JP2010189641A5 - - Google Patents

Download PDF

Info

Publication number
JP2010189641A5
JP2010189641A5 JP2010036379A JP2010036379A JP2010189641A5 JP 2010189641 A5 JP2010189641 A5 JP 2010189641A5 JP 2010036379 A JP2010036379 A JP 2010036379A JP 2010036379 A JP2010036379 A JP 2010036379A JP 2010189641 A5 JP2010189641 A5 JP 2010189641A5
Authority
JP
Japan
Prior art keywords
composition
group
weight
aliphatic ester
containing component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010036379A
Other languages
English (en)
Japanese (ja)
Other versions
JP5656419B2 (ja
JP2010189641A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2010189641A publication Critical patent/JP2010189641A/ja
Publication of JP2010189641A5 publication Critical patent/JP2010189641A5/ja
Application granted granted Critical
Publication of JP5656419B2 publication Critical patent/JP5656419B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2010036379A 2002-05-03 2010-02-22 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法 Expired - Lifetime JP5656419B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37723902P 2002-05-03 2002-05-03
US60/377,239 2002-05-03

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2004502060A Division JP2005529200A (ja) 2002-05-03 2003-05-01 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法

Publications (3)

Publication Number Publication Date
JP2010189641A JP2010189641A (ja) 2010-09-02
JP2010189641A5 true JP2010189641A5 (enExample) 2011-03-03
JP5656419B2 JP5656419B2 (ja) 2015-01-21

Family

ID=29401462

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2004502060A Pending JP2005529200A (ja) 2002-05-03 2003-05-01 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法
JP2010036379A Expired - Lifetime JP5656419B2 (ja) 2002-05-03 2010-02-22 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2004502060A Pending JP2005529200A (ja) 2002-05-03 2003-05-01 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法

Country Status (8)

Country Link
US (3) US7183040B2 (enExample)
EP (2) EP1502155B1 (enExample)
JP (2) JP2005529200A (enExample)
KR (3) KR20120086737A (enExample)
CN (2) CN100576069C (enExample)
AU (1) AU2003224516A1 (enExample)
ES (1) ES2405107T3 (enExample)
WO (1) WO2003093901A1 (enExample)

