JP5586229B2 - 酸化セリウム粒子の液体懸濁物及び粉末、その製造方法並びに研磨におけるその使用 - Google Patents

酸化セリウム粒子の液体懸濁物及び粉末、その製造方法並びに研磨におけるその使用 Download PDF

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JP5586229B2
JP5586229B2 JP2009531812A JP2009531812A JP5586229B2 JP 5586229 B2 JP5586229 B2 JP 5586229B2 JP 2009531812 A JP2009531812 A JP 2009531812A JP 2009531812 A JP2009531812 A JP 2009531812A JP 5586229 B2 JP5586229 B2 JP 5586229B2
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suspension
cerium
solution
suspension according
particles
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JP2010505735A5 (enExample
JP2010505735A (ja
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クリニエール,ギヨーム
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ロデイア・オペラシヨン
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C01F17/235—Cerium oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/50—Agglomerated particles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/51—Particles with a specific particle size distribution
    • C01P2004/52—Particles with a specific particle size distribution highly monodisperse size distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Catalysts (AREA)
JP2009531812A 2006-10-09 2007-10-04 酸化セリウム粒子の液体懸濁物及び粉末、その製造方法並びに研磨におけるその使用 Active JP5586229B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0608838A FR2906800B1 (fr) 2006-10-09 2006-10-09 Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utilisation dans le polissage
FR0608838 2006-10-09
PCT/EP2007/060549 WO2008043703A2 (fr) 2006-10-09 2007-10-04 Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utilisation dans le polissage

Publications (3)

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JP2010505735A JP2010505735A (ja) 2010-02-25
JP2010505735A5 JP2010505735A5 (enExample) 2014-03-13
JP5586229B2 true JP5586229B2 (ja) 2014-09-10

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US (1) US8317888B2 (enExample)
EP (1) EP2081871B1 (enExample)
JP (1) JP5586229B2 (enExample)
KR (4) KR20130045954A (enExample)
CN (2) CN102627310B (enExample)
ES (1) ES2628504T3 (enExample)
FR (1) FR2906800B1 (enExample)
TW (1) TWI367863B (enExample)
WO (1) WO2008043703A2 (enExample)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009077412A2 (en) * 2007-12-14 2009-06-25 Akzo Nobel N.V. Aqueous slurry comprising inorganic oxygen-containing particulates
KR101216373B1 (ko) 2008-02-12 2012-12-28 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 세리아 재료 및 그 형성 방법
FR2935145B1 (fr) * 2008-08-22 2010-09-03 Rhodia Operations Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utlisation dans le polissage
JP5499556B2 (ja) * 2008-11-11 2014-05-21 日立化成株式会社 スラリ及び研磨液セット並びにこれらから得られるcmp研磨液を用いた基板の研磨方法及び基板
JP5317118B2 (ja) * 2009-07-29 2013-10-16 花王株式会社 ポリフェノールの定量法
KR101075966B1 (ko) * 2010-03-09 2011-10-21 주식회사 엘지화학 결정성 산화세륨 및 이의 제조 방법
WO2011111421A1 (ja) 2010-03-12 2011-09-15 日立化成工業株式会社 スラリ、研磨液セット、研磨液及びこれらを用いた基板の研磨方法
JP5590144B2 (ja) 2010-11-22 2014-09-17 日立化成株式会社 スラリー、研磨液セット、研磨液、及び、基板の研磨方法
KR20130129400A (ko) 2010-11-22 2013-11-28 히타치가세이가부시끼가이샤 슬러리, 연마액 세트, 연마액, 기판의 연마 방법 및 기판
CN104137232A (zh) 2012-02-21 2014-11-05 日立化成株式会社 研磨剂、研磨剂组和基体的研磨方法
KR102004570B1 (ko) 2012-02-21 2019-07-26 히타치가세이가부시끼가이샤 연마제, 연마제 세트 및 기체의 연마 방법
KR102034328B1 (ko) 2012-05-22 2019-10-18 히타치가세이가부시끼가이샤 슬러리, 연마액 세트, 연마액, 기체의 연마 방법 및 기체
US10557059B2 (en) 2012-05-22 2020-02-11 Hitachi Chemical Company, Ltd. Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
US9346978B2 (en) 2012-05-22 2016-05-24 Hitachi Chemical Company, Ltd. Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
KR102034331B1 (ko) * 2012-05-22 2019-10-18 히타치가세이가부시끼가이샤 슬러리, 연마액 세트, 연마액, 기체의 연마 방법 및 기체
KR102367577B1 (ko) * 2013-12-16 2022-02-25 로디아 오퍼레이션스 세륨 옥사이드 입자의 액체 현탁액
RU2563015C2 (ru) * 2014-01-30 2015-09-10 Общество с ограниченной ответственностью "Научно-производственная компания "Русредмет"(ООО НПК"Русредмет") Способ выделения церия из нитратных растворов, содержащих сумму редкоземельных элементов
JP6169120B2 (ja) * 2014-03-13 2017-07-26 第一稀元素化学工業株式会社 セリウム含有溶液及びその製造方法
EP3160905B1 (en) 2014-06-24 2021-02-24 Rhodia Operations Metal doped cerium oxide compositions
KR101773543B1 (ko) 2015-06-30 2017-09-01 유비머트리얼즈주식회사 연마 입자, 연마 슬러리 및 연마 입자의 제조 방법
US20180282548A1 (en) 2015-09-23 2018-10-04 Rhodia Operations Hydrophobically-modified cerium oxide particles and uses thereof
FR3041528A1 (fr) * 2015-09-25 2017-03-31 Rhodia Operations Composition cosmetique photoprotectrice
FR3047736A1 (fr) * 2016-02-17 2017-08-18 Rhodia Operations Composition de peinture formulee en phase aqueuse
FR3047737A1 (fr) 2016-02-17 2017-08-18 Rhodia Operations Composition fluide pour proteger le bois
JP2017228576A (ja) * 2016-06-20 2017-12-28 日立化成株式会社 研磨液及び研磨方法
CN110214126A (zh) 2016-12-02 2019-09-06 罗地亚经营管理公司 氧化铈的悬浮液
JP6827318B2 (ja) * 2016-12-28 2021-02-10 花王株式会社 酸化セリウム砥粒
KR102539028B1 (ko) 2017-06-15 2023-06-02 로디아 오퍼레이션스 세륨 기반 입자
FR3074162A1 (fr) 2017-11-24 2019-05-31 Rhodia Operations Particules d'oxyde de cerium / silice
JP6939741B2 (ja) * 2018-08-31 2021-09-22 信越化学工業株式会社 希土類化合物粒子の製造方法
WO2020066786A1 (ja) 2018-09-28 2020-04-02 花王株式会社 酸化珪素膜用研磨液組成物
KR102282872B1 (ko) * 2019-11-11 2021-07-28 주식회사 켐톤 세륨 산화물 입자의 제조방법, 연마입자 및 이를 포함하는 연마용 슬러리 조성물
IL292962A (en) * 2019-11-26 2022-07-01 Rhodia Operations Cerium-based particles, a process for their production and use in polishing
WO2021105169A1 (en) 2019-11-26 2021-06-03 Rhodia Operations Liquid dispersion and powder of cerium based core-shell particles, process for producing the same and uses thereof in polishing
CN114671451A (zh) * 2020-12-25 2022-06-28 安集微电子(上海)有限公司 一种氧化铈的合成方法及其使用方法
EP4304984A1 (en) 2021-03-12 2024-01-17 Rhodia Operations Cerium oxide particles, making process thereof and use thereof in chemical mechanical polishing
