JP2014534336A5 - - Google Patents
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- Publication number
- JP2014534336A5 JP2014534336A5 JP2014533979A JP2014533979A JP2014534336A5 JP 2014534336 A5 JP2014534336 A5 JP 2014534336A5 JP 2014533979 A JP2014533979 A JP 2014533979A JP 2014533979 A JP2014533979 A JP 2014533979A JP 2014534336 A5 JP2014534336 A5 JP 2014534336A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- ald
- oxide layer
- inorganic oxide
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1117242.6 | 2011-10-06 | ||
| GBGB1117242.6A GB201117242D0 (en) | 2011-10-06 | 2011-10-06 | Method and device for manufacturing a barrier layer on a flexible subtrate |
| PCT/GB2012/052378 WO2013050741A1 (en) | 2011-10-06 | 2012-09-26 | A method for producing a coating by atmospheric pressure plasma technology |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014534336A JP2014534336A (ja) | 2014-12-18 |
| JP2014534336A5 true JP2014534336A5 (enExample) | 2015-11-12 |
| JP6096783B2 JP6096783B2 (ja) | 2017-03-15 |
Family
ID=45035243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014533979A Expired - Fee Related JP6096783B2 (ja) | 2011-10-06 | 2012-09-26 | 大気圧プラズマ法によるコーティング作製方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20140242365A1 (enExample) |
| EP (1) | EP2764133B1 (enExample) |
| JP (1) | JP6096783B2 (enExample) |
| GB (1) | GB201117242D0 (enExample) |
| WO (1) | WO2013050741A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6345116B2 (ja) * | 2012-09-06 | 2018-06-20 | 株式会社クレハ | 非水電解質二次電池負極用炭素質材料及びその製造方法 |
| EA028651B1 (ru) * | 2012-12-21 | 2017-12-29 | Асахи Гласс Компани Лимитед | Пара электродов для плазменного процесса диэлектрического барьерного разряда (дбр) |
| KR102244070B1 (ko) * | 2014-01-07 | 2021-04-26 | 삼성디스플레이 주식회사 | 기상 증착 장치, 기상 증착 방법 및 유기 발광 표시 장치 제조 방법 |
| JP2015178231A (ja) * | 2014-03-19 | 2015-10-08 | 東洋製罐グループホールディングス株式会社 | ガスバリア性積層構造体 |
| CN106255591A (zh) * | 2014-03-04 | 2016-12-21 | 东洋制罐集团控股株式会社 | 阻气性层压体 |
| JP2015166170A (ja) * | 2014-03-04 | 2015-09-24 | 東洋製罐グループホールディングス株式会社 | ガスバリア性積層体 |
| JP6812793B2 (ja) * | 2014-07-29 | 2021-01-13 | 凸版印刷株式会社 | 積層体及びその製造方法、並びにガスバリアフィルム及びその製造方法 |
| DE102015115329A1 (de) * | 2015-09-11 | 2017-03-16 | Hanwha Q Cells Gmbh | Verfahren zur plasmaunterstützten Abscheidung von Aluminiumoxiddünnschichten auf Halbleiterwafern für die Herstellung von Wafersolarzellen und Inline-PECVD-Anlage |
| CN107254675B (zh) * | 2017-06-07 | 2019-07-09 | 华中科技大学 | 一种纳米颗粒空间原子层沉积连续包覆装置及方法 |
| EP3914750A4 (en) * | 2019-01-25 | 2023-02-15 | Applied Materials, Inc. | METHOD FOR FORMING MOISTURE AND OXYGEN BARRIER COATINGS |
| EP4095283A1 (en) * | 2021-05-25 | 2022-11-30 | Molecular Plasma Group SA | Method and system for coating filter media |
| GB202109309D0 (en) * | 2021-06-29 | 2021-08-11 | Fujifilm Mfg Europe Bv | Gas separation membranes |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8427943D0 (en) * | 1984-11-05 | 1984-12-12 | Alcan Int Ltd | Anodic aluminium oxide film |
| US6391785B1 (en) | 1999-08-24 | 2002-05-21 | Interuniversitair Microelektronica Centrum (Imec) | Method for bottomless deposition of barrier layers in integrated circuit metallization schemes |
