JP2012500989A5 - - Google Patents

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Publication number
JP2012500989A5
JP2012500989A5 JP2011524443A JP2011524443A JP2012500989A5 JP 2012500989 A5 JP2012500989 A5 JP 2012500989A5 JP 2011524443 A JP2011524443 A JP 2011524443A JP 2011524443 A JP2011524443 A JP 2011524443A JP 2012500989 A5 JP2012500989 A5 JP 2012500989A5
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JP
Japan
Prior art keywords
detector
measurement system
interference pattern
electromagnetic radiation
generator
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JP2011524443A
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English (en)
Japanese (ja)
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JP2012500989A (ja
JP5690268B2 (ja
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Priority claimed from GB0815514A external-priority patent/GB0815514D0/en
Priority claimed from GB0823707A external-priority patent/GB0823707D0/en
Application filed filed Critical
Priority claimed from PCT/GB2009/002071 external-priority patent/WO2010023442A2/en
Publication of JP2012500989A publication Critical patent/JP2012500989A/ja
Publication of JP2012500989A5 publication Critical patent/JP2012500989A5/ja
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Publication of JP5690268B2 publication Critical patent/JP5690268B2/ja
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JP2011524443A 2008-08-26 2009-08-25 測定システム、位置決定装置、波長決定装置、及び屈折率決定装置 Active JP5690268B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB0815514A GB0815514D0 (en) 2008-08-26 2008-08-26 Position dermination system and method
GB0815514.5 2008-08-26
GB0823707A GB0823707D0 (en) 2008-12-31 2008-12-31 Position determination system and method
GB0823707.5 2008-12-31
PCT/GB2009/002071 WO2010023442A2 (en) 2008-08-26 2009-08-25 Uses of electromagnetic interference patterns

Publications (3)

Publication Number Publication Date
JP2012500989A JP2012500989A (ja) 2012-01-12
JP2012500989A5 true JP2012500989A5 (enExample) 2012-10-11
JP5690268B2 JP5690268B2 (ja) 2015-03-25

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JP2011524443A Active JP5690268B2 (ja) 2008-08-26 2009-08-25 測定システム、位置決定装置、波長決定装置、及び屈折率決定装置

Country Status (6)

Country Link
US (1) US9618369B2 (enExample)
EP (1) EP2318810B1 (enExample)
JP (1) JP5690268B2 (enExample)
CN (1) CN102216736B (enExample)
GB (1) GB2463967B (enExample)
WO (1) WO2010023442A2 (enExample)

