JP2011077283A5 - - Google Patents
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- Publication number
- JP2011077283A5 JP2011077283A5 JP2009227013A JP2009227013A JP2011077283A5 JP 2011077283 A5 JP2011077283 A5 JP 2011077283A5 JP 2009227013 A JP2009227013 A JP 2009227013A JP 2009227013 A JP2009227013 A JP 2009227013A JP 2011077283 A5 JP2011077283 A5 JP 2011077283A5
- Authority
- JP
- Japan
- Prior art keywords
- gate electrode
- layout
- light emitting
- emitting diode
- organic light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009227013A JP5532803B2 (ja) | 2009-09-30 | 2009-09-30 | 半導体デバイスおよび表示装置 |
| TW099126360A TW201133859A (en) | 2009-09-30 | 2010-08-06 | Semiconductor device and display device |
| CN201010275594.9A CN102034873B (zh) | 2009-09-30 | 2010-09-08 | 薄膜晶体管和制造薄膜晶体管的方法 |
| KR1020100089849A KR20110035891A (ko) | 2009-09-30 | 2010-09-14 | 반도체 디바이스 및 표시 장치 |
| US12/886,983 US20110073860A1 (en) | 2009-09-30 | 2010-09-21 | Semiconductor device and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009227013A JP5532803B2 (ja) | 2009-09-30 | 2009-09-30 | 半導体デバイスおよび表示装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011077283A JP2011077283A (ja) | 2011-04-14 |
| JP2011077283A5 true JP2011077283A5 (enExample) | 2012-11-08 |
| JP5532803B2 JP5532803B2 (ja) | 2014-06-25 |
Family
ID=43779296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009227013A Active JP5532803B2 (ja) | 2009-09-30 | 2009-09-30 | 半導体デバイスおよび表示装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20110073860A1 (enExample) |
| JP (1) | JP5532803B2 (enExample) |
| KR (1) | KR20110035891A (enExample) |
| CN (1) | CN102034873B (enExample) |
| TW (1) | TW201133859A (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101952570B1 (ko) * | 2011-05-13 | 2019-02-27 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 제작 방법 |
| JP6035734B2 (ja) * | 2011-06-20 | 2016-11-30 | ソニー株式会社 | 半導体素子、表示装置および電子機器 |
| CN102254917B (zh) * | 2011-07-07 | 2014-05-21 | 深圳市华星光电技术有限公司 | 薄膜晶体管阵列基板及其制法 |
| US8716708B2 (en) * | 2011-09-29 | 2014-05-06 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
| KR101951260B1 (ko) * | 2012-03-15 | 2019-02-25 | 삼성디스플레이 주식회사 | 박막트랜지스터, 상기 박막트랜지스터를 포함하는 표시 장치 및 상기 박막트랜지스터를 포함하는 유기 발광 표시 장치 |
| CN202487578U (zh) | 2012-03-27 | 2012-10-10 | 京东方科技集团股份有限公司 | 薄膜晶体管、阵列基板及显示装置 |
| JP6001308B2 (ja) * | 2012-04-17 | 2016-10-05 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| CN103943684B (zh) | 2014-03-26 | 2017-09-29 | 京东方科技集团股份有限公司 | 薄膜晶体管及其制作方法、阵列基板、显示装置 |
| CN104134699A (zh) * | 2014-07-15 | 2014-11-05 | 京东方科技集团股份有限公司 | 一种薄膜晶体管、阵列基板及显示装置 |
| US9468050B1 (en) * | 2014-09-25 | 2016-10-11 | X-Celeprint Limited | Self-compensating circuit for faulty display pixels |
| US9799261B2 (en) | 2014-09-25 | 2017-10-24 | X-Celeprint Limited | Self-compensating circuit for faulty display pixels |
| CN104409513A (zh) * | 2014-11-05 | 2015-03-11 | 京东方科技集团股份有限公司 | 一种金属氧化物薄膜晶体管及其制备方法、阵列基板 |
| US10255834B2 (en) | 2015-07-23 | 2019-04-09 | X-Celeprint Limited | Parallel redundant chiplet system for controlling display pixels |
| JP6240692B2 (ja) * | 2016-02-15 | 2017-11-29 | 株式会社ジャパンディスプレイ | 表示装置および表示装置の製造方法 |
