JP2010534619A5 - - Google Patents
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- Publication number
- JP2010534619A5 JP2010534619A5 JP2010518587A JP2010518587A JP2010534619A5 JP 2010534619 A5 JP2010534619 A5 JP 2010534619A5 JP 2010518587 A JP2010518587 A JP 2010518587A JP 2010518587 A JP2010518587 A JP 2010518587A JP 2010534619 A5 JP2010534619 A5 JP 2010534619A5
- Authority
- JP
- Japan
- Prior art keywords
- silica
- produced
- pyrolysis
- average
- modified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical class O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 30
- 239000000377 silicon dioxide Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 7
- 239000003607 modifier Substances 0.000 claims description 5
- RSKGMYDENCAJEN-UHFFFAOYSA-N hexadecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCCCCCC[Si](OC)(OC)OC RSKGMYDENCAJEN-UHFFFAOYSA-N 0.000 claims description 4
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 2
- 238000012986 modification Methods 0.000 claims description 2
- 230000004048 modification Effects 0.000 claims description 2
- 238000000197 pyrolysis Methods 0.000 claims 5
- 229910021485 fumed silica Inorganic materials 0.000 claims 4
- 239000007788 liquid Substances 0.000 claims 2
- 239000011164 primary particle Substances 0.000 claims 2
- 230000008719 thickening Effects 0.000 claims 2
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 238000010348 incorporation Methods 0.000 claims 1
- 239000003973 paint Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 238000000518 rheometry Methods 0.000 claims 1
- 238000005979 thermal decomposition reaction Methods 0.000 claims 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 238000005507 spraying Methods 0.000 description 6
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 229910002016 Aerosil® 200 Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007035951A DE102007035951A1 (de) | 2007-07-30 | 2007-07-30 | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
| DE102007035951.0 | 2007-07-30 | ||
| PCT/EP2008/058435 WO2009015971A1 (en) | 2007-07-30 | 2008-07-01 | Surface-modified, pyrogenically prepared silicas |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010534619A JP2010534619A (ja) | 2010-11-11 |
| JP2010534619A5 true JP2010534619A5 (enExample) | 2014-02-13 |
| JP5484331B2 JP5484331B2 (ja) | 2014-05-07 |
Family
ID=39772907
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010518587A Active JP5484331B2 (ja) | 2007-07-30 | 2008-07-01 | 表面改質された、熱分解法で製造されたシリカ |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20100196243A1 (enExample) |
| EP (1) | EP2171002B1 (enExample) |
| JP (1) | JP5484331B2 (enExample) |
| CN (1) | CN101755015A (enExample) |
| DE (1) | DE102007035951A1 (enExample) |
| UA (1) | UA100697C2 (enExample) |
| WO (1) | WO2009015971A1 (enExample) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007035955A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
| DE102007035952A1 (de) * | 2007-07-30 | 2009-04-09 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
| WO2011000816A1 (de) | 2009-07-03 | 2011-01-06 | Basf Se | Nanokompositblends enthaltend polyamide und polyolefine |
| EP2456816A1 (de) | 2009-07-21 | 2012-05-30 | Basf Se | Nanokompositblends auf basis von polyamiden und polyarylenethersulfonen |
| WO2011134930A1 (de) | 2010-04-30 | 2011-11-03 | Basf Se | Langfaserverstärkte polyamide mit polyolefinen |
| WO2012022669A2 (de) | 2010-08-19 | 2012-02-23 | Basf Se | Nanocompositblends mit polyestern |
| WO2012168324A1 (de) * | 2011-06-09 | 2012-12-13 | Basf Se | Biologisch abbaubare polyestermischung |
| EP2935445B1 (en) * | 2012-12-21 | 2019-04-03 | 3M Innovative Properties Company | Composition comprising particulate flow aid |
