JP2016513071A5 - - Google Patents
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- JP2016513071A5 JP2016513071A5 JP2015547398A JP2015547398A JP2016513071A5 JP 2016513071 A5 JP2016513071 A5 JP 2016513071A5 JP 2015547398 A JP2015547398 A JP 2015547398A JP 2015547398 A JP2015547398 A JP 2015547398A JP 2016513071 A5 JP2016513071 A5 JP 2016513071A5
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- JP
- Japan
- Prior art keywords
- addition
- meth
- compound
- weight
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000203 mixture Substances 0.000 claims 13
- 238000003776 cleavage reaction Methods 0.000 claims 12
- 150000001875 compounds Chemical class 0.000 claims 12
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 9
- 239000000178 monomer Substances 0.000 claims 8
- 238000000034 method Methods 0.000 claims 6
- 239000011347 resin Substances 0.000 claims 5
- 229920005989 resin Polymers 0.000 claims 5
- 125000000524 functional group Chemical group 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- 125000005842 heteroatom Chemical group 0.000 claims 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 239000004851 dental resin Substances 0.000 claims 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 claims 2
- 239000003999 initiator Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 2
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 claims 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 claims 1
- VNFYMAPAENTMMO-UHFFFAOYSA-N 5-chloro-2-methylquinoline Chemical compound ClC1=CC=CC2=NC(C)=CC=C21 VNFYMAPAENTMMO-UHFFFAOYSA-N 0.000 claims 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 1
- AMFGWXWBFGVCKG-UHFFFAOYSA-N Panavia opaque Chemical compound C1=CC(OCC(O)COC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCC(O)COC(=O)C(C)=C)C=C1 AMFGWXWBFGVCKG-UHFFFAOYSA-N 0.000 claims 1
- 239000002202 Polyethylene glycol Substances 0.000 claims 1
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 claims 1
- BIAPHJKUKHWRMP-UHFFFAOYSA-N [SiH4].C=C1CCCCSS1 Chemical compound [SiH4].C=C1CCCCSS1 BIAPHJKUKHWRMP-UHFFFAOYSA-N 0.000 claims 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 229940008075 allyl sulfide Drugs 0.000 claims 1
- QUZSUMLPWDHKCJ-UHFFFAOYSA-N bisphenol A dimethacrylate Chemical class C1=CC(OC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OC(=O)C(C)=C)C=C1 QUZSUMLPWDHKCJ-UHFFFAOYSA-N 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 239000003085 diluting agent Substances 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 150000002148 esters Chemical group 0.000 claims 1
- MKVYSRNJLWTVIK-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O.CC(=C)C(O)=O MKVYSRNJLWTVIK-UHFFFAOYSA-N 0.000 claims 1
- 239000000945 filler Substances 0.000 claims 1
- 229910052809 inorganic oxide Inorganic materials 0.000 claims 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims 1
- -1 neopentyl glycol diester Chemical class 0.000 claims 1
- 229920001223 polyethylene glycol Polymers 0.000 claims 1
- 150000003254 radicals Chemical class 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261738067P | 2012-12-17 | 2012-12-17 | |
| US61/738,067 | 2012-12-17 | ||
| PCT/US2013/072250 WO2014099317A1 (en) | 2012-12-17 | 2013-11-27 | Addition-fragmentation oligomers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016513071A JP2016513071A (ja) | 2016-05-12 |
| JP2016513071A5 true JP2016513071A5 (enExample) | 2016-12-22 |
| JP6306044B2 JP6306044B2 (ja) | 2018-04-04 |
Family
ID=49780392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015547398A Expired - Fee Related JP6306044B2 (ja) | 2012-12-17 | 2013-11-27 | 付加開裂オリゴマー |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9463146B2 (enExample) |
| EP (1) | EP2931756B1 (enExample) |
| JP (1) | JP6306044B2 (enExample) |
| KR (1) | KR102008353B1 (enExample) |
| CN (1) | CN104870484B (enExample) |
| WO (1) | WO2014099317A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105051007B (zh) | 2013-03-20 | 2020-03-13 | 3M创新有限公司 | 高折射率加成-断裂剂 |
