID=43629207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012544923A Expired - Fee Related JP5536901B2 (ja) | 2009-12-17 | 2010-12-17 | 半導体ダイの反りを制御する装置及び方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8710629B2 (enExample) |
| EP (1) | EP2513967A2 (enExample) |
| JP (1) | JP5536901B2 (enExample) |
| KR (1) | KR20120101136A (enExample) |
| CN (1) | CN103038877A (enExample) |
| TW (1) | TW201131717A (enExample) |
| WO (1) | WO2011084706A2 (enExample) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8378458B2 (en) * | 2010-03-22 | 2013-02-19 | Advanced Micro Devices, Inc. | Semiconductor chip with a rounded corner |
| US8883634B2 (en) * | 2011-06-29 | 2014-11-11 | Globalfoundries Singapore Pte. Ltd. | Package interconnects |
| US9184144B2 (en) * | 2011-07-21 | 2015-11-10 | Qualcomm Incorporated | Interconnect pillars with directed compliance geometry |
| US9059191B2 (en) * | 2011-10-19 | 2015-06-16 | International Business Machines Corporation | Chamfered corner crackstop for an integrated circuit chip |
| US8566773B2 (en) | 2012-02-15 | 2013-10-22 | International Business Machines Corporation | Thermal relief automation |
| US8464200B1 (en) | 2012-02-15 | 2013-06-11 | International Business Machines Corporation | Thermal relief optimization |
| CN103378030B (zh) * | 2012-04-18 | 2016-04-20 | 中芯国际集成电路制造(上海)有限公司 | 硅通孔结构 |
| CN103377990B (zh) * | 2012-04-18 | 2016-08-31 | 中芯国际集成电路制造(上海)有限公司 | 硅通孔结构 |
| US9291578B2 (en) * | 2012-08-03 | 2016-03-22 | David L. Adler | X-ray photoemission microscope for integrated devices |
| US9245826B2 (en) * | 2013-03-11 | 2016-01-26 | Newport Fab, Llc | Anchor vias for improved backside metal adhesion to semiconductor substrate |
| US9247636B2 (en) | 2013-03-12 | 2016-01-26 | International Business Machines Corporation | Area array device connection structures with complimentary warp characteristics |
| US9355967B2 (en) * | 2013-06-24 | 2016-05-31 | Qualcomm Incorporated | Stress compensation patterning |
| US9236301B2 (en) | 2013-07-11 | 2016-01-12 | Globalfoundries Inc. | Customized alleviation of stresses generated by through-substrate via(S) |
| KR102122456B1 (ko) | 2013-12-20 | 2020-06-12 | 삼성전자주식회사 | 실리콘 관통 비아 플러그들을 갖는 반도체 소자 및 이를 포함하는 반도체 패키지 |
| US10006899B2 (en) | 2014-03-25 | 2018-06-26 | Genia Technologies, Inc. | Nanopore-based sequencing chips using stacked wafer technology |
| US9728518B2 (en) | 2014-04-01 | 2017-08-08 | Ati Technologies Ulc | Interconnect etch with polymer layer edge protection |
| US9560745B2 (en) * | 2014-09-26 | 2017-01-31 | Qualcomm Incorporated | Devices and methods to reduce stress in an electronic device |
| US9772268B2 (en) * | 2015-03-30 | 2017-09-26 | International Business Machines Corporation | Predicting semiconductor package warpage |
| US9721906B2 (en) * | 2015-08-31 | 2017-08-01 | Intel Corporation | Electronic package with corner supports |
| US20170287873A1 (en) * | 2016-03-29 | 2017-10-05 | Santosh Sankarasubramanian | Electronic assembly components with corner adhesive for warpage reduction during thermal processing |
| CN106531714A (zh) * | 2017-01-24 | 2017-03-22 | 日月光封装测试(上海)有限公司 | 用于半导体封装的引线框架条及其制造方法 |
