JP2011510133A5 - - Google Patents

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Publication number
JP2011510133A5
JP2011510133A5 JP2010543104A JP2010543104A JP2011510133A5 JP 2011510133 A5 JP2011510133 A5 JP 2011510133A5 JP 2010543104 A JP2010543104 A JP 2010543104A JP 2010543104 A JP2010543104 A JP 2010543104A JP 2011510133 A5 JP2011510133 A5 JP 2011510133A5
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JP
Japan
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value
group
silsesquioxane resin
antireflective coating
generator
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Application number
JP2010543104A
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Japanese (ja)
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JP2011510133A (ja
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Priority claimed from PCT/US2008/083849 external-priority patent/WO2009091440A1/en
Publication of JP2011510133A publication Critical patent/JP2011510133A/ja
Publication of JP2011510133A5 publication Critical patent/JP2011510133A5/ja
Pending legal-status Critical Current

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JP2010543104A 2008-01-15 2008-11-18 シルセスキオキサン樹脂 Pending JP2011510133A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2109708P 2008-01-15 2008-01-15
PCT/US2008/083849 WO2009091440A1 (en) 2008-01-15 2008-11-18 Silsesquioxane resins

Publications (2)

Publication Number Publication Date
JP2011510133A JP2011510133A (ja) 2011-03-31
JP2011510133A5 true JP2011510133A5 (https=) 2011-11-24

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Application Number Title Priority Date Filing Date
JP2010543104A Pending JP2011510133A (ja) 2008-01-15 2008-11-18 シルセスキオキサン樹脂

Country Status (7)

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US (1) US9023433B2 (https=)
EP (1) EP2238198A4 (https=)
JP (1) JP2011510133A (https=)
KR (1) KR20100114075A (https=)
CN (1) CN101910253B (https=)
TW (1) TWI437048B (https=)
WO (1) WO2009091440A1 (https=)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101541939B1 (ko) * 2008-03-05 2015-08-04 다우 코닝 코포레이션 실세스퀴옥산 수지
KR101690159B1 (ko) * 2008-12-10 2016-12-27 다우 코닝 코포레이션 변환가능한 반사방지 코팅
EP2373722A4 (en) 2008-12-10 2013-01-23 Dow Corning SILSESQUIOXAN RESINS
CN102933626B (zh) * 2010-05-13 2015-01-28 日产化学工业株式会社 热固化性树脂组合物及显示器装置
CN101891893B (zh) * 2010-07-23 2012-01-04 深圳市安品有机硅材料有限公司 Led封装用苯基氢基硅树脂的制备方法
CN103460135B (zh) * 2011-03-29 2017-03-01 道康宁公司 用于设备制造的可曝光成像和可显影的倍半硅氧烷树脂
EP2733155B1 (en) * 2011-07-11 2019-12-11 Tokuyama Corporation Photochromic curable composition
US20140178698A1 (en) 2012-12-21 2014-06-26 3M Innovative Properties Company Curable silsesquioxane polymers, compositions, articles, and methods
KR20150100765A (ko) * 2012-12-21 2015-09-02 쓰리엠 이노베이티브 프로퍼티즈 컴파니 경화성 실세스퀴옥산 중합체, 조성물, 물품, 및 방법
US8999625B2 (en) 2013-02-14 2015-04-07 International Business Machines Corporation Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
KR101665308B1 (ko) * 2014-06-05 2016-10-13 한국과학기술연구원 양이온 경화성을 갖는 폴리에폭시계실세스퀴옥산 및 이를 이용한 고강도 필름
CN104356392B (zh) * 2014-11-07 2017-04-19 广州市白云化工实业有限公司 笼型枝状有机硅树脂及其制备方法和应用
TWI747956B (zh) 2016-09-30 2021-12-01 美商道康寧公司 橋接聚矽氧樹脂、膜、電子裝置及相關方法
TWI742160B (zh) 2016-09-30 2021-10-11 美商道康寧公司 橋接聚矽氧樹脂、膜、電子裝置及相關方法
KR20200037295A (ko) * 2017-07-28 2020-04-08 다우 실리콘즈 코포레이션 포지티브 포토레지스트 특징과 네거티브 포토레지스트 특징 둘 모두를 갖는 실세스퀴옥산 조성물
JP6999808B2 (ja) * 2018-06-06 2022-02-10 富士フイルム株式会社 組成物、ハードコートフィルム、ハードコートフィルムを備えた物品、及び画像表示装置
CN112469563B (zh) * 2018-07-27 2023-06-27 富士胶片株式会社 硬涂膜、具备硬涂膜的物品及图像显示装置
JP7119997B2 (ja) * 2018-12-28 2022-08-17 信越化学工業株式会社 感光性樹脂組成物、積層体、及びパターン形成方法
CN110452384B (zh) * 2019-08-30 2020-10-23 北京理工大学 一种笼型结构环氧基苯基硅倍半氧烷及其制备方法
CN111100463A (zh) * 2019-12-26 2020-05-05 广东盈骅新材料科技有限公司 环氧改性硅树脂组合物及其应用
US12163068B2 (en) 2020-05-07 2024-12-10 Dow Silicones Corporation Silicone hybrid pressure sensitive adhesive and methods for its preparation and use on uneven surfaces
US12503554B2 (en) 2020-05-07 2025-12-23 Dow Silicones Corporation (Meth)acrylate functional silicone and methods for its preparation and use
JP2023524667A (ja) 2020-05-07 2023-06-13 ダウ シリコーンズ コーポレーション シリコーンハイブリッド感圧接着剤、及びその調製方法、及び（光）電子デバイスを製作するための保護フィルムにおける使用
JP7713516B2 (ja) 2020-09-22 2025-07-25 ダウ シリコーンズ コーポレーション 硬化性シリコーン－（メタ）アクリレート組成物並びにその調製及び使用方法

