JP2012506474A5 - - Google Patents

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JP2012506474A5
JP2012506474A5 JP2011532650A JP2011532650A JP2012506474A5 JP 2012506474 A5 JP2012506474 A5 JP 2012506474A5 JP 2011532650 A JP2011532650 A JP 2011532650A JP 2011532650 A JP2011532650 A JP 2011532650A JP 2012506474 A5 JP2012506474 A5 JP 2012506474A5
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poly
ether ketone
aryl ether
sodium carbonate
particle size
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JP2011532650A
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Japanese (ja)
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JP2012506474A (ja
JP5606443B2 (ja
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Priority claimed from PCT/EP2009/064011 external-priority patent/WO2010046484A1/en
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Publication of JP2012506474A5 publication Critical patent/JP2012506474A5/ja
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JP2011532650A 2008-10-24 2009-10-23 炭酸ナトリウムの存在下でポリ(アリールエーテルケトン)を製造するための方法 Active JP5606443B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US10809608P 2008-10-24 2008-10-24
US10809708P 2008-10-24 2008-10-24
US61/108,097 2008-10-24
US61/108,096 2008-10-24
US14020508P 2008-12-23 2008-12-23
US61/140,205 2008-12-23
PCT/EP2009/064011 WO2010046484A1 (en) 2008-10-24 2009-10-23 Method for the manufacture of poly(aryl ether ketone)s in the presence of sodium carbonate

Publications (3)

Publication Number Publication Date
JP2012506474A JP2012506474A (ja) 2012-03-15
JP2012506474A5 true JP2012506474A5 (https=) 2012-05-24
JP5606443B2 JP5606443B2 (ja) 2014-10-15

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JP2011532649A Active JP5734859B2 (ja) 2008-10-24 2009-10-23 高純度4,4′−ジフルオロベンゾフェノンを使用する、ポリ(アリールエーテルケトン)を製造するための改善された方法
JP2011532650A Active JP5606443B2 (ja) 2008-10-24 2009-10-23 炭酸ナトリウムの存在下でポリ(アリールエーテルケトン)を製造するための方法
JP2011532648A Active JP5734858B2 (ja) 2008-10-24 2009-10-23 高純度ジフェニルスルホン、調製、およびポリ(アリールエーテルケトン)の調製のためのその使用
JP2014252502A Active JP5985598B2 (ja) 2008-10-24 2014-12-12 高純度4,4′−ジフルオロベンゾフェノンを使用する、ポリ(アリールエーテルケトン)を製造するための改善された方法
JP2014252460A Active JP5933676B2 (ja) 2008-10-24 2014-12-12 高純度ジフェニルスルホン、調製、およびポリ(アリールエーテルケトン)の調製のためのその使用

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JP2011532649A Active JP5734859B2 (ja) 2008-10-24 2009-10-23 高純度4,4′−ジフルオロベンゾフェノンを使用する、ポリ(アリールエーテルケトン)を製造するための改善された方法

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JP2011532648A Active JP5734858B2 (ja) 2008-10-24 2009-10-23 高純度ジフェニルスルホン、調製、およびポリ(アリールエーテルケトン)の調製のためのその使用
JP2014252502A Active JP5985598B2 (ja) 2008-10-24 2014-12-12 高純度4,4′−ジフルオロベンゾフェノンを使用する、ポリ(アリールエーテルケトン)を製造するための改善された方法
JP2014252460A Active JP5933676B2 (ja) 2008-10-24 2014-12-12 高純度ジフェニルスルホン、調製、およびポリ(アリールエーテルケトン)の調製のためのその使用

Country Status (8)

Country Link
US (7) US8710171B2 (https=)
EP (5) EP2722353A1 (https=)
JP (5) JP5734859B2 (https=)
CN (6) CN102257033B (https=)
AU (1) AU2009306298A1 (https=)
CA (3) CA2740697C (https=)
RU (1) RU2011120794A (https=)
WO (4) WO2010046484A1 (https=)

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CN113993930B (zh) 2019-06-20 2023-11-03 索尔维特殊聚合物美国有限责任公司 制造PEEK-PEoEK共聚物的方法和由该方法获得的共聚物
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WO2022050330A1 (ja) * 2020-09-02 2022-03-10 出光興産株式会社 芳香族ポリエーテルの製造方法及びこれに用いる炭酸カリウム
TW202219111A (zh) * 2020-09-02 2022-05-16 日商出光興產股份有限公司 聚醚醚酮之製造方法
CN116710783A (zh) * 2020-12-03 2023-09-05 豪夫迈·罗氏有限公司 通过交叉喷雾esi质谱检测目标分析物
CN113563578B (zh) * 2021-08-16 2023-12-26 吉林省中研高分子材料股份有限公司 一种制备聚(芳基醚酮)的方法及聚(芳基醚酮)
CN113912799B (zh) * 2021-09-16 2022-05-10 吉林省中研高分子材料股份有限公司 聚醚醚酮及其制备方法
CN114230785B (zh) * 2021-11-17 2023-03-03 吉林省中研高分子材料股份有限公司 一种耐辐射的聚醚醚酮聚合物及其制备方法
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CN116087378A (zh) * 2022-11-28 2023-05-09 湖北省宏源药业科技股份有限公司 一种气相色谱法测定4,4’-二氟二苯甲酮纯度的方法
CN119285952A (zh) * 2024-08-13 2025-01-10 沃顿科技股份有限公司 降低砜聚合物的灰分和金属离子含量的方法及由其制备的砜聚合物
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