JP6403679B2 - 付加開裂剤 - Google Patents
付加開裂剤 Download PDFInfo
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- JP6403679B2 JP6403679B2 JP2015541828A JP2015541828A JP6403679B2 JP 6403679 B2 JP6403679 B2 JP 6403679B2 JP 2015541828 A JP2015541828 A JP 2015541828A JP 2015541828 A JP2015541828 A JP 2015541828A JP 6403679 B2 JP6403679 B2 JP 6403679B2
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- group
- meth
- acid
- acrylate
- formula
- Prior art date
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- 238000003776 cleavage reaction Methods 0.000 title claims description 35
- 230000007017 scission Effects 0.000 title claims description 32
- 239000000178 monomer Substances 0.000 claims description 84
- 239000000203 mixture Substances 0.000 claims description 80
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 61
- 125000000524 functional group Chemical group 0.000 claims description 57
- 239000003795 chemical substances by application Substances 0.000 claims description 51
- 239000000945 filler Substances 0.000 claims description 42
- 239000002253 acid Substances 0.000 claims description 31
- 239000002245 particle Substances 0.000 claims description 29
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 21
- 125000003118 aryl group Chemical group 0.000 claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 19
- 125000005647 linker group Chemical group 0.000 claims description 18
- 125000005842 heteroatom Chemical group 0.000 claims description 17
- 239000003999 initiator Substances 0.000 claims description 15
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 15
- NEAQRZUHTPSBBM-UHFFFAOYSA-N 2-hydroxy-3,3-dimethyl-7-nitro-4h-isoquinolin-1-one Chemical group C1=C([N+]([O-])=O)C=C2C(=O)N(O)C(C)(C)CC2=C1 NEAQRZUHTPSBBM-UHFFFAOYSA-N 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 11
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 125000004076 pyridyl group Chemical group 0.000 claims description 10
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 10
- 150000004712 monophosphates Chemical group 0.000 claims description 9
- 229920002554 vinyl polymer Polymers 0.000 claims description 9
- 125000002947 alkylene group Chemical group 0.000 claims description 8
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 8
- 239000011256 inorganic filler Substances 0.000 claims description 8
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 8
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 7
- 150000008064 anhydrides Chemical class 0.000 claims description 7
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 claims description 7
- 230000000269 nucleophilic effect Effects 0.000 claims description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 6
- 125000003354 benzotriazolyl group Chemical group N1N=NC2=C1C=CC=C2* 0.000 claims description 6