| US7098131B2 (en) | 2001-07-19 | 2006-08-29 | Samsung Electronics Co., Ltd. | Methods for forming atomic layers and thin films including tantalum nitride and devices including the same |
| US7045010B2 (en) * | 2001-09-06 | 2006-05-16 | Alcatel | Applicator for high-speed gel buffering of flextube optical fiber bundles |
| US6756318B2 (en) | 2001-09-10 | 2004-06-29 | Tegal Corporation | Nanolayer thick film processing system and method |
| EP1351321B1 (en) * | 2002-04-01 | 2013-12-25 | Konica Corporation | Support and organic electroluminescence element comprising the support |
| US6774569B2 (en) | 2002-07-11 | 2004-08-10 | Fuji Photo Film B.V. | Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
| US7288204B2 (en) | 2002-07-19 | 2007-10-30 | Fuji Photo Film B.V. | Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG) |
| EP1403902A1 (en) | 2002-09-30 | 2004-03-31 | Fuji Photo Film B.V. | Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG) |
| ATE348497T1 (de) | 2004-08-13 | 2007-01-15 | Fuji Photo Film Bv | Verfahren und vorrichtung zur steuerung eines glühentladungsplasmas unter atmosphärischem druck |
| WO2007145513A1 (en) | 2006-06-16 | 2007-12-21 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma |
| CN101641400B (zh) * | 2007-04-04 | 2014-09-10 | 利乐拉瓦尔集团及财务有限公司 | 包装层压板，制造该包装层压板的方法和由其生产的包装容器 |
| US20080303744A1 (en) * | 2007-06-11 | 2008-12-11 | Tokyo Electron Limited | Plasma processing system, antenna, and use of plasma processing system |
| JP2010535291A (ja) * | 2007-07-30 | 2010-11-18 | ダウ グローバル テクノロジーズ インコーポレイティド | 大気圧プラズマ化学蒸着方法 |
| US20100255625A1 (en) | 2007-09-07 | 2010-10-07 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma |
| CN101896286A (zh) * | 2007-10-15 | 2010-11-24 | 陶氏环球技术公司 | 等离子体涂布聚丙烯物体的方法 |
| TWI388078B (zh) * | 2008-01-30 | 2013-03-01 | 歐斯朗奧托半導體股份有限公司 | 電子組件之製造方法及電子組件 |
| EP2528082A3 (en) * | 2008-02-21 | 2014-11-05 | FUJIFILM Manufacturing Europe B.V. | Plasma treatment apparatus with an atmospheric pressure glow discharge electrode configuration |
| US20090311496A1 (en) * | 2008-06-17 | 2009-12-17 | Ford Global Technologies, Llc | Intermediate Coating Compositions and Methods of Using the Same |
| US20100132762A1 (en) * | 2008-12-02 | 2010-06-03 | Georgia Tech Research Corporation | Environmental barrier coating for organic semiconductor devices and methods thereof |
| KR101040175B1 (ko) * | 2008-12-11 | 2011-06-16 | 한국전자통신연구원 | 연성 기판 및 그의 제조 방법 |
| EP2226832A1 (en) | 2009-03-06 | 2010-09-08 | FUJIFILM Manufacturing Europe B.V. | Substrate plasma treatment using side tabs |
| JP5912228B2 (ja) * | 2010-05-17 | 2016-04-27 | 凸版印刷株式会社 | ガスバリア性積層体の製造方法 |
-
2011
- 2011-10-06 GB GBGB1117242.6A patent/GB201117242D0/en not_active Ceased
-
2012
- 2012-09-26 US US14/349,472 patent/US20140242365A1/en not_active Abandoned
- 2012-09-26 JP JP2014533979A patent/JP6096783B2/ja not_active Expired - Fee Related
- 2012-09-26 EP EP12770196.9A patent/EP2764133B1/en active Active
- 2012-09-26 WO PCT/GB2012/052378 patent/WO2013050741A1/en not_active Ceased
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