JP2010527152A5 - - Google Patents

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Publication number
JP2010527152A5
JP2010527152A5 JP2010507574A JP2010507574A JP2010527152A5 JP 2010527152 A5 JP2010527152 A5 JP 2010527152A5 JP 2010507574 A JP2010507574 A JP 2010507574A JP 2010507574 A JP2010507574 A JP 2010507574A JP 2010527152 A5 JP2010527152 A5 JP 2010527152A5
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JP
Japan
Prior art keywords
chamber
substrate
substrate support
arcuate surface
support
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JP2010507574A
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English (en)
Japanese (ja)
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JP5427171B2 (ja
JP2010527152A (ja
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Priority claimed from US11/745,451 external-priority patent/US8435379B2/en
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Publication of JP2010527152A5 publication Critical patent/JP2010527152A5/ja
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Publication of JP5427171B2 publication Critical patent/JP5427171B2/ja
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JP2010507574A 2007-05-08 2008-05-02 洗浄チャンバ及び前記洗浄チャンバのための天井電極 Active JP5427171B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/745,451 2007-05-08
US11/745,451 US8435379B2 (en) 2007-05-08 2007-05-08 Substrate cleaning chamber and cleaning and conditioning methods
PCT/US2008/062541 WO2008140982A1 (en) 2007-05-08 2008-05-02 Substrate cleaning chamber and cleaning and conditioning methods

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012134438A Division JP5437445B2 (ja) 2007-05-08 2012-06-14 基板洗浄チャンバ、洗浄及びコンディショニング方法

Publications (3)

Publication Number Publication Date
JP2010527152A JP2010527152A (ja) 2010-08-05
JP2010527152A5 true JP2010527152A5 (enExample) 2011-06-23
JP5427171B2 JP5427171B2 (ja) 2014-02-26

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ID=39968423

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2010507574A Active JP5427171B2 (ja) 2007-05-08 2008-05-02 洗浄チャンバ及び前記洗浄チャンバのための天井電極
JP2012134438A Active JP5437445B2 (ja) 2007-05-08 2012-06-14 基板洗浄チャンバ、洗浄及びコンディショニング方法

Family Applications After (1)

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JP2012134438A Active JP5437445B2 (ja) 2007-05-08 2012-06-14 基板洗浄チャンバ、洗浄及びコンディショニング方法

Country Status (6)

Country Link
US (2) US8435379B2 (enExample)
JP (2) JP5427171B2 (enExample)
KR (2) KR101490117B1 (enExample)
CN (2) CN101680105B (enExample)
TW (2) TWI433215B (enExample)
WO (1) WO2008140982A1 (enExample)

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CN111074236A (zh) * 2019-12-27 2020-04-28 重庆康佳光电技术研究院有限公司 一种化学气相沉积装置
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KR102861407B1 (ko) * 2020-06-19 2025-09-18 에이에스엠 아이피 홀딩 비.브이. 다중 스테이지 기판 처리 시스템
JP7519822B2 (ja) * 2020-06-19 2024-07-22 東京エレクトロン株式会社 収納モジュール、基板処理システムおよび消耗部材の搬送方法
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