JP2010505735A5 - - Google Patents

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Publication number
JP2010505735A5
JP2010505735A5 JP2009531812A JP2009531812A JP2010505735A5 JP 2010505735 A5 JP2010505735 A5 JP 2010505735A5 JP 2009531812 A JP2009531812 A JP 2009531812A JP 2009531812 A JP2009531812 A JP 2009531812A JP 2010505735 A5 JP2010505735 A5 JP 2010505735A5
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JP
Japan
Prior art keywords
suspension
suspension according
cerium
solution
average size
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JP2009531812A
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English (en)
Japanese (ja)
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JP2010505735A (ja
JP5586229B2 (ja
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Priority claimed from FR0608838A external-priority patent/FR2906800B1/fr
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JP2009531812A 2006-10-09 2007-10-04 酸化セリウム粒子の液体懸濁物及び粉末、その製造方法並びに研磨におけるその使用 Active JP5586229B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0608838A FR2906800B1 (fr) 2006-10-09 2006-10-09 Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utilisation dans le polissage
FR0608838 2006-10-09
PCT/EP2007/060549 WO2008043703A2 (fr) 2006-10-09 2007-10-04 Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utilisation dans le polissage

Publications (3)

Publication Number Publication Date
JP2010505735A JP2010505735A (ja) 2010-02-25
JP2010505735A5 true JP2010505735A5 (enExample) 2014-03-13
JP5586229B2 JP5586229B2 (ja) 2014-09-10

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JP2009531812A Active JP5586229B2 (ja) 2006-10-09 2007-10-04 酸化セリウム粒子の液体懸濁物及び粉末、その製造方法並びに研磨におけるその使用

Country Status (9)

Country Link
US (1) US8317888B2 (enExample)
EP (1) EP2081871B1 (enExample)
JP (1) JP5586229B2 (enExample)
KR (4) KR101475174B1 (enExample)
CN (2) CN102627310B (enExample)
ES (1) ES2628504T3 (enExample)
FR (1) FR2906800B1 (enExample)
TW (1) TWI367863B (enExample)
WO (1) WO2008043703A2 (enExample)

