ATE348497T1 - Verfahren und vorrichtung zur steuerung eines glühentladungsplasmas unter atmosphärischem druck - Google Patents
Verfahren und vorrichtung zur steuerung eines glühentladungsplasmas unter atmosphärischem druckInfo
- Publication number
- ATE348497T1 ATE348497T1 AT04077286T AT04077286T ATE348497T1 AT E348497 T1 ATE348497 T1 AT E348497T1 AT 04077286 T AT04077286 T AT 04077286T AT 04077286 T AT04077286 T AT 04077286T AT E348497 T1 ATE348497 T1 AT E348497T1
- Authority
- AT
- Austria
- Prior art keywords
- plasma
- controlling
- under atmospheric
- glow discharge
- atmospheric pressure
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32018—Glow discharge
- H01J37/32045—Circuits specially adapted for controlling the glow discharge
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/4697—Generating plasma using glow discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2242/00—Auxiliary systems
- H05H2242/20—Power circuits
- H05H2242/26—Matching networks
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
- Discharge Heating (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04077286A EP1626613B8 (de) | 2004-08-13 | 2004-08-13 | Verfahren und Vorrichtung zur Steuerung eines Glühentladungsplasmas unter atmosphärischem Druck |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE348497T1 true ATE348497T1 (de) | 2007-01-15 |
Family
ID=34928445
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04077286T ATE348497T1 (de) | 2004-08-13 | 2004-08-13 | Verfahren und vorrichtung zur steuerung eines glühentladungsplasmas unter atmosphärischem druck |
Country Status (5)
Country | Link |
---|---|
US (1) | US7399944B2 (de) |
EP (1) | EP1626613B8 (de) |
JP (1) | JP5459923B2 (de) |
AT (1) | ATE348497T1 (de) |
DE (1) | DE602004003697T2 (de) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009538989A (ja) * | 2006-05-30 | 2009-11-12 | フジフィルム マニュファクチャリング ユーロプ ビー.ブイ. | パルス化大気圧グロー放電を使用する堆積の方法及び装置 |
EP2032738A1 (de) | 2006-06-16 | 2009-03-11 | Fuji Film Manufacturing Europe B.V. | Verrfahren und vorrichtung zur atomlagenabscheidung unter verwendung eines atmosphärendruckglimmentladungsplasmas |
US8338307B2 (en) | 2007-02-13 | 2012-12-25 | Fujifilm Manufacturing Europe B.V. | Substrate plasma treatment using magnetic mask device |
JP5597551B2 (ja) | 2008-02-01 | 2014-10-01 | フジフィルム マニュファクチュアリング ヨーロッパ ビー.ヴィ. | 移動基材のプラズマ表面処理の装置、方法および当該方法の使用 |
JP5473946B2 (ja) | 2008-02-08 | 2014-04-16 | フジフィルム マニュファクチュアリング ヨーロッパ ビー.ヴィ. | Wvtrバリア性を改善した多層スタック構造体の製造方法 |
EP2528082A3 (de) | 2008-02-21 | 2014-11-05 | FUJIFILM Manufacturing Europe B.V. | Plasmabehandlungsvorrichtung mit einem Luftdruck-Glimmentladungselektrodenaufbau |
EP2299922B1 (de) | 2008-05-30 | 2016-11-09 | Colorado State University Research Foundation | Gerät zur erzeugung von plasma |
US8994270B2 (en) | 2008-05-30 | 2015-03-31 | Colorado State University Research Foundation | System and methods for plasma application |
WO2009146432A1 (en) | 2008-05-30 | 2009-12-03 | Colorado State University Research Foundation | Plasma-based chemical source device and method of use thereof |
WO2011123125A1 (en) | 2010-03-31 | 2011-10-06 | Colorado State University Research Foundation | Liquid-gas interface plasma device |
EP2145701A1 (de) * | 2008-07-16 | 2010-01-20 | AGC Flat Glass Europe SA | Verfahren und Anlage für die Oberflächenvorbereitung durch dielektrische Barriere Entladung |
EP2396452A1 (de) | 2009-02-12 | 2011-12-21 | Fujifilm Manufacturing Europe BV | Zweischichtige barriere auf polymersubstrat |
EP2226832A1 (de) | 2009-03-06 | 2010-09-08 | FUJIFILM Manufacturing Europe B.V. | Substratplasmabehandlung mittels Seitenlaschen |
US9120073B2 (en) * | 2009-06-05 | 2015-09-01 | Eon Labs, Llc | Distributed dielectric barrier discharge reactor |
US8083737B2 (en) | 2009-08-26 | 2011-12-27 | Tyco Healthcare Group Lp | Gas-enhanced surgical instrument with mechanism for cylinder puncture |
US8222822B2 (en) * | 2009-10-27 | 2012-07-17 | Tyco Healthcare Group Lp | Inductively-coupled plasma device |
JP5689653B2 (ja) | 2009-12-03 | 2015-03-25 | 富士フイルム株式会社 | 電荷輸送膜、その製造方法及びこれを用いた発光素子並びに光電変換素子 |
JP5616657B2 (ja) * | 2010-03-12 | 2014-10-29 | 富士フイルム株式会社 | 表面処理方法 |
JP2013529352A (ja) | 2010-03-31 | 2013-07-18 | コロラド ステート ユニバーシティー リサーチ ファウンデーション | 液体−気体界面プラズマデバイス |
US8436271B2 (en) * | 2010-04-14 | 2013-05-07 | Baruch Boris Gutman | Thermal nucleus fusion torch method |
GB201012226D0 (en) | 2010-07-21 | 2010-09-08 | Fujifilm Mfg Europe Bv | Method for manufacturing a barrier on a sheet and a sheet for PV modules |
