JP2011233784A - 半導体発光素子、半導体発光素子の保護膜及びその作製方法 - Google Patents

半導体発光素子、半導体発光素子の保護膜及びその作製方法 Download PDF

Info

Publication number
JP2011233784A
JP2011233784A JP2010104443A JP2010104443A JP2011233784A JP 2011233784 A JP2011233784 A JP 2011233784A JP 2010104443 A JP2010104443 A JP 2010104443A JP 2010104443 A JP2010104443 A JP 2010104443A JP 2011233784 A JP2011233784 A JP 2011233784A
Authority
JP
Japan
Prior art keywords
film
protective film
semiconductor light
emitting device
sin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2010104443A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011233784A5 (enExample
Inventor
Hidenaru Kafuku
秀考 加福
Toshihiko Nishimori
年彦 西森
Hisao Kawasaki
尚夫 河▲崎▼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP2010104443A priority Critical patent/JP2011233784A/ja
Priority to PCT/JP2011/052814 priority patent/WO2011135889A1/ja
Priority to US13/582,192 priority patent/US20130037850A1/en
Priority to EP11774674.3A priority patent/EP2565946A4/en
Priority to KR1020127022725A priority patent/KR20120125326A/ko
Priority to TW100105984A priority patent/TW201203613A/zh
Publication of JP2011233784A publication Critical patent/JP2011233784A/ja
Publication of JP2011233784A5 publication Critical patent/JP2011233784A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/84Coatings, e.g. passivation layers or antireflective coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/0212Auxiliary members for bonding areas, e.g. spacers
    • H01L2224/02122Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body
    • H01L2224/02163Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body on the bonding area
    • H01L2224/02165Reinforcing structures
    • H01L2224/02166Collar structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49107Connecting at different heights on the semiconductor or solid-state body
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/034Manufacture or treatment of coatings

Landscapes

  • Led Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP2010104443A 2010-04-28 2010-04-28 半導体発光素子、半導体発光素子の保護膜及びその作製方法 Pending JP2011233784A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2010104443A JP2011233784A (ja) 2010-04-28 2010-04-28 半導体発光素子、半導体発光素子の保護膜及びその作製方法
PCT/JP2011/052814 WO2011135889A1 (ja) 2010-04-28 2011-02-10 半導体発光素子、半導体発光素子の保護膜及びその作製方法
US13/582,192 US20130037850A1 (en) 2010-04-28 2011-02-10 Semiconductor light-emitting element, protective film of semiconductor light-emitting element, and method for fabricating same
EP11774674.3A EP2565946A4 (en) 2010-04-28 2011-02-10 LIGHT-EMITTING SEMICONDUCTOR COMPONENT, PROTECTIVE FILM FOR THE LIGHT-EMITTING SEMICONDUCTOR COMPONENT AND METHOD OF MANUFACTURING THEREOF
KR1020127022725A KR20120125326A (ko) 2010-04-28 2011-02-10 반도체 발광 소자, 반도체 발광 소자의 보호막 및 그 제작 방법
TW100105984A TW201203613A (en) 2010-04-28 2011-02-23 Semiconductor light-emitting element, protective film of semiconductor light-emitting element, and method for fabricating same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010104443A JP2011233784A (ja) 2010-04-28 2010-04-28 半導体発光素子、半導体発光素子の保護膜及びその作製方法

Publications (2)

Publication Number Publication Date
JP2011233784A true JP2011233784A (ja) 2011-11-17
JP2011233784A5 JP2011233784A5 (enExample) 2013-06-06

Family

ID=44861210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010104443A Pending JP2011233784A (ja) 2010-04-28 2010-04-28 半導体発光素子、半導体発光素子の保護膜及びその作製方法

Country Status (6)

Country Link
US (1) US20130037850A1 (enExample)
EP (1) EP2565946A4 (enExample)
JP (1) JP2011233784A (enExample)
KR (1) KR20120125326A (enExample)
TW (1) TW201203613A (enExample)
WO (1) WO2011135889A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011233783A (ja) * 2010-04-28 2011-11-17 Mitsubishi Heavy Ind Ltd 半導体発光素子、半導体発光素子の保護膜及びその作製方法
JP2013251423A (ja) * 2012-06-01 2013-12-12 Mitsubishi Heavy Ind Ltd 発光素子の保護膜の作製方法及び装置
JP6476854B2 (ja) * 2014-12-26 2019-03-06 日亜化学工業株式会社 発光素子の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0856056A (ja) * 1994-04-06 1996-02-27 At & T Corp SiO▲x▼層を含む製品及びその製品の作製法
JP2001160650A (ja) * 1999-09-24 2001-06-12 Sanyo Electric Co Ltd 半導体発光素子
JP2005286135A (ja) * 2004-03-30 2005-10-13 Eudyna Devices Inc 半導体装置および半導体装置の製造方法
JP2005310937A (ja) * 2004-04-20 2005-11-04 Hitachi Cable Ltd 発光ダイオードアレイ