Families Citing this family (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008022156A2 (en) 2006-08-14 2008-02-21 Neural Id, Llc Pattern recognition system
EP2387708B1 (en) 2009-01-16 2019-05-01 New York University Automated real-time particle characterization and three-dimensional velocimetry with holographic video microscopy
US9465228B2 (en) 2010-03-19 2016-10-11 Optical Biosystems, Inc. Illumination apparatus optimized for synthetic aperture optics imaging using minimum selective excitation patterns
JP5138116B2 (ja) * 2011-04-19 2013-02-06 三洋電機株式会社 情報取得装置および物体検出装置
CN108509021B (zh) * 2011-11-21 2021-11-09 英特尔公司 用于性能改善的可重配置图形处理器
CN107806826B (zh) * 2012-03-26 2021-10-26 螳螂慧视科技有限公司 三维照相机及其投影仪
GB201207800D0 (en) * 2012-05-03 2012-06-13 Phase Focus Ltd Improvements in providing image data
JP6099908B2 (ja) * 2012-09-13 2017-03-22 キヤノン株式会社 ２次元アブソリュートエンコーダおよびスケール
DE102012222505B4 (de) * 2012-12-07 2017-11-09 Michael Gilge Verfahren zum Erfassen dreidimensionaler Daten eines zu vermessenden Objekts, Verwendung eines derartigen Verfahrens zur Gesichtserkennung und Vorrichtung zur Durchführung eines derartigen Verfahrens
US9294758B2 (en) 2013-04-18 2016-03-22 Microsoft Technology Licensing, Llc Determining depth data for a captured image
WO2015034759A1 (en) 2013-09-04 2015-03-12 Neural Id Llc Pattern recognition system
WO2015065999A1 (en) * 2013-10-28 2015-05-07 Oakland University Spatial phase-shift shearography system for strain measurement
ES2812611T3 (es) 2014-02-12 2021-03-17 Univ New York Identificación rápida de características para el seguimiento holográfico y la caracterización de partículas coloidales
US9111558B1 (en) 2014-03-14 2015-08-18 Western Digital (Fremont), Llc System and method of diffractive focusing of light in a waveguide
WO2016060995A1 (en) * 2014-10-13 2016-04-21 New York University Machine-learning approach to holographic particle characterization
WO2016077472A1 (en) 2014-11-12 2016-05-19 New York University Colloidal fingerprints for soft materials using total holographic characterization
CN104596556A (zh) * 2015-01-08 2015-05-06 佛山轻子精密测控技术有限公司 一种新型编码器及其测量方法
US10008530B2 (en) * 2015-01-30 2018-06-26 Taiwan Semiconductor Manufacturing Company Ltd. Image sensing device and manufacturing method thereof
DE102015211879B4 (de) * 2015-06-25 2018-10-18 Carl Zeiss Ag Vermessen von individuellen Daten einer Brille
JP6634249B2 (ja) * 2015-09-14 2020-01-22 株式会社ミツトヨ 絶対位置検出型光電式エンコーダ
WO2017048960A1 (en) 2015-09-18 2017-03-23 New York University Holographic detection and characterization of large impurity particles in precision slurries
CN105281855B (zh) * 2015-12-04 2017-10-27 大唐国际发电股份有限公司重庆分公司 一种基于曲边梯形的对流层散射通信随机信道建模方法
ES2901608T3 (es) 2016-02-08 2022-03-23 Univ New York Caracterización holográfica de agregados proteicos
US10670677B2 (en) 2016-04-22 2020-06-02 New York University Multi-slice acceleration for magnetic resonance fingerprinting
US11237251B2 (en) * 2016-05-11 2022-02-01 Texas Instruments Incorporated Lidar scanning with expanded scan angle
