TWI367863B - Liquid suspension and powder of cerium oxide particles, processes for the preparation thereof and use in polishing - Google Patents
Liquid suspension and powder of cerium oxide particles, processes for the preparation thereof and use in polishingInfo
- Publication number
- TWI367863B TWI367863B TW096137695A TW96137695A TWI367863B TW I367863 B TWI367863 B TW I367863B TW 096137695 A TW096137695 A TW 096137695A TW 96137695 A TW96137695 A TW 96137695A TW I367863 B TWI367863 B TW I367863B
- Authority
- TW
- Taiwan
- Prior art keywords
- polishing
- powder
- processes
- preparation
- oxide particles
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F17/00—Compounds of rare earth metals
- C01F17/20—Compounds containing only rare earth metals as the metal element
- C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
- C01F17/224—Oxides or hydroxides of lanthanides
- C01F17/235—Cerium oxides or hydroxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
- C01P2004/52—Particles with a specific particle size distribution highly monodisperse size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Composite Materials (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Catalysts (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0608838A FR2906800B1 (fr) | 2006-10-09 | 2006-10-09 | Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utilisation dans le polissage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200831412A TW200831412A (en) | 2008-08-01 |
| TWI367863B true TWI367863B (en) | 2012-07-11 |
Family
ID=38158014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096137695A TWI367863B (en) | 2006-10-09 | 2007-10-08 | Liquid suspension and powder of cerium oxide particles, processes for the preparation thereof and use in polishing |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8317888B2 (zh) |
| EP (1) | EP2081871B1 (zh) |
| JP (1) | JP5586229B2 (zh) |
| KR (4) | KR20120030575A (zh) |
| CN (2) | CN102627310B (zh) |
| ES (1) | ES2628504T3 (zh) |
| FR (1) | FR2906800B1 (zh) |
| TW (1) | TWI367863B (zh) |
| WO (1) | WO2008043703A2 (zh) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009077412A2 (en) * | 2007-12-14 | 2009-06-25 | Akzo Nobel N.V. | Aqueous slurry comprising inorganic oxygen-containing particulates |
| CN101977873A (zh) | 2008-02-12 | 2011-02-16 | 圣戈本陶瓷及塑料股份有限公司 | 二氧化铈及其形成方法 |
| FR2935145B1 (fr) * | 2008-08-22 | 2010-09-03 | Rhodia Operations | Suspension liquide et poudre de particules d'oxyde de cerium, procedes de preparation de celles-ci et utlisation dans le polissage |
| JP5499556B2 (ja) * | 2008-11-11 | 2014-05-21 | 日立化成株式会社 | スラリ及び研磨液セット並びにこれらから得られるｃｍｐ研磨液を用いた基板の研磨方法及び基板 |
| JP5317118B2 (ja) * | 2009-07-29 | 2013-10-16 | 花王株式会社 | ポリフェノールの定量法 |
| KR101075966B1 (ko) * | 2010-03-09 | 2011-10-21 | 주식회사 엘지화학 | 결정성 산화세륨 및 이의 제조 방법 |
| KR20130136593A (ko) | 2010-03-12 | 2013-12-12 | 히타치가세이가부시끼가이샤 | 슬러리, 연마액 세트, 연마액 및 이것들을 이용한 기판의 연마 방법 |
| CN103497732B (zh) | 2010-11-22 | 2016-08-10 | 日立化成株式会社 | 悬浮液、研磨液套剂、研磨液、基板的研磨方法及基板 |
| KR101886892B1 (ko) | 2010-11-22 | 2018-08-08 | 히타치가세이가부시끼가이샤 | 슬러리, 연마액 세트, 연마액, 기판의 연마 방법 및 기판 |
| SG10201606827RA (en) | 2012-02-21 | 2016-10-28 | Hitachi Chemical Co Ltd | Polishing agent, polishing agent set, and substrate polishing method |