- 150000001735 carboxylic acids Chemical class 0.000 claims description 6
- XFXPMWWXUTWYJX-UHFFFAOYSA-N isonitrile group Chemical group N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims description 6
- WDJHALXBUFZDSR-UHFFFAOYSA-M acetoacetate Chemical compound CC(=O)CC([O-])=O WDJHALXBUFZDSR-UHFFFAOYSA-M 0.000 claims description 5
- XNQULTQRGBXLIA-UHFFFAOYSA-O phosphonic anhydride Chemical group O[P+](O)=O XNQULTQRGBXLIA-UHFFFAOYSA-O 0.000 claims description 5
- 150000003573 thiols Chemical class 0.000 claims description 5
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 150000004820 halides Chemical class 0.000 claims description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims 4
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 claims 4
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims 4
- JXUFISIHEZOBPI-UHFFFAOYSA-N amidosulfurous acid Chemical compound NS(O)=O JXUFISIHEZOBPI-UHFFFAOYSA-N 0.000 claims 3
- 229910052809 inorganic oxide Inorganic materials 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 1
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 claims 1
- -1 hard coats Substances 0.000 description 52
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 43
- 239000000853 adhesive Substances 0.000 description 34
- 230000001070 adhesive effect Effects 0.000 description 34
- 238000012360 testing method Methods 0.000 description 30
- 239000000758 substrate Substances 0.000 description 26
- 150000003254 radicals Chemical class 0.000 description 20
- 239000002105 nanoparticle Substances 0.000 description 19
- 229920000642 polymer Polymers 0.000 description 19
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 18
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 18
- 239000000377 silicon dioxide Substances 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 16
- 239000003607 modifier Substances 0.000 description 16
- 239000007787 solid Substances 0.000 description 15
- 125000004432 carbon atom Chemical group C* 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- 150000002148 esters Chemical class 0.000 description 13
- 239000011521 glass Substances 0.000 description 13
- 239000004593 Epoxy Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 11
- 238000006116 polymerization reaction Methods 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 10
- 239000000047 product Substances 0.000 description 10
- 229910000077 silane Inorganic materials 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 229920000728 polyester Polymers 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 239000013638 trimer Substances 0.000 description 8
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 150000001408 amides Chemical class 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 125000004404 heteroalkyl group Chemical group 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 238000010998 test method Methods 0.000 description 7