DE102016226073A1 (de) * 2016-12-22 2018-06-28 Deckel Maho Pfronten Gmbh Vorrichtung zum einsatz in einer numerisch gesteuerten werkzeugmaschine zur verwendung in einem verfahren zum vermessen der numerisch gesteuerten werkzeugmaschine
DE102017201257A1 (de) * 2017-01-26 2018-07-26 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
CN107219619A (zh) * 2017-06-29 2017-09-29 清华大学 三维折射率层析显微成像系统及其方法
US10382145B2 (en) * 2017-07-13 2019-08-13 Benjamin J. Egg System and method for improving wireless data links
JP6818702B2 (ja) * 2018-01-15 2021-01-20 株式会社東芝 光学検査装置及び光学検査方法
WO2019152539A1 (en) 2018-01-30 2019-08-08 Optical Biosystems, Inc. Method for detecting particles using structured illumination
KR102561101B1 (ko) * 2018-02-19 2023-07-28 삼성전자주식회사 확장된 시야창을 제공하는 홀로그래픽 디스플레이 장치
US10771884B2 (en) * 2018-04-05 2020-09-08 Apple Inc. Electronic devices with coherent self-mixing proximity sensors
CN108764407A (zh) * 2018-05-30 2018-11-06 深圳市恩兴实业有限公司 产品溯源方法、装置、系统及计算机存储介质
CN110728713B (zh) * 2018-07-16 2022-09-30 Oppo广东移动通信有限公司 测试方法及测试系统
CN111769370B (zh) * 2019-04-02 2024-11-19 富泰华工业（深圳）有限公司 全息天线及其制作方法
US11156846B2 (en) 2019-04-19 2021-10-26 Kla Corporation High-brightness illumination source for optical metrology
US11543338B2 (en) 2019-10-25 2023-01-03 New York University Holographic characterization of irregular particles
CN113189835B (zh) * 2020-01-10 2022-03-04 中国工程物理研究院激光聚变研究中心 针孔高清晰成像器件及针孔成像系统
WO2021168723A1 (en) * 2020-02-27 2021-09-02 Shenzhen Xpectvision Technology Co., Ltd. Method of phase contrast imaging
US11948302B2 (en) 2020-03-09 2024-04-02 New York University Automated holographic video microscopy assay
CN111351425B (zh) * 2020-03-10 2022-06-03 南通大学 一种确定干涉仪在球面离焦检测时动态范围的方法
DE102020113675B4 (de) 2020-05-20 2022-03-10 Bundesrepublik Deutschland, Vertreten Durch Das Bundesministerium Für Wirtschaft Und Energie, Dieses Vertreten Durch Den Präsidenten Der Physikalisch-Technischen Bundesanstalt Autokollimator und Oberflächen-Messsystem
CN112001956B (zh) * 2020-07-30 2024-04-09 中国科学院西安光学精密机械研究所 基于cnn的纹影法强激光远场焦斑测量图像去噪方法
KR102247277B1 (ko) * 2020-08-25 2021-05-03 주식회사 내일해 측정 대상 물체의 3차원 형상 정보 생성 방법
CN112399792B (zh) * 2020-12-07 2024-02-13 北京航天长征飞行器研究所 多源电磁波束串扰抑制方法、装置及计算机存储介质
DE102021109392B4 (de) 2021-04-14 2023-02-16 Bundesrepublik Deutschland, Vertreten Durch Das Bundesministerium Für Wirtschaft Und Energie, Dieses Vertreten Durch Den Präsidenten Der Physikalisch-Technischen Bundesanstalt Winkelmessgerät
CN113238288B (zh) * 2021-05-20 2022-07-01 桂林电子科技大学 一种基于差值谱线的旋翼目标特征提取方法
CN113345619B (zh) * 2021-06-16 2022-07-12 中国工程物理研究院激光聚变研究中心 一维x射线折射闪耀波带片
CN113804977B (zh) * 2021-09-08 2023-03-17 中国矿业大学(北京) 一种射电波波长测量方法
US12320632B2 (en) * 2022-02-10 2025-06-03 Sarcos Corp. High resolution optical displacement measurement
KR102523049B1 (ko) * 2022-05-12 2023-04-19 한국기계연구원 광을 이용한 롤러 갭 측정시스템 및 이를 이용한 롤러 갭 측정방법
TWI846203B (zh) * 2022-12-14 2024-06-21 財團法人工業技術研究院 量測系統及量測方法
DE102022133517A1 (de) * 2022-12-15 2024-06-20 Carl Zeiss Ag Verfahren und System zur Posenbestimmung