| US12424531B2 (en) | 2017-03-14 | 2025-09-23 | Mediatek Inc. | Semiconductor package structure |
| US11362044B2 (en) | 2017-03-14 | 2022-06-14 | Mediatek Inc. | Semiconductor package structure |
| US10784211B2 (en) | 2017-03-14 | 2020-09-22 | Mediatek Inc. | Semiconductor package structure |
| US11387176B2 (en) | 2017-03-14 | 2022-07-12 | Mediatek Inc. | Semiconductor package structure |
| US11171113B2 (en) | 2017-03-14 | 2021-11-09 | Mediatek Inc. | Semiconductor package structure having an annular frame with truncated corners |
| US11264337B2 (en) | 2017-03-14 | 2022-03-01 | Mediatek Inc. | Semiconductor package structure |
| US10396003B2 (en) * | 2017-10-18 | 2019-08-27 | Micron Technology, Inc. | Stress tuned stiffeners for micro electronics package warpage control |
| US10861797B2 (en) | 2018-07-16 | 2020-12-08 | Micron Technology, Inc. | Electrically or temperature activated shape-memory materials for warpage control |
| US11879170B2 (en) | 2019-08-14 | 2024-01-23 | Massachusetts Institute Of Technology | Stress patterning systems and methods for manufacturing free-form deformations in thin substrates |
| US11308257B1 (en) | 2020-12-15 | 2022-04-19 | International Business Machines Corporation | Stacked via rivets in chip hotspots |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2704001B2 (ja) * | 1989-07-18 | 1998-01-26 | キヤノン株式会社 | 位置検出装置 |
| JP3920399B2 (ja) * | 1997-04-25 | 2007-05-30 | 株式会社東芝 | マルチチップ半導体装置用チップの位置合わせ方法、およびマルチチップ半導体装置の製造方法・製造装置 |
| US6011301A (en) * | 1998-06-09 | 2000-01-04 | Stmicroelectronics, Inc. | Stress reduction for flip chip package |
| US6372600B1 (en) * | 1999-08-30 | 2002-04-16 | Agere Systems Guardian Corp. | Etch stops and alignment marks for bonded wafers |
| JP3895987B2 (ja) * | 2001-12-27 | 2007-03-22 | 株式会社東芝 | 半導体装置およびその製造方法 |
| US6897125B2 (en) * | 2003-09-17 | 2005-05-24 | Intel Corporation | Methods of forming backside connections on a wafer stack |
| JP4467318B2 (ja) * | 2004-01-28 | 2010-05-26 | Necエレクトロニクス株式会社 | 半導体装置、マルチチップ半導体装置用チップのアライメント方法およびマルチチップ半導体装置用チップの製造方法 |
| JP4768994B2 (ja) * | 2005-02-07 | 2011-09-07 | ルネサスエレクトロニクス株式会社 | 配線基板および半導体装置 |
| TWI397972B (zh) | 2005-08-26 | 2013-06-01 | 日立製作所股份有限公司 | Semiconductor device manufacturing method |
| TWI407539B (zh) | 2005-08-26 | 2013-09-01 | 日立製作所股份有限公司 | Semiconductor device |
| JP4735280B2 (ja) * | 2006-01-18 | 2011-07-27 | 株式会社日立製作所 | パターン形成方法 |
| JP4714049B2 (ja) * | 2006-03-15 | 2011-06-29 | Okiセミコンダクタ株式会社 | 半導体装置及び半導体装置の製造方法 |
| JP5361156B2 (ja) * | 2007-08-06 | 2013-12-04 | ラピスセミコンダクタ株式会社 | 半導体装置及びその製造方法 |
-
2009
- 2009-12-17 US US12/640,111 patent/US8710629B2/en active Active
-
2010
- 2010-12-17 CN CN2010800639960A patent/CN103038877A/zh active Pending
- 2010-12-17 KR KR1020127018759A patent/KR20120101136A/ko not_active Abandoned
- 2010-12-17 WO PCT/US2010/061143 patent/WO2011084706A2/en not_active Ceased
- 2010-12-17 JP JP2012544923A patent/JP5536901B2/ja not_active Expired - Fee Related
- 2010-12-17 TW TW099144602A patent/TW201131717A/zh unknown
- 2010-12-17 EP EP10799213A patent/EP2513967A2/en not_active Withdrawn
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