JP2012222157A5 - - Google Patents

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Publication number
JP2012222157A5
JP2012222157A5 JP2011086642A JP2011086642A JP2012222157A5 JP 2012222157 A5 JP2012222157 A5 JP 2012222157A5 JP 2011086642 A JP2011086642 A JP 2011086642A JP 2011086642 A JP2011086642 A JP 2011086642A JP 2012222157 A5 JP2012222157 A5 JP 2012222157A5
Authority
JP
Japan
Prior art keywords
containing gas
processing chamber
reaction tube
coating film
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011086642A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012222157A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2011086642A priority Critical patent/JP2012222157A/ja
Priority claimed from JP2011086642A external-priority patent/JP2012222157A/ja
Priority to KR1020120022171A priority patent/KR20120115091A/ko
Priority to US13/427,419 priority patent/US20120258566A1/en
Priority to TW101110714A priority patent/TWI462322B/zh
Priority to CN201210104813.6A priority patent/CN102738261B/zh
Publication of JP2012222157A publication Critical patent/JP2012222157A/ja
Publication of JP2012222157A5 publication Critical patent/JP2012222157A5/ja
Priority to KR20140158573A priority patent/KR20150002556A/ko
Pending legal-status Critical Current

Links

JP2011086642A 2011-04-08 2011-04-08 基板処理装置、及び、太陽電池の製造方法 Pending JP2012222157A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2011086642A JP2012222157A (ja) 2011-04-08 2011-04-08 基板処理装置、及び、太陽電池の製造方法
KR1020120022171A KR20120115091A (ko) 2011-04-08 2012-03-05 기판 처리 장치, 태양 전지의 제조 방법 및 기판의 제조 방법
US13/427,419 US20120258566A1 (en) 2011-04-08 2012-03-22 Substrate processing apparatus, method for manufacturing solar battery, and method for manufacturing substrate
TW101110714A TWI462322B (zh) 2011-04-08 2012-03-28 基板處理裝置,太陽電池之製造方法,基板之製造方法及反應管
CN201210104813.6A CN102738261B (zh) 2011-04-08 2012-04-06 衬底处理装置、太阳能电池的制造方法及衬底的制造方法
KR20140158573A KR20150002556A (ko) 2011-04-08 2014-11-14 기판 처리 장치, 태양 전지의 제조 방법 및 기판의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011086642A JP2012222157A (ja) 2011-04-08 2011-04-08 基板処理装置、及び、太陽電池の製造方法

Publications (2)

Publication Number Publication Date
JP2012222157A JP2012222157A (ja) 2012-11-12
JP2012222157A5 true JP2012222157A5 (enExample) 2014-05-15

Family

ID=46966423

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011086642A Pending JP2012222157A (ja) 2011-04-08 2011-04-08 基板処理装置、及び、太陽電池の製造方法

Country Status (5)

Country Link
US (1) US20120258566A1 (enExample)
JP (1) JP2012222157A (enExample)
KR (2) KR20120115091A (enExample)
CN (1) CN102738261B (enExample)
TW (1) TWI462322B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015106693B4 (de) * 2015-04-29 2024-11-28 Infineon Technologies Austria Ag Superjunction-Halbleitervorrichtung mit Übergangsabschlusserstreckungsstruktur
JP5741921B2 (ja) * 2011-04-08 2015-07-01 株式会社日立国際電気 基板処理装置、基板処理装置に用いられる反応管の表面へのコーティング膜の形成方法、および、太陽電池の製造方法
JP6068633B2 (ja) * 2013-05-31 2017-01-25 株式会社日立国際電気 基板処理装置、半導体装置の製造方法及び炉口蓋体
CN105531808A (zh) * 2013-09-10 2016-04-27 泰拉半导体株式会社 热处理装置的腔室及其制造方法
CN104677116B (zh) * 2014-12-30 2017-09-19 湖南顶立科技有限公司 一种自膨胀式超高温加热器

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2855458B2 (ja) * 1989-12-15 1999-02-10 東芝セラミックス株式会社 半導体用処理部材
US5273911A (en) * 1991-03-07 1993-12-28 Mitsubishi Denki Kabushiki Kaisha Method of producing a thin-film solar cell
US5680013A (en) * 1994-03-15 1997-10-21 Applied Materials, Inc. Ceramic protection for heated metal surfaces of plasma processing chamber exposed to chemically aggressive gaseous environment therein and method of protecting such heated metal surfaces
JP4380211B2 (ja) * 2002-08-30 2009-12-09 東ソー株式会社 石英ガラス部品及びその製造方法並びにそれを用いた装置
WO2004027849A1 (ja) * 2002-09-20 2004-04-01 Hitachi Kokusai Electric Inc. 半導体装置の製造方法および基板処理装置
JP2010509779A (ja) * 2006-11-10 2010-03-25 ソロパワー、インコーポレイテッド 太陽電池吸収体を形成するための前駆体膜のオープンリール式反応
US20080210168A1 (en) * 2007-01-18 2008-09-04 May Su Single chamber, multiple tube high efficiency vertical furnace system
JP5154814B2 (ja) * 2007-03-29 2013-02-27 東ソー・クォーツ株式会社 石英ガラス材料の製造方法
WO2010060646A1 (de) * 2008-11-28 2010-06-03 Volker Probst Verfahren zum herstellen von halbleiterschichten bzw. von mit elementarem selen und/oder schwefel behandelten beschichteten substraten, insbesondere flächigen substraten
EP2144026B1 (de) * 2008-06-20 2016-04-13 Volker Probst Prozessvorrichtung und verfahren zum prozessieren von gestapelten prozessgütern
WO2011031521A2 (en) * 2009-08-27 2011-03-17 Applied Materials, Inc. Method of decontamination of process chamber after in-situ chamber clean

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