JP5586229B2 - 酸化セリウム粒子の液体懸濁物及び粉末、その製造方法並びに研磨におけるその使用 - Google Patents

酸化セリウム粒子の液体懸濁物及び粉末、その製造方法並びに研磨におけるその使用 Download PDF

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JP5586229B2
JP5586229B2 JP2009531812A JP2009531812A JP5586229B2 JP 5586229 B2 JP5586229 B2 JP 5586229B2 JP 2009531812 A JP2009531812 A JP 2009531812A JP 2009531812 A JP2009531812 A JP 2009531812A JP 5586229 B2 JP5586229 B2 JP 5586229B2
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suspension
cerium
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particles
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JP2010505735A5 (enExample
JP2010505735A (ja
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クリニエール,ギヨーム
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ロデイア・オペラシヨン
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00Compounds of rare earth metals
    • C01F17/20Compounds containing only rare earth metals as the metal element
    • C01F17/206Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224Oxides or hydroxides of lanthanides
    • C01F17/235Cerium oxides or hydroxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1454Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463Aqueous liquid suspensions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1436Composite particles, e.g. coated particles
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/01Particle morphology depicted by an image
    • C01P2004/04Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/50Agglomerated particles
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/51Particles with a specific particle size distribution
    • C01P2004/52Particles with a specific particle size distribution highly monodisperse size distribution
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/62Submicrometer sized, i.e. from 0.1-1 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Catalysts (AREA)
JP2009531812A 2006-10-09 2007-10-04 酸化セリウム粒子の液体懸濁物及び粉末、その製造方法並びに研磨におけるその使用 Active JP5586229B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0608838A FR2906800B1 (fr) 2006-10-09 2006-10-09 Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utilisation dans le polissage
FR0608838 2006-10-09
PCT/EP2007/060549 WO2008043703A2 (fr) 2006-10-09 2007-10-04 Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utilisation dans le polissage

Publications (3)

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JP2010505735A JP2010505735A (ja) 2010-02-25
JP2010505735A5 JP2010505735A5 (enExample) 2014-03-13
JP5586229B2 true JP5586229B2 (ja) 2014-09-10