- 125000003396 thiol group Chemical group [H]S* 0.000 description 7
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000006059 cover glass Substances 0.000 description 6
- 239000003085 diluting agent Substances 0.000 description 6
- 125000001072 heteroaryl group Chemical group 0.000 description 6
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 5
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- 241000183024 Populus tremula Species 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 239000000539 dimer Substances 0.000 description 5
- 238000006073 displacement reaction Methods 0.000 description 5
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 4
- 101100215647 Aspergillus flavus (strain ATCC 200026 / FGSC A1120 / IAM 13836 / NRRL 3357 / JCM 12722 / SRRC 167) aflR gene Proteins 0.000 description 4
- 0 CC1*(C)CCC1 Chemical compound CC1*(C)CCC1 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000011324 bead Substances 0.000 description 4
- 235000013877 carbamide Nutrition 0.000 description 4
- 125000002843 carboxylic acid group Chemical group 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical group OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- QMVPMAAFGQKVCJ-UHFFFAOYSA-N citronellol Chemical compound OCCC(C)CCC=C(C)C QMVPMAAFGQKVCJ-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 239000007822 coupling agent Substances 0.000 description 4
- 150000002009 diols Chemical class 0.000 description 4
- 125000002228 disulfide group Chemical group 0.000 description 4
- SJWFXCIHNDVPSH-UHFFFAOYSA-N octan-2-ol Chemical compound CCCCCCC(C)O SJWFXCIHNDVPSH-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011345 viscous material Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 3
- QPRQEDXDYOZYLA-UHFFFAOYSA-N 2-methylbutan-1-ol Chemical compound CCC(C)CO QPRQEDXDYOZYLA-UHFFFAOYSA-N 0.000 description 3
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 3
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
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- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
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- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
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- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 description 3
- 125000000335 thiazolyl group Chemical group 0.000 description 3
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- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
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- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000013467 fragmentation Methods 0.000 description 2