Family Cites Families (90)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4587138A (en) 1984-11-09 1986-05-06 Intel Corporation MOS rear end processing
US5010159A (en) 1989-09-01 1991-04-23 Dow Corning Corporation Process for the synthesis of soluble, condensed hydridosilicon resins containing low levels of silanol
US5100503A (en) 1990-09-14 1992-03-31 Ncr Corporation Silica-based anti-reflective planarizing layer
US5210168A (en) 1992-04-02 1993-05-11 Dow Corning Corporation Process for forming siloxane bonds
EP0568476B1 (en) 1992-04-30 1995-10-11 International Business Machines Corporation Silicon-containing positive resist and method of using the same in thin film packaging technology
JPH0656560A (ja) 1992-08-10 1994-03-01 Sony Corp Ｓｏｇ組成物及びそれを用いた半導体装置の製造方法
US5484867A (en) 1993-08-12 1996-01-16 The University Of Dayton Process for preparation of polyhedral oligomeric silsesquioxanes and systhesis of polymers containing polyhedral oligomeric silsesqioxane group segments
US5412053A (en) 1993-08-12 1995-05-02 The University Of Dayton Polymers containing alternating silsesquioxane and bridging group segments and process for their preparation
US5441765A (en) 1993-09-22 1995-08-15 Dow Corning Corporation Method of forming Si-O containing coatings
JP3499032B2 (ja) 1995-02-02 2004-02-23 ダウ コーニング アジア株式会社 放射線硬化性組成物、その硬化方法及びパターン形成方法
JP3324360B2 (ja) 1995-09-25 2002-09-17 信越化学工業株式会社 ポリシロキサン化合物及びポジ型レジスト材料
GB9521996D0 (en) * 1995-10-27 1996-01-03 Boc Group Plc Air separation
JPH09124794A (ja) 1995-11-06 1997-05-13 Dow Corning Asia Ltd 有機光機能材を含有するポリシロキサン樹脂組成物及びそれから得られる透明な光機能素子
JP3192947B2 (ja) 1995-11-16 2001-07-30 東京応化工業株式会社 シリカ系被膜形成用塗布液の製造方法
JPH09221630A (ja) 1996-02-13 1997-08-26 Showa Denko Kk 塗料組成物及びそれを用いて得られる塗膜
US6143855A (en) 1997-04-21 2000-11-07 Alliedsignal Inc. Organohydridosiloxane resins with high organic content
US6057239A (en) 1997-12-17 2000-05-02 Advanced Micro Devices, Inc. Dual damascene process using sacrificial spin-on materials
US6962727B2 (en) 1998-03-20 2005-11-08 Honeywell International Inc. Organosiloxanes
US6344284B1 (en) 1998-04-10 2002-02-05 Organic Display Technology Organic electroluminescent materials and devices made from such materials
US6156640A (en) 1998-07-14 2000-12-05 United Microelectronics Corp. Damascene process with anti-reflection coating
US6087064A (en) 1998-09-03 2000-07-11 International Business Machines Corporation Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method
US6177143B1 (en) 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
US6461955B1 (en) 1999-04-29 2002-10-08 Texas Instruments Incorporated Yield improvement of dual damascene fabrication through oxide filling
US6509259B1 (en) 1999-06-09 2003-01-21 Alliedsignal Inc. Process of using siloxane dielectric films in the integration of organic dielectric films in electronic devices
US6281285B1 (en) 1999-06-09 2001-08-28 Dow Corning Corporation Silicone resins and process for synthesis
JP2003502449A (ja) 1999-06-10 2003-01-21 ハネウエル・インターナシヨナル・インコーポレーテツド フォトリソグラフィ用スピンオンガラス反射防止コーティング
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6268457B1 (en) 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