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US (1) US8317888B2 (enExample)
EP (1) EP2081871B1 (enExample)
JP (1) JP5586229B2 (enExample)
KR (4) KR101475174B1 (enExample)
CN (2) CN102627310B (enExample)
ES (1) ES2628504T3 (enExample)
FR (1) FR2906800B1 (enExample)
TW (1) TWI367863B (enExample)
WO (1) WO2008043703A2 (enExample)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009077412A2 (en) * 2007-12-14 2009-06-25 Akzo Nobel N.V. Aqueous slurry comprising inorganic oxygen-containing particulates
TWI476153B (zh) * 2008-02-12 2015-03-11 Saint Gobain Ceramics 氧化鈰材料及生成其之方法
FR2935145B1 (fr) * 2008-08-22 2010-09-03 Rhodia Operations Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utlisation dans le polissage
JP5499556B2 (ja) * 2008-11-11 2014-05-21 日立化成株式会社 スラリ及び研磨液セット並びにこれらから得られるcmp研磨液を用いた基板の研磨方法及び基板
JP5317118B2 (ja) * 2009-07-29 2013-10-16 花王株式会社 ポリフェノールの定量法
KR101075966B1 (ko) * 2010-03-09 2011-10-21 주식회사 엘지화학 결정성 산화세륨 및 이의 제조 방법
US9982177B2 (en) 2010-03-12 2018-05-29 Hitachi Chemical Company, Ltd Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same
KR20130129400A (ko) 2010-11-22 2013-11-28 히타치가세이가부시끼가이샤 슬러리, 연마액 세트, 연마액, 기판의 연마 방법 및 기판
JP5590144B2 (ja) 2010-11-22 2014-09-17 日立化成株式会社 スラリー、研磨液セット、研磨液、及び、基板の研磨方法
WO2013125445A1 (ja) 2012-02-21 2013-08-29 日立化成株式会社 研磨剤、研磨剤セット及び基体の研磨方法
SG11201405091TA (en) 2012-02-21 2014-09-26 Hitachi Chemical Co Ltd Polishing agent, polishing agent set, and substrate polishing method
KR102034330B1 (ko) 2012-05-22 2019-10-18 히타치가세이가부시끼가이샤 슬러리, 연마액 세트, 연마액, 기체의 연마 방법 및 기체
CN104334675B (zh) 2012-05-22 2016-10-26 日立化成株式会社 悬浮液、研磨液套剂、研磨液、基体的研磨方法及基体
SG11201407086TA (en) 2012-05-22 2015-02-27 Hitachi Chemical Co Ltd Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
KR102034328B1 (ko) * 2012-05-22 2019-10-18 히타치가세이가부시끼가이샤 슬러리, 연마액 세트, 연마액, 기체의 연마 방법 및 기체
WO2015091495A1 (en) 2013-12-16 2015-06-25 Rhodia Operations Liquid suspension of cerium oxide particles
RU2563015C2 (ru) * 2014-01-30 2015-09-10 Общество с ограниченной ответственностью "Научно-производственная компания "Русредмет"(ООО НПК"Русредмет") Способ выделения церия из нитратных растворов, содержащих сумму редкоземельных элементов
JP6169120B2 (ja) * 2014-03-13 2017-07-26 第一稀元素化学工業株式会社 セリウム含有溶液及びその製造方法
TW201822886A (zh) * 2014-06-24 2018-07-01 法商羅地亞經營管理公司 金屬摻雜氧化鈰組合物
KR101773543B1 (ko) 2015-06-30 2017-09-01 유비머트리얼즈주식회사 연마 입자, 연마 슬러리 및 연마 입자의 제조 방법
JP6991964B2 (ja) 2015-09-23 2022-01-13 ローディア オペレーションズ 疎水的に改質された酸化セリウム粒子およびそれらの使用
FR3041528A1 (fr) * 2015-09-25 2017-03-31 Rhodia Operations Composition cosmetique photoprotectrice
FR3047736A1 (fr) * 2016-02-17 2017-08-18 Rhodia Operations Composition de peinture formulee en phase aqueuse
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JP2017228576A (ja) * 2016-06-20 2017-12-28 日立化成株式会社 研磨液及び研磨方法
EP3548436A1 (fr) 2016-12-02 2019-10-09 Rhodia Operations Suspension d'oxyde de cerium
JP6827318B2 (ja) * 2016-12-28 2021-02-10 花王株式会社 酸化セリウム砥粒
WO2018229005A1 (en) 2017-06-15 2018-12-20 Rhodia Operations Cerium based particles
FR3074162A1 (fr) 2017-11-24 2019-05-31 Rhodia Operations Particules d'oxyde de cerium / silice
JP6939741B2 (ja) * 2018-08-31 2021-09-22 信越化学工業株式会社 希土類化合物粒子の製造方法
US11814547B2 (en) 2018-09-28 2023-11-14 Kao Corporation Polishing liquid composition for silicon oxide film
KR102282872B1 (ko) * 2019-11-11 2021-07-28 주식회사 켐톤 세륨 산화물 입자의 제조방법, 연마입자 및 이를 포함하는 연마용 슬러리 조성물
EP4065659A1 (en) * 2019-11-26 2022-10-05 Rhodia Operations Cerium based particles, process for producing the same and uses thereof in polishing
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CN114671451A (zh) * 2020-12-25 2022-06-28 安集微电子(上海)有限公司 一种氧化铈的合成方法及其使用方法
