JP2013207061A - 太陽電池の製造方法および太陽電池 - Google Patents
太陽電池の製造方法および太陽電池 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- 238000010438 heat treatment Methods 0.000 claims abstract description 77
- 239000011521 glass Substances 0.000 claims abstract description 70
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 230000009477 glass transition Effects 0.000 claims abstract description 25
- 239000011669 selenium Substances 0.000 claims abstract description 24
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 20
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000002243 precursor Substances 0.000 claims abstract description 14
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 14
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000011593 sulfur Substances 0.000 claims abstract description 11
- 229910052951 chalcopyrite Inorganic materials 0.000 claims abstract description 8
- 229910052795 boron group element Inorganic materials 0.000 claims abstract description 7
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical compound [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 230000008569 process Effects 0.000 claims description 12
- 230000007547 defect Effects 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- 229910052708 sodium Inorganic materials 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 33
- 150000003346 selenoethers Chemical class 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 107
- 230000031700 light absorption Effects 0.000 description 23
- 230000007423 decrease Effects 0.000 description 15
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 14
- 229910000058 selane Inorganic materials 0.000 description 14
- 238000002844 melting Methods 0.000 description 13
- 230000008018 melting Effects 0.000 description 13
- 238000004544 sputter deposition Methods 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- 239000011734 sodium Substances 0.000 description 11
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 229910052733 gallium Inorganic materials 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 229910052738 indium Inorganic materials 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 238000010248 power generation Methods 0.000 description 8
- 238000007740 vapor deposition Methods 0.000 description 8
- 239000006059 cover glass Substances 0.000 description 7
- 238000004031 devitrification Methods 0.000 description 7
- 230000001737 promoting effect Effects 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 230000000630 rising effect Effects 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- -1 chalcopyrite compound Chemical class 0.000 description 4
- 238000000224 chemical solution deposition Methods 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000000137 annealing Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000005361 soda-lime glass Substances 0.000 description 3
- 238000005486 sulfidation Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 2
- 229910007709 ZnTe Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 2
- 229910052798 chalcogen Inorganic materials 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000004151 rapid thermal annealing Methods 0.000 description 2
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000807 Ga alloy Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QCUOBSQYDGUHHT-UHFFFAOYSA-L cadmium sulfate Chemical compound [Cd+2].[O-]S([O-])(=O)=O QCUOBSQYDGUHHT-UHFFFAOYSA-L 0.000 description 1
- 229910000331 cadmium sulfate Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000445 field-emission scanning electron microscopy Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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Abstract