GB201012225D0 (en) | 2010-07-21 | 2010-09-08 | Fujifilm Mfg Europe Bv | Method for manufacturing a barrier layer on a substrate and a multi-layer stack |
GB201110117D0 (en) | 2011-06-16 | 2011-07-27 | Fujifilm Mfg Europe Bv | method and device for manufacturing a barrie layer on a flexible substrate |
GB201117242D0 (en) | 2011-10-06 | 2011-11-16 | Fujifilm Mfg Europe Bv | Method and device for manufacturing a barrier layer on a flexible subtrate |
GB201210836D0 (en) | 2012-06-19 | 2012-08-01 | Fujifilm Mfg Europe Bv | Method and device for manufacturing a barrier layer on a flexible substrate |
US9532826B2 (en) | 2013-03-06 | 2017-01-03 | Covidien Lp | System and method for sinus surgery |
US9555145B2 (en) | 2013-03-13 | 2017-01-31 | Covidien Lp | System and method for biofilm remediation |
US11452982B2 (en) | 2015-10-01 | 2022-09-27 | Milton Roy, Llc | Reactor for liquid and gas and method of use |
US10882021B2 (en) | 2015-10-01 | 2021-01-05 | Ion Inject Technology Llc | Plasma reactor for liquid and gas and method of use |
US10010854B2 (en) | 2015-10-01 | 2018-07-03 | Ion Inject Technology Llc | Plasma reactor for liquid and gas |
US10187968B2 (en) | 2015-10-08 | 2019-01-22 | Ion Inject Technology Llc | Quasi-resonant plasma voltage generator |
US10046300B2 (en) | 2015-12-09 | 2018-08-14 | Ion Inject Technology Llc | Membrane plasma reactor |
US10542613B2 (en) * | 2016-04-04 | 2020-01-21 | University Of South Carolina | Suppression of self pulsing DC driven nonthermal microplasma discharge to operate in a steady DC mode |
JP7018119B2 (ja) | 2018-02-13 | 2022-02-09 | 富士フイルム株式会社 | 大気圧プラズマ発生装置、大気圧プラズマ発生回路、及び、大気圧プラズマ発生方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT388814B (de) * | 1985-11-15 | 1989-09-11 | Paar Anton Kg | Verfahren und vorrichtung zum erzeugen eines hf-induzierten edelgasplasmas |
JPH02303357A (ja) * | 1989-05-18 | 1990-12-17 | Hitachi Lighting Ltd | スイッチング電源装置 |
US5095247A (en) * | 1989-08-30 | 1992-03-10 | Shimadzu Corporation | Plasma discharge apparatus with temperature sensing |
DE69304522T2 (de) * | 1992-04-16 | 1997-01-23 | Advanced Energy Ind Inc | Stabilisator fuer schalt-mode geleistet radio-frequenz plasma einrichtung |
US5414324A (en) * | 1993-05-28 | 1995-05-09 | The University Of Tennessee Research Corporation | One atmosphere, uniform glow discharge plasma |
CA2205817C (en) * | 1996-05-24 | 2004-04-06 | Sekisui Chemical Co., Ltd. | Treatment method in glow-discharge plasma and apparatus thereof |
JP3492878B2 (ja) * | 1997-03-05 | 2004-02-03 | パイオニア株式会社 | 面放電型プラズマディスプレイパネルの駆動方法 |
US6475350B2 (en) * | 1997-07-18 | 2002-11-05 | Noxtech Inc | Method for removing NOx and other pollutants from gas streams using a plasma assisted catalyst |
JP2000164578A (ja) * | 1998-11-30 | 2000-06-16 | Hitachi Ltd | プラズマ処理装置及びプラズマ処理方法 |
US6433553B1 (en) * | 1999-10-27 | 2002-08-13 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for eliminating displacement current from current measurements in a plasma processing system |
KR20020018902A (ko) * | 2000-09-04 | 2002-03-09 | 김영남 | 플라즈마 디스플레이 패널의 구동방법 |
US6774569B2 (en) * | 2002-07-11 | 2004-08-10 | Fuji Photo Film B.V. | Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
US7288204B2 (en) * | 2002-07-19 | 2007-10-30 | Fuji Photo Film B.V. | Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG) |
EP1403902A1 (de) * | 2002-09-30 | 2004-03-31 | Fuji Photo Film B.V. | Verfahren und Vorrichtung zur Erzeugung eines Glühentladungsplasmas unter atmosphärischem Druck |
JP2004134716A (ja) * | 2002-10-11 | 2004-04-30 | Mori Engineering:Kk | 2電源方式プラズマ発生装置 |
JP2004227990A (ja) * | 2003-01-24 | 2004-08-12 | Kunihide Tachibana | プラズマ処理方法およびプラズマ処理装置 |
-
2004
- 2004-08-13 AT AT04077286T patent/ATE348497T1/de not_active IP Right Cessation
- 2004-08-13 DE DE602004003697T patent/DE602004003697T2/de active Active
- 2004-08-13 EP EP04077286A patent/EP1626613B8/de active Active
-
2005
- 2005-08-12 US US11/202,366 patent/US7399944B2/en active Active
- 2005-08-15 JP JP2005235517A patent/JP5459923B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
DE602004003697D1 (de) | 2007-01-25 |
DE602004003697T2 (de) | 2007-10-04 |
JP2006080060A (ja) | 2006-03-23 |
EP1626613B8 (de) | 2007-03-07 |
EP1626613A1 (de) | 2006-02-15 |
JP5459923B2 (ja) | 2014-04-02 |
US20060081566A1 (en) | 2006-04-20 |
EP1626613B1 (de) | 2006-12-13 |
US7399944B2 (en) | 2008-07-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |