JP2012015216A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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Abstract
【解決手段】複数の半導体チップ20と、複数の突起を有する金属構造体とを支持基板11上の所定の箇所に配置し、前記複数の半導体チップ及び前記金属構造体25を樹脂で覆って固化し、前記固化した樹脂の一部及び前記金属構造体の一部を除去、平坦化して、前記金属構造体の前記突起25aを貫通ビアとして露出させ、前記半導体チップ及び前記貫通ビアが埋め込まれた樹脂層を前記支持基板から剥離し、前記剥離面に所定の配線パターンを形成して擬似ウエハーを完成する。
【選択図】図2
Description
複数の半導体チップと、複数の突起を有する金属構造体とを支持基板上の所定の箇所に配置し、
前記複数の半導体チップ及び前記金属構造体を樹脂で覆って固化し、
前記固化した樹脂の一部及び前記金属構造体の一部を除去、平坦化して、前記金属構造体の前記突起を貫通ビアとして露出させ、
前記半導体チップ及び前記貫通ビアが埋め込まれた樹脂層を前記支持基板から剥離し、
前記剥離面に所定の配線パターンを形成して擬似ウエハーを完成する
工程を含む。
このような手法により、所望の形状の金属構造体55を安価かつ大量に作製することができる。また、金属構造体を構成する金属として、Cuに限定されず、Ni、Ni−Co、Ni−Sn、Ag、Ag−Cu、Auなど、配線に適した任意の金属材料を用いることができる。
(付記1)
複数の半導体チップと、複数の突起を有する金属構造体とを支持基板上の所定の箇所に配置し、
前記複数の半導体チップ及び前記金属構造体を樹脂で覆って固化し、
前記固化した樹脂の一部及び前記金属構造体の一部を除去、平坦化して、前記金属構造体の前記突起を貫通ビアとして露出させ、
前記半導体チップ及び前記貫通ビアが埋め込まれた樹脂層を前記支持基板から剥離し、
前記剥離面に所定の配線パターンを形成して擬似ウエハーを完成する
工程を含むことを特徴とする半導体装置の製造方法。
(付記2)
前記金属構造体は、平坦な保持部と、前記保持部から垂直方向に延びる前記複数の突起とを有し、前記平坦化により、前記保持部が除去されて前記突起が露出することを特徴とする付記1に記載の半導体装置の製造方法。
(付記3)
前記金属構造体は、前記保持部から垂直方向に延びるビア用の第1の突起と、前記保持部から垂直方向に突出する配線用の第2の突起を有し、前記平坦化により、前記保持部が除去されて、前記第1の突起と前記第2の突起が、それぞれ前記貫通ビア及び配線として露出することを特徴とする付記2に記載の半導体装置の製造方法。
(付記4)
前記金属構造体はリードフレームであり、前記平坦化により前記リードフレームの平坦な保持部が除去されて、前記端子が前記貫通ビアとして露出することを特徴とする付記2に記載の半導体装置の製造方法。
(付記5)
前記リードフレームの前記複数の端子の先端部を、あらかじめ樹脂層により所定の位置に固定し、前記固定された前記リードフレームを、前記支持基板上の所定の箇所に配置することを特徴とする付記4に記載の半導体装置の製造方法。
(付記6)
前記金属構造体は、金属箔の一方の面に絶縁層を形成したフィルムを、前記保持部から前記複数の端子が延びるパターンに加工し、前記絶縁層が形成された面が外側になるように前記複数の端子を前記保持部に対して垂直に折り曲げて作製することを特徴とする付記2に記載の半導体装置の製造方法。
(付記7)
前記金属構造体を、前記折り曲げた端子の弾性を利用して前記複数の半導体チップ間に保持することを特徴とする付記6に記載の半導体装置の製造方法。
(付記8)
前記半導体チップは、電極面を下向きにして前記支持基板上に配置される第1の半導体チップを含み、前記剥離面への配線パターンの形成は、前記半導体チップの前記電極間及び/又は前記電極と前記貫通ビアとの間を電気的に接続するように形成することを特徴とする付記1〜7に記載の半導体装置の製造方法。