US6890448B2 (en) 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
CN1360668A (zh) 1999-06-15 2002-07-24 艾普万有限公司 单向阀
US6329118B1 (en) 1999-06-21 2001-12-11 Intel Corporation Method for patterning dual damascene interconnects using a sacrificial light absorbing material
US6982006B1 (en) 1999-10-19 2006-01-03 Boyers David G Method and apparatus for treating a substrate with an ozone-solvent solution
US6359096B1 (en) 1999-10-25 2002-03-19 Dow Corning Corporation Silicone resin compositions having good solution solubility and stability
KR100355604B1 (ko) 1999-12-23 2002-10-12 주식회사 하이닉스반도체 난반사 방지막용 중합체와 그 제조방법
JP3795333B2 (ja) 2000-03-30 2006-07-12 東京応化工業株式会社 反射防止膜形成用組成物
US6420088B1 (en) 2000-06-23 2002-07-16 International Business Machines Corporation Antireflective silicon-containing compositions as hardmask layer
US6420084B1 (en) 2000-06-23 2002-07-16 International Business Machines Corporation Mask-making using resist having SIO bond-containing polymer
US20030176614A1 (en) 2000-06-30 2003-09-18 Nigel Hacker Organohydridosiloxane resins with high organic content
US6368400B1 (en) 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
JP4141625B2 (ja) 2000-08-09 2008-08-27 東京応化工業株式会社 ポジ型レジスト組成物およびそのレジスト層を設けた基材
EP1197511A1 (en) 2000-10-10 2002-04-17 Shipley Company LLC Antireflective composition
TW588072B (en) 2000-10-10 2004-05-21 Shipley Co Llc Antireflective porogens
JP3931951B2 (ja) 2001-03-13 2007-06-20 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
JP2002299441A (ja) * 2001-03-30 2002-10-11 Jsr Corp デュアルダマシン構造の形成方法
US6589711B1 (en) 2001-04-04 2003-07-08 Advanced Micro Devices, Inc. Dual inlaid process using a bilayer resist
JP5225528B2 (ja) 2001-05-30 2013-07-03 株式会社Ａｄｅｋａ ケイ素含有重合体の製造方法
JP2003025510A (ja) * 2001-07-16 2003-01-29 Shin Etsu Chem Co Ltd 反射防止性及び耐擦傷性を有する多層積層体
US6746530B2 (en) 2001-08-02 2004-06-08 Chunghwa Pictures Tubes, Ltd. High contrast, moisture resistant antistatic/antireflective coating for CRT display screen
US20030096090A1 (en) 2001-10-22 2003-05-22 Boisvert Ronald Paul Etch-stop resins
EP1478682A4 (en) 2001-11-15 2005-06-15 Honeywell Int Inc ANTIREFLECTIVE LAYERS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF
WO2003044600A1 (en) 2001-11-15 2003-05-30 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
JP2005509710A (ja) 2001-11-16 2005-04-14 ハネウェル・インターナショナル・インコーポレーテッド フォトリソグラフィ用のスピンオングラス反射防止性コーティング
TW200307709A (en) * 2002-02-19 2003-12-16 Honeywell Int Inc Organosiloxanes
US6730454B2 (en) 2002-04-16 2004-05-04 International Business Machines Corporation Antireflective SiO-containing compositions for hardmask layer
WO2004014924A1 (ja) 2002-08-07 2004-02-19 Chisso Corporation ケイ素化合物
WO2004044025A2 (en) 2002-11-12 2004-05-27 Honeywell International Inc Anti-reflective coatings for photolithography and methods of preparation thereof
KR20050084283A (ko) 2002-12-02 2005-08-26 토쿄오오카코교 가부시기가이샤 래더형 실리콘 공중합체
TW200505966A (en) 2003-04-02 2005-02-16 Dow Global Technologies Inc Organosilicate resin formulation for use in microelectronic devices
JP2004361692A (ja) * 2003-04-07 2004-12-24 Dow Corning Asia Ltd 光伝送部材用硬化性オルガノポリシロキサン樹脂組成物、オルガノポリシロキサン樹脂硬化物からなる光伝送部材および光伝送部材の製造方法
