KR20120101136A - 반도체 다이 뒤틀림을 제어하기 위한 장치 및 방법 - Google Patents

반도체 다이 뒤틀림을 제어하기 위한 장치 및 방법 Download PDF

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Publication number
KR20120101136A
KR20120101136A KR1020127018759A KR20127018759A KR20120101136A KR 20120101136 A KR20120101136 A KR 20120101136A KR 1020127018759 A KR1020127018759 A KR 1020127018759A KR 20127018759 A KR20127018759 A KR 20127018759A KR 20120101136 A KR20120101136 A KR 20120101136A
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KR
South Korea
Prior art keywords
semiconductor die
vias
silicon
die
manufacturing
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Abandoned
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KR1020127018759A
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English (en)
Korean (ko)
Inventor
쉐 배이
울미 레이
Original Assignee
콸콤 인코포레이티드
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Publication date
Application filed by 콸콤 인코포레이티드 filed Critical 콸콤 인코포레이티드
Publication of KR20120101136A publication Critical patent/KR20120101136A/ko
Abandoned legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/562—Protection against mechanical damage
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10—Bump connectors; Manufacturing methods related thereto
    • H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161—Disposition
    • H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • H01L23/3128—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/367—Cooling facilitated by shape of device
    • H01L23/3677—Wire-like or pin-like cooling fins or heat sinks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151—Die mounting substrate
    • H01L2924/153—Connection portion
    • H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Lead Frames For Integrated Circuits (AREA)
KR1020127018759A 2009-12-17 2010-12-17 반도체 다이 뒤틀림을 제어하기 위한 장치 및 방법 Abandoned KR20120101136A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/640,111 2009-12-17
US12/640,111 US8710629B2 (en) 2009-12-17 2009-12-17 Apparatus and method for controlling semiconductor die warpage

Publications (1)

Publication Number Publication Date
KR20120101136A true KR20120101136A (ko) 2012-09-12

Family

ID=43629207

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127018759A Abandoned KR20120101136A (ko) 2009-12-17 2010-12-17 반도체 다이 뒤틀림을 제어하기 위한 장치 및 방법

Country Status (7)

Country Link
US (1) US8710629B2 (enExample)
EP (1) EP2513967A2 (enExample)
JP (1) JP5536901B2 (enExample)
KR (1) KR20120101136A (enExample)
CN (1) CN103038877A (enExample)
TW (1) TW201131717A (enExample)
WO (1) WO2011084706A2 (enExample)