【解決手段】太陽電池の製造方法は、580℃以上のガラス転移点Tgを有するガラス基板上に、電極層と、11族元素および13族元素を含有するプリカーサ層とを少なくともこの順に有する被処理基板に対し、セレン源を含む雰囲気下、200〜350℃の温度範囲内で2〜90分の熱処理を行う第1の工程と、前記第1の工程後、前記被処理基板に対し、セレン源または硫黄源を含む雰囲気下、550〜690℃の温度範囲内で2〜120分の熱処理を行う第2の工程とを有する。
【選択図】なし
Description
図1は、本発明の太陽電池の一実施形態を模式的に示す断面図である。
50〜350℃の平均熱膨張係数:示差熱膨張計(TMA)を用いて測定し、JIS R3102(1995年度)より求めた。
密度:気泡を含まない約20gのガラス塊をアルキメデス法によって測定した。
ヤング率:厚み7〜10mmのガラスについて、超音波パルス法により測定した。
ソーラーシミュレータ(山下電装株式会社製、商品名「YSS−T80A」)に、評価用の太陽電池10を設置し、Mo電極2にプラス端子を(不図示)、U字状のアルミニウム電極7の下端部分にマイナス端子13を設け、それぞれ電圧発生器に接続した。ソーラーシミュレータ内の温度は、25℃で一定となるように温度調節機により制御した。疑似太陽光を照射し、10秒後に電圧を−1Vから+1Vまで0.015V間隔で変化させ、8個のセル11のそれぞれの電流値を測定した。
変換効率[%]=Voc[V]×Jsc[A/cm2]×FF[無次元]×100
/試験に用いる光源の照度[W/cm2] ……式(1)
セル11の半導体特性として、CIGS層3のキャリア濃度温度依存性(キャリア密度増加率dN/dT)を測定した。測定方法を以下に示す。なお、キャリア濃度温度依存性の測定は、実施例および一部の比較例について行った。
キャリア密度は、DLCP(Drive Level Capacietance Profiling)法によって求めた。なお、測定は、以下の文献1に記載された方法に準じて行った。
キャリア密度は、20〜300Kの温度範囲で10Kずつ温度を上げながら測定している。キャリア密度は、温度を上げていくと、N1欠陥による立ち上がりによって急激に増える温度領域がある。ここで、キャリア密度増加率dN/dTは、キャリア密度の増加量が最も大きくなる30K間でのキャリア密度の変化率と定義した。測定結果を表2に示す。
FE−SEM(SU−70、日立ハイテク製)付属のEBIC像観察ユニットを用いて、EBIC(Electron Beam Induced Current)像を取得した。すなわち、セル11を半分に割断し、Mo電極2とAl電極7とにEBIC専用端子の+側と−側をそれぞれ配線した。分析には、加速電圧3kVの走査電子線を用い、CIGSのPN接合の空乏層部分に電子線が照射した時に発生する電流の強度分布を画像化し、同時に測定しているSEM像と合成して、EBIC像を得た。実施例3および比較例3のEBIC像を図4に示す。また、図4に示すEBIC像を図式化したものを図5に示す。なお、図5中、斜線部は、電流の強度分布が高い部分、すなわち、光電変換に寄与する部分を示す。
Claims (8)
- 580℃以上のガラス転移点Tgを有するガラス基板上に、電極層と、11族元素および13族元素を含有するプリカーサ層とを少なくともこの順に有する被処理基板に対し、セレン源を含む雰囲気下、200〜350℃の温度範囲内で2〜90分の熱処理を行う第1の工程と、
前記第1の工程後、前記被処理基板に対し、セレン源または硫黄源を含む雰囲気下、550〜690℃の温度範囲内で2〜120分の熱処理を行う第2の工程と
を有することを特徴とするカルコパイライト型の太陽電池の製造方法。 - 前記第2の工程後、前記被処理基板に対し、450〜560℃の温度範囲内で、かつ前記第2の工程の最低熱処理温度よりも低い熱処理温度で2〜120分の熱処理を行う第3の工程を有する請求項1記載の太陽電池の製造方法。
- 前記第1の工程の熱処理を一定温度で行うことを特徴とする請求項1または請求項2記載の太陽電池の製造方法。
- 前記ガラス基板は、酸化物基準の質量百分率表示で、SiO2を45〜72%、Al2O3を1〜19%、MgOを0〜10%、CaOを0〜10%、SrOを0〜19%、BaOを0〜12%、ZrO2を0〜11%、Na2Oを0〜15%、K2Oを0〜15%、Na2OおよびK2Oを合計で0〜20%含有する請求項1乃至3のいずれか1項記載の太陽電池の製造方法。
- 前記ガラス基板は、酸化物基準の質量百分率表示で、Na2OおよびK2Oを合計で5〜20%含有する請求項4記載の太陽電池の製造方法。
- 前記ガラス基板は、50〜350℃の平均熱膨張係数が60〜110×10−7/Kである請求項1乃至5のいずれか1項記載の太陽電池の製造方法。
- 請求項1乃至6のいずれか1項記載の太陽電池の製造方法によって得られたことを特徴とする太陽電池。
- 20〜300Kの温度範囲のうちN1欠陥によるキャリア密度増加率dN/dTが最も大きくなる温度範囲30Kの間での前記キャリア密度増加率dN/dTが1.7[1014/cm3・K]以上であることを特徴とする太陽電池。
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TW102109119A TW201349549A (zh) | 2012-03-28 | 2013-03-14 | 太陽能電池之製造方法及太陽能電池 |
KR1020130032915A KR20130110099A (ko) | 2012-03-28 | 2013-03-27 | 태양 전지의 제조 방법 및 태양 전지 |
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JP2015115454A (ja) * | 2013-12-11 | 2015-06-22 | 京セラ株式会社 | 光電変換装置の製造方法 |
KR20180034274A (ko) * | 2016-09-27 | 2018-04-04 | 재단법인대구경북과학기술원 | 은이 첨가된 czts계 박막 태양전지 및 이의 제조방법 |
CN111682079A (zh) * | 2020-06-01 | 2020-09-18 | 大连理工大学 | 一种中/远红外透明导电材料体系及其制备导电薄膜的方法 |
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KR101582121B1 (ko) * | 2014-04-03 | 2016-01-05 | 한국과학기술연구원 | 이종 적층형 cis계 광활성층 박막의 제조방법, 이로부터 제조된 cis계 광활성층 박막 및 상기 박막을 포함하는 박막 태양전지 |
US9601653B2 (en) * | 2014-06-13 | 2017-03-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | Na dosing control method |
CN108183141A (zh) * | 2017-12-28 | 2018-06-19 | 成都中建材光电材料有限公司 | 一种新型结构的碲化镉薄膜电池及其制备方法 |
KR102505239B1 (ko) * | 2021-05-17 | 2023-03-02 | 주식회사 엘앤알테크 | 홀효과 측정이 가능한 깊은 준위 결함 측정기 |
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JP2009135299A (ja) * | 2007-11-30 | 2009-06-18 | Showa Shell Sekiyu Kk | Cis系薄膜太陽電池の光吸収層の製造方法 |
WO2012014854A1 (ja) * | 2010-07-26 | 2012-02-02 | 旭硝子株式会社 | Cu-In-Ga-Se太陽電池用ガラス基板及びそれを用いた太陽電池 |
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KR20130110099A (ko) | 2013-10-08 |
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