KR20110035891A - 반도체 디바이스 및 표시 장치 - Google Patents

반도체 디바이스 및 표시 장치 Download PDF

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Publication number
KR20110035891A
KR20110035891A KR1020100089849A KR20100089849A KR20110035891A KR 20110035891 A KR20110035891 A KR 20110035891A KR 1020100089849 A KR1020100089849 A KR 1020100089849A KR 20100089849 A KR20100089849 A KR 20100089849A KR 20110035891 A KR20110035891 A KR 20110035891A
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South Korea
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gate electrode
electrode
plan
view
edge
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KR1020100089849A
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English (en)
Korean (ko)
Inventor
미치히로 칸노
타카히로 카와무라
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소니 주식회사
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Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/031—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT]
    • H10D30/0312—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT] characterised by the gate electrodes
    • H10D30/0316—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT] characterised by the gate electrodes of lateral bottom-gate TFTs comprising only a single gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/031—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT]
    • H10D30/0321—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT] comprising silicon, e.g. amorphous silicon or polysilicon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6706—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device for preventing leakage current 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/6737—Thin-film transistors [TFT] characterised by the electrodes characterised by the electrode materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/674—Thin-film transistors [TFT] characterised by the active materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6757—Thin-film transistors [TFT] characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile

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  • Thin Film Transistor (AREA)
  • Liquid Crystal (AREA)
KR1020100089849A 2009-09-30 2010-09-14 반도체 디바이스 및 표시 장치 Ceased KR20110035891A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009227013A JP5532803B2 (ja) 2009-09-30 2009-09-30 半導体デバイスおよび表示装置
JPJP-P-2009-227013 2009-09-30

Publications (1)

Publication Number Publication Date
KR20110035891A true KR20110035891A (ko) 2011-04-06

Family

ID=43779296

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100089849A Ceased KR20110035891A (ko) 2009-09-30 2010-09-14 반도체 디바이스 및 표시 장치

Country Status (5)

Country Link
US (1) US20110073860A1 (enExample)
JP (1) JP5532803B2 (enExample)
KR (1) KR20110035891A (enExample)
CN (1) CN102034873B (enExample)
TW (1) TW201133859A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130104770A (ko) * 2012-03-15 2013-09-25 삼성디스플레이 주식회사 박막트랜지스터, 상기 박막트랜지스터를 포함하는 표시 장치 및 상기 박막트랜지스터를 포함하는 유기 발광 표시 장치
KR20190126270A (ko) * 2011-09-29 2019-11-11 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR20220019530A (ko) * 2020-08-10 2022-02-17 재단법인대구경북과학기술원 반도체 트랜지스터

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KR101952570B1 (ko) * 2011-05-13 2019-02-27 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제작 방법
JP6035734B2 (ja) * 2011-06-20 2016-11-30 ソニー株式会社 半導体素子、表示装置および電子機器
CN102254917B (zh) * 2011-07-07 2014-05-21 深圳市华星光电技术有限公司 薄膜晶体管阵列基板及其制法
CN202487578U (zh) 2012-03-27 2012-10-10 京东方科技集团股份有限公司 薄膜晶体管、阵列基板及显示装置
JP6001308B2 (ja) * 2012-04-17 2016-10-05 株式会社半導体エネルギー研究所 半導体装置
CN103943684B (zh) 2014-03-26 2017-09-29 京东方科技集团股份有限公司 薄膜晶体管及其制作方法、阵列基板、显示装置
CN104134699A (zh) * 2014-07-15 2014-11-05 京东方科技集团股份有限公司 一种薄膜晶体管、阵列基板及显示装置
US9468050B1 (en) * 2014-09-25 2016-10-11 X-Celeprint Limited Self-compensating circuit for faulty display pixels
US9799261B2 (en) 2014-09-25 2017-10-24 X-Celeprint Limited Self-compensating circuit for faulty display pixels
CN104409513A (zh) * 2014-11-05 2015-03-11 京东方科技集团股份有限公司 一种金属氧化物薄膜晶体管及其制备方法、阵列基板
US10255834B2 (en) 2015-07-23 2019-04-09 X-Celeprint Limited Parallel redundant chiplet system for controlling display pixels
JP6240692B2 (ja) * 2016-02-15 2017-11-29 株式会社ジャパンディスプレイ 表示装置および表示装置の製造方法
US9882064B2 (en) * 2016-03-10 2018-01-30 Semiconductor Energy Laboratory Co., Ltd. Transistor and electronic device
US10950705B2 (en) * 2017-02-15 2021-03-16 Sharp Kabushiki Kaisha Active matrix substrate
CN107895726A (zh) * 2017-11-30 2018-04-10 武汉天马微电子有限公司 一种阵列基板及其制作方法和显示装置
TWI717855B (zh) * 2019-10-05 2021-02-01 友達光電股份有限公司 畫素電路及顯示裝置
US11469195B2 (en) * 2020-09-24 2022-10-11 Nanya Technology Corporation Semiconductor device with tilted insulating layers and method for fabricating the same
CN114863828B (zh) * 2022-05-31 2023-07-25 武汉华星光电半导体显示技术有限公司 拼接屏
CN120112092B (zh) * 2025-05-08 2025-09-30 合肥维信诺科技有限公司 显示面板、显示面板的制造方法及电子设备