CN116981752A (zh) 2021-03-12 2023-10-31 罗地亚经营管理公司 氧化铈粒子、其制造方法及其在化学机械研磨中的用途
JP7511105B2 (ja) 2021-03-26 2024-07-05 Agc株式会社 化学強化ガラス及び化学強化ガラスの製造方法
TWI920315B (zh) 2021-05-17 2026-04-01 法商羅地亞經營管理公司 基於鈰的核-殼顆粒的液體分散體和粉末、其生產方法及其在拋光中之用途
US12480009B2 (en) 2021-07-30 2025-11-25 Xheme Inc. Nanoporous cerium oxide nanoparticle macro-structure
KR102679084B1 (ko) 2021-08-30 2024-06-27 주식회사 케이씨텍 산화세륨 연마입자 및 연마 슬러리 조성물
US12534630B2 (en) 2022-01-26 2026-01-27 Xheme, Inc. Nanoporous cerium oxide nanoparticle macro-structures in paints and coatings
JPWO2023145572A1 (enExample) 2022-01-28 2023-08-03
CN119768483A (zh) 2022-09-07 2025-04-04 Agc株式会社 研磨剂、研磨剂用添加液和研磨方法
CN115403063B (zh) * 2022-09-30 2024-08-06 深圳市聚芯半导体材料有限公司 一种二氧化铈颗粒及其制备方法和应用
KR20250091253A (ko) 2022-10-20 2025-06-20 에이지씨 가부시키가이샤 연마 방법 및 반도체 부품의 제조 방법
CN118725745A (zh) * 2023-03-31 2024-10-01 华为技术有限公司 分散液及其应用
DE112024003049T5 (de) 2023-07-21 2026-05-07 AGC Inc. Poliermittel und verfahren zur herstellung dessen, verfahren zur herstellung von poliermittel-zusatzflüssigkeit, polierverfahren und verfahren zur fertigung einer halbleiterkomponente
WO2025131949A1 (en) 2023-12-18 2025-06-26 Specialty Operations France Composition comprising sulfide solid material comprising alkali metal, p, s and halogen elements
WO2025133363A1 (en) 2023-12-21 2025-06-26 Specialty Operations France Compositions comprising cerium oxide/polyoxometalate particles and ion exchange polymer, and their use in proton exchange membranes or electrocatalyst layers
CN122422452A (zh) 2023-12-21 2026-07-17 罗地亚经营管理公司 包含其上吸附有多金属氧酸盐物质的氧化铈颗粒的水性分散体,其生产方法及其在抛光中的用途
WO2025190482A1 (en) * 2024-03-13 2025-09-18 Rhodia Operations Cerium oxide particles with cotrolled microstructure
CN120864546B (zh) * 2025-09-25 2026-01-06 包头稀土研究院 降低纳米氧化铈的松装密度的方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2617153B1 (fr) * 1987-06-26 1991-04-05 Rhone Poulenc Chimie Procede d'obtention d'un oxyde cerique et oxyde cerique a nouvelles caracteristiques morphologiques
JP2746861B2 (ja) * 1995-11-20 1998-05-06 三井金属鉱業株式会社 酸化セリウム超微粒子の製造方法
US5962343A (en) * 1996-07-30 1999-10-05 Nissan Chemical Industries, Ltd. Process for producing crystalline ceric oxide particles and abrasive
US6045716A (en) * 1997-03-12 2000-04-04 Strasbaugh Chemical mechanical polishing apparatus and method
SG72802A1 (en) * 1997-04-28 2000-05-23 Seimi Chem Kk Polishing agent for semiconductor and method for its production
GB9903519D0 (en) * 1999-02-16 1999-04-07 Europ Economic Community Precipitation process
JP4544379B2 (ja) * 1999-06-28 2010-09-15 日産化学工業株式会社 ガラス製ハードディスク用研磨剤
EP1201725A4 (en) * 1999-06-28 2007-09-12 Nissan Chemical Ind Ltd ABRASIVE COMPOUND FOR HARD DISK GLASS TRAY
JP2003257910A (ja) * 2001-12-28 2003-09-12 Fujikoshi Mach Corp 基板における銅層の研磨方法
KR101087763B1 (ko) * 2002-10-28 2011-11-30 닛산 가가쿠 고교 가부시키 가이샤 산화 세륨 입자 및 그 제조방법
DE10251029A1 (de) * 2002-11-02 2004-05-19 Degussa Ag Pyrogen hergestelltes Ceroxid
US8685123B2 (en) * 2005-10-14 2014-04-01 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material

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KR20120030575A (ko) 2012-03-28
JP2010505735A (ja) 2010-02-25
KR20130045954A (ko) 2013-05-06
KR20090064566A (ko) 2009-06-19
EP2081871B1 (fr) 2017-05-03
KR101475174B1 (ko) 2014-12-22
US8317888B2 (en) 2012-11-27
FR2906800A1 (fr) 2008-04-11
WO2008043703A2 (fr) 2008-04-17
CN101522567B (zh) 2014-06-04
ES2628504T3 (es) 2017-08-03
CN102627310A (zh) 2012-08-08
KR101139110B1 (ko) 2012-07-05
CN101522567A (zh) 2009-09-02
KR20130140228A (ko) 2013-12-23
US20100072417A1 (en) 2010-03-25
TW200831412A (en) 2008-08-01
TWI367863B (en) 2012-07-11
WO2008043703A3 (fr) 2008-08-14
FR2906800B1 (fr) 2008-11-28
CN102627310B (zh) 2017-06-20
EP2081871A2 (fr) 2009-07-29

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