| EP2986269A1 (en) | 2013-04-15 | 2016-02-24 | 3M Innovative Properties Company | Dental composition containing high refractive index monomers |
| WO2015041863A1 (en) | 2013-09-20 | 2015-03-26 | 3M Innovative Properties Company | Trithiocarbonate-containing addition-fragmentation agents |
| US9758478B2 (en) | 2013-10-16 | 2017-09-12 | 3M Innovative Properties Company | Allyl disulfide-containing addition-fragmentation oligomers |
| CN106029802B (zh) * | 2014-02-18 | 2020-08-18 | 3M创新有限公司 | 具有高折射率基团的加成-断裂低聚物 |
| US10350297B2 (en) | 2014-10-31 | 2019-07-16 | 3M Innovative Properties Company | Dental materials and methods |
| WO2016069290A1 (en) | 2014-10-31 | 2016-05-06 | 3M Innovative Properties Company | Dental materials and methods |
| JP6644079B2 (ja) * | 2015-02-20 | 2020-02-12 | スリーエム イノベイティブ プロパティズ カンパニー | 付加−開裂オリゴマー |
| US10492888B2 (en) | 2015-07-07 | 2019-12-03 | Align Technology, Inc. | Dental materials using thermoset polymers |
| KR20190031505A (ko) * | 2016-07-20 | 2019-03-26 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 양자점을 위한 안정화 스티렌계 중합체 |
| US10975221B2 (en) | 2016-10-27 | 2021-04-13 | 3M Innovative Properties Company | Crosslinkable composition including a (meth)acrylic polymer and methods of making a crosslinked composition |
| WO2019189579A1 (ja) * | 2018-03-30 | 2019-10-03 | 三井化学株式会社 | 歯科材料用重合性組成物、該組成物から得られた歯科材料 |
| US10781274B2 (en) * | 2018-05-04 | 2020-09-22 | Align Technology, Inc. | Polymerizable monomers and method of polymerizing the same |
| CN117736392A (zh) | 2018-05-04 | 2024-03-22 | 阿莱恩技术有限公司 | 用于基于高温光刻的光致聚合工艺的可固化组合物和由其制备交联聚合物的方法 |
| US11932571B2 (en) | 2019-05-24 | 2024-03-19 | Covestro (Netherland) B.V. | Radiation curable compositions for coating optical fiber with enhanced high-speed processability |
| DE102019122174A1 (de) | 2019-08-19 | 2021-02-25 | Voco Gmbh | Dentale polymerisierbare Zusammensetzung auf der Basis kondensierter Silane |
| US12215223B2 (en) | 2019-10-31 | 2025-02-04 | Align Technology, Inc. | Crystallizable resins |
| US12404419B2 (en) | 2020-11-05 | 2025-09-02 | 3M Innovative Properties Company | Imide addition-fragmentation agents |
| US12398301B2 (en) | 2021-12-06 | 2025-08-26 | 3M Innovative Properties Company | Adhesives comprising cyclic imide addition-fragmentation and adhesion agents |
| US12618138B2 (en) | 2021-12-21 | 2026-05-05 | Corning Incorporated | Anti-reflective coatings for IR-transmitting substrates |
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| US4522958A (en) | 1983-09-06 | 1985-06-11 | Ppg Industries, Inc. | High-solids coating composition for improved rheology control containing chemically modified inorganic microparticles |
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| US4886861A (en) | 1985-04-23 | 1989-12-12 | E. I. Dupont De Nemours And Company | Molecular weight control in free radical polymerizations |
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| US6387981B1 (en) | 1999-10-28 | 2002-05-14 | 3M Innovative Properties Company | Radiopaque dental materials with nano-sized particles |
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| WO2003015720A1 (en) | 2001-08-15 | 2003-02-27 | 3M Innovative Properties Company | Hardenable self-supporting structures and methods |
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| RU2586743C2 (ru) | 2011-08-23 | 2016-06-10 | Зм Инновейтив Пропертиз Компани | Стоматологические композиции, содержащие агенты присоединения-фрагментации |
| US9414996B2 (en) | 2012-11-12 | 2016-08-16 | 3M Innovative Properties Company | Dental compositions comprising addition-fragmentation agents |
| JP6403679B2 (ja) | 2012-11-12 | 2018-10-10 | スリーエム イノベイティブ プロパティズ カンパニー | 付加開裂剤 |
-
2013
- 2013-11-27 EP EP13808374.6A patent/EP2931756B1/en active Active
- 2013-11-27 JP JP2015547398A patent/JP6306044B2/ja not_active Expired - Fee Related
- 2013-11-27 US US14/652,134 patent/US9463146B2/en active Active
- 2013-11-27 KR KR1020157018846A patent/KR102008353B1/ko not_active Expired - Fee Related
- 2013-11-27 CN CN201380065942.1A patent/CN104870484B/zh active Active
- 2013-11-27 WO PCT/US2013/072250 patent/WO2014099317A1/en not_active Ceased