Families Citing this family (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0212062D0 (en) * 2002-05-24 2002-07-03 Vantico Ag Jetable compositions
US20040077745A1 (en) * 2002-10-18 2004-04-22 Jigeng Xu Curable compositions and rapid prototyping process using the same
US20040137368A1 (en) * 2003-01-13 2004-07-15 3D Systems, Inc. Stereolithographic resins containing selected oxetane compounds
US20050040564A1 (en) * 2003-08-18 2005-02-24 Jones Oliver Systems and methods for using norbornene based curable materials
US20070007698A1 (en) * 2003-08-27 2007-01-11 Shojiro Sano Method of producting three-dimensional model
US7232850B2 (en) * 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
US20070149667A1 (en) * 2003-10-16 2007-06-28 Dsm Ip Assets B.V. Curable compositions and rapid prototyping process using the same
JP2007514805A (ja) * 2003-11-06 2007-06-07 ディーエスエム アイピー アセッツ ビー．ブイ． 硬化性組成物およびそれを用いるラピッドプロトタイピング法
JP2007513234A (ja) * 2003-12-02 2007-05-24 ディーエスエム アイピー アセッツ ビー．ブイ． 難燃性の放射線硬化性組成物
WO2006029095A1 (en) * 2004-09-03 2006-03-16 Henkel Corporation Photoinitiated cationic epoxy compositions
SE529306C2 (sv) * 2005-03-18 2007-06-26 Perstorp Specialty Chem Ab Ultravioletthärdande hartskomposition
JP4702784B2 (ja) * 2005-08-08 2011-06-15 ソニー株式会社 液体吐出型記録ヘッドの流路構成材料
US7279210B2 (en) * 2005-09-07 2007-10-09 3M Innovative Properties Company Curable compositions, methods of making and using the same, and articles therefrom
WO2007031505A1 (en) 2005-09-13 2007-03-22 Huntsman Advanced Materials (Switzerland) Gmbh Photocurable compositions for preparing abs-like articles
US20100152314A1 (en) * 2005-09-29 2010-06-17 Cmet Inc. Resin composition for stereolithography
TWI431416B (zh) * 2005-10-27 2014-03-21 ３Ｄ系統公司 不含銻之光可固化樹脂組合物及三維物件
JP5068454B2 (ja) * 2005-12-06 2012-11-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
JP5280615B2 (ja) * 2006-06-16 2013-09-04 シーメット株式会社 光学的立体造形用樹脂組成物
JP2008024871A (ja) * 2006-07-24 2008-02-07 Fujifilm Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
KR20100014901A (ko) * 2007-03-14 2010-02-11 훈츠만 어드밴스트 머티리얼스(스위처랜드) 게엠베하 Ａｂｓ-유사 물품을 제조하기 위한 광경화성 조성물
KR101433413B1 (ko) * 2007-03-20 2014-08-26 디에스엠 아이피 어셋츠 비.브이. 입체리소그래피 수지 조성물 및 이로부터 제조된 3차원 물체
US20090004579A1 (en) * 2007-06-27 2009-01-01 Dsm Ip Assets B.V. Clear and colorless three-dimensional articles made via stereolithography and method of making said articles
EP2215525B1 (en) * 2007-11-27 2018-01-10 3D Systems Incorporated Photocurable resin composition for producing three dimensional articles having high clarity
JP5210645B2 (ja) * 2008-01-25 2013-06-12 シーメット株式会社 光学的立体造形用樹脂組成物
JP5284833B2 (ja) * 2008-03-31 2013-09-11 富士フイルム株式会社 フォトスペーサーの製造方法
JP5446902B2 (ja) * 2009-03-05 2014-03-19 Ｄｉｃ株式会社 カチオン重合性接着剤及びそれを用いて得られた偏光板
CN102272227B (zh) 2009-03-13 2014-03-12 帝斯曼知识产权资产管理有限公司 可辐射固化树脂组合物以及使用这种组合物的快速三维成像方法
US11725395B2 (en) 2009-09-04 2023-08-15 Välinge Innovation AB Resilient floor
US8365499B2 (en) 2009-09-04 2013-02-05 Valinge Innovation Ab Resilient floor
CA2770470C (en) 2009-09-04 2018-04-03 Vaelinge Innovation Ab A method of assembling resilient floorboards which are provided with a mechanical locking system
CN102803625B (zh) * 2010-01-11 2014-12-31 韦林奇创新公司 具有互锁设计的地板覆盖物
CN102385250A (zh) * 2011-06-29 2012-03-21 南昌大学 一种紫外激光固化快速成型光敏树脂及制备方法
JP5843508B2 (ja) * 2011-07-21 2016-01-13 Jsr株式会社 光学的立体造形用放射線硬化性液状樹脂組成物、及びそれを光硬化させて得られる光造形物
US9314936B2 (en) 2011-08-29 2016-04-19 Valinge Flooring Technology Ab Mechanical locking system for floor panels
JP2014048556A (ja) * 2012-09-03 2014-03-17 Sumitomo Chemical Co Ltd 感光性樹脂組成物
UA111803C2 (uk) * 2012-10-05 2016-06-10 Кроноплюс Текнікал Аг Підлогова панель для зовнішнього застосування
CN102981362A (zh) * 2012-11-14 2013-03-20 南昌大学 4,5-环氧环己烷-1,2-二甲酸二缩水甘油酯作为预聚物制备立体光刻快速成型光敏树脂的方法及应用
BR112015024059B1 (pt) 2013-03-25 2021-09-21 Välinge Innovation AB Tábuas de piso providas com um sistema de travamento mecânico e um método para a produção de um sistema de travamento como esse
JP6414411B2 (ja) 2013-08-09 2018-10-31 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 積層造形用の低粘度液状放射線硬化型歯科アライナー成形型用樹脂組成物
JP6399084B2 (ja) * 2014-03-14 2018-10-03 コニカミノルタ株式会社 ３ｄ造形用光硬化性組成物および３ｄ造形物の製造方法
CA2996422C (en) 2014-08-29 2023-05-02 Inotec Global Ltd Vertical joint system for a surface covering panel
KR101835296B1 (ko) * 2015-03-26 2018-03-06 도오꾜오까고오교 가부시끼가이샤 네거티브형 감광성 조성물, 패턴 형성 방법
CA3008157C (en) 2015-12-17 2023-08-22 Valinge Innovation Ab A method for producing a mechanical locking system for panels
CN108779321B (zh) * 2016-03-30 2021-04-02 株式会社Adeka 固化性组合物、固化物的制造方法、及其固化物
US10287777B2 (en) 2016-09-30 2019-05-14 Valinge Innovation Ab Set of panels
EP3532518B1 (en) 2016-10-28 2022-08-10 Covestro (Netherlands) B.V. Thermosetting compositions and forming three-dimensional objects therefrom
EP3315292A1 (en) * 2016-10-28 2018-05-02 DSM IP Assets B.V. Thermosetting compositions and forming three-dimensional objects therefrom
JP7068270B2 (ja) * 2017-03-06 2022-05-16 マクセル株式会社 モデル材インクセット、サポート材組成物、インクセット、立体造形物および立体造形物の製造方法
TWI760487B (zh) * 2017-04-28 2022-04-11 南韓商Ｌｇ化學股份有限公司 封裝組成物
PL3687949T3 (pl) 2017-11-03 2024-11-04 Covestro (Netherlands) B.V. Układy blokujące wodę zawierające włókna powleczone ciekłymi, utwardzanymi promieniowaniem kompozycjami sap
CN111788269B (zh) 2017-12-15 2023-10-20 科思创(荷兰)有限公司 用于高温喷射粘性热固性材料以经由增材制造创建固体制品的组合物和方法
TWI692502B (zh) 2017-12-29 2020-05-01 法商阿科瑪法國公司 可固化組成物
PT3737802T (pt) 2018-01-09 2023-07-19 Vaelinge Innovation Ab Conjunto de painéis
US11633908B2 (en) * 2018-03-02 2023-04-25 Formlabs, Inc. Latent cure resins and related methods
US10793735B2 (en) * 2018-03-15 2020-10-06 Ricoh Company, Ltd. Curable composition, curable ink, storing container, two-dimensional or three-dimensional image forming device, two-dimensional or three-dimensional image forming method, cured product, printed matter, and adhesive label
WO2020003133A1 (en) * 2018-06-29 2020-01-02 3M Innovative Properties Company Hydrated orthodontic articles, kits, and methods of making same
CN111624853B (zh) * 2019-07-10 2023-07-14 住华科技股份有限公司 着色树脂组成物、及应用其的彩色滤光片和显示设备
EP4117892A4 (en) * 2020-03-09 2023-11-22 Hewlett-Packard Development Company, L.P. THREE-DIMENSIONAL PRINTING USING A WATER-SOLUBLE CHARGED YELLOW DYE FUSING AGENT
SE545292C2 (en) * 2020-07-08 2023-06-20 Perstorp Ab A radiation curable composition comprising a biobased reactive diluent
EP4206820A1 (en) 2021-12-30 2023-07-05 Arkema France Hybrid photocurable composition