CN100451070C (zh) * 2003-04-07 2009-01-14 陶氏康宁公司 用于光波导的固化性有机聚硅氧烷树脂组合物,光波导及其制造方法
ATE377036T1 (de) 2003-05-23 2007-11-15 Dow Corning Siloxan-harz basierte anti- reflektionsbeschichtung mit hoher nassätzgeschwindigkeit
KR100857967B1 (ko) 2003-06-03 2008-09-10 신에쓰 가가꾸 고교 가부시끼가이샤 반사 방지막 재료, 이것을 이용한 반사 방지막 및 패턴형성 방법
CN100375908C (zh) 2003-06-18 2008-03-19 旭化成株式会社 抗反射膜
WO2005005238A1 (en) 2003-07-02 2005-01-20 Keith Gilstrap Seatpost mounted bicycle wheel holding device
WO2005035236A1 (en) 2003-09-15 2005-04-21 Sunco Products, Inc. Sheeting system
WO2005034236A1 (de) 2003-09-29 2005-04-14 Siemens Aktiengesellschaft Plastisch verformbarer kühlkörper für elektrische und/ oder elektronische bauelemente
US8101015B2 (en) 2003-10-07 2012-01-24 Honeywell International Inc. Coatings and hard mask compositions for integrated circuit applications methods of production and uses thereof
SG119201A1 (en) 2003-10-13 2006-02-28 Sportiv Tech Lab Pte Ltd Utility garment
US7557900B2 (en) 2004-02-10 2009-07-07 Nikon Corporation Exposure apparatus, device manufacturing method, maintenance method, and exposure method
DE602005003475T2 (de) * 2004-07-16 2008-09-25 Dow Corning Corp., Midland Strahlungsempfindliche silikonharzzusammensetzung
US20060019468A1 (en) 2004-07-21 2006-01-26 Beatty John J Method of manufacturing a plurality of electronic assemblies
JP2006117867A (ja) 2004-10-25 2006-05-11 Takemoto Oil & Fat Co Ltd 有機シリコーン微粒子、有機シリコーン微粒子の製造方法、高分子材料改質剤及び化粧品原料
US7756384B2 (en) 2004-11-08 2010-07-13 Dow Corning Corporation Method for forming anti-reflective coating
US20060128163A1 (en) * 2004-12-14 2006-06-15 International Business Machines Corporation Surface treatment of post-rie-damaged p-osg and other damaged materials
ATE486098T1 (de) 2004-12-17 2010-11-15 Dow Corning Siloxanharzbeschichtung
CN101073039B (zh) 2004-12-17 2011-12-14 陶氏康宁公司 形成抗反射涂层的方法
DE602005008100D1 (de) * 2004-12-17 2008-08-21 Dow Corning Verfahren zur ausbildung einer antireflexionsbeschichtung
WO2006065316A1 (en) 2004-12-17 2006-06-22 Dow Corning Corporation Method for forming anti-reflective coating
CN101371196B (zh) 2006-02-13 2012-07-04 陶氏康宁公司 抗反射涂料
WO2007094849A2 (en) 2006-02-13 2007-08-23 Dow Corning Corporation Antireflective coating material
US20070212886A1 (en) * 2006-03-13 2007-09-13 Dong Seon Uh Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositions
US20070298349A1 (en) * 2006-06-22 2007-12-27 Ruzhi Zhang Antireflective Coating Compositions Comprising Siloxane Polymer
US7736837B2 (en) * 2007-02-20 2010-06-15 Az Electronic Materials Usa Corp. Antireflective coating composition based on silicon polymer
KR20090114476A (ko) * 2007-02-26 2009-11-03 에이제트 일렉트로닉 머트리얼즈 유에스에이 코프. 실록산 중합체의 제조 방법
WO2009088600A1 (en) 2008-01-08 2009-07-16 Dow Corning Toray Co., Ltd. Silsesquioxane resins
CN101990551B (zh) * 2008-03-04 2012-10-03 陶氏康宁公司 倍半硅氧烷树脂
KR101541939B1 (ko) * 2008-03-05 2015-08-04 다우 코닝 코포레이션 실세스퀴옥산 수지
EP2373722A4 (en) * 2008-12-10 2013-01-23 Dow Corning SILSESQUIOXAN RESINS
US20110236835A1 (en) * 2008-12-10 2011-09-29 Peng-Fei Fu Silsesquioxane Resins
KR101690159B1 (ko) * 2008-12-10 2016-12-27 다우 코닝 코포레이션 변환가능한 반사방지 코팅

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