JP2011516620A5 - - Google Patents

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Publication number
JP2011516620A5
JP2011516620A5 JP2010548782A JP2010548782A JP2011516620A5 JP 2011516620 A5 JP2011516620 A5 JP 2011516620A5 JP 2010548782 A JP2010548782 A JP 2010548782A JP 2010548782 A JP2010548782 A JP 2010548782A JP 2011516620 A5 JP2011516620 A5 JP 2011516620A5
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JP
Japan
Prior art keywords
composition
microelectronic substrate
cleaning
weight
tetrafluoroborate ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2010548782A
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English (en)
Japanese (ja)
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JP5512554B2 (ja
JP2011516620A (ja
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Publication date
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Priority claimed from PCT/US2009/033148 external-priority patent/WO2009108474A1/en
Publication of JP2011516620A publication Critical patent/JP2011516620A/ja
Publication of JP2011516620A5 publication Critical patent/JP2011516620A5/ja
Application granted granted Critical
Publication of JP5512554B2 publication Critical patent/JP5512554B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010548782A 2008-02-29 2009-02-05 マイクロエレクトロニクス基板洗浄用組成物 Active JP5512554B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3244908P 2008-02-29 2008-02-29
US61/032,449 2008-02-29
PCT/US2009/033148 WO2009108474A1 (en) 2008-02-29 2009-02-05 Microelectronic substrate cleaning compositions

Publications (3)

Publication Number Publication Date
JP2011516620A JP2011516620A (ja) 2011-05-26
JP2011516620A5 true JP2011516620A5 (enExample) 2012-03-22
JP5512554B2 JP5512554B2 (ja) 2014-06-04

Family

ID=40419175

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010548782A Active JP5512554B2 (ja) 2008-02-29 2009-02-05 マイクロエレクトロニクス基板洗浄用組成物

Country Status (11)

Country Link
US (1) US8168577B2 (enExample)
EP (1) EP2247672B1 (enExample)
JP (1) JP5512554B2 (enExample)
KR (1) KR101570256B1 (enExample)
CN (1) CN101959977B (enExample)
BR (1) BRPI0908905A2 (enExample)
CA (1) CA2716641A1 (enExample)
IL (1) IL207605A (enExample)
TW (1) TW200942608A (enExample)
WO (1) WO2009108474A1 (enExample)
ZA (1) ZA201005419B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101838483B (zh) * 2010-05-11 2012-07-04 华北电网有限公司北京超高压公司 一种溶解型防污闪涂层清除剂及其制备方法
KR102475619B1 (ko) * 2017-03-31 2022-12-07 간또 가가꾸 가부시끼가이샤 세정액 조성물
CN115386954A (zh) * 2022-09-17 2022-11-25 中国科学院新疆理化技术研究所 化合物氟硼酸锂钠和氟硼酸锂钠双折射晶体及制备方法和用途

Family Cites Families (38)

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US4491530A (en) * 1983-05-20 1985-01-01 Allied Corporation Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper
US5480585A (en) * 1992-04-02 1996-01-02 Nagase Electronic Chemicals, Ltd. Stripping liquid compositions
US5568461A (en) * 1994-04-20 1996-10-22 Matsushita Electric Industrial Co., Ltd. Optical information recording and reproducing apparatus
JPH07311469A (ja) * 1994-05-17 1995-11-28 Hitachi Chem Co Ltd ポリイミド系樹脂膜のレジスト剥離残り除去液およびポリイミド系樹脂膜パターンの製造法
US5571447A (en) * 1995-03-20 1996-11-05 Ashland Inc. Stripping and cleaning composition
JPH1055993A (ja) * 1996-08-09 1998-02-24 Hitachi Ltd 半導体素子製造用洗浄液及びそれを用いた半導体素子の製造方法
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US6150282A (en) * 1997-11-13 2000-11-21 International Business Machines Corporation Selective removal of etching residues
US6432209B2 (en) 1998-03-03 2002-08-13 Silicon Valley Chemlabs Composition and method for removing resist and etching residues using hydroxylazmmonium carboxylates
JPH11323394A (ja) * 1998-05-14 1999-11-26 Texas Instr Japan Ltd 半導体素子製造用洗浄剤及びそれを用いた半導体素子の製造方法
KR100288769B1 (ko) * 1998-07-10 2001-09-17 윤종용 포토레지스트용스트리퍼조성물
US6828289B2 (en) * 1999-01-27 2004-12-07 Air Products And Chemicals, Inc. Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature
US6761835B2 (en) * 2000-07-07 2004-07-13 Tdk Corporation Phosphor multilayer and EL panel
US6777380B2 (en) * 2000-07-10 2004-08-17 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductor devices
US20030022800A1 (en) * 2001-06-14 2003-01-30 Peters Darryl W. Aqueous buffered fluoride-containing etch residue removers and cleaners
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PL207297B1 (pl) * 2002-06-07 2010-11-30 Mallinckrodt Baker Inc Bezkrzemianowa kompozycja czyszcząca i zastosowanie bezkrzemianowej kompozycji czyszczącej
US7192860B2 (en) * 2002-06-20 2007-03-20 Honeywell International Inc. Highly selective silicon oxide etching compositions
US6677286B1 (en) * 2002-07-10 2004-01-13 Air Products And Chemicals, Inc. Compositions for removing etching residue and use thereof
US7166419B2 (en) * 2002-09-26 2007-01-23 Air Products And Chemicals, Inc. Compositions substrate for removing etching residue and use thereof
EP1692572A2 (en) * 2003-10-29 2006-08-23 Mallinckrodt Baker, Inc. Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors
US8030263B2 (en) * 2004-07-01 2011-10-04 Air Products And Chemicals, Inc. Composition for stripping and cleaning and use thereof
JP2006041446A (ja) * 2004-07-30 2006-02-09 Sumitomo Chemical Co Ltd 電子部品洗浄液
PT1828848E (pt) * 2004-12-10 2010-05-21 Mallinckrodt Baker Inc Composições de limpeza para microelectrónica, não aquosas e não corrosivas, contendo inibidores da corrosão poliméricos
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EP1875493A2 (en) * 2005-04-04 2008-01-09 MALLINCKRODT BAKER, Inc. Composition for cleaning ion implanted photoresist in front end of line applications
JP2006310603A (ja) * 2005-04-28 2006-11-09 Nissan Chem Ind Ltd ホウ素化合物を含む半導体用洗浄液組成物及び洗浄方法
JP2008547202A (ja) * 2005-06-13 2008-12-25 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 金属ケイ化物の形成後の金属または金属合金の選択的な除去のための組成物および方法
KR100655647B1 (ko) * 2005-07-04 2006-12-08 삼성전자주식회사 반도체 기판용 세정액 조성물, 이의 제조 방법, 이를이용한 반도체 기판의 세정 방법 및 반도체 장치의 제조방법
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US7582508B2 (en) * 2006-05-31 2009-09-01 Byoung-Choo Park Method for manufacturing an organic semiconductor device that utilizes ionic salt
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US8026201B2 (en) * 2007-01-03 2011-09-27 Az Electronic Materials Usa Corp. Stripper for coating layer

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