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3708296A (en) 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US3835003A (en) * 1968-08-20 1974-09-10 American Can Co Photopolymerization of oxetanes
PT71476A (en) 1979-07-03 1980-08-01 Sagami Chem Res Process for producing oxygen-containing hydrocarbon compounds
US4339567A (en) 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
US4383025A (en) 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts
US4398014A (en) 1980-11-04 1983-08-09 Ciba-Geigy Corporation Sulfoxonium salts and their use as polymerization catalysts
DE3369398D1 (en) 1982-05-19 1987-02-26 Ciba Geigy Ag Curable compositions containing metallocen complexes, activated primers obtained therefrom and their use
DE3366408D1 (en) 1982-05-19 1986-10-30 Ciba Geigy Ag Photopolymerisation with organometal salts
DE3565013D1 (en) 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
GB8414525D0 (en) 1984-06-07 1984-07-11 Ciba Geigy Ag Sulphoxonium salts
US4694029A (en) * 1985-04-09 1987-09-15 Cook Paint And Varnish Company Hybrid photocure system
EP0389067B1 (en) 1985-11-20 1994-10-19 The Mead Corporation Ionic dye compounds
US4772530A (en) 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
US4772541A (en) 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US4751102A (en) 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
US5002856A (en) 1989-08-02 1991-03-26 E. I. Du Pont De Nemours And Company Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid
TW269017B (enExample) 1992-12-21 1996-01-21 Ciba Geigy Ag
US5364737A (en) * 1994-01-25 1994-11-15 Morton International, Inc. Waterbone photoresists having associate thickeners
KR950034472A (ko) * 1994-04-06 1995-12-28 가나이 쓰토무 패턴형성방법 및 그것에 사용되는 투영노광장치
US5665792A (en) 1995-06-07 1997-09-09 E. I. Du Pont De Nemours And Company Stabilizers for use with photoacid precursor formulations
WO1996041237A1 (en) 1995-06-07 1996-12-19 E.I. Du Pont De Nemours And Company Sensitizers and photoacid precursors
JP3161583B2 (ja) * 1995-07-21 2001-04-25 東亞合成株式会社 活性エネルギー線硬化型組成物
JP3849989B2 (ja) * 1996-04-09 2006-11-22 株式会社Ａｄｅｋａ 光学的立体造形用樹脂組成物および光学的立体造形法
TW329539B (en) * 1996-07-05 1998-04-11 Mitsubishi Electric Corp The semiconductor device and its manufacturing method
KR100491736B1 (ko) 1996-07-29 2005-09-09 반티코 아게 입체리토그래피용방사선-경화성액체조성물
EP1351308B1 (en) * 1996-08-27 2009-04-22 Seiko Epson Corporation Exfoliating method and transferring method of thin film device
JP4197361B2 (ja) * 1996-12-02 2008-12-17 株式会社Ａｄｅｋａ 光学的立体造形用樹脂組成物および光学的立体造形方法
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 光硬化性樹脂組成物
US5821897A (en) 1996-12-20 1998-10-13 Wiltron Company Simulator for testing a collision avoidance radar system
FR2757530A1 (fr) 1996-12-24 1998-06-26 Rhodia Chimie Sa Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques
JP3913350B2 (ja) * 1998-01-13 2007-05-09 ナブテスコ株式会社 光学的造形用樹脂組成物
EP0938026B1 (en) * 1998-02-18 2009-05-27 DSM IP Assets B.V. Photocurable liquid resin composition
EP1092174B1 (en) * 1998-06-11 2003-03-19 Dow Global Technologies Inc. Photocurable elastomeric polymers
JP4350832B2 (ja) * 1999-04-19 2009-10-21 Ｊｓｒ株式会社 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物
US6413699B1 (en) * 1999-10-11 2002-07-02 Macdermid Graphic Arts, Inc. UV-absorbing support layers and flexographic printing elements comprising same
JP3893833B2 (ja) * 2000-02-09 2007-03-14 ブラザー工業株式会社 インクジェット記録方式用エネルギー線硬化型組成物
JP2001310938A (ja) 2000-04-28 2001-11-06 Showa Denko Kk 重合性組成物、その硬化物と製造方法
JP3974336B2 (ja) * 2001-03-01 2007-09-12 ナブテスコ株式会社 光学的立体造形用の活性エネルギー線硬化性樹脂組成物
US20030149124A1 (en) * 2001-11-27 2003-08-07 Thommes Glen A. Radiation curable resin composition for making colored three dimensional objects

