JP2010080230A5 - - Google Patents

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Publication number
JP2010080230A5
JP2010080230A5 JP2008246503A JP2008246503A JP2010080230A5 JP 2010080230 A5 JP2010080230 A5 JP 2010080230A5 JP 2008246503 A JP2008246503 A JP 2008246503A JP 2008246503 A JP2008246503 A JP 2008246503A JP 2010080230 A5 JP2010080230 A5 JP 2010080230A5
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JP
Japan
Prior art keywords
vacuum
organic
wiring
cableveyor
outgas
Prior art date
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Application number
JP2008246503A
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English (en)
Japanese (ja)
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JP2010080230A (ja
JP5231917B2 (ja
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Priority to JP2008246503A priority Critical patent/JP5231917B2/ja
Priority claimed from JP2008246503A external-priority patent/JP5231917B2/ja
Publication of JP2010080230A publication Critical patent/JP2010080230A/ja
Publication of JP2010080230A5 publication Critical patent/JP2010080230A5/ja
Application granted granted Critical
Publication of JP5231917B2 publication Critical patent/JP5231917B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008246503A 2008-09-25 2008-09-25 成膜装置 Expired - Fee Related JP5231917B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008246503A JP5231917B2 (ja) 2008-09-25 2008-09-25 成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008246503A JP5231917B2 (ja) 2008-09-25 2008-09-25 成膜装置

Publications (3)

Publication Number Publication Date
JP2010080230A JP2010080230A (ja) 2010-04-08
JP2010080230A5 true JP2010080230A5 (enExample) 2011-02-03
JP5231917B2 JP5231917B2 (ja) 2013-07-10

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ID=42210432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008246503A Expired - Fee Related JP5231917B2 (ja) 2008-09-25 2008-09-25 成膜装置

Country Status (1)

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JP (1) JP5231917B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5476227B2 (ja) * 2010-06-29 2014-04-23 株式会社日立ハイテクノロジーズ 成膜装置及び成膜方法
KR101763906B1 (ko) * 2013-09-26 2017-08-01 가부시키가이샤 알박 기판처리 장치, 및 성막(成膜) 장치
KR101553626B1 (ko) * 2013-12-19 2015-09-16 주식회사 에스에프에이 기판 턴장치
WO2019192680A1 (en) * 2018-04-03 2019-10-10 Applied Materials, Inc. Apparatus for handling a carrier in a vacuum chamber, vacuum deposition system, and method of handling a carrier in a vacuum chamber
KR102167534B1 (ko) * 2018-04-03 2020-10-19 어플라이드 머티어리얼스, 인코포레이티드 진공 챔버에서의 캐리어 정렬을 위한 장치 및 진공 시스템, 및 캐리어의 정렬 방법
JP6627181B1 (ja) * 2018-07-31 2020-01-08 キヤノントッキ株式会社 蒸発源及び蒸着装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4286496B2 (ja) * 2002-07-04 2009-07-01 株式会社半導体エネルギー研究所 蒸着装置及び薄膜作製方法
JP3965479B2 (ja) * 2003-07-28 2007-08-29 株式会社エフ・ティ・エスコーポレーション 箱型対向ターゲット式スパッタ装置及び化合物薄膜の製造方法
JP4345057B2 (ja) * 2004-04-19 2009-10-14 日本精工株式会社 位置決め装置
JP2006241489A (ja) * 2005-03-01 2006-09-14 Canon Inc 位置決め装置、及び有機エレクトロルミネッセンスパネルの製造装置
JP2007332458A (ja) * 2006-05-18 2007-12-27 Sony Corp 蒸着装置および蒸着源ならびに表示装置の製造方法
KR20090130559A (ko) * 2008-06-16 2009-12-24 삼성모바일디스플레이주식회사 이송 장치 및 이를 구비하는 유기물 증착 장치
JP2010040956A (ja) * 2008-08-08 2010-02-18 Tokyo Electron Ltd 基板の処理装置

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