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- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- AYOHIQLKSOJJQH-UHFFFAOYSA-N dibutyltin Chemical compound CCCC[Sn]CCCC AYOHIQLKSOJJQH-UHFFFAOYSA-N 0.000 description 1
- JGUQDUKBUKFFRO-CIIODKQPSA-N dimethylglyoxime Chemical compound O/N=C(/C)\C(\C)=N\O JGUQDUKBUKFFRO-CIIODKQPSA-N 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000004088 foaming agent Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229920001002 functional polymer Polymers 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004474 heteroalkylene group Chemical group 0.000 description 1
- 239000008241 heterogeneous mixture Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229920006270 hydrocarbon resin Polymers 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N n-butyl methyl ketone Natural products CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical compound C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- OPECTNGATDYLSS-UHFFFAOYSA-N naphthalene-2-sulfonyl chloride Chemical compound C1=CC=CC2=CC(S(=O)(=O)Cl)=CC=C21 OPECTNGATDYLSS-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- ZDHCZVWCTKTBRY-UHFFFAOYSA-N omega-Hydroxydodecanoic acid Natural products OCCCCCCCCCCCC(O)=O ZDHCZVWCTKTBRY-UHFFFAOYSA-N 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- YNXCGLKMOXLBOD-UHFFFAOYSA-N oxolan-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CCCO1 YNXCGLKMOXLBOD-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 238000003359 percent control normalization Methods 0.000 description 1
- 239000013500 performance material Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 230000000886 photobiology Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- KRIOVPPHQSLHCZ-UHFFFAOYSA-N propiophenone Chemical compound CCC(=O)C1=CC=CC=C1 KRIOVPPHQSLHCZ-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- YLQLIQIAXYRMDL-UHFFFAOYSA-N propylheptyl alcohol Chemical compound CCCCCC(CO)CCC YLQLIQIAXYRMDL-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 238000007342 radical addition reaction Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000002407 reforming Methods 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 230000000979 retarding effect Effects 0.000 description 1
- 125000006413 ring segment Chemical group 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000526 short-path distillation Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000000626 sulfinic acid group Chemical group 0.000 description 1
- IWOKCMBOJXYDEE-UHFFFAOYSA-N sulfinylmethane Chemical compound C=S=O IWOKCMBOJXYDEE-UHFFFAOYSA-N 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical group [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 239000011593 sulfur Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000006188 syrup Substances 0.000 description 1