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JP5590144B2 (ja) 2010-11-22 2014-09-17 日立化成株式会社 スラリー、研磨液セット、研磨液、及び、基板の研磨方法
WO2013125445A1 (ja) 2012-02-21 2013-08-29 日立化成株式会社 研磨剤、研磨剤セット及び基体の研磨方法
SG11201405091TA (en) 2012-02-21 2014-09-26 Hitachi Chemical Co Ltd Polishing agent, polishing agent set, and substrate polishing method
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WO2015091495A1 (en) 2013-12-16 2015-06-25 Rhodia Operations Liquid suspension of cerium oxide particles
RU2563015C2 (ru) * 2014-01-30 2015-09-10 Общество с ограниченной ответственностью "Научно-производственная компания "Русредмет"(ООО НПК"Русредмет") Способ выделения церия из нитратных растворов, содержащих сумму редкоземельных элементов
JP6169120B2 (ja) * 2014-03-13 2017-07-26 第一稀元素化学工業株式会社 セリウム含有溶液及びその製造方法
TW201822886A (zh) * 2014-06-24 2018-07-01 法商羅地亞經營管理公司 金屬摻雜氧化鈰組合物
KR101773543B1 (ko) 2015-06-30 2017-09-01 유비머트리얼즈주식회사 연마 입자, 연마 슬러리 및 연마 입자의 제조 방법
JP6991964B2 (ja) 2015-09-23 2022-01-13 ローディア オペレーションズ 疎水的に改質された酸化セリウム粒子およびそれらの使用
FR3041528A1 (fr) * 2015-09-25 2017-03-31 Rhodia Operations Composition cosmetique photoprotectrice
FR3047736A1 (fr) * 2016-02-17 2017-08-18 Rhodia Operations Composition de peinture formulee en phase aqueuse
FR3047737A1 (fr) 2016-02-17 2017-08-18 Rhodia Operations Composition fluide pour proteger le bois
JP2017228576A (ja) * 2016-06-20 2017-12-28 日立化成株式会社 研磨液及び研磨方法
EP3548436A1 (fr) 2016-12-02 2019-10-09 Rhodia Operations Suspension d'oxyde de cerium
JP6827318B2 (ja) * 2016-12-28 2021-02-10 花王株式会社 酸化セリウム砥粒
WO2018229005A1 (en) 2017-06-15 2018-12-20 Rhodia Operations Cerium based particles
FR3074162A1 (fr) 2017-11-24 2019-05-31 Rhodia Operations Particules d'oxyde de cerium / silice
JP6939741B2 (ja) * 2018-08-31 2021-09-22 信越化学工業株式会社 希土類化合物粒子の製造方法
US11814547B2 (en) 2018-09-28 2023-11-14 Kao Corporation Polishing liquid composition for silicon oxide film
KR102282872B1 (ko) * 2019-11-11 2021-07-28 주식회사 켐톤 세륨 산화물 입자의 제조방법, 연마입자 및 이를 포함하는 연마용 슬러리 조성물
EP4065659A1 (en) * 2019-11-26 2022-10-05 Rhodia Operations Cerium based particles, process for producing the same and uses thereof in polishing
CN114599754B (zh) 2019-11-26 2024-09-13 罗地亚经营管理公司 基于铈的核-壳颗粒的液体分散体和粉末、其生产方法及其在抛光中的用途
CN114671451A (zh) * 2020-12-25 2022-06-28 安集微电子（上海）有限公司 一种氧化铈的合成方法及其使用方法
IL305292A (en) 2021-03-12 2023-10-01 Rhodia Operations Cerium oxide particles, making process thereof and use thereof in chemical mechanical polishing
JP2024513308A (ja) 2021-03-12 2024-03-25 ローディア オペレーションズ 酸化セリウム粒子、その製造プロセス及び化学機械研磨でのその使用
JP7511105B2 (ja) 2021-03-26 2024-07-05 Ａｇｃ株式会社 化学強化ガラス及び化学強化ガラスの製造方法
IL308442A (en) 2021-05-17 2024-01-01 Rhodia Operations Liquid and powder dispersion of cerium-based shell-core particles, a process for their production and their uses in polishing
US12480009B2 (en) * 2021-07-30 2025-11-25 Xheme Inc. Nanoporous cerium oxide nanoparticle macro-structure
KR102679084B1 (ko) 2021-08-30 2024-06-27 주식회사 케이씨텍 산화세륨 연마입자 및 연마 슬러리 조성물
KR20240138088A (ko) 2022-01-28 2024-09-20 에이지씨 가부시키가이샤 연마제, 연마제용 첨가액 및 연마 방법
CN119768483A (zh) 2022-09-07 2025-04-04 Ａｇｃ株式会社 研磨剂、研磨剂用添加液和研磨方法
CN115403063B (zh) * 2022-09-30 2024-08-06 深圳市聚芯半导体材料有限公司 一种二氧化铈颗粒及其制备方法和应用
CN120282859A (zh) 2022-10-20 2025-07-08 Ａｇｃ株式会社 研磨方法和半导体部件的制造方法
CN118725745A (zh) * 2023-03-31 2024-10-01 华为技术有限公司 分散液及其应用
WO2025131949A1 (en) 2023-12-18 2025-06-26 Specialty Operations France Composition comprising sulfide solid material comprising alkali metal, p, s and halogen elements
WO2025133363A1 (en) 2023-12-21 2025-06-26 Specialty Operations France Compositions comprising cerium oxide/polyoxometalate particles and ion exchange polymer, and their use in proton exchange membranes or electrocatalyst layers
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WO2025190482A1 (en) * 2024-03-13 2025-09-18 Rhodia Operations Cerium oxide particles with cotrolled microstructure
CN120864546A (zh) * 2025-09-25 2025-10-31 包头稀土研究院 降低纳米氧化铈的松装密度的方法

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