| KR102004570B1 (ko) | 2012-02-21 | 2019-07-26 | 히타치가세이가부시끼가이샤 | 연마제, 연마제 세트 및 기체의 연마 방법 |
| KR102034331B1 (ko) | 2012-05-22 | 2019-10-18 | 히타치가세이가부시끼가이샤 | 슬러리, 연마액 세트, 연마액, 기체의 연마 방법 및 기체 |
| SG11201407031VA (en) * | 2012-05-22 | 2014-12-30 | Hitachi Chemical Co Ltd | Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate |
| SG11201407087XA (en) | 2012-05-22 | 2014-12-30 | Hitachi Chemical Co Ltd | Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate |
| JP5943074B2 (ja) * | 2012-05-22 | 2016-06-29 | 日立化成株式会社 | スラリー、研磨液セット、研磨液及び基体の研磨方法 |
| WO2015091495A1 (en) | 2013-12-16 | 2015-06-25 | Rhodia Operations | Liquid suspension of cerium oxide particles |
| RU2563015C2 (ru) * | 2014-01-30 | 2015-09-10 | Общество с ограниченной ответственностью "Научно-производственная компания "Русредмет"(ООО НПК"Русредмет") | Способ выделения церия из нитратных растворов, содержащих сумму редкоземельных элементов |
| JP6169120B2 (ja) * | 2014-03-13 | 2017-07-26 | 第一稀元素化学工業株式会社 | セリウム含有溶液及びその製造方法 |
| TWI635905B (zh) | 2014-06-24 | 2018-09-21 | 羅地亞經營管理公司 | 金屬摻雜氧化鈰組合物 |
| KR101773543B1 (ko) | 2015-06-30 | 2017-09-01 | 유비머트리얼즈주식회사 | 연마 입자, 연마 슬러리 및 연마 입자의 제조 방법 |
| CN108025276A (zh) | 2015-09-23 | 2018-05-11 | 罗地亚经营管理公司 | 疏水改性的氧化铈颗粒及其用途 |
| FR3041528A1 (fr) | 2015-09-25 | 2017-03-31 | Rhodia Operations | Composition cosmetique photoprotectrice |
| FR3047736A1 (fr) * | 2016-02-17 | 2017-08-18 | Rhodia Operations | Composition de peinture formulee en phase aqueuse |
| FR3047737A1 (fr) * | 2016-02-17 | 2017-08-18 | Rhodia Operations | Composition fluide pour proteger le bois |
| JP2017228576A (ja) * | 2016-06-20 | 2017-12-28 | 日立化成株式会社 | 研磨液及び研磨方法 |
| KR20190089945A (ko) | 2016-12-02 | 2019-07-31 | 로디아 오퍼레이션스 | 산화세륨의 현탁액 |
| JP6827318B2 (ja) * | 2016-12-28 | 2021-02-10 | 花王株式会社 | 酸化セリウム砥粒 |
| JP7326166B2 (ja) | 2017-06-15 | 2023-08-15 | ローディア オペレーションズ | セリウム系粒子 |
| FR3074162A1 (fr) | 2017-11-24 | 2019-05-31 | Rhodia Operations | Particules d'oxyde de cerium / silice |
| US11814547B2 (en) | 2018-09-28 | 2023-11-14 | Kao Corporation | Polishing liquid composition for silicon oxide film |
| KR102282872B1 (ko) * | 2019-11-11 | 2021-07-28 | 주식회사 켐톤 | 세륨 산화물 입자의 제조방법, 연마입자 및 이를 포함하는 연마용 슬러리 조성물 |
| EP4065658A1 (en) | 2019-11-26 | 2022-10-05 | Rhodia Operations | Liquid dispersion and powder of cerium based core-shell particles, process for producing the same and uses thereof in polishing |
| WO2021105174A1 (en) * | 2019-11-26 | 2021-06-03 | Rhodia Operations | Cerium based particles, process for producing the same and uses thereof in polishing |
| CN114671451A (zh) * | 2020-12-25 | 2022-06-28 | 安集微电子（上海）有限公司 | 一种氧化铈的合成方法及其使用方法 |
| JP2024511723A (ja) | 2021-03-12 | 2024-03-15 | ローディア オペレーションズ | 酸化セリウム粒子、その製造プロセス及びその化学機械研磨における使用 |
| KR20230154254A (ko) | 2021-03-12 | 2023-11-07 | 로디아 오퍼레이션스 | 산화세륨 입자, 이의 제조 공정 및 화학적 기계적 폴리싱에서의 이의 용도 |
| EP4341358A1 (en) | 2021-05-17 | 2024-03-27 | Rhodia Operations | Liquid dispersion and powder of cerium based core-shell particles, process for producing the same and uses thereof in polishing |
| CN115403063B (zh) * | 2022-09-30 | 2024-08-06 | 深圳市聚芯半导体材料有限公司 | 一种二氧化铈颗粒及其制备方法和应用 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2617153B1 (fr) * | 1987-06-26 | 1991-04-05 | Rhone Poulenc Chimie | Procede d'obtention d'un oxyde cerique et oxyde cerique a nouvelles caracteristiques morphologiques |