| DE102013205347A1 (de) | 2013-03-26 | 2014-10-02 | Hilti Aktiengesellschaft | Additiv-Zusammensetzung für Amin-Härter, deren Verwendung sowie diese enthaltende Amin-Härterzusammensetzung |
| EP3178887B1 (en) * | 2015-12-09 | 2018-06-20 | Evonik Degussa GmbH | Hydrophobic silica for electrophotographic toner composition |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| TWI733723B (zh) | 2015-12-18 | 2021-07-21 | 德商何瑞斯廓格拉斯公司 | 不透明石英玻璃體的製備 |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| CN108698894A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在多腔式烘箱中制备石英玻璃体 |
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| KR20180095619A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 실리카 유리 제조 동안 규소 함량의 증가 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| CN112638490B (zh) | 2018-06-15 | 2023-01-03 | 格雷斯公司 | 消泡剂活性物质、其制造方法和消泡制剂 |
| EP3954743A1 (de) | 2020-08-12 | 2022-02-16 | Evonik Operations GmbH | Verwendung von siliziumdioxid zur verbesserung der leitfähigkeit von beschichtungen |
| CN115838176A (zh) * | 2022-08-18 | 2023-03-24 | 杭州应星新材料有限公司 | 一种硅油处理的疏水二氧化硅制备方法及二氧化硅 |
| CN115806746B (zh) * | 2022-08-18 | 2024-11-15 | 杭州应星新材料有限公司 | 一种等离子体原位聚合硅油改性二氧化硅的方法及应用 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5989768A (en) * | 1997-03-06 | 1999-11-23 | Cabot Corporation | Charge-modified metal oxides with cyclic silazane and electrostatographic systems incorporating same |
| JP4372331B2 (ja) * | 2000-11-07 | 2009-11-25 | 電気化学工業株式会社 | シリカ微粉の表面改質法 |
| DE10132943A1 (de) * | 2001-07-06 | 2003-01-23 | Degussa | Silanmodifizierter oxidischer oder silikatischer Füllstoff, Verfahren zu dessen Herstellung und dessen Verwendung |
| DE10145162A1 (de) * | 2001-09-13 | 2003-04-10 | Wacker Chemie Gmbh | Kieselsäure mit geringem Gehalt an Kieselsäure-Silanolgruppen |
| DE10150274A1 (de) * | 2001-10-12 | 2003-04-30 | Wacker Chemie Gmbh | Kieselsäure mit homogener Silyliermittelschicht |
| DE10151478C1 (de) * | 2001-10-18 | 2003-03-13 | Wacker Chemie Gmbh | Mit Aminogruppen oberflächenmodifizierte Feststoffe, Verfahren zu deren Herstellung und deren Verwendung |
| DE10239424A1 (de) * | 2002-08-28 | 2004-03-11 | Degussa Ag | Kieselsäuren |
| EP1431245A1 (de) * | 2002-12-17 | 2004-06-23 | Degussa-Hüls Aktiengesellschaft | Oberflächenmodifizierte, aerogelartige, strukturierte Kieselsäure |
| DE10260323A1 (de) * | 2002-12-20 | 2004-07-08 | Wacker-Chemie Gmbh | Wasserbenetzbare silylierte Metalloxide |
| US8034173B2 (en) * | 2003-12-18 | 2011-10-11 | Evonik Degussa Gmbh | Processing compositions and method of forming the same |
| DE102004029073A1 (de) * | 2004-06-16 | 2005-12-29 | Degussa Ag | Lackformulierung mit verbesserten rheologischen Eigenschaften |
| DE102005001409A1 (de) * | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver und dieses Pulver enthaltene Silikondichtmasse |
| DE102005001408A1 (de) * | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver |
| DE102007035952A1 (de) * | 2007-07-30 | 2009-04-09 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
| DE102007035955A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
-
2007
- 2007-07-30 DE DE102007035951A patent/DE102007035951A1/de not_active Ceased
-
2008
- 2008-07-01 CN CN200880025235A patent/CN101755015A/zh active Pending
- 2008-07-01 US US12/670,130 patent/US20100196243A1/en not_active Abandoned
- 2008-07-01 JP JP2010518587A patent/JP5484331B2/ja active Active
- 2008-07-01 UA UAA201002024A patent/UA100697C2/uk unknown
- 2008-07-01 EP EP08774581.6A patent/EP2171002B1/en active Active
- 2008-07-01 WO PCT/EP2008/058435 patent/WO2009015971A1/en not_active Ceased
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