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US8378458B2 (en) * 2010-03-22 2013-02-19 Advanced Micro Devices, Inc. Semiconductor chip with a rounded corner
US8883634B2 (en) * 2011-06-29 2014-11-11 Globalfoundries Singapore Pte. Ltd. Package interconnects
US9184144B2 (en) * 2011-07-21 2015-11-10 Qualcomm Incorporated Interconnect pillars with directed compliance geometry
US9059191B2 (en) * 2011-10-19 2015-06-16 International Business Machines Corporation Chamfered corner crackstop for an integrated circuit chip
US8566773B2 (en) 2012-02-15 2013-10-22 International Business Machines Corporation Thermal relief automation
US8464200B1 (en) 2012-02-15 2013-06-11 International Business Machines Corporation Thermal relief optimization
CN103378030B (zh) * 2012-04-18 2016-04-20 中芯国际集成电路制造(上海)有限公司 硅通孔结构
CN103377990B (zh) * 2012-04-18 2016-08-31 中芯国际集成电路制造(上海)有限公司 硅通孔结构
US9291578B2 (en) * 2012-08-03 2016-03-22 David L. Adler X-ray photoemission microscope for integrated devices
US9245826B2 (en) * 2013-03-11 2016-01-26 Newport Fab, Llc Anchor vias for improved backside metal adhesion to semiconductor substrate
US9247636B2 (en) 2013-03-12 2016-01-26 International Business Machines Corporation Area array device connection structures with complimentary warp characteristics
US9355967B2 (en) * 2013-06-24 2016-05-31 Qualcomm Incorporated Stress compensation patterning
US9236301B2 (en) 2013-07-11 2016-01-12 Globalfoundries Inc. Customized alleviation of stresses generated by through-substrate via(S)
KR102122456B1 (ko) 2013-12-20 2020-06-12 삼성전자주식회사 실리콘 관통 비아 플러그들을 갖는 반도체 소자 및 이를 포함하는 반도체 패키지
US10006899B2 (en) 2014-03-25 2018-06-26 Genia Technologies, Inc. Nanopore-based sequencing chips using stacked wafer technology
US9728518B2 (en) 2014-04-01 2017-08-08 Ati Technologies Ulc Interconnect etch with polymer layer edge protection
US9560745B2 (en) * 2014-09-26 2017-01-31 Qualcomm Incorporated Devices and methods to reduce stress in an electronic device
US9772268B2 (en) * 2015-03-30 2017-09-26 International Business Machines Corporation Predicting semiconductor package warpage
US9721906B2 (en) * 2015-08-31 2017-08-01 Intel Corporation Electronic package with corner supports
US20170287873A1 (en) * 2016-03-29 2017-10-05 Santosh Sankarasubramanian Electronic assembly components with corner adhesive for warpage reduction during thermal processing
CN106531714A (zh) * 2017-01-24 2017-03-22 日月光封装测试(上海)有限公司 用于半导体封装的引线框架条及其制造方法
US12424531B2 (en) 2017-03-14 2025-09-23 Mediatek Inc. Semiconductor package structure
US11362044B2 (en) 2017-03-14 2022-06-14 Mediatek Inc. Semiconductor package structure
US10784211B2 (en) 2017-03-14 2020-09-22 Mediatek Inc. Semiconductor package structure
US11387176B2 (en) 2017-03-14 2022-07-12 Mediatek Inc. Semiconductor package structure
US11171113B2 (en) 2017-03-14 2021-11-09 Mediatek Inc. Semiconductor package structure having an annular frame with truncated corners
US11264337B2 (en) 2017-03-14 2022-03-01 Mediatek Inc. Semiconductor package structure
US10396003B2 (en) * 2017-10-18 2019-08-27 Micron Technology, Inc. Stress tuned stiffeners for micro electronics package warpage control
US10861797B2 (en) 2018-07-16 2020-12-08 Micron Technology, Inc. Electrically or temperature activated shape-memory materials for warpage control
US11879170B2 (en) 2019-08-14 2024-01-23 Massachusetts Institute Of Technology Stress patterning systems and methods for manufacturing free-form deformations in thin substrates
US11308257B1 (en) 2020-12-15 2022-04-19 International Business Machines Corporation Stacked via rivets in chip hotspots

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US6897125B2 (en) * 2003-09-17 2005-05-24 Intel Corporation Methods of forming backside connections on a wafer stack
JP4467318B2 (ja) * 2004-01-28 2010-05-26 Ｎｅｃエレクトロニクス株式会社 半導体装置、マルチチップ半導体装置用チップのアライメント方法およびマルチチップ半導体装置用チップの製造方法
JP4768994B2 (ja) * 2005-02-07 2011-09-07 ルネサスエレクトロニクス株式会社 配線基板および半導体装置
TWI397972B (zh) 2005-08-26 2013-06-01 日立製作所股份有限公司 Semiconductor device manufacturing method
TWI407539B (zh) 2005-08-26 2013-09-01 日立製作所股份有限公司 Semiconductor device
JP4735280B2 (ja) * 2006-01-18 2011-07-27 株式会社日立製作所 パターン形成方法
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Also Published As

Publication number Publication date
WO2011084706A3 (en) 2013-03-28
US8710629B2 (en) 2014-04-29
JP5536901B2 (ja) 2014-07-02
EP2513967A2 (en) 2012-10-24
TW201131717A (en) 2011-09-16
WO2011084706A2 (en) 2011-07-14
US20110147895A1 (en) 2011-06-23
CN103038877A (zh) 2013-04-10
JP2013526001A (ja) 2013-06-20

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