- 235000020357 syrup Nutrition 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000003828 vacuum filtration Methods 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- 239000002446 δ-tocopherol Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
- C08K5/5455—Silicon-containing compounds containing nitrogen containing at least one group
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
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- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
- C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
- C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08F2438/00—Living radical polymerisation
- C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
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Description
本開示は、低応力重合性組成物において使用するための新規付加開裂剤を提供する。フリーラジカル重合は、通常、モノマーがポリマーに変換されるとき、体積の減少を伴う。体積の収縮によって、硬化された組成物において応力が生じ、微小な亀裂及び変形を引き起こす。硬化された組成物と基材との間の界面に移動した応力は、接着不良を引き起こす場合があり、硬化された組成物の耐久性に影響を与える場合がある。
本開示は、次の官能基、1)開裂させ、再形成させて歪みを軽減することができる不安定な付加開裂基、及び2)共有結合又はイオン結合を形成することなどによって、基材の表面と結合する少なくとも2つの表面結合官能基を有する、付加開裂剤を提供する。
「アクリロイル」は一般的な意味で用いられ、アクリル酸の誘導体だけなくアミン誘導体及びアルコール誘導体もそれぞれ意味する。
本開示は、次の官能基、1)開裂させ、再形成させて歪みを軽減することができる不安定な付加開裂基、及び2)少なくとも2つの表面結合官能基を有する、付加開裂剤を提供する。
[式中、
R1、R2、及びR3は各々独立して、Yp−Q’−、(ヘテロ)アルキル基、又は(ヘテロ)アリール基であり、ただし、R1、R2、及びR3のうちの少なくとも2つはYp−Q’−であり、
Q’は共有結合又は連結基であり、好ましくは価数がp+1である(ヘテロ)ヒドロカルビル連結基であり、
Yは、表面結合官能基であり、
pは、1又は2であり、
各X1は、独立して、−O−又は−NR4−(式中、R4は、H又はC1〜C4アルキルである)であり、
nは0又は1である]R1、R2、及びR3の各々は、2つ以上のYp−Q’−基を含んでもよいことが、更に理解されるであろう。
[式中、X2は、求電子性又は求核性の官能基を含み、
X3は、独立して、X2、X1−R2、又はX1−R3であり、
nは、0又は1である]
で表される化合物を、
式(III)で表される共反応性化合物と反応させる。
A2−R5*−Y III、
[式中、
A2は、官能基X2と共反応性である官能基であり、
R5*は、単結合、又は基Yを反応性官能基A2に結合させる二価若しくは三価の(ヘテロ)ヒドロカルビル連結基である]反応の結果として、付加開裂剤は、2つ以上の表面結合官能基Yを備える。
式中、各R4は、水素、C1〜C4アルキル基、又はアリール基であり、各R6は、1〜6個の炭素原子を有するアルキレン基、5〜10個の炭素原子を有する5員環若しくは6員環シクロアルキレン基、又は6〜16個の炭素原子を有する二価芳香族基である。
上記のように、A2*−X2*−がA2とX2との間に形成される結合である、−R5−A2*−X2*−として定義し得ることが理解されるであろう。したがって、Q’は、単結合又は二価の連結(ヘテロ)ヒドロカルビル基として定義し得る。より具体的には、Q’は、単結合、又は表面結合基を共反応性官能基Aに結合させる二価連結基であり、好ましくは、最大34個、好ましくは最大18個、より好ましくは最大10個の炭素、並びに任意に、酸素及び窒素原子、任意のカテナリーエステル、アミド、尿素、ウレタン、及び炭酸塩基を含む。Qが単結合ではない場合、−O−、−S−、−NR4−、−SO2−、−PO2−、−CO−、−OCO−、−R6−、並びに−N(R4)−CO−O−、−N(R4)−CO−N(R4)−、−CO−O−R6−、−CO−NR4−R6−、及び−R6−CO−O−R6−、−O−R6−、−S−R6−−、−N(R4)−R6−、−SO2−R6−、−PO2−R6−、−CO−R6−、−OCO−R6−、−N(R4)−CO−R6−、NR4−R6−CO−O−、N(R4)−CO−N(R4)−、−R6−等のそれらの組み合わせから選択され得、ただし、Q’−Ypは、過酸化結合、すなわち、O−O、N−O、S−O、N−N、N−S結合を含まず、各R4は、水素、C1〜C4アルキル基、又はアリール基であり、各R6は、1〜6個の炭素原子を有するアルキレン基、5〜10個の炭素原子を有する5員環若しくは6員環シクロアルキレン基、又は6〜16個の炭素原子を有する二価アリーレン基である。
式中、各R6は、1〜6個の炭素原子を有するアルキレン基、5〜10個の炭素原子を有する5員環若しくは6員環シクロアルキレン基、又は6〜16個の炭素原子を有する二価芳香族基である。R6は、エーテル、アミン、チオエーテル、エステル、アミド、尿素、及びウレタン官能基、例えば、R6’がR6として定義されるR6−NH−CO−O−R6’−NCOを含む、1つ以上の鎖内官能基で置換されてもよい。R4は、H又はC1〜C4アルキルである。
i.100重量部以下、好ましくは85〜99.5重量部の(メタ)アクリル酸エステル、
