JP2012517529A5 - - Google Patents

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Publication number
JP2012517529A5
JP2012517529A5 JP2011549669A JP2011549669A JP2012517529A5 JP 2012517529 A5 JP2012517529 A5 JP 2012517529A5 JP 2011549669 A JP2011549669 A JP 2011549669A JP 2011549669 A JP2011549669 A JP 2011549669A JP 2012517529 A5 JP2012517529 A5 JP 2012517529A5
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JP
Japan
Prior art keywords
layer
less
energy
oxygen
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011549669A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012517529A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/GB2010/050207 external-priority patent/WO2010092383A1/en
Publication of JP2012517529A publication Critical patent/JP2012517529A/ja
Publication of JP2012517529A5 publication Critical patent/JP2012517529A5/ja
Pending legal-status Critical Current

Links

JP2011549669A 2009-02-12 2010-02-10 ポリマー基材上の２層バリヤー Pending JP2012517529A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP09152674.9 2009-02-12
EP09152674 2009-02-12
PCT/GB2010/050207 WO2010092383A1 (en) 2009-02-12 2010-02-10 Two layer barrier on polymeric substrate

Publications (2)

Publication Number Publication Date
JP2012517529A JP2012517529A (ja) 2012-08-02
JP2012517529A5 true JP2012517529A5 (enExample) 2013-03-21

Family

ID=40821829

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2011549669A Pending JP2012517529A (ja) 2009-02-12 2010-02-10 ポリマー基材上の２層バリヤー
JP2011549670A Pending JP2012517530A (ja) 2009-02-12 2010-02-10 ポリマー基材上の２層バリヤー

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2011549670A Pending JP2012517530A (ja) 2009-02-12 2010-02-10 ポリマー基材上の２層バリヤー

Country Status (4)

Country Link
US (2) US20110311808A1 (enExample)
EP (2) EP2396451B1 (enExample)
JP (2) JP2012517529A (enExample)
WO (2) WO2010092383A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2024533A1 (en) * 2006-05-30 2009-02-18 Fuji Film Manufacturing Europe B.V. Method and apparatus for deposition using pulsed atmospheric pressure glow discharge
WO2008100139A1 (en) 2007-02-13 2008-08-21 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
US8702999B2 (en) 2008-02-01 2014-04-22 Fujifilm Manufacturing Europe B.V. Method and apparatus for plasma surface treatment of a moving substrate
US8445897B2 (en) 2008-02-08 2013-05-21 Fujifilm Manufacturing Europe B.V. Method for manufacturing a multi-layer stack structure with improved WVTR barrier property
JP2012517529A (ja) * 2009-02-12 2012-08-02 フジフィルム・マニュファクチュアリング・ヨーロッパ・ベスローテン・フエンノートシャップ ポリマー基材上の２層バリヤー
GB201210836D0 (en) * 2012-06-19 2012-08-01 Fujifilm Mfg Europe Bv Method and device for manufacturing a barrier layer on a flexible substrate
GB201215098D0 (en) * 2012-08-24 2012-10-10 Fujifilm Mfg Europe Bv Method of treating a porous substrate and manufacture of a membrane
US9339770B2 (en) 2013-11-19 2016-05-17 Applied Membrane Technologies, Inc. Organosiloxane films for gas separations

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2704558B1 (fr) * 1993-04-29 1995-06-23 Air Liquide Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement.
JP3148910B2 (ja) 1993-09-01 2001-03-26 日本真空技術株式会社 プラズマｃｖｄ成膜方法
JPH1158587A (ja) * 1997-08-12 1999-03-02 Mitsui Chem Inc 酸化防止用包装フィルム
ATE402277T1 (de) * 2002-02-05 2008-08-15 Dow Global Technologies Inc Chemische dampfphasenabscheidung auf einem substrat mittels eines korona-plasmas
EP1351321B1 (en) 2002-04-01 2013-12-25 Konica Corporation Support and organic electroluminescence element comprising the support
TWI273143B (en) 2002-06-10 2007-02-11 Konica Corp Layer formation method, and substrate with a layer formed by the method
US6774569B2 (en) 2002-07-11 2004-08-10 Fuji Photo Film B.V. Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions
US7288204B2 (en) 2002-07-19 2007-10-30 Fuji Photo Film B.V. Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
EP1403902A1 (en) 2002-09-30 2004-03-31 Fuji Photo Film B.V. Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG)
US7488683B2 (en) * 2003-03-28 2009-02-10 Toyo Seikan Kaisha, Ltd. Chemical vapor deposited film based on a plasma CVD method and method of forming the film
WO2005049228A2 (en) 2003-09-09 2005-06-02 Dow Global Technologies Inc. Glow discharge-generated chemical vapor deposition
ATE348497T1 (de) 2004-08-13 2007-01-15 Fuji Photo Film Bv Verfahren und vorrichtung zur steuerung eines glühentladungsplasmas unter atmosphärischem druck
KR20070057200A (ko) * 2004-09-27 2007-06-04 다우 글로벌 테크놀로지스 인크. 플라즈마 강화 화학 기상 증착에 의한 다층 코팅
GB0505517D0 (en) 2005-03-17 2005-04-27 Dupont Teijin Films Us Ltd Coated polymeric substrates
JP2007190844A (ja) * 2006-01-20 2007-08-02 Konica Minolta Holdings Inc ガスバリア性樹脂基材および有機エレクトロルミネッセンスデバイス
JP5093107B2 (ja) * 2006-05-25 2012-12-05 コニカミノルタホールディングス株式会社 ガスバリア性樹脂基材の製造方法及びガスバリア性樹脂基材の製造装置
EP2024533A1 (en) 2006-05-30 2009-02-18 Fuji Film Manufacturing Europe B.V. Method and apparatus for deposition using pulsed atmospheric pressure glow discharge
WO2008147184A2 (en) 2007-05-25 2008-12-04 Fujifilm Manufacturing Europe B.V. Atmospheric pressure glow discharge plasma method and system using heated substrate
FR2918301B1 (fr) * 2007-07-06 2011-06-24 Sidel Participations Revetement barriere depose par plasma comprenant au moins trois couches, procede d'obtention d'un tel revetement et recipient revetu d'un tel revetement
JP2012517529A (ja) * 2009-02-12 2012-08-02 フジフィルム・マニュファクチュアリング・ヨーロッパ・ベスローテン・フエンノートシャップ ポリマー基材上の２層バリヤー

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