(付記9)
電極面を上向きにした第2の半導体チップを、前記支持基板上及び/又は前記電極面を下向きにした前記半導体チップ上に配置する工程をさらに含むことを特徴とする付記1に記載の半導体装置の製造方法。
(付記10)
前記第2の半導体チップの前記電極上に導線をボールボンディングし、前記導線を所定の長さに切断して金属柱を形成し、
前記第1及び第2の半導体チップ、前記金属構造体、及び前記金属柱を前記樹脂で覆って固化し、
前記平坦化により、前記金属構造体の前記突起と前記金属柱を、前記貫通ビアとして露出し、
前記露出面に、前記貫通ビアを電気的に接続する配線パターンを形成する
工程をさらに含むことを特徴とする付記9に記載の半導体装置の製造方法。
(付記11)
前記擬似ウエハーを所定の形状の個別片に切り出して擬似ウエハーモジュールを作製する工程をさらに含むことを特徴とする付記1に記載の半導体装置の製造方法。
(付記12)
複数種類の前記擬似ウエハーモジュールを3次元に積層する工程をさらに含むことを特徴とする半導体装置の製造方法。
(付記13)
前記複数の半導体チップは、仮接着層を介して前記支持基板上に配置され、前記剥離工程は、前記仮接着層に熱または紫外線の照射を与えることにより前記樹脂層を前記支持基板から剥離することを特徴とする付記1〜12のいずれか一項に記載の半導体装置の製造方法。
12 仮接着層
15 埋め込み樹脂層
20、20a〜20d 半導体チップ
21 電極
25、65A、65B 金属構造体
25a、55a、65a 第1の突起(貫通ビア用突起)
25b、 保持部
25c、55c 第2の突起(配線用突起)
30、79、80 擬似ウエハー
45、75、78 配線
50 半導体装置
Claims (7)
- 複数の半導体チップと、複数の突起を有する金属構造体とを支持基板上の所定の箇所に配置し、
前記複数の半導体チップ及び前記金属構造体を樹脂で覆って固化し、
前記固化した樹脂の一部及び前記金属構造体の一部を除去、平坦化して、前記金属構造体の前記突起を貫通ビアとして露出させ、
前記半導体チップ及び前記貫通ビアが埋め込まれた樹脂層を前記支持基板から剥離し、
前記剥離面に所定の配線パターンを形成して擬似ウエハーを完成する
工程を含むことを特徴とする半導体装置の製造方法。 - 前記金属構造体は、平坦な保持部と、前記保持部から垂直方向に延びる前記複数の突起とを有し、前記平坦化により、前記保持部が除去されて前記突起が露出することを特徴とする請求項1に記載の半導体装置の製造方法。
- 前記金属構造体は、前記保持部から垂直方向に延びるビア用の第1の突起と、前記保持部から垂直方向に突出する配線用の第2の突起を有し、前記平坦化により、前記第1の突起及び前記第2の突起から、前記貫通ビア及び配線が同時に形成されることを特徴とする請求項2に記載の半導体装置の製造方法。
- 前記金属構造体はリードフレームであり、前記平坦化により前記リードフレームの平坦な保持部が除去されて、前記端子が前記貫通ビアとして露出することを特徴とする請求項2に記載の半導体装置の製造方法。
- 前記金属構造体は、金属箔の一方の面に絶縁層を形成したフィルムを、前記保持部から前記複数の端子が延びるパターンに加工し、前記絶縁層が形成された面が外側になるように前記複数の端子を前記保持部に対して垂直に折り曲げて作製することを特徴とする請求項2に記載の半導体装置の製造方法。
- 前記半導体チップは、電極面を下向きにして前記支持基板上に配置される第1の半導体チップを含み、前記剥離面への配線パターンの形成は、前記半導体チップの前記電極間及び/又は前記電極と前記貫通ビアとの間を電気的に接続するように形成することを特徴とする付記1〜7に記載の半導体装置の製造方法。
- 電極面を上向きにした第2の半導体チップを、前記支持基板上及び/又は前記電極面を下向きにした前記半導体チップ上に配置する工程をさらに含むことを特徴とする請求項6に記載の半導体装置の製造方法。
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