ii.0〜15重量部、好ましくは0.5〜15重量部の酸官能性エチレン性不飽和モノマー、
iii.0〜15重量部の非酸官能性エチレン性不飽和極性モノマー、
iv.0〜5部のビニルモノマー、
v.0〜5部の多官能性(メタ)アクリレート、
vi.0〜5部の光開始剤、
を含み得る。
[式中、
Fillerは、無機フィラー粒子であり、
R2は、Yp−Q’−、(ヘテロ)アルキル基、又は(ヘテロ)アリール基であり、
Q’は共有結合又は連結基であり、好ましくは、価数がp+1である有機(ヘテロ)ヒドロカルビル連結基であり、
Y’は、付加開裂剤を配置した基材と結合する表面結合有機官能基の残基であり、
pは1又は2であり、
X1は、独立して、−O−又は−NR4−(式中、R4は、H又はC1〜C4アルキルである)であり、
nは、0又は1である]。
0.1〜12重量%の付加開裂(AFM)及び/又はAFM修飾シリカ、官能化フィラーであるか否かに関わらずAFMそれ自体に関する重量パーセント(0.1〜12重量%のAFM)
20〜75重量%の多官能性(メタ)アクリレートモノマー及び/又は多官能性(メタ)アクリレートオリゴマー、
0〜25重量%の範囲の(メタ)アクリレート希釈剤(0〜25重量%)
20〜75重量%のシリカなどの無機フィラー、官能化されるか否かに関わらず無機フィラーそれ自体に関する重量範囲、を含み得る。
式中、破線は基材の表面を表し、基材と結合基Y’との間の結合は、上記のように、共結合又はイオン性結合であり得る。残りの基は、表面修飾フィラー粒子について前述した通りである。示す通り、そのような表面官能化基材は、種々のモノマー又は重合性組成物と共重合され得るα,β−エチレン性不飽和基を提供する。具体的には、AFM表面修飾基材は、AFMを含む重合性組成物で続いてコーティングされ得る。エチレン性不飽和基を硬化中に重合性組成物に組み込むことで、基材とコーティングとの間の確実な結合が得られると考えられる。
ダイヤメトラル引張強度(DTS)試験方法
本試験では、硬化性組成物のダイヤメトラル引張強度を測定した。未硬化の試験サンプル組成物を4mm(内径)のガラス管に注入し、この管にシリコーンゴムのプラグで蓋をした。管を5分間、約2.88kg/cm2の圧力で軸方向に圧縮した。その後、XL 1500歯科用硬化光(3M ESPE(St.Paul,MN))に曝露することにより、サンプルを80秒間光硬化させ、続いてKulzer UniXS硬化ボックス(Heraeus Kulzer GmbH(Germany))内で90秒間照射した。試験サンプルをダイヤモンドの鋸で切断して、厚さ約2mmのディスクを形成し、これを試験前に約24時間37℃の蒸留水中で保存した。測定は、ISO規格7489(又はAmerican Dental Association(ADA)規格番号27)に従って、10キロニュートン(kN)のロードセルを用い、クロスヘッド速度1mm/分で、Instron試験機(Instron 4505、Instron Corp.(Canton,MA))で実施した。試験結果は、複数の測定値の平均として、MPa(メガパスカル)で記録した。
応力試験方法により、硬化プロセス時に試験サンプル組成物に発生する応力を測定する。15×8×8mmの矩形アルミニウムブロック内に、8×2.5×2mmスロットを機械加工し、各試験サンプル用の試験装置を作製した。スロットは端に沿って2mmの位置に配置し、したがって、試験する組成物を含む2mm幅の空洞に隣接し並行した2mm幅のアルミニウム尖点を作製した。線状可変変位変換器(モデルGT 1000、E309アナログ増幅器とともに使用、両方ともRDP Electronics(United Kingdom)製)を配置して、組成物を室温で光硬化させたときの尖点の変位を測定した。試験前に、アルミニウムブロックにおけるスロットを、Rocatec Plus Special Surface Coating Blasting Material(3M ESPE(St.Paul,MN))を用いて砂で磨き、RelyX Ceramic Primer(3M ESPE)で処理し、最後に、歯科用接着剤Adper Easy Bond(3M ESPE)で処理した。約100mgの試験組成物によりスロットを完全に充填した。スロット中の材料とほぼ接触するように(<1mm)配置された歯科用硬化ランプ(Elipar S−10、3M ESPE)を用いて、材料を1分間照射し、次いで、ランプを消した9分後に尖点の変位をマイクロメートルで記録した。
測定値1×4×1/16インチ(2.54×10.2×0.159cm)のアルミニウム製試験片を使用して、重なり剪断強度を試験した。試験片の約2.54cmの結合表面を、研磨パッド(Scotch−Brite Heavy Duty Scour Pad、3M Company(St.Paul,MN,USA))により研磨した。次に、紙タオルの上で、試験片に対してメチルエチルケトン(MEK)を吹きかけて試験片を洗浄し、紙タオルによりMEKを拭きとった。各試験用接着サンプル用に3つの試験片を用意した。
基材を接着剤で濡らし、接着剤組成物の取り扱い性、並びに可使時間、すなわちゲル化及び硬化させるまでにどの程度の間、接着剤を使用することができるかを評価する。8×2インチ(20.3×5.08cm)の高密度ポリエチレン(HDPE)試験片上に接着剤を(直径約1.8cm)で12箇所一列に分配し、接着剤試験サンプルを調製した。スペーサービーズ(重なりせん断試験を参照のこと)を各ドットの接着剤表面全体にまぶし、ストップウォッチを開始させるまでの間、最初の2つのドット上にガラス製顕微鏡スライドカバーガラスを載せ、押さえた。5分後、カバーガラスを次のドット上に載せ、押さえた。すべてのドットを覆って処理するまで、このプロセスを続けた。結合を形成するのに十分な程度接着剤がカバーガラスを濡らす最大の時間を、分数で濡れ時間として記録した。例えば、接着剤がカバーガラスの端を10分で濡らしたものの、15分で濡らすことはできなかった場合には、濡れ時間は10分として記録した。
硬化後に、アルミニウムシムに対する接着剤の変形を測定し、重合時に構造接着剤が受ける硬化応力を評価した。カール測定値が大きくなるほど、硬化させた接着剤中の応力が大きいことを示す。試験手順及び装置は、米国特許第13/169306号(2012年2月11日出願)に記載されている。
・1,2−エポキシ−3−フェノキシプロパン−TCI America(Portland,OR,USA)