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US5187551A (en) * 1988-04-30 1993-02-16 Sharp Kabushiki Kaisha Thin film semiconductor device and liquid crystal display apparatus thereof for preventing irradiated light from reaching the semiconductor layers
JP2635885B2 (ja) * 1992-06-09 1997-07-30 インターナショナル・ビジネス・マシーンズ・コーポレイション 薄膜トランジスタ及びアクティブマトリクス液晶表示装置
US5461250A (en) * 1992-08-10 1995-10-24 International Business Machines Corporation SiGe thin film or SOI MOSFET and method for making the same
KR0139573B1 (ko) * 1994-12-26 1998-06-15 김주용 이중 채널 박막트랜지스터 및 그 제조방법
KR100205306B1 (ko) * 1995-12-26 1999-07-01 구본준 박막트랜지스터의 제조방법
CN100373563C (zh) * 1998-06-30 2008-03-05 东芝松下显示技术有限公司 顶栅型薄膜晶体管的制造方法
JP3420201B2 (ja) * 1999-12-22 2003-06-23 日本電気株式会社 液晶表示装置
US7058283B2 (en) * 2000-06-08 2006-06-06 Sony Corporation Magnetic tape tracking control apparatus and method, magnetic tape format, recording medium and program
JP2004343018A (ja) * 2003-03-20 2004-12-02 Fujitsu Ltd 半導体装置及びその製造方法
JP2005079560A (ja) * 2003-09-04 2005-03-24 Hitachi Ltd 薄膜トランジスタ，表示装置、およびその製造方法
KR100585410B1 (ko) * 2003-11-11 2006-06-07 엘지.필립스 엘시디 주식회사 구동회로 일체형 액정표시장치의 스위칭 소자 및 구동소자및 그 제조방법
CN100463193C (zh) * 2006-11-03 2009-02-18 北京京东方光电科技有限公司 一种tft阵列结构及其制造方法
KR101410926B1 (ko) * 2007-02-16 2014-06-24 삼성전자주식회사 박막 트랜지스터 및 그 제조방법
JP2008258345A (ja) * 2007-04-04 2008-10-23 Sony Corp 薄膜トランジスタおよびその製造方法ならびに表示装置
JP5245287B2 (ja) * 2007-05-18 2013-07-24 ソニー株式会社 半導体装置の製造方法、薄膜トランジスタ基板の製造方法および表示装置の製造方法
KR101533098B1 (ko) * 2008-06-04 2015-07-02 삼성디스플레이 주식회사 박막 트랜지스터 기판 및 그 제조 방법
KR101929726B1 (ko) * 2009-07-18 2018-12-14 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 반도체 장치의 제조 방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190126270A (ko) * 2011-09-29 2019-11-11 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR20130104770A (ko) * 2012-03-15 2013-09-25 삼성디스플레이 주식회사 박막트랜지스터, 상기 박막트랜지스터를 포함하는 표시 장치 및 상기 박막트랜지스터를 포함하는 유기 발광 표시 장치
KR20220019530A (ko) * 2020-08-10 2022-02-17 재단법인대구경북과학기술원 반도체 트랜지스터

Also Published As

Publication number Publication date
JP5532803B2 (ja) 2014-06-25
JP2011077283A (ja) 2011-04-14
TW201133859A (en) 2011-10-01
CN102034873A (zh) 2011-04-27
US20110073860A1 (en) 2011-03-31
CN102034873B (zh) 2014-04-16

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