IL305292A (en) 2021-03-12 2023-10-01 Rhodia Operations Cerium oxide particles, making process thereof and use thereof in chemical mechanical polishing
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IL308442A (en) 2021-05-17 2024-01-01 Rhodia Operations Liquid and powder dispersion of cerium-based shell-core particles, a process for their production and their uses in polishing
US12480009B2 (en) * 2021-07-30 2025-11-25 Xheme Inc. Nanoporous cerium oxide nanoparticle macro-structure
KR102679084B1 (ko) 2021-08-30 2024-06-27 주식회사 케이씨텍 산화세륨 연마입자 및 연마 슬러리 조성물
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CN119768483A (zh) 2022-09-07 2025-04-04 Agc株式会社 研磨剂、研磨剂用添加液和研磨方法
CN115403063B (zh) * 2022-09-30 2024-08-06 深圳市聚芯半导体材料有限公司 一种二氧化铈颗粒及其制备方法和应用
CN120282859A (zh) 2022-10-20 2025-07-08 Agc株式会社 研磨方法和半导体部件的制造方法
CN118725745A (zh) * 2023-03-31 2024-10-01 华为技术有限公司 分散液及其应用
WO2025131949A1 (en) 2023-12-18 2025-06-26 Specialty Operations France Composition comprising sulfide solid material comprising alkali metal, p, s and halogen elements
WO2025133363A1 (en) 2023-12-21 2025-06-26 Specialty Operations France Compositions comprising cerium oxide/polyoxometalate particles and ion exchange polymer, and their use in proton exchange membranes or electrocatalyst layers
WO2025132262A1 (en) 2023-12-21 2025-06-26 Rhodia Operations Aqueous dispersion comprising particles of cerium oxide with adsorbed polyoxometalates species thereon, process for producing the same and use thereof in polishing
WO2025190482A1 (en) * 2024-03-13 2025-09-18 Rhodia Operations Cerium oxide particles with cotrolled microstructure
CN120864546A (zh) * 2025-09-25 2025-10-31 包头稀土研究院 降低纳米氧化铈的松装密度的方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2617153B1 (fr) * 1987-06-26 1991-04-05 Rhone Poulenc Chimie Procede d'obtention d'un oxyde cerique et oxyde cerique a nouvelles caracteristiques morphologiques
JP2746861B2 (ja) * 1995-11-20 1998-05-06 三井金属鉱業株式会社 酸化セリウム超微粒子の製造方法
US5962343A (en) * 1996-07-30 1999-10-05 Nissan Chemical Industries, Ltd. Process for producing crystalline ceric oxide particles and abrasive
US6045716A (en) * 1997-03-12 2000-04-04 Strasbaugh Chemical mechanical polishing apparatus and method
SG72802A1 (en) * 1997-04-28 2000-05-23 Seimi Chem Kk Polishing agent for semiconductor and method for its production
GB9903519D0 (en) * 1999-02-16 1999-04-07 Europ Economic Community Precipitation process
JP4544379B2 (ja) * 1999-06-28 2010-09-15 日産化学工業株式会社 ガラス製ハードディスク用研磨剤
WO2001000744A1 (en) * 1999-06-28 2001-01-04 Nissan Chemical Industries, Ltd. Abrasive compound for glass hard disk platter
JP2003257910A (ja) * 2001-12-28 2003-09-12 Fujikoshi Mach Corp 基板における銅層の研磨方法
US7431758B2 (en) * 2002-10-28 2008-10-07 Nissan Chemical Industries, Ltd. Cerium oxide particles and production method therefor
DE10251029A1 (de) * 2002-11-02 2004-05-19 Degussa Ag Pyrogen hergestelltes Ceroxid
US8685123B2 (en) * 2005-10-14 2014-04-01 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material

Also Published As

Publication number Publication date
WO2008043703A2 (fr) 2008-04-17
KR20130045954A (ko) 2013-05-06
US8317888B2 (en) 2012-11-27
JP2010505735A (ja) 2010-02-25
ES2628504T3 (es) 2017-08-03
CN101522567B (zh) 2014-06-04
KR20090064566A (ko) 2009-06-19
CN102627310B (zh) 2017-06-20
FR2906800B1 (fr) 2008-11-28
US20100072417A1 (en) 2010-03-25
TW200831412A (en) 2008-08-01
EP2081871A2 (fr) 2009-07-29
CN101522567A (zh) 2009-09-02
FR2906800A1 (fr) 2008-04-11
KR20130140228A (ko) 2013-12-23
KR101139110B1 (ko) 2012-07-05
WO2008043703A3 (fr) 2008-08-14
CN102627310A (zh) 2012-08-08
KR101475174B1 (ko) 2014-12-22
TWI367863B (en) 2012-07-11
EP2081871B1 (fr) 2017-05-03
KR20120030575A (ko) 2012-03-28

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