Similar Documents

Publication Publication Date Title
JP2005529200A5 (enExample)
JP2010506979A5 (enExample)
JP2011516694A5 (enExample)
JP2016513071A5 (enExample)
JP2012007080A5 (enExample)
JP2014529608A5 (enExample)
JP2016505668A5 (enExample)
JP2012525467A5 (enExample)
JP2014505105A5 (enExample)
JP2012530052A5 (enExample)
RU2011138614A (ru) Отверждаемая излучением полимерная композиция для покрытия проводов
CN104887535B (zh) 一种低体积收缩、抗菌牙科树脂复合材料的制备方法
JP2014520903A5 (enExample)
JP2014509612A5 (enExample)
RU2011138616A (ru) Отверждаемая излучением полимерная композиция для покрытия проводов
JP2010506931A5 (enExample)
JP2021525821A5 (enExample)
JP2013540864A5 (enExample)
JP5479060B2 (ja) 歯科用化学重合触媒
WO2014106799A3 (es) Monómeros de bis-glicidilmetacri latos para la formulación de resinas compuestas para uso dental, método para la preparación de dichos monómeros bis- glicidilmetacri latos, formulación de resinas de restauración dental directa que los comprenden y usos de dichos monómeros
JP2017186526A5 (enExample)
CN106661153A (zh) 聚合性单体、固化性组合物以及树脂部件
JP2012533527A5 (enExample)
JP2011162770A5 (enExample)
WO2016031829A1 (ja) 重合性単量体、硬化性組成物および樹脂部材