Family Cites Families (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3955095A (en) * 1974-10-04 1976-05-04 Rca Corporation Method and apparatus for determining the average size of apertures in an apertured member
DE2514930A1 (de) 1975-04-05 1976-10-14 Opto Produkte Ag Verfahren zur optischen ermittlung und zum vergleich von formen und lagen von objekten
US4173442A (en) * 1977-05-27 1979-11-06 The United States Of America As Represented By The Secretary Of Commerce Apparatus and method for determination of wavelength
IL66127A (en) 1982-06-24 1987-11-30 Israel State Method and apparatus for measuring the index of refraction of fluids
GB2272759B (en) 1983-12-23 1994-11-23 Gec Ferranti Defence Syst Detector apparatus for detecting coherent point-source radiation
US4794384A (en) 1984-09-27 1988-12-27 Xerox Corporation Optical translator device
US5189485A (en) 1986-09-25 1993-02-23 The United States Of America As Represented By The United States Department Of Energy Wavelength meter having single mode fiber optics multiplexed inputs
JPS63247615A (ja) 1987-04-02 1988-10-14 Matsushita Electric Ind Co Ltd 位置検出方法及びその装置
EP0426866B1 (en) 1989-04-21 1996-07-10 Hitachi, Ltd. Projection/exposure device and projection/exposure method
EP0503176A1 (en) 1991-03-12 1992-09-16 Lien Polymer Enterprise Co. Ltd. A ping-pong ball shooter
US5293214A (en) * 1991-12-06 1994-03-08 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser
US5390023A (en) 1992-06-03 1995-02-14 Zygo Corporation Interferometric method and apparatus to measure surface topography
JP3400485B2 (ja) 1993-03-23 2003-04-28 株式会社ワコム 光学式位置検出装置および光学式座標入力装置
JPH07120326A (ja) * 1993-10-22 1995-05-12 Komatsu Ltd 波長検出装置
IL107807A0 (en) 1993-11-30 1994-02-27 Aaron Lewis Simple microamplitude vibration detector
DE69622297T2 (de) * 1995-02-21 2002-11-21 Canon K.K., Tokio/Tokyo Vorrichtung zur Bestimmung einer Verschiebung und deren Verwendung in einer Einrichtung zur Antriebsregelung
US6690474B1 (en) 1996-02-12 2004-02-10 Massachusetts Institute Of Technology Apparatus and methods for surface contour measurement
JP3213552B2 (ja) 1996-09-10 2001-10-02 株式会社リコー エンコーダの原点位置検出装置
JP3599921B2 (ja) * 1996-10-03 2004-12-08 株式会社リコー 屈折率分布の測定方法及び装置
US6141104A (en) 1997-09-09 2000-10-31 Image Guided Technologies, Inc. System for determination of a location in three dimensional space
DE19816951C2 (de) 1998-04-17 2000-08-10 Fh Harz Wernigerode Anordnung zur optischen Positions-, Bewegungsrichtungs- und Geschwindigkeitsbestimmung
CA2267519A1 (en) * 1999-04-13 2000-10-13 Inspeck Inc. Optical full human body 3d digitizer
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
JP2001007007A (ja) * 1999-06-23 2001-01-12 Ushio Sogo Gijutsu Kenkyusho:Kk 半導体露光用エキシマレーザ光のための波長モニタ装置
GB9928483D0 (en) 1999-12-03 2000-02-02 Renishaw Plc Opto-electronic scale reading apparatus
GB0109057D0 (en) 2001-04-11 2001-05-30 Renishaw Plc Absolute postition measurement
DE60130193T2 (de) 2001-05-02 2008-05-15 Avago Technologies Fiber Ip (Singapore) Pte. Ltd. Vorrichtung zur Steuerung der Wellenlänge eines Lasers
JP4274751B2 (ja) 2001-07-03 2009-06-10 オリンパス株式会社 エンコーダ
US6836337B2 (en) * 2001-09-20 2004-12-28 Visual Pathways, Inc. Non-invasive blood glucose monitoring by interferometry
DE10151563A1 (de) 2001-10-23 2003-04-30 Heidenhain Gmbh Dr Johannes Positionsmessgerät
JP3851160B2 (ja) * 2001-12-21 2006-11-29 独立行政法人産業技術総合研究所 測長装置
KR100462071B1 (ko) 2002-01-29 2004-12-16 한국과학기술원 멀티레터레이션에 근거한 점회절 광원을 이용한 대영역형상 측정법 및 시스템
US20040135209A1 (en) * 2002-02-05 2004-07-15 Tzu-Chiang Hsieh Camera with MOS or CMOS sensor array
US20030160964A1 (en) * 2002-02-27 2003-08-28 Dallas Joseph L. System and method for measuring position of optical transmission members in an array
JP3975892B2 (ja) * 2002-05-02 2007-09-12 富士ゼロックス株式会社 位置計測システム
US7218403B2 (en) * 2002-06-26 2007-05-15 Zygo Corporation Scanning interferometer for aspheric surfaces and wavefronts
DE10333772A1 (de) * 2002-08-07 2004-02-26 Dr. Johannes Heidenhain Gmbh Interferenzielle Positionsmesseinrichtung
US7280216B2 (en) 2002-09-27 2007-10-09 Fizeau Electro-Optic Systems, Llc Method and apparatus for determining the wavelength of an input light beam
GB0222970D0 (en) 2002-10-04 2002-11-13 Renishaw Plc Vacuum compatible laser interferometer
JP4343559B2 (ja) 2003-03-07 2009-10-14 キヤノン株式会社 収差測定装置
US6934037B2 (en) 2003-10-06 2005-08-23 Agilent Technologies, Inc. System and method for optical navigation using a projected fringe technique
JP2005207856A (ja) 2004-01-22 2005-08-04 Hitachi Cable Ltd 波長分析装置
US20050190988A1 (en) 2004-03-01 2005-09-01 Mass Institute Of Technology (Mit) Passive positioning sensors
JP2006010645A (ja) * 2004-06-29 2006-01-12 Tohoku Univ 検出装置及びステージ装置
US7268889B2 (en) * 2004-09-22 2007-09-11 Corning Incorporated Phase-resolved measurement for frequency-shifting interferometry
US7259860B2 (en) * 2004-09-22 2007-08-21 Corning Incorporated Optical feedback from mode-selective tuner
JP2006170899A (ja) * 2004-12-17 2006-06-29 Sendai Nikon:Kk 光電式エンコーダ
GB0428165D0 (en) 2004-12-23 2005-01-26 Renishaw Plc Position measurement
US7433052B2 (en) * 2005-07-07 2008-10-07 Mitutoyo Corporation Systems and methods for tilt and range measurement
US7333214B2 (en) * 2006-03-31 2008-02-19 Mitutoyo Corporation Detector for interferometric distance measurement
JP2008046037A (ja) 2006-08-18 2008-02-28 Osaka Prefecture 光学的角度・変位測定方法及び測定装置

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