JP2010199497A5 - - Google Patents

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Publication number
JP2010199497A5
JP2010199497A5 JP2009045633A JP2009045633A JP2010199497A5 JP 2010199497 A5 JP2010199497 A5 JP 2010199497A5 JP 2009045633 A JP2009045633 A JP 2009045633A JP 2009045633 A JP2009045633 A JP 2009045633A JP 2010199497 A5 JP2010199497 A5 JP 2010199497A5
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JP
Japan
Prior art keywords
exhaust pipe
radical
chamber
semiconductor device
exhaust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2009045633A
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English (en)
Japanese (ja)
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JP2010199497A (ja
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Publication date
Application filed filed Critical
Priority to JP2009045633A priority Critical patent/JP2010199497A/ja
Priority claimed from JP2009045633A external-priority patent/JP2010199497A/ja
Publication of JP2010199497A publication Critical patent/JP2010199497A/ja
Publication of JP2010199497A5 publication Critical patent/JP2010199497A5/ja
Withdrawn legal-status Critical Current

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JP2009045633A 2009-02-27 2009-02-27 半導体装置の製造装置および半導体装置の製造方法 Withdrawn JP2010199497A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009045633A JP2010199497A (ja) 2009-02-27 2009-02-27 半導体装置の製造装置および半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009045633A JP2010199497A (ja) 2009-02-27 2009-02-27 半導体装置の製造装置および半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2010199497A JP2010199497A (ja) 2010-09-09
JP2010199497A5 true JP2010199497A5 (enExample) 2012-03-22

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ID=42823889

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009045633A Withdrawn JP2010199497A (ja) 2009-02-27 2009-02-27 半導体装置の製造装置および半導体装置の製造方法

Country Status (1)

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JP (1) JP2010199497A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2569633A (en) * 2017-12-21 2019-06-26 Edwards Ltd A vacuum pumping arrangement and method of cleaning the vacuum pumping arrangement
JP7080140B2 (ja) * 2018-09-06 2022-06-03 東京エレクトロン株式会社 基板処理装置
US20200370175A1 (en) * 2019-05-22 2020-11-26 Asm Ip Holding B.V. Apparatus operating method and substrate processing apparatus
CN112543673A (zh) * 2019-06-27 2021-03-23 北京康肯环保设备有限公司 废气除害单元

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3926033B2 (ja) * 1998-05-28 2007-06-06 三井化学株式会社 ドライエッチング装置およびその運転方法
JP2001168033A (ja) * 1999-12-03 2001-06-22 Sony Corp 半導体製造装置
KR100706792B1 (ko) * 2005-08-01 2007-04-12 삼성전자주식회사 펌프 유닛을 가지는 반도체 소자 제조 장치 및 상기 펌프유닛을 세정하는 방법

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