JP2010060385A5 - - Google Patents

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Publication number
JP2010060385A5
JP2010060385A5 JP2008225105A JP2008225105A JP2010060385A5 JP 2010060385 A5 JP2010060385 A5 JP 2010060385A5 JP 2008225105 A JP2008225105 A JP 2008225105A JP 2008225105 A JP2008225105 A JP 2008225105A JP 2010060385 A5 JP2010060385 A5 JP 2010060385A5
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JP
Japan
Prior art keywords
thickness
liquid film
substrate
liquid
color gradation
Prior art date
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Pending
Application number
JP2008225105A
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English (en)
Japanese (ja)
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JP2010060385A (ja
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Priority to JP2008225105A priority Critical patent/JP2010060385A/ja
Priority claimed from JP2008225105A external-priority patent/JP2010060385A/ja
Publication of JP2010060385A publication Critical patent/JP2010060385A/ja
Publication of JP2010060385A5 publication Critical patent/JP2010060385A5/ja
Pending legal-status Critical Current

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JP2008225105A 2008-09-02 2008-09-02 液膜厚の測定装置及び測定方法 Pending JP2010060385A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008225105A JP2010060385A (ja) 2008-09-02 2008-09-02 液膜厚の測定装置及び測定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008225105A JP2010060385A (ja) 2008-09-02 2008-09-02 液膜厚の測定装置及び測定方法

Publications (2)

Publication Number Publication Date
JP2010060385A JP2010060385A (ja) 2010-03-18
JP2010060385A5 true JP2010060385A5 (enExample) 2011-10-13

Family

ID=42187338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008225105A Pending JP2010060385A (ja) 2008-09-02 2008-09-02 液膜厚の測定装置及び測定方法

Country Status (1)

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JP (1) JP2010060385A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10236222B2 (en) * 2017-02-08 2019-03-19 Kla-Tencor Corporation System and method for measuring substrate and film thickness distribution
CN107401981A (zh) * 2017-07-19 2017-11-28 大连理工大学 非接触测量管内波动液膜基底膜厚的装置及使用方法
KR101935692B1 (ko) 2017-09-29 2019-01-04 서울대학교산학협력단 액막 두께 측정 장치 및 그 제어 방법
JP7530824B2 (ja) 2020-12-24 2024-08-08 東京エレクトロン株式会社 膜厚推定方法、記憶媒体、及び膜厚推定装置
KR102553643B1 (ko) * 2021-05-17 2023-07-13 세메스 주식회사 기판 처리 장치 및 기판 반송로봇
CN118189833B (zh) * 2024-02-26 2025-10-21 华侨大学 一种磨削液体薄膜厚度测量装置及其测量方法
CN118632604B (zh) * 2024-08-15 2024-11-08 深圳黑晶光电技术有限公司 一种可原位监测钙钛矿薄膜闪蒸干燥时间的装置及方法
CN119803317B (zh) * 2025-01-09 2025-07-04 东华理工大学 一种基于激光衍射的溶液中微液膜厚度测量装置与方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60131408A (ja) * 1983-12-21 1985-07-13 Hitachi Ltd 微小隙間測定装置
JPS6115072U (ja) * 1984-06-29 1986-01-28 ホ−ヤ株式会社 レジスト塗布装置
JPH0797548B2 (ja) * 1988-03-30 1995-10-18 東京エレクトロン株式会社 塗布膜形成方法及びその装置
JPH02233176A (ja) * 1989-03-06 1990-09-14 Mitsubishi Electric Corp 塗布装置
JPH05234869A (ja) * 1992-02-03 1993-09-10 Nec Corp 塗布装置
JP2005221401A (ja) * 2004-02-06 2005-08-18 Dainippon Printing Co Ltd 膜厚測定方法および装置

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