JP2010222709A5 - - Google Patents

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Publication number
JP2010222709A5
JP2010222709A5 JP2010152079A JP2010152079A JP2010222709A5 JP 2010222709 A5 JP2010222709 A5 JP 2010222709A5 JP 2010152079 A JP2010152079 A JP 2010152079A JP 2010152079 A JP2010152079 A JP 2010152079A JP 2010222709 A5 JP2010222709 A5 JP 2010222709A5
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film
forming method
substrate
energy
particles
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JP2010152079A
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Japanese (ja)
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JP5116812B2 (ja
JP2010222709A (ja
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Publication of JP2010222709A5 publication Critical patent/JP2010222709A5/ja
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JP2010152079A 2008-09-05 2010-07-02 成膜方法及び撥油性基材 Expired - Fee Related JP5116812B2 (ja)

Priority Applications (1)

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JP2010152079A JP5116812B2 (ja) 2008-09-05 2010-07-02 成膜方法及び撥油性基材

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008228587 2008-09-05
JP2008228587 2008-09-05
JP2010152079A JP5116812B2 (ja) 2008-09-05 2010-07-02 成膜方法及び撥油性基材

Related Parent Applications (1)

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JP2009550117A Division JP5036827B2 (ja) 2008-09-05 2009-08-24 成膜方法及び撥油性基材

Publications (3)

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JP2010222709A JP2010222709A (ja) 2010-10-07
JP2010222709A5 true JP2010222709A5 (enExample) 2012-09-20
JP5116812B2 JP5116812B2 (ja) 2013-01-09

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JP2009550117A Expired - Fee Related JP5036827B2 (ja) 2008-09-05 2009-08-24 成膜方法及び撥油性基材
JP2010152079A Expired - Fee Related JP5116812B2 (ja) 2008-09-05 2010-07-02 成膜方法及び撥油性基材
JP2012107963A Active JP5147028B2 (ja) 2008-09-05 2012-05-09 成膜方法及び撥油性基材

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JP2009550117A Expired - Fee Related JP5036827B2 (ja) 2008-09-05 2009-08-24 成膜方法及び撥油性基材

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JP2012107963A Active JP5147028B2 (ja) 2008-09-05 2012-05-09 成膜方法及び撥油性基材

Country Status (7)

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US (3) US9315415B2 (enExample)
EP (1) EP2333132A4 (enExample)
JP (3) JP5036827B2 (enExample)
KR (1) KR101302237B1 (enExample)
CN (1) CN102084025B (enExample)
TW (1) TWI467039B (enExample)
WO (1) WO2010026887A1 (enExample)

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JP3152777B2 (ja) 1992-12-28 2001-04-03 石川島播磨重工業株式会社 ロール用の軸受装置
JP5036827B2 (ja) * 2008-09-05 2012-09-26 株式会社シンクロン 成膜方法及び撥油性基材
JP4688230B2 (ja) * 2008-10-09 2011-05-25 株式会社シンクロン 成膜方法
KR101312752B1 (ko) 2011-09-30 2013-09-27 신크론 컴퍼니 리미티드 성막방법 및 성막장치
CN104040023B (zh) * 2012-01-16 2016-04-13 株式会社爱发科 成膜装置
US20130255858A1 (en) * 2012-04-03 2013-10-03 Jun-Chung Hsu Method of manufacturing a laminate circuit board
KR101426390B1 (ko) * 2012-05-24 2014-08-07 주식회사 삼화옵틱스 케이스 코팅 방법
KR101362420B1 (ko) * 2012-05-24 2014-02-14 주식회사 삼화옵틱스 시트 코팅 방법
CN108129032B (zh) * 2013-01-30 2020-11-03 Agc 株式会社 带防污膜的透明基体
JP6533511B2 (ja) * 2015-06-17 2019-06-19 株式会社シンクロン 成膜方法及び成膜装置
WO2017038466A1 (ja) * 2015-09-02 2017-03-09 株式会社アルバック ワーク保持体および成膜装置
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US12139785B2 (en) * 2019-10-24 2024-11-12 Soon Young Kwon Method for forming coating layer having plasma resistance
CN113355646B (zh) * 2021-06-10 2022-08-30 西华师范大学 一种基于多源共蒸技术的薄膜监测制备装置及方法
TWI789930B (zh) * 2021-10-01 2023-01-11 南亞塑膠工業股份有限公司 食品包裝用的阻隔膜及其製造方法
JP7752875B2 (ja) * 2023-11-30 2025-10-14 株式会社オプトラン 蒸着装置及びこれを用いた蒸着方法

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