| US9882064B2 (en) * | 2016-03-10 | 2018-01-30 | Semiconductor Energy Laboratory Co., Ltd. | Transistor and electronic device |
| US10950705B2 (en) * | 2017-02-15 | 2021-03-16 | Sharp Kabushiki Kaisha | Active matrix substrate |
| CN107895726A (zh) * | 2017-11-30 | 2018-04-10 | 武汉天马微电子有限公司 | 一种阵列基板及其制作方法和显示装置 |
| TWI717855B (zh) * | 2019-10-05 | 2021-02-01 | 友達光電股份有限公司 | 畫素電路及顯示裝置 |
| KR102371366B1 (ko) * | 2020-08-10 | 2022-03-04 | 재단법인대구경북과학기술원 | 반도체 트랜지스터 |
| US11469195B2 (en) * | 2020-09-24 | 2022-10-11 | Nanya Technology Corporation | Semiconductor device with tilted insulating layers and method for fabricating the same |
| CN114863828B (zh) * | 2022-05-31 | 2023-07-25 | 武汉华星光电半导体显示技术有限公司 | 拼接屏 |
| CN120112092B (zh) * | 2025-05-08 | 2025-09-30 | 合肥维信诺科技有限公司 | 显示面板、显示面板的制造方法及电子设备 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5187551A (en) * | 1988-04-30 | 1993-02-16 | Sharp Kabushiki Kaisha | Thin film semiconductor device and liquid crystal display apparatus thereof for preventing irradiated light from reaching the semiconductor layers |
| JP2635885B2 (ja) * | 1992-06-09 | 1997-07-30 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 薄膜トランジスタ及びアクティブマトリクス液晶表示装置 |
| US5461250A (en) * | 1992-08-10 | 1995-10-24 | International Business Machines Corporation | SiGe thin film or SOI MOSFET and method for making the same |
| KR0139573B1 (ko) * | 1994-12-26 | 1998-06-15 | 김주용 | 이중 채널 박막트랜지스터 및 그 제조방법 |
| KR100205306B1 (ko) * | 1995-12-26 | 1999-07-01 | 구본준 | 박막트랜지스터의 제조방법 |
| CN100373563C (zh) * | 1998-06-30 | 2008-03-05 | 东芝松下显示技术有限公司 | 顶栅型薄膜晶体管的制造方法 |
| JP3420201B2 (ja) * | 1999-12-22 | 2003-06-23 | 日本電気株式会社 | 液晶表示装置 |
| US7058283B2 (en) * | 2000-06-08 | 2006-06-06 | Sony Corporation | Magnetic tape tracking control apparatus and method, magnetic tape format, recording medium and program |
| JP2004343018A (ja) * | 2003-03-20 | 2004-12-02 | Fujitsu Ltd | 半導体装置及びその製造方法 |
| JP2005079560A (ja) * | 2003-09-04 | 2005-03-24 | Hitachi Ltd | 薄膜トランジスタ,表示装置、およびその製造方法 |
| KR100585410B1 (ko) * | 2003-11-11 | 2006-06-07 | 엘지.필립스 엘시디 주식회사 | 구동회로 일체형 액정표시장치의 스위칭 소자 및 구동소자및 그 제조방법 |
| CN100463193C (zh) * | 2006-11-03 | 2009-02-18 | 北京京东方光电科技有限公司 | 一种tft阵列结构及其制造方法 |
| KR101410926B1 (ko) * | 2007-02-16 | 2014-06-24 | 삼성전자주식회사 | 박막 트랜지스터 및 그 제조방법 |
| JP2008258345A (ja) * | 2007-04-04 | 2008-10-23 | Sony Corp | 薄膜トランジスタおよびその製造方法ならびに表示装置 |
| JP5245287B2 (ja) * | 2007-05-18 | 2013-07-24 | ソニー株式会社 | 半導体装置の製造方法、薄膜トランジスタ基板の製造方法および表示装置の製造方法 |
| KR101533098B1 (ko) * | 2008-06-04 | 2015-07-02 | 삼성디스플레이 주식회사 | 박막 트랜지스터 기판 및 그 제조 방법 |
| KR101929726B1 (ko) * | 2009-07-18 | 2018-12-14 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치의 제조 방법 |
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2009
- 2009-09-30 JP JP2009227013A patent/JP5532803B2/ja active Active
-
2010
- 2010-08-06 TW TW099126360A patent/TW201133859A/zh unknown
- 2010-09-08 CN CN201010275594.9A patent/CN102034873B/zh active Active
- 2010-09-14 KR KR1020100089849A patent/KR20110035891A/ko not_active Ceased
- 2010-09-21 US US12/886,983 patent/US20110073860A1/en not_active Abandoned