・1−メトキシ−2−プロパノール−Alfa Aesar又はJT Bauer
・2−ヒドロキシエチルメタクリレート(HEMA)−Alfa Aesar又はJT Bauer
・2−メルカプトエタノール−Alfa Aesar(Ward Hill,MA,USA)
・3−クロロ−2−クロロメチル−1−プロペン−Secant Chemicals,Inc.(USA)
・3−イソシアナトプロピルトリエトキシシラン−Sigma Aldrich(St.Louis,MO,USA)
・3−トリエトキシシリルプロピルイソシアネート−Alfa Aesar(Ward Hill,MA,USA)
・BHT−ブチル化ヒドロキシトルエン、Sigma−Aldrich(Milwaukee,WI,USA)
・酢酸コバルト(II)四水和物−Alfa Aesar(Ward Hill,MA,USA)
・CPQ−カンファキノン、Sigma−Alrich
・DDDMA−ドデカンジオールジメタクリレート、Sartomer
・ジブチルスズジラウレート−Alfa Aesar(Ward Hill,MA,USA)
・ジメチルグリオキシム−Alfa Aesar(Ward Hill,MA,USA)
・DI水−脱イオン水
・ジオール2−米国特許公開第2012/0208965号、実施例2−ジオール2によるAFM−2の調製に記載の通りに調製したジオール
・DPIHFP−ジフェニルヨードニウムヘキサフルオロホスフェート(≧98%)、Sigma−Aldrich
・DP807接着剤−2部硬化性アクリル系樹脂、3M Scotch−Weld(商標)アクリル系接着剤樹脂DP807 Duo−pak、3M Company(St.Paul,MN)
・ENMAP−エチルN−メチル−N−フェニル−3−アミノプロピオネート、CAS番号2003−76−1;これは、米国特許出願第2010−0311858号(Holmes)中の式1−aの化合物である。化合物は、Adamsonら、JCSOA9;J.Chem.Soc.;1949;spl.144,152に記載の方法により合成することができる(この文献は参照により本明細書に組み込まれる)。
・ERGP−IEM−EP特許公開第EP 2401998号の実施例の節に記載の通りに調製
・エタノール−Pharmaco−AAPER(Brookfield,CT,USA)
・酢酸エチル−EMD Chemicals Inc.(Gibbstown,NJ,USA)
・GF−31シラン−3−メタクリルオキシプロピルトリメトキシシラン、Wacker Chemie AG(Munich,Germany);Silquest A−174、Momentive Performance Materials(Albany,NY)も使用
・Ciba Specialty Chemicalsから入手したIrgacure(商標)651光開始剤
・Nalco 2327kシリカゾル−水性ゾル中の20ナノメートル平均粒度シリカ粒子、41重量%固体、Nalco Company(Naperville,IL)
・NH4OH溶液−水酸化アンモニウム溶液、水中30%のNH4OH−Sigma Aldrich
・ナノジルコニアフィラー−SILQUEST A−1230の代わりにGF−31シランを使用したことを除き、米国特許第7,156,911号、調製例1Aに記載の通りに調製した、シラン処理ナノジルコニア粉末GF−31シランを、約1.2ミリモルのシラン/g酸化物で充填した。
・ナノシリカフィラー(20nmのシリカとしても言及される)−名目粒径20nmのシラン処理ナノシリカ粉末、米国特許第6,572,693号(第21段、第63〜67行、ナノサイズ粒子フィラー、タイプ2)に記載の通りに調製
・粒子A(125m2/gシリカ/ジルコニアナノクラスター)−米国特許第6,730,156号、調製例Aに概して記載の通りに調製した凝集粒子クラスター材料。材料の表面積は125m2/gであり、シリカ/ジルコニア重量比は73/27であった。材料の調製は、米国特許第20110196062号のジルコニア及びシリカナノ粒子(Bradley)を含むフィラー及び複合材の段[0067]〜[0073](2009年10月9日出願)並びにその参照文献(すなわち、米国特許第6,376,590号(Kolbら)(1999年10月28日出願)、又は米国特許第7,429,422号(Davidsonら)(2007年6月7日出願))に、より詳細に記載されており、これらの文献の各々は、参照により本明細書に組み込まれる。
・PETフィルム−米国特許第6,893,731号(Kausch)の実施例29に記載の通りに調製した、厚さ5ミル(0.127mm)のポリエステルフィルム
・ペンタエリスリトールトリアクリレートは、Sartomer USA,LLC(Exton,PA)から入手した
・Prostab 5198−4−ヒドロキシ−TEMPO、Sigma Aldrich(St.Louis,MO USA)
・ピリジン−Alfa Aesar(Heysham,Lanc,England)
・ナトリウム金属−Alfa Aesar(Ward Hill,MA,USA)
・UDMA−Rohamere(商標)6661−0(ジウレタンジメタクリレート、CAS番号41 137−60−4)、Rohm Tech,Inc.(Malden,MA)
・Vazo(商標)67−フリーラジカル開始剤、DuPont(Wilmington,DE)
・YbF3−フッ化イッテルビウム、100ナノメートル粒度(Sukgyung、Korea)。
実施例4において、10gの粒子A、1.0502gのAFL−1、10.64gの酢酸エチル、及び0.21gのNH4OH溶液を混合し、室温で一晩撹拌して、官能化フィラーを調製した。次に、混合物をフラッシュ乾燥させ、次に、80℃の炉の中で30分間乾燥させた。
表1に示した組成物を手で混合し、均一な混合物を形成して、樹脂組成物を調製した。
以降の手順に従い、表2に示す成分を有する組成物を調製した。Nalco 2327kシリカゾルを、テフロンで包まれた糸を用いて8オンス(235mL)ガラス瓶に添加し、マグネチックスターラーバーで撹拌した。メトキシプロパノール、Prostab、シラン(3−メタクリルオキシプロピルトリメトキシシラン)、並びにそれぞれ実施例1及び2に記載の通りに調製したAFL−1又はAFL−2を、4オンス(115mL)褐色ガラス瓶中で混合して、溶液を調製した。次に、溶液を、約5分かけて撹拌しながら、8オンス(235mL)瓶中のシリカゾルにゆっくりと添加した。