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07240535A (ja) * 1994-02-28 1995-09-12 Kyocera Corp 薄膜パターンの形成方法
JP2003332616A (ja) * 2002-05-14 2003-11-21 Sharp Corp 化合物半導体素子およびその製造方法
JP2006041403A (ja) 2004-07-29 2006-02-09 Nichia Chem Ind Ltd 半導体発光素子
JP2007189097A (ja) 2006-01-13 2007-07-26 Nichia Chem Ind Ltd 半導体発光素子
JP2009135466A (ja) * 2007-10-29 2009-06-18 Mitsubishi Chemicals Corp 半導体発光素子およびその製造方法
US8031754B2 (en) * 2008-04-24 2011-10-04 The Furukawa Electric Co., Ltd. Surface emitting laser element, surface emitting laser element array, method of fabricating a surface emitting laser element

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0856056A (ja) * 1994-04-06 1996-02-27 At & T Corp SiO▲x▼層を含む製品及びその製品の作製法
JP2001160650A (ja) * 1999-09-24 2001-06-12 Sanyo Electric Co Ltd 半導体発光素子
JP2005286135A (ja) * 2004-03-30 2005-10-13 Eudyna Devices Inc 半導体装置および半導体装置の製造方法
JP2005310937A (ja) * 2004-04-20 2005-11-04 Hitachi Cable Ltd 発光ダイオードアレイ

Also Published As

Publication number Publication date
WO2011135889A1 (ja) 2011-11-03
US20130037850A1 (en) 2013-02-14
TW201203613A (en) 2012-01-16
KR20120125326A (ko) 2012-11-14
EP2565946A1 (en) 2013-03-06
EP2565946A4 (en) 2014-09-10

Similar Documents

Publication Publication Date Title
JP2011233783A (ja) 半導体発光素子、半導体発光素子の保護膜及びその作製方法
CN101904018B (zh) 发光装置及其制造方法
US8502193B2 (en) Light-emitting device and fabricating method thereof
US8373152B2 (en) Light-emitting element and a production method therefor
JP5397369B2 (ja) 半導体発光素子、該半導体発光素子の製造方法および該半導体発光素子を用いたランプ
WO2007055202A1 (ja) 窒化物半導体発光素子及び窒化物半導体発光素子製造方法
JP2006041403A (ja) 半導体発光素子
US20130203194A1 (en) Method for producing group iii nitride semiconductor light-emitting device
WO2014045883A1 (ja) Led素子及びその製造方法
KR101234376B1 (ko) 반도체 발광 소자, 반도체 발광 소자의 보호막 및 그 제작 방법
US8673677B2 (en) Method for producing group III nitride semiconductor light emitting element
JP4115988B2 (ja) 発光効率を改善した発光ダイオード
KR100999800B1 (ko) 발광 소자 패키지 및 그 제조방법
JP5265090B2 (ja) 半導体発光素子およびランプ
JP2011233784A (ja) 半導体発光素子、半導体発光素子の保護膜及びその作製方法
JP2014045094A (ja) 高透過率保護膜作製方法および半導体発光素子の製造方法
US20080283850A1 (en) Reflective Positive Electrode and Gallium Nitride-Based Compound Semiconductor Light-Emitting Device Using the Same
KR101689164B1 (ko) 발광소자
JP6361722B2 (ja) 発光装置の製造方法
CN103840073A (zh) 倒装发光二极管器件及其制造方法
KR20120055332A (ko) 발광소자 및 발광소자 패키지
KR101701115B1 (ko) 발광소자 패키지
JP4252622B1 (ja) 半導体発光素子の製造方法
JP2006245555A (ja) 透光性電極
KR20150117816A (ko) 굴절률이 연속적으로 변하는 광추출층을 구비하는 발광소자 및 이의 제조방법

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130423

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20130423

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130924

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20140204