AT388814B - Verfahren und vorrichtung zum erzeugen eines hf-induzierten edelgasplasmas - Google Patents

Verfahren und vorrichtung zum erzeugen eines hf-induzierten edelgasplasmas

Info

Publication number
AT388814B
AT388814B AT0334285A AT334285A AT388814B AT 388814 B AT388814 B AT 388814B AT 0334285 A AT0334285 A AT 0334285A AT 334285 A AT334285 A AT 334285A AT 388814 B AT388814 B AT 388814B
Authority
AT
Austria
Prior art keywords
plasma
producing
induced
induced plasma
plasma plasma
Prior art date
Application number
AT0334285A
Other languages
English (en)
Other versions
ATA334285A (de
Original Assignee
Paar Anton Kg
Knapp Guenther Dr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Paar Anton Kg, Knapp Guenther Dr filed Critical Paar Anton Kg
Priority to AT0334285A priority Critical patent/AT388814B/de
Priority to DE19863638880 priority patent/DE3638880A1/de
Priority to GB8627399A priority patent/GB2183087B/en
Priority to US07/180,590 priority patent/US4877999A/en
Publication of ATA334285A publication Critical patent/ATA334285A/de
Application granted granted Critical
Publication of AT388814B publication Critical patent/AT388814B/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
AT0334285A 1985-11-15 1985-11-15 Verfahren und vorrichtung zum erzeugen eines hf-induzierten edelgasplasmas AT388814B (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AT0334285A AT388814B (de) 1985-11-15 1985-11-15 Verfahren und vorrichtung zum erzeugen eines hf-induzierten edelgasplasmas
DE19863638880 DE3638880A1 (de) 1985-11-15 1986-11-14 Verfahren und vorrichtung zum erzeugen eines hf-induzierten edelgasplasmas
GB8627399A GB2183087B (en) 1985-11-15 1986-11-17 A method aned apparatus for producing an hf-induced noble-gas plasma
US07/180,590 US4877999A (en) 1985-11-15 1988-04-07 Method and apparatus for producing an hf-induced noble-gas plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT0334285A AT388814B (de) 1985-11-15 1985-11-15 Verfahren und vorrichtung zum erzeugen eines hf-induzierten edelgasplasmas

Publications (2)

Publication Number Publication Date
ATA334285A ATA334285A (de) 1989-01-15
AT388814B true AT388814B (de) 1989-09-11

Family

ID=3549095

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0334285A AT388814B (de) 1985-11-15 1985-11-15 Verfahren und vorrichtung zum erzeugen eines hf-induzierten edelgasplasmas

Country Status (4)

Country Link
US (1) US4877999A (de)
AT (1) AT388814B (de)
DE (1) DE3638880A1 (de)
GB (1) GB2183087B (de)