表3に示す量で、実施例8〜13及びC3からの官能化シリカナノ粒子のメトキシプロパノール溶液を、ペンタエリスリトールトリアクリレート及びIrgacure(商標)651と20mLガラスバイアル中で組み合わせて、ハードコート溶液を調製した。更なるメトキシプロパノールを添加して、溶液の固形分重量パーセントを50パーセントにした。溶液を十分に混合し、2〜5分間超音波処理した。
2部からなるメチルメタクリレート構造接着剤(DP807)を、表6に示す量で、実施例1からのAFL−1で修飾した。DP807接着剤は、基剤部と促進剤部とを持つデュオパックカートリッジとして供給され、1:1の割合でカートリッジから分配及び混合される。
AFL−1の代わりにAFL−2を使用したことを除き、構造接着剤を、実施例18〜21のように調製及び試験した。組成物及び試験結果を表6に示す。
Claims (14)
- 1)不安定な付加開裂基、及び2)少なくとも2つの表面結合官能基を含み、
下記式で表される、付加開裂剤。
[式中、R1、R2、及びR3は、各々独立して、Y−Q’−、(ヘテロ)アルキル基又はアリール基であり、ただし、R1、R2、及びR3のうちの少なくとも2つは、Y−Q’−であり、
Q’は共有結合又は連結基であり(ただし、連結基の側鎖にエチレン性不飽和重合性基を含む場合は除く)、
Yは、モノホスフェート、ホスホネート、ホスホン酸、ヒドロキサム酸、カルボン酸、及びアセトアセテート、無水物、イソニトリル基、シリル、ジスルフィド、チオール、アミノ、スルフィン酸、スルホン酸、ホスフィン、フェノール、ベンゾトリアゾリル、チアゾイル、ベンズイミダゾリル、又はピリジニルから選択される表面結合官能基であり、
各X1は、独立して、−O−又は−NR4−(式中、R4は、H又はC1〜C4アルキルである)であり、
nは、0又は1である。] - Q’が、式:−CrH2r−[式中、rが1〜10である。]で表されるアルキレンである、請求項1に記載の付加開裂剤。
- Q’が、式:−CH2−CH(OH)−CH2−で表されるヒドロキシル置換アルキレンである、請求項1に記載の付加開裂剤。
- Q’がアリールオキシ置換アルキレンである、請求項1に記載の付加開裂剤。
- Yが、式:−SiR7 3で表されるシリル基である、請求項1に記載の付加開裂剤。
[式中、R7基が、独立して、アルコキシ、アセトキシ、及びハロゲン化物の群から選択される。] - 請求項1に記載の付加開裂剤、フリーラジカルにより重合可能な少なくとも1つのモノマー及び開始剤を含む、重合性組成物。
- 100重量部の全モノマーa)〜e)に基づき、
a)85〜100重量部の(メタ)アクリル酸エステル、
b)0〜15重量部の酸官能性エチレン性不飽和モノマー、
c)0〜10重量部の非酸官能性エチレン性不飽和極性モノマー(ただし、前記非酸官能性エチレン性不飽和極性モノマーはモノマーa)、b)、d)及びe)とは異なる)、
d)0〜5部のビニルモノマー(ただし、前記ビニルモノマーはモノマーa)、b)、c)及びe)とは異なる)、及び
e)0〜5部の多官能性(メタ)アクリレートを含み、
100重量部のa)〜e)に基づき、
f)0.1〜12重量部の前記付加開裂剤、及び
g)開始剤、を含む、請求項6に記載の重合性組成物。 - 0.01〜5部の多官能性(メタ)アクリレートを更に含む、請求項7に記載の重合性組成物。
- 下記式で表される化合物を、
[式中、X2が、求電子性又は求核性の官能基を含み、
X3が、X2、X1−R2、又はX1−R3であり、
各X1は、独立して、−O−又は−NR4−(式中、R4は、H又はC1〜C4アルキルである)であり、
R 2 及びR 3 は、各々独立して、Y−Q’−、(ヘテロ)アルキル基又はアリール基であり、
Q’は共有結合又は連結基であり(ただし、連結基の側鎖にエチレン性不飽和重合性基を含む場合は除く)、
Yは、モノホスフェート、ホスホネート、ホスホン酸、ヒドロキサム酸、カルボン酸、及びアセトアセテート、無水物、イソニトリル基、シリル、ジスルフィド、チオール、アミノ、スルフィン酸、スルホン酸、ホスフィン、フェノール、ベンゾトリアゾリル、チアゾイル、ベンズイミダゾリル、又はピリジニルから選択される表面結合官能基であり、
nが、0又は1である。]
式(III)で表される化合物と反応させる工程を含む、付加開裂剤を作製する方法。
A2−R5*−Y III
[式中、A2が、官能基X2と共反応性である官能基であり、
R5*が、単結合、又はY基を反応性官能基A2に結合させる二価若しくは三価の(ヘテロ)ヒドロカルビル連結基であり(ただし、連結基の側鎖にエチレン性不飽和重合性基を含む場合は除く)、
Yは、モノホスフェート、ホスホネート、ホスホン酸、ヒドロキサム酸、カルボン酸、及びアセトアセテート、無水物、イソニトリル基、シリル、ジスルフィド、チオール、アミノ、スルフィン酸、スルホン酸、ホスフィン、フェノール、ベンゾトリアゾリル、チアゾイル、ベンズイミダゾリル、又はピリジニルから選択される表面結合官能基である。] - 下記式で表される表面修飾無機酸化物。
[式中、Fillerは、無機フィラー粒子であり、
R2は、Y−Q’−、(ヘテロ)アルキル基、又はアリール基であり、
Q’は共有結合又は連結基であり、
Y’は、表面結合官能基Yの残基であり、Yは、モノホスフェート、ホスホネート、ホスホン酸、ヒドロキサム酸、カルボン酸、及びアセトアセテート、無水物、イソニトリル基、シリル、ジスルフィド、チオール、アミノ、スルフィン酸、スルホン酸、ホスフィン、フェノール、ベンゾトリアゾリル、チアゾイル、ベンズイミダゾリル、又はピリジニルから選択され、
X1は、独立して、−O−又は−NR4−(式中、R4は、H又はC1〜C4アルキルである。)であり、
nは、0又は1である]。 - フリーラジカルにより重合可能な少なくとも1つのモノマー、開始剤、及び請求項10に記載の表面修飾無機酸化物を含む、重合性組成物。
- 1つ以上の多官能性(メタ)アクリレートモノマー又は(メタ)アクリレートオリゴマーと、請求項1〜5のいずれか一項に記載の付加開裂剤と、を含む、ハードコート組成物。
- 1つ以上の多官能性(メタ)アクリレートモノマー又は(メタ)アクリレートオリゴマーと、請求項12に記載の重合性組成物と、を含む、ハードコート組成物。
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