| JP2746861B2 (ja) * | 1995-11-20 | 1998-05-06 | 三井金属鉱業株式会社 | 酸化セリウム超微粒子の製造方法 |
| US5962343A (en) * | 1996-07-30 | 1999-10-05 | Nissan Chemical Industries, Ltd. | Process for producing crystalline ceric oxide particles and abrasive |
| US6045716A (en) * | 1997-03-12 | 2000-04-04 | Strasbaugh | Chemical mechanical polishing apparatus and method |
| TW365563B (en) * | 1997-04-28 | 1999-08-01 | Seimi Chem Kk | Polishing agent for semiconductor and method for its production |
| GB9903519D0 (en) * | 1999-02-16 | 1999-04-07 | Europ Economic Community | Precipitation process |
| WO2001000744A1 (fr) * | 1999-06-28 | 2001-01-04 | Nissan Chemical Industries, Ltd. | Compose abrasif pour plateau en verre de disque dur |
| JP4544379B2 (ja) * | 1999-06-28 | 2010-09-15 | 日産化学工業株式会社 | ガラス製ハードディスク用研磨剤 |
| JP2003257910A (ja) * | 2001-12-28 | 2003-09-12 | Fujikoshi Mach Corp | 基板における銅層の研磨方法 |
| US7431758B2 (en) * | 2002-10-28 | 2008-10-07 | Nissan Chemical Industries, Ltd. | Cerium oxide particles and production method therefor |
| DE10251029A1 (de) * | 2002-11-02 | 2004-05-19 | Degussa Ag | Pyrogen hergestelltes Ceroxid |
| US8685123B2 (en) * | 2005-10-14 | 2014-04-01 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material |
-
2006
- 2006-10-09 FR FR0608838A patent/FR2906800B1/fr not_active Expired - Fee Related
-
2007
- 2007-10-04 CN CN201210075352.4A patent/CN102627310B/zh active Active
- 2007-10-04 WO PCT/EP2007/060549 patent/WO2008043703A2/fr active Application Filing
- 2007-10-04 KR KR1020127002406A patent/KR20120030575A/ko not_active Application Discontinuation
- 2007-10-04 CN CN200780037633.8A patent/CN101522567B/zh active Active
- 2007-10-04 US US12/444,746 patent/US8317888B2/en active Active
- 2007-10-04 ES ES07820926.9T patent/ES2628504T3/es active Active
- 2007-10-04 EP EP07820926.9A patent/EP2081871B1/fr active Active
- 2007-10-04 KR KR1020097007237A patent/KR101139110B1/ko active IP Right Grant
- 2007-10-04 KR KR1020137009798A patent/KR20130045954A/ko not_active Application Discontinuation
- 2007-10-04 KR KR1020137032326A patent/KR101475174B1/ko active IP Right Grant
- 2007-10-04 JP JP2009531812A patent/JP5586229B2/ja active Active
- 2007-10-08 TW TW096137695A patent/TWI367863B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010505735A (ja) | 2010-02-25 |
| KR20120030575A (ko) | 2012-03-28 |
| CN101522567B (zh) | 2014-06-04 |
| US8317888B2 (en) | 2012-11-27 |
| KR101139110B1 (ko) | 2012-07-05 |
| FR2906800A1 (fr) | 2008-04-11 |
| KR101475174B1 (ko) | 2014-12-22 |
| EP2081871A2 (fr) | 2009-07-29 |
| FR2906800B1 (fr) | 2008-11-28 |
| JP5586229B2 (ja) | 2014-09-10 |
| US20100072417A1 (en) | 2010-03-25 |
| KR20090064566A (ko) | 2009-06-19 |
| CN101522567A (zh) | 2009-09-02 |
| ES2628504T3 (es) | 2017-08-03 |
| CN102627310B (zh) | 2017-06-20 |
| CN102627310A (zh) | 2012-08-08 |
| WO2008043703A2 (fr) | 2008-04-17 |
| KR20130140228A (ko) | 2013-12-23 |
| KR20130045954A (ko) | 2013-05-06 |
| EP2081871B1 (fr) | 2017-05-03 |
| TW200831412A (en) | 2008-08-01 |
| WO2008043703A3 (fr) | 2008-08-14 |
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