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DE3923661A1 (de) * 1989-07-18 1991-01-24 Leybold Ag Schaltungsanordnung fuer die anpassung der impedanz einer plasmastrecke an einen hochfrequenzgenerator
DE3927324A1 (de) * 1989-08-18 1991-02-21 Leybold Ag Kuehlvorrichtung fuer elektrische schaltungsanordnungen
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US5210466A (en) * 1989-10-03 1993-05-11 Applied Materials, Inc. VHF/UHF reactor system
US5170098A (en) * 1989-10-18 1992-12-08 Matsushita Electric Industrial Co., Ltd. Plasma processing method and apparatus for use in carrying out the same
US5019750A (en) * 1990-01-16 1991-05-28 Gte Products Corporation Radio-frequency driven display
US5155547A (en) * 1990-02-26 1992-10-13 Leco Corporation Power control circuit for inductively coupled plasma atomic emission spectroscopy
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JPH04901A (ja) * 1990-04-18 1992-01-06 Mitsubishi Electric Corp プラズマ装置の高周波給電方法及び装置
US5707486A (en) * 1990-07-31 1998-01-13 Applied Materials, Inc. Plasma reactor using UHF/VHF and RF triode source, and process
US5280252A (en) * 1991-05-21 1994-01-18 Kabushiki Kaisha Kobe Seiko Sho Charged particle accelerator
US5302882A (en) * 1991-09-09 1994-04-12 Sematech, Inc. Low pass filter for plasma discharge
US5200672A (en) * 1991-11-14 1993-04-06 Gte Products Corporation Circuit containing symetrically-driven coil for energizing electrodeless lamp
DE69304522T2 (de) * 1992-04-16 1997-01-23 Advanced Energy Ind Inc Stabilisator fuer schalt-mode geleistet radio-frequenz plasma einrichtung
US5325019A (en) * 1992-08-21 1994-06-28 Sematech, Inc. Control of plasma process by use of harmonic frequency components of voltage and current
DE4322608C2 (de) * 1993-07-07 1996-10-10 Fraunhofer Ges Forschung Einrichtung zur Leistungsmodulation bei einer Plasmaanregung, vorzugsweise beim Einsatz von Gaslasern
DE4333725C2 (de) * 1993-09-28 1997-01-30 Dresden Ev Inst Festkoerper Verfahren und Vorrichtung zur Elementanalytik elektrisch leitender oder nichtleitender Werkstoffproben
DE19605518C2 (de) * 1996-02-15 2000-01-27 Dornier Gmbh Vorrichtung zur Herstellung von Hochdruck/Hochtemperatur-Plasmajets
US6098568A (en) * 1997-12-01 2000-08-08 Applied Materials, Inc. Mixed frequency CVD apparatus
US6041734A (en) * 1997-12-01 2000-03-28 Applied Materials, Inc. Use of an asymmetric waveform to control ion bombardment during substrate processing
US7004107B1 (en) 1997-12-01 2006-02-28 Applied Materials Inc. Method and apparatus for monitoring and adjusting chamber impedance
US6136388A (en) * 1997-12-01 2000-10-24 Applied Materials, Inc. Substrate processing chamber with tunable impedance
DE10161743B4 (de) * 2001-12-15 2004-08-05 Hüttinger Elektronik GmbH & Co. KG Hochfrequenzanregungsanordnung
US8025775B2 (en) * 2002-03-15 2011-09-27 Oerlikon Trading Ag, Truebbach Vacuum plasma generator
ATE348497T1 (de) * 2004-08-13 2007-01-15 Fuji Photo Film Bv Verfahren und vorrichtung zur steuerung eines glühentladungsplasmas unter atmosphärischem druck
US7459899B2 (en) 2005-11-21 2008-12-02 Thermo Fisher Scientific Inc. Inductively-coupled RF power source
US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
WO2009146432A1 (en) 2008-05-30 2009-12-03 Colorado State University Research Foundation Plasma-based chemical source device and method of use thereof
US8575843B2 (en) 2008-05-30 2013-11-05 Colorado State University Research Foundation System, method and apparatus for generating plasma
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
JP2013529352A (ja) 2010-03-31 2013-07-18 コロラド ステート ユニバーシティー リサーチ ファウンデーション 液体−気体界面プラズマデバイス
EP2552340A4 (de) 2010-03-31 2015-10-14 Univ Colorado State Res Found Plasmavorrichtung mit flüssig-gas-schnittstelle
US9075093B2 (en) * 2010-07-08 2015-07-07 Konstantin G. Korotkov Device for measuring electromagnetic field intensity
DE102010050973B4 (de) 2010-11-10 2019-01-24 Thermo Electron (Karlsruhe) Gmbh Rheometer oder Viskosimeter
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation
DE102017115438A1 (de) 2017-06-06 2018-12-06 Fricke Und Mallah Microwave Technology Gmbh Vorrichtung zum erzeugen eines plasmastrahls im mhz- und ghzbereich mit tem- und hohlleitermoden

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Also Published As

Publication number Publication date
ATA334285A (de) 1989-01-15
GB2183087B (en) 1990-02-21
US4877999A (en) 1989-10-31
GB2183087A (en) 1987-05-28
GB8627399D0 (en) 1986-12-17
DE3638880A1 (de) 1987-05-27

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Legal Events

Date Code Title Description
EIH Change in the person of patent owner
ELJ Ceased due to non-payment of the annual fee