JP2013086088A5 - - Google Patents
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- Publication number
- JP2013086088A5 JP2013086088A5 JP2011232506A JP2011232506A JP2013086088A5 JP 2013086088 A5 JP2013086088 A5 JP 2013086088A5 JP 2011232506 A JP2011232506 A JP 2011232506A JP 2011232506 A JP2011232506 A JP 2011232506A JP 2013086088 A5 JP2013086088 A5 JP 2013086088A5
- Authority
- JP
- Japan
- Prior art keywords
- brought
- contact
- dry
- gas
- exhaust gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000001784 detoxification Methods 0.000 description 2
- 238000005108 dry cleaning Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011232506A JP2013086088A (ja) | 2011-10-24 | 2011-10-24 | ハロゲン化物粒子を含むガスの除害方法 |
| TW101138609A TW201321072A (zh) | 2011-10-24 | 2012-10-19 | 含有鹵化物粒子的氣體之除害方法 |
| KR1020120117859A KR20130045196A (ko) | 2011-10-24 | 2012-10-23 | 할로겐화물 입자를 포함하는 가스의 제해방법 |
| CN2012104103690A CN103055692A (zh) | 2011-10-24 | 2012-10-24 | 含卤化物颗粒气体的除害方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011232506A JP2013086088A (ja) | 2011-10-24 | 2011-10-24 | ハロゲン化物粒子を含むガスの除害方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013086088A JP2013086088A (ja) | 2013-05-13 |
| JP2013086088A5 true JP2013086088A5 (enExample) | 2014-09-25 |
Family
ID=48098764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011232506A Pending JP2013086088A (ja) | 2011-10-24 | 2011-10-24 | ハロゲン化物粒子を含むガスの除害方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2013086088A (enExample) |
| KR (1) | KR20130045196A (enExample) |
| CN (1) | CN103055692A (enExample) |
| TW (1) | TW201321072A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102035021B1 (ko) * | 2013-09-24 | 2019-10-22 | 다이요 닛산 가부시키가이샤 | 유해 가스의 제해 장치 |
| CN116103515B (zh) * | 2023-02-08 | 2025-05-13 | 西安交通大学 | 一种基于CaO滤材的硅热法炼镁低成本高效除铝方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63291624A (ja) * | 1987-05-23 | 1988-11-29 | Showa Denko Kk | ガリウム・ヒ素ウェハ−のドライエッチング排ガスの処理方法 |
| JPH03202128A (ja) * | 1989-12-28 | 1991-09-03 | Ebara Res Co Ltd | Ｎｆ↓３の除害方法 |
| JPH0716583B2 (ja) * | 1990-08-10 | 1995-03-01 | セントラル硝子株式会社 | フッ化塩素を含む排ガスの乾式処理方法 |
| JP3563758B2 (ja) * | 1994-02-09 | 2004-09-08 | 住友精化株式会社 | 塩素含有ガスの処理方法 |
| JP4210395B2 (ja) * | 1999-08-10 | 2009-01-14 | 住友精化株式会社 | ドライエッチング排ガス処理装置 |
| JP3840877B2 (ja) * | 2000-05-26 | 2006-11-01 | 昭和電工株式会社 | ハロゲン系ガスの除害剤、除害方法及びその用途 |
| JP2003326128A (ja) * | 2002-05-09 | 2003-11-18 | Ebara Corp | ヒ素又はヒ素化合物を含む排ガスの処理方法及び装置 |
| JP2004073974A (ja) * | 2002-08-14 | 2004-03-11 | Sud-Chemie Catalysts Inc | ハロゲンガス除去剤及びその製造方法 |
| JP4498183B2 (ja) * | 2005-03-23 | 2010-07-07 | 株式会社東芝 | 塩化水素ガス吸収材および塩化水素ガスの除去方法 |
| JP2011143329A (ja) * | 2010-01-12 | 2011-07-28 | Central Glass Co Ltd | 三フッ化塩素含有ガスの除害処理装置 |
-
2011
- 2011-10-24 JP JP2011232506A patent/JP2013086088A/ja active Pending
-
2012
- 2012-10-19 TW TW101138609A patent/TW201321072A/zh not_active IP Right Cessation
- 2012-10-23 KR KR1020120117859A patent/KR20130045196A/ko not_active Ceased
- 2012-10-24 CN CN2012104103690A patent